WO2018127565A3 - Guiding device and associated system - Google Patents
Guiding device and associated system Download PDFInfo
- Publication number
- WO2018127565A3 WO2018127565A3 PCT/EP2018/050278 EP2018050278W WO2018127565A3 WO 2018127565 A3 WO2018127565 A3 WO 2018127565A3 EP 2018050278 W EP2018050278 W EP 2018050278W WO 2018127565 A3 WO2018127565 A3 WO 2018127565A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- euv
- radiation
- vessel wall
- inner vessel
- Prior art date
Links
- 230000005855 radiation Effects 0.000 abstract 5
- 230000015572 biosynthetic process Effects 0.000 abstract 3
- 238000011109 contamination Methods 0.000 abstract 1
- 230000000116 mitigating effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
- H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
Abstract
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019531630A JP7193459B2 (en) | 2017-01-06 | 2018-01-05 | Extreme ultraviolet source (EUV source) |
CN201880006126.6A CN110169206B (en) | 2017-01-06 | 2018-01-05 | Guiding device and associated system |
KR1020197022981A KR102536355B1 (en) | 2017-01-06 | 2018-01-05 | Guidance devices and related systems |
CN202311317803.5A CN117202469A (en) | 2017-01-06 | 2018-01-05 | Guiding device and associated system |
US16/469,689 US10955749B2 (en) | 2017-01-06 | 2018-01-05 | Guiding device and associated system |
US17/155,951 US11822252B2 (en) | 2017-01-06 | 2021-01-22 | Guiding device and associated system |
JP2022140574A JP7465923B2 (en) | 2017-01-06 | 2022-09-05 | Extreme ultraviolet radiation source |
US18/380,439 US20240085796A1 (en) | 2017-01-06 | 2023-10-16 | Guiding device and associated system |
JP2024059164A JP2024091652A (en) | 2017-01-06 | 2024-04-01 | RADIATION SOURCE, LITHOGRAPHY SYSTEM AND INSPECTION SYSTEM |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201715400929A | 2017-01-06 | 2017-01-06 | |
US15/400,929 | 2017-01-06 | ||
EP17158280.2 | 2017-02-28 | ||
EP17158280 | 2017-02-28 | ||
US201762596629P | 2017-12-08 | 2017-12-08 | |
US62/596,629 | 2017-12-08 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US201715400929A Continuation-In-Part | 2017-01-06 | 2017-01-06 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/469,689 A-371-Of-International US10955749B2 (en) | 2017-01-06 | 2018-01-05 | Guiding device and associated system |
US17/155,951 Continuation US11822252B2 (en) | 2017-01-06 | 2021-01-22 | Guiding device and associated system |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2018127565A2 WO2018127565A2 (en) | 2018-07-12 |
WO2018127565A3 true WO2018127565A3 (en) | 2018-09-27 |
Family
ID=62789234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2018/050278 WO2018127565A2 (en) | 2017-01-06 | 2018-01-05 | Guiding device and associated system |
Country Status (2)
Country | Link |
---|---|
NL (1) | NL2020238A (en) |
WO (1) | WO2018127565A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2022644A (en) | 2018-03-05 | 2019-09-10 | Asml Netherlands Bv | Prolonging optical element lifetime in an euv lithography system |
NL2024042A (en) | 2018-10-22 | 2020-05-07 | Asml Netherlands Bv | Apparatus for and method of reducing contamination from source material in an euv light source |
US11153957B2 (en) | 2018-10-31 | 2021-10-19 | Taiwan Semiconductor Manufacturing Company Ltd. | Apparatus and method for generating an electromagnetic radiation |
JP7311296B2 (en) | 2019-04-01 | 2023-07-19 | ギガフォトン株式会社 | EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method |
EP3798730A1 (en) | 2019-09-30 | 2021-03-31 | ASML Netherlands B.V. | Radiation conduit |
JP2023506424A (en) | 2019-12-23 | 2023-02-16 | エーエスエムエル ネザーランズ ビー.ブイ. | collector flow ring |
JP7467174B2 (en) | 2020-03-16 | 2024-04-15 | ギガフォトン株式会社 | Chamber apparatus, extreme ultraviolet light generating apparatus, and method for manufacturing electronic device |
JP7389691B2 (en) | 2020-03-18 | 2023-11-30 | ギガフォトン株式会社 | Extreme ultraviolet light generation device, extreme ultraviolet light generation system, and electronic device manufacturing method |
JP2021152601A (en) | 2020-03-24 | 2021-09-30 | ギガフォトン株式会社 | Extreme ultraviolet generator, and method for manufacturing electronic device |
KR20220167375A (en) | 2020-04-13 | 2022-12-20 | 에이에스엠엘 네델란즈 비.브이. | Apparatus and method for controlling gas flow in an EUV light source |
EP4203626A1 (en) * | 2021-12-22 | 2023-06-28 | ASML Netherlands B.V. | Vessel for a radiation source |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090073396A1 (en) * | 2007-09-17 | 2009-03-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20090154642A1 (en) * | 2007-12-14 | 2009-06-18 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US20110164236A1 (en) * | 2008-09-11 | 2011-07-07 | Asml Netherlands B.V. | Radiation source and lithographic apparatus |
WO2011110383A1 (en) * | 2010-03-12 | 2011-09-15 | Asml Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
US20140306115A1 (en) * | 2013-04-10 | 2014-10-16 | Kla-Tencor Corporation | Debris Protection System For Reflective Optic Utilizing Gas Flow |
US20150008335A1 (en) * | 2013-02-14 | 2015-01-08 | Kla-Tencor Corporation | System and method for producing an exclusionary buffer gas flow in an euv light source |
-
2018
- 2018-01-05 NL NL2020238A patent/NL2020238A/en unknown
- 2018-01-05 WO PCT/EP2018/050278 patent/WO2018127565A2/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090073396A1 (en) * | 2007-09-17 | 2009-03-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20090154642A1 (en) * | 2007-12-14 | 2009-06-18 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
US20110164236A1 (en) * | 2008-09-11 | 2011-07-07 | Asml Netherlands B.V. | Radiation source and lithographic apparatus |
WO2011110383A1 (en) * | 2010-03-12 | 2011-09-15 | Asml Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
US20150008335A1 (en) * | 2013-02-14 | 2015-01-08 | Kla-Tencor Corporation | System and method for producing an exclusionary buffer gas flow in an euv light source |
US20140306115A1 (en) * | 2013-04-10 | 2014-10-16 | Kla-Tencor Corporation | Debris Protection System For Reflective Optic Utilizing Gas Flow |
Also Published As
Publication number | Publication date |
---|---|
WO2018127565A2 (en) | 2018-07-12 |
NL2020238A (en) | 2018-07-23 |
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