KR101850584B1 - 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법 - Google Patents

조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법 Download PDF

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Publication number
KR101850584B1
KR101850584B1 KR1020150084943A KR20150084943A KR101850584B1 KR 101850584 B1 KR101850584 B1 KR 101850584B1 KR 1020150084943 A KR1020150084943 A KR 1020150084943A KR 20150084943 A KR20150084943 A KR 20150084943A KR 101850584 B1 KR101850584 B1 KR 101850584B1
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KR
South Korea
Prior art keywords
light
light source
optical system
intensity distribution
illumination optical
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KR1020150084943A
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English (en)
Korean (ko)
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KR20150144711A (ko
Inventor
요시쿠니 요네야마
겐타로오 히루마
노보루 오사카
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • F21S2/005—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction of modular construction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S10/00—Lighting devices or systems producing a varying lighting effect
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V11/00—Screens not covered by groups F21V1/00, F21V3/00, F21V7/00 or F21V9/00
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/007—Array of lenses or refractors for a cluster of light sources, e.g. for arrangement of multiple light sources in one plane
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
    • F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
    • F21W2131/40—Lighting for industrial, commercial, recreational or military use
    • F21W2131/403—Lighting for industrial, commercial, recreational or military use for machines

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020150084943A 2014-06-17 2015-06-16 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법 Active KR101850584B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-124752 2014-06-17
JP2014124752A JP6362095B2 (ja) 2014-06-17 2014-06-17 照明装置、露光装置、調整方法、及び、物品の製造方法

Publications (2)

Publication Number Publication Date
KR20150144711A KR20150144711A (ko) 2015-12-28
KR101850584B1 true KR101850584B1 (ko) 2018-04-19

Family

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KR1020150084943A Active KR101850584B1 (ko) 2014-06-17 2015-06-16 조명 장치, 노광 장치, 조정 방법 및 물품의 제조 방법

Country Status (5)

Country Link
US (1) US9632423B2 (enExample)
JP (1) JP6362095B2 (enExample)
KR (1) KR101850584B1 (enExample)
CN (1) CN105278258B (enExample)
TW (1) TWI587097B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202016103819U1 (de) * 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
CN107179653B (zh) * 2017-07-20 2018-10-19 武汉华星光电技术有限公司 一种曝光机及其发光装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100259740A1 (en) * 2009-04-13 2010-10-14 Canon Kabushiki Kaisha Exposure method, exposure apparatus, and device manufacturing method
JP4990416B2 (ja) 2010-08-23 2012-08-01 三菱電機株式会社 投写型表示装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2899026B2 (ja) 1989-11-27 1999-06-02 株式会社日立製作所 マーク検出装置
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
JP2633091B2 (ja) * 1991-02-22 1997-07-23 キヤノン株式会社 像投影方法、回路製造方法及び投影露光装置
JP2890892B2 (ja) * 1991-04-30 1999-05-17 キヤノン株式会社 露光装置及びそれを用いた素子製造方法
CN1045103C (zh) 1994-06-18 1999-09-15 兰州炼油化工总厂三星公司 一种烷基水杨酸盐润滑油添加剂
JP2000075496A (ja) * 1998-08-31 2000-03-14 Canon Inc 冷却機構を有する光源、光源装置及びこれを用いた露光装置
JP2000098099A (ja) * 1998-09-21 2000-04-07 Nikon Corp Ｘ線照明装置及びｘ線投影露光装置
US6704090B2 (en) * 2000-05-11 2004-03-09 Nikon Corporation Exposure method and exposure apparatus
JP2001326171A (ja) * 2000-05-18 2001-11-22 Canon Inc 照明装置
EP1280008B2 (en) 2001-07-27 2011-09-14 Canon Kabushiki Kaisha Illumination system, projection exposure apparatus and device manufacturing method
JP2004063988A (ja) * 2002-07-31 2004-02-26 Canon Inc 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4086582B2 (ja) * 2002-08-06 2008-05-14 キヤノン株式会社 照明装置及び露光装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
JP4470558B2 (ja) * 2004-03-31 2010-06-02 ウシオ電機株式会社 光照射装置
TWI401538B (zh) 2007-03-28 2013-07-11 Orc Mfg Co Ltd Exposure drawing device
KR102016673B1 (ko) 2007-04-12 2019-08-30 가부시키가이샤 니콘 방전램프

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100259740A1 (en) * 2009-04-13 2010-10-14 Canon Kabushiki Kaisha Exposure method, exposure apparatus, and device manufacturing method
JP4990416B2 (ja) 2010-08-23 2012-08-01 三菱電機株式会社 投写型表示装置

Also Published As

Publication number Publication date
KR20150144711A (ko) 2015-12-28
US9632423B2 (en) 2017-04-25
US20150362843A1 (en) 2015-12-17
CN105278258A (zh) 2016-01-27
JP6362095B2 (ja) 2018-07-25
TWI587097B (zh) 2017-06-11
CN105278258B (zh) 2017-10-24
TW201600936A (zh) 2016-01-01
JP2016004921A (ja) 2016-01-12

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