JP2015518268A5 - - Google Patents

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Publication number
JP2015518268A5
JP2015518268A5 JP2015500917A JP2015500917A JP2015518268A5 JP 2015518268 A5 JP2015518268 A5 JP 2015518268A5 JP 2015500917 A JP2015500917 A JP 2015500917A JP 2015500917 A JP2015500917 A JP 2015500917A JP 2015518268 A5 JP2015518268 A5 JP 2015518268A5
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JP
Japan
Prior art keywords
pressure regulator
electron beam
guide body
beam lithography
hollow guide
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JP2015500917A
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English (en)
Japanese (ja)
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JP2015518268A (ja
JP6239583B2 (ja
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Priority claimed from PCT/EP2013/055865 external-priority patent/WO2013139878A2/en
Publication of JP2015518268A publication Critical patent/JP2015518268A/ja
Publication of JP2015518268A5 publication Critical patent/JP2015518268A5/ja
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Publication of JP6239583B2 publication Critical patent/JP6239583B2/ja
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JP2015500917A 2012-03-20 2013-03-20 ラジカルを輸送するための装置および方法 Active JP6239583B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261613391P 2012-03-20 2012-03-20
US61/613,391 2012-03-20
PCT/EP2013/055865 WO2013139878A2 (en) 2012-03-20 2013-03-20 Arrangement and method for transporting radicals

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017210550A Division JP2018050061A (ja) 2012-03-20 2017-10-31 ラジカルを輸送するための装置および方法

Publications (3)

Publication Number Publication Date
JP2015518268A JP2015518268A (ja) 2015-06-25
JP2015518268A5 true JP2015518268A5 (enExample) 2016-05-19
JP6239583B2 JP6239583B2 (ja) 2017-11-29

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Family Applications (4)

Application Number Title Priority Date Filing Date
JP2015500917A Active JP6239583B2 (ja) 2012-03-20 2013-03-20 ラジカルを輸送するための装置および方法
JP2017210550A Pending JP2018050061A (ja) 2012-03-20 2017-10-31 ラジカルを輸送するための装置および方法
JP2020135584A Active JP7166315B2 (ja) 2012-03-20 2020-08-11 ラジカルを輸送するための装置および方法
JP2022129814A Active JP7446374B2 (ja) 2012-03-20 2022-08-17 ラジカルを輸送するための装置および方法

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP2017210550A Pending JP2018050061A (ja) 2012-03-20 2017-10-31 ラジカルを輸送するための装置および方法
JP2020135584A Active JP7166315B2 (ja) 2012-03-20 2020-08-11 ラジカルを輸送するための装置および方法
JP2022129814A Active JP7446374B2 (ja) 2012-03-20 2022-08-17 ラジカルを輸送するための装置および方法

Country Status (8)

Country Link
US (2) US9123507B2 (enExample)
EP (1) EP2828708B1 (enExample)
JP (4) JP6239583B2 (enExample)
KR (4) KR102136829B1 (enExample)
CN (2) CN106933063B (enExample)
NL (3) NL2010488C2 (enExample)
RU (2) RU2642494C2 (enExample)
WO (1) WO2013139878A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013226678A1 (de) * 2013-12-19 2015-06-25 Carl Zeiss Smt Gmbh EUV-Lithographiesystem und Transporteinrichtung zum Transport eines reflektiven optischen Elements
US9981293B2 (en) * 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems
NL2022156B1 (en) 2018-12-10 2020-07-02 Asml Netherlands Bv Plasma source control circuit
CN114616198A (zh) * 2019-11-22 2022-06-10 Abb瑞士股份有限公司 输送机、输送系统以及输送机的制造方法
CN111638569B (zh) * 2020-07-17 2022-04-22 中国人民解放军空军工程大学 一种射频感性耦合等离子体叠加相位梯度超表面吸波结构

Family Cites Families (63)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS586129A (ja) * 1981-07-03 1983-01-13 Fujitsu Ltd 電子ビ−ム露光装置
US4555303A (en) * 1984-10-02 1985-11-26 Motorola, Inc. Oxidation of material in high pressure oxygen plasma
JPS62274080A (ja) * 1986-05-21 1987-11-28 Hitachi Ltd プラズマ処理方法
US4870030A (en) 1987-09-24 1989-09-26 Research Triangle Institute, Inc. Remote plasma enhanced CVD method for growing an epitaxial semiconductor layer
JP3253675B2 (ja) * 1991-07-04 2002-02-04 株式会社東芝 荷電ビーム照射装置及び方法
US5466942A (en) * 1991-07-04 1995-11-14 Kabushiki Kaisha Toshiba Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus
JPH05198536A (ja) * 1992-01-23 1993-08-06 Sony Corp ドライエッチング方法
CN1078768A (zh) * 1992-05-16 1993-11-24 S·H·福尔 进气控制装置
JP3258104B2 (ja) * 1992-12-21 2002-02-18 株式会社東芝 荷電ビーム照射方法及び装置
JP3568553B2 (ja) * 1993-03-18 2004-09-22 富士通株式会社 荷電粒子ビーム露光装置及びそのクリーニング方法
JPH0737807A (ja) * 1993-07-21 1995-02-07 Hitachi Ltd 原子、分子線による表面処理方法およびその装置
JP3466744B2 (ja) * 1993-12-29 2003-11-17 株式会社東芝 洗浄機能付き荷電ビーム装置および荷電ビーム装置の洗浄方法
JP3257742B2 (ja) * 1994-03-15 2002-02-18 富士通株式会社 電子ビーム露光装置
US5665640A (en) 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
JPH09223594A (ja) * 1996-02-16 1997-08-26 Ebara Corp ビーム源及び微細加工方法
JP3827359B2 (ja) * 1996-03-19 2006-09-27 富士通株式会社 荷電粒子ビーム露光方法及びその装置
JPH09293472A (ja) 1996-04-26 1997-11-11 Fujitsu Ltd 荷電粒子ビーム露光装置、その露光方法及びその製造方法
US5788778A (en) 1996-09-16 1998-08-04 Applied Komatsu Technology, Inc. Deposition chamber cleaning technique using a high power remote excitation source
US6039834A (en) 1997-03-05 2000-03-21 Applied Materials, Inc. Apparatus and methods for upgraded substrate processing system with microwave plasma source
US8075789B1 (en) * 1997-07-11 2011-12-13 Applied Materials, Inc. Remote plasma cleaning source having reduced reactivity with a substrate processing chamber
JPH11135297A (ja) * 1997-10-31 1999-05-21 Kumagai Hiromi プラズマ発生器
US6182603B1 (en) * 1998-07-13 2001-02-06 Applied Komatsu Technology, Inc. Surface-treated shower head for use in a substrate processing chamber
US6989546B2 (en) * 1998-08-19 2006-01-24 Ims-Innenmikrofabrikations Systeme Gmbh Particle multibeam lithography
GB9822294D0 (en) 1998-10-14 1998-12-09 Univ Birmingham Contaminant removal method
US6105589A (en) * 1999-01-11 2000-08-22 Vane; Ronald A. Oxidative cleaning method and apparatus for electron microscopes using an air plasma as an oxygen radical source
US6394109B1 (en) 1999-04-13 2002-05-28 Applied Materials, Inc. Method and apparatus for removing carbon contamination in a sub-atmospheric charged particle beam lithography system
JP2001144000A (ja) 1999-11-16 2001-05-25 Nikon Corp 荷電粒子線転写装置及びそのクリーニング方法並びにそれを用いるデバイス製造方法
JP2001148340A (ja) * 1999-11-19 2001-05-29 Advantest Corp 荷電粒子ビーム露光方法及び装置
US6465795B1 (en) 2000-03-28 2002-10-15 Applied Materials, Inc. Charge neutralization of electron beam systems
US6387207B1 (en) 2000-04-28 2002-05-14 Applied Materials, Inc. Integration of remote plasma generator with semiconductor processing chamber
US6905547B1 (en) * 2000-12-21 2005-06-14 Genus, Inc. Method and apparatus for flexible atomic layer deposition
US20020144706A1 (en) * 2001-04-10 2002-10-10 Davis Matthew F. Remote plasma cleaning of pumpstack components of a reactor chamber
US6772776B2 (en) 2001-09-18 2004-08-10 Euv Llc Apparatus for in situ cleaning of carbon contaminated surfaces
US6936551B2 (en) 2002-05-08 2005-08-30 Applied Materials Inc. Methods and apparatus for E-beam treatment used to fabricate integrated circuit devices
KR101060557B1 (ko) 2002-10-25 2011-08-31 마퍼 리쏘그라피 아이피 비.브이. 리소그라피 시스템
KR101077098B1 (ko) * 2002-10-30 2011-10-26 마퍼 리쏘그라피 아이피 비.브이. 전자 빔 노출 시스템
KR100536140B1 (ko) * 2002-11-26 2005-12-14 한국전자통신연구원 반도체 소자의 제조 장치 및 이를 이용한 반도체 소자의제조 방법
DE60323927D1 (de) 2002-12-13 2008-11-20 Asml Netherlands Bv Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
KR101068607B1 (ko) 2003-03-10 2011-09-30 마퍼 리쏘그라피 아이피 비.브이. 복수 개의 빔렛 발생 장치
JP4949843B2 (ja) 2003-05-28 2012-06-13 マッパー・リソグラフィー・アイピー・ビー．ブイ． 荷電粒子ビームレット露光システム
JP2005208120A (ja) * 2004-01-20 2005-08-04 Ebara Corp 試料修正装置及び試料修正方法並びに該方法を用いたデバイス製造方法
JP2006128542A (ja) * 2004-11-01 2006-05-18 Nec Electronics Corp 電子デバイスの製造方法
ITMI20050585A1 (it) * 2005-04-07 2006-10-08 Francesco Cino Matacotta Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma
KR100717505B1 (ko) * 2005-11-25 2007-05-14 동부일렉트로닉스 주식회사 노광장치의 투영 렌즈 세정장치
US7465943B2 (en) 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
JP4952375B2 (ja) 2007-05-23 2012-06-13 株式会社明電舎 レジスト除去方法及びその装置
CN100591801C (zh) * 2007-09-30 2010-02-24 南京大学 快速大面积制备薄膜材料的装置及设置方法
JP5017232B2 (ja) * 2007-10-31 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング装置および液浸リソグラフィ装置
KR20140097574A (ko) * 2007-11-06 2014-08-06 칼 짜이스 에스엠티 게엠베하 광학면으로부터 오염층을 제거하는 방법, 세정 가스를 생성하는 방법 및 대응하는 세정 및 세정 가스 생성 장치들
US8089056B2 (en) * 2008-02-26 2012-01-03 Mapper Lithography Ip B.V. Projection lens arrangement
US7967913B2 (en) * 2008-10-22 2011-06-28 Applied Materials, Inc. Remote plasma clean process with cycled high and low pressure clean steps
WO2010094719A1 (en) * 2009-02-22 2010-08-26 Mapper Lithography Ip B.V. Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
CN102414776A (zh) * 2009-02-22 2012-04-11 迈普尔平版印刷Ip有限公司 微影机及基板处理的配置
CN102414775A (zh) * 2009-02-22 2012-04-11 迈普尔平版印刷Ip有限公司 用于在真空腔中实现真空的方法和配置
JP5658245B2 (ja) * 2009-06-23 2015-01-21 エーエスエムエル ネザーランズ ビー．ブイ． レーザクリーニングデバイス、リソグラフィ投影装置および表面を浄化する方法
US8349125B2 (en) * 2009-07-24 2013-01-08 Xei Scientific, Inc. Cleaning device for transmission electron microscopes
CN102098863B (zh) * 2009-12-14 2013-09-11 北京北方微电子基地设备工艺研究中心有限责任公司 用于等离子体加工设备的电极板和清除工艺沉积物的方法
JP5988537B2 (ja) * 2010-06-10 2016-09-07 株式会社ニコン 荷電粒子線露光装置及びデバイス製造方法
JP2012023316A (ja) * 2010-07-16 2012-02-02 Canon Inc 荷電粒子線描画装置および物品の製造方法
JP5709535B2 (ja) * 2011-01-07 2015-04-30 キヤノン株式会社 電子ビーム描画装置、およびそれを用いた物品の製造方法
JP5709546B2 (ja) * 2011-01-19 2015-04-30 キヤノン株式会社 エネルギービーム描画装置及びデバイス製造方法
JP5785436B2 (ja) 2011-05-09 2015-09-30 キヤノン株式会社 荷電粒子線描画装置およびそのクリーニング方法ならびにデバイスの製造方法
US9224580B2 (en) * 2011-09-28 2015-12-29 Mapper Litohgraphy Ip B.V. Plasma generator

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