CN105278258B - 照明器件、曝光装置、调整方法和用于制造物品的方法 - Google Patents

照明器件、曝光装置、调整方法和用于制造物品的方法 Download PDF

Info

Publication number
CN105278258B
CN105278258B CN201510336459.3A CN201510336459A CN105278258B CN 105278258 B CN105278258 B CN 105278258B CN 201510336459 A CN201510336459 A CN 201510336459A CN 105278258 B CN105278258 B CN 105278258B
Authority
CN
China
Prior art keywords
light
light source
source cell
shade
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201510336459.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN105278258A (zh
Inventor
米山义邦
昼间健太郎
大阪昇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN105278258A publication Critical patent/CN105278258A/zh
Application granted granted Critical
Publication of CN105278258B publication Critical patent/CN105278258B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201510336459.3A 2014-06-17 2015-06-17 照明器件、曝光装置、调整方法和用于制造物品的方法 Active CN105278258B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014124752A JP6362095B2 (ja) 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法
JP2014-124752 2014-06-17

Publications (2)

Publication Number Publication Date
CN105278258A CN105278258A (zh) 2016-01-27
CN105278258B true CN105278258B (zh) 2017-10-24

Family

ID=54836065

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510336459.3A Active CN105278258B (zh) 2014-06-17 2015-06-17 照明器件、曝光装置、调整方法和用于制造物品的方法

Country Status (5)

Country Link
US (1) US9632423B2 (enExample)
JP (1) JP6362095B2 (enExample)
KR (1) KR101850584B1 (enExample)
CN (1) CN105278258B (enExample)
TW (1) TWI587097B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202016103819U1 (de) * 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
CN107179653B (zh) * 2017-07-20 2018-10-19 武汉华星光电技术有限公司 一种曝光机及其发光装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1199086C (zh) * 2001-07-27 2005-04-27 佳能株式会社 照明系统,投影曝光设备和器件制造方法
CN101276156A (zh) * 2007-03-28 2008-10-01 株式会社Orc制作所 曝光绘图装置
CN101548132A (zh) * 2007-04-12 2009-09-30 株式会社尼康 放电灯、连接用线缆、光源装置及曝光装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2899026B2 (ja) 1989-11-27 1999-06-02 株式会社日立製作所 マーク検出装置
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JP2633091B2 (ja) * 1991-02-22 1997-07-23 キヤノン株式会社 像投影方法、回路製造方法及び投影露光装置
JP2890892B2 (ja) * 1991-04-30 1999-05-17 キヤノン株式会社 露光装置及びそれを用いた素子製造方法
CN1045103C (zh) 1994-06-18 1999-09-15 兰州炼油化工总厂三星公司 一种烷基水杨酸盐润滑油添加剂
JP2000075496A (ja) * 1998-08-31 2000-03-14 Canon Inc 冷却機構を有する光源、光源装置及びこれを用いた露光装置
JP2000098099A (ja) * 1998-09-21 2000-04-07 Nikon Corp Ｘ線照明装置及びｘ線投影露光装置
US6704090B2 (en) * 2000-05-11 2004-03-09 Nikon Corporation Exposure method and exposure apparatus
JP2001326171A (ja) * 2000-05-18 2001-11-22 Canon Inc 照明装置
JP2004063988A (ja) * 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4086582B2 (ja) * 2002-08-06 2008-05-14 キヤノン株式会社 照明装置及び露光装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
JP4470558B2 (ja) * 2004-03-31 2010-06-02 ウシオ電機株式会社 光照射装置
JP4921512B2 (ja) * 2009-04-13 2012-04-25 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
JP4990416B2 (ja) 2010-08-23 2012-08-01 三菱電機株式会社 投写型表示装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1199086C (zh) * 2001-07-27 2005-04-27 佳能株式会社 照明系统,投影曝光设备和器件制造方法
CN101276156A (zh) * 2007-03-28 2008-10-01 株式会社Orc制作所 曝光绘图装置
CN101548132A (zh) * 2007-04-12 2009-09-30 株式会社尼康 放电灯、连接用线缆、光源装置及曝光装置

Also Published As

Publication number Publication date
TWI587097B (zh) 2017-06-11
KR101850584B1 (ko) 2018-04-19
US9632423B2 (en) 2017-04-25
US20150362843A1 (en) 2015-12-17
TW201600936A (zh) 2016-01-01
JP6362095B2 (ja) 2018-07-25
CN105278258A (zh) 2016-01-27
KR20150144711A (ko) 2015-12-28
JP2016004921A (ja) 2016-01-12

Similar Documents

Publication Publication Date Title
US9915621B2 (en) Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof
JP2004063988A (ja) 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
TW200821772A (en) Line width measuring method, image forming status detecting method, adjusting method, exposure method and device manufacturing method
JP2008544531A (ja) 瞳ファセットミラー上に減衰素子を備えた二重ファセット照明光学系
TW201027269A (en) Lighting optical system, exposure device and element manufacturing method
CN105629671B (zh) 照明光学装置和设备制造方法
JP2004247527A (ja) 照明光学装置、露光装置および露光方法
CN105278258B (zh) 照明器件、曝光装置、调整方法和用于制造物品的方法
JP2004087987A (ja) 露光装置及び方法、並びに、デバイス製造方法
JP3200244B2 (ja) 走査型露光装置
JP2021189397A (ja) 露光装置、露光方法、及び物品の製造方法
TW200844647A (en) Photomask inspecting apparatus, photomask inspecting method, method of producing a photomask for use in manufacturing a liquid crystal device and pattern transferring method
US20040022068A1 (en) Illumination optical system, exposure method and apparatus using the same
TWI768243B (zh) 確定用於微影光罩基材之複數個像素的位置之方法和裝置
JP2007027240A (ja) 照明光学装置、露光装置、および露光方法
JP2008181980A (ja) 照明装置の光強度分布の調整方法及び評価方法、照明装置、露光装置及びデバイス製造方法
CN107239005A (zh) 照明光学单元
JP3710321B2 (ja) 露光量制御方法、露光装置およびデバイス製造方法
JP3507459B2 (ja) 照明装置、露光装置及びデバイス製造方法
JP4078953B2 (ja) マーク位置検出装置ならびにその調整用基板および調整方法
JP5388019B2 (ja) 露光照明装置及び露光パターンの位置ずれ調整方法
JPH1041219A (ja) 投影露光装置及びそれを用いたデバイスの製造方法
KR100870028B1 (ko) 노광장치용 광축확인기 및 이를 구비한 노광장치
JPH0261131B2 (enExample)
JP2006253529A (ja) 照明光学装置、露光装置、および露光方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant