JP2015511403A5 - - Google Patents

Download PDF

Info

Publication number
JP2015511403A5
JP2015511403A5 JP2014556783A JP2014556783A JP2015511403A5 JP 2015511403 A5 JP2015511403 A5 JP 2015511403A5 JP 2014556783 A JP2014556783 A JP 2014556783A JP 2014556783 A JP2014556783 A JP 2014556783A JP 2015511403 A5 JP2015511403 A5 JP 2015511403A5
Authority
JP
Japan
Prior art keywords
temperature
substrate
chamber walls
gas
exposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014556783A
Other languages
English (en)
Japanese (ja)
Other versions
JP6254098B2 (ja
JP2015511403A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from US13/764,137 external-priority patent/US8993458B2/en
Publication of JP2015511403A publication Critical patent/JP2015511403A/ja
Publication of JP2015511403A5 publication Critical patent/JP2015511403A5/ja
Application granted granted Critical
Publication of JP6254098B2 publication Critical patent/JP6254098B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014556783A 2012-02-13 2013-02-11 基板の選択性酸化のための方法および装置 Active JP6254098B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261597900P 2012-02-13 2012-02-13
US61/597,900 2012-02-13
US13/764,137 2013-02-11
US13/764,137 US8993458B2 (en) 2012-02-13 2013-02-11 Methods and apparatus for selective oxidation of a substrate
PCT/US2013/025577 WO2013122874A1 (en) 2012-02-13 2013-02-11 Methods and apparatus for selective oxidation of a substrate

Publications (3)

Publication Number Publication Date
JP2015511403A JP2015511403A (ja) 2015-04-16
JP2015511403A5 true JP2015511403A5 (cg-RX-API-DMAC7.html) 2016-06-09
JP6254098B2 JP6254098B2 (ja) 2017-12-27

Family

ID=48945926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014556783A Active JP6254098B2 (ja) 2012-02-13 2013-02-11 基板の選択性酸化のための方法および装置

Country Status (5)

Country Link
US (2) US8993458B2 (cg-RX-API-DMAC7.html)
JP (1) JP6254098B2 (cg-RX-API-DMAC7.html)
KR (1) KR102028779B1 (cg-RX-API-DMAC7.html)
CN (1) CN104106128B (cg-RX-API-DMAC7.html)
WO (1) WO2013122874A1 (cg-RX-API-DMAC7.html)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106637048A (zh) * 2016-12-29 2017-05-10 常州大学 一种低露点下选择性氧化薄膜的制备方法
TWI700750B (zh) * 2017-01-24 2020-08-01 美商應用材料股份有限公司 用於介電薄膜的選擇性沉積之方法及設備
US10224224B2 (en) 2017-03-10 2019-03-05 Micromaterials, LLC High pressure wafer processing systems and related methods
US10847360B2 (en) 2017-05-25 2020-11-24 Applied Materials, Inc. High pressure treatment of silicon nitride film
US10622214B2 (en) 2017-05-25 2020-04-14 Applied Materials, Inc. Tungsten defluorination by high pressure treatment
WO2018222771A1 (en) 2017-06-02 2018-12-06 Applied Materials, Inc. Dry stripping of boron carbide hardmask
US10276411B2 (en) 2017-08-18 2019-04-30 Applied Materials, Inc. High pressure and high temperature anneal chamber
WO2019036157A1 (en) 2017-08-18 2019-02-21 Applied Materials, Inc. HIGH PRESSURE AND HIGH TEMPERATURE RECOVERY CHAMBER
SG11202001450UA (en) 2017-09-12 2020-03-30 Applied Materials Inc Apparatus and methods for manufacturing semiconductor structures using protective barrier layer
US10643867B2 (en) 2017-11-03 2020-05-05 Applied Materials, Inc. Annealing system and method
KR102779084B1 (ko) 2017-11-11 2025-03-07 마이크로머티어리얼즈 엘엘씨 고압 프로세싱 챔버를 위한 가스 전달 시스템
CN111373519B (zh) 2017-11-16 2021-11-23 应用材料公司 高压蒸气退火处理设备
WO2019099255A2 (en) 2017-11-17 2019-05-23 Applied Materials, Inc. Condenser system for high pressure processing system
TWI794363B (zh) 2017-12-20 2023-03-01 美商應用材料股份有限公司 金屬薄膜之高壓氧化
SG11202006867QA (en) 2018-01-24 2020-08-28 Applied Materials Inc Seam healing using high pressure anneal
WO2019173006A1 (en) 2018-03-09 2019-09-12 Applied Materials, Inc. High pressure annealing process for metal containing materials
US10714331B2 (en) 2018-04-04 2020-07-14 Applied Materials, Inc. Method to fabricate thermally stable low K-FinFET spacer
US10950429B2 (en) 2018-05-08 2021-03-16 Applied Materials, Inc. Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom
US10566188B2 (en) 2018-05-17 2020-02-18 Applied Materials, Inc. Method to improve film stability
US10704141B2 (en) 2018-06-01 2020-07-07 Applied Materials, Inc. In-situ CVD and ALD coating of chamber to control metal contamination
US10748783B2 (en) 2018-07-25 2020-08-18 Applied Materials, Inc. Gas delivery module
US10675581B2 (en) 2018-08-06 2020-06-09 Applied Materials, Inc. Gas abatement apparatus
JP7179172B6 (ja) 2018-10-30 2022-12-16 アプライド マテリアルズ インコーポレイテッド 半導体用途の構造体をエッチングするための方法
JP2022507390A (ja) 2018-11-16 2022-01-18 アプライド マテリアルズ インコーポレイテッド 強化拡散プロセスを使用する膜の堆積
WO2020117462A1 (en) 2018-12-07 2020-06-11 Applied Materials, Inc. Semiconductor processing system
US11322347B2 (en) 2018-12-14 2022-05-03 Applied Materials, Inc. Conformal oxidation processes for 3D NAND
US11901222B2 (en) 2020-02-17 2024-02-13 Applied Materials, Inc. Multi-step process for flowable gap-fill film
US11996305B2 (en) * 2021-06-29 2024-05-28 Applied Materials, Inc. Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation

Family Cites Families (89)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2814009B2 (ja) 1990-06-05 1998-10-22 三菱電機株式会社 半導体装置の製造方法
JPH07118522B2 (ja) 1990-10-24 1995-12-18 インターナショナル・ビジネス・マシーンズ・コーポレイション 基板表面を酸化処理するための方法及び半導体の構造
KR940009597B1 (ko) * 1991-08-22 1994-10-15 삼성전자 주식회사 반도체장치의 게이트산화막 형성법
JPH05343391A (ja) 1992-06-04 1993-12-24 Fujitsu Ltd 半導体装置の製造方法
JP3271407B2 (ja) * 1993-12-24 2002-04-02 ソニー株式会社 熱処理方法及び熱処理装置
JPH07273101A (ja) * 1994-03-31 1995-10-20 Tokyo Electron Ltd 枚葉式熱処理装置
JP3383140B2 (ja) 1995-10-02 2003-03-04 株式会社東芝 不揮発性半導体記憶装置の製造方法
JP3084232B2 (ja) * 1996-06-04 2000-09-04 イートン コーポレーション 縦型加熱処理装置
US6071572A (en) 1996-10-15 2000-06-06 Applied Materials, Inc. Forming tin thin films using remote activated specie generation
US5800621A (en) 1997-02-10 1998-09-01 Applied Materials, Inc. Plasma source for HDP-CVD chamber
JPH10313004A (ja) * 1997-05-09 1998-11-24 Oki Electric Ind Co Ltd 半導体装置の製造方法
JP3413174B2 (ja) * 1997-07-11 2003-06-03 アプライド マテリアルズ インコーポレイテッド Ｉｎ−ｓｉｔｕ蒸気生成方法及び装置
WO1999027575A1 (fr) 1997-11-20 1999-06-03 Tokyo Electron Limited Procede de formation d'un film par plasma
FR2777115B1 (fr) * 1998-04-07 2001-07-13 Commissariat Energie Atomique Procede de traitement de substrats semi-conducteurs et structures obtenues par ce procede
US6114258A (en) 1998-10-19 2000-09-05 Applied Materials, Inc. Method of oxidizing a substrate in the presence of nitride and oxynitride films
US6159835A (en) 1998-12-18 2000-12-12 Texas Instruments Incorporated Encapsulated low resistance gate structure and method for forming same
US6450116B1 (en) 1999-04-22 2002-09-17 Applied Materials, Inc. Apparatus for exposing a substrate to plasma radicals
US6348420B1 (en) 1999-12-23 2002-02-19 Asm America, Inc. Situ dielectric stacks
TW520453B (en) 1999-12-27 2003-02-11 Seiko Epson Corp A method to fabricate thin insulating films
JP4222707B2 (ja) 2000-03-24 2009-02-12 東京エレクトロン株式会社 プラズマ処理装置及び方法、ガス供給リング及び誘電体
US6598559B1 (en) * 2000-03-24 2003-07-29 Applied Materials, Inc. Temperature controlled chamber
EP1340247B1 (en) 2000-09-19 2010-11-24 Mattson Technology Inc. Method of forming dielectric films
US6458714B1 (en) 2000-11-22 2002-10-01 Micron Technology, Inc. Method of selective oxidation in semiconductor manufacture
US6617266B2 (en) 2001-04-12 2003-09-09 Applied Materials, Inc. Barium strontium titanate annealing process
US6596653B2 (en) 2001-05-11 2003-07-22 Applied Materials, Inc. Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD
US6627501B2 (en) 2001-05-25 2003-09-30 Macronix International Co., Ltd. Method of forming tunnel oxide layer
US6753506B2 (en) 2001-08-23 2004-06-22 Axcelis Technologies System and method of fast ambient switching for rapid thermal processing
JP2003086569A (ja) 2001-09-12 2003-03-20 Tokyo Electron Ltd プラズマ処理方法
US6716734B2 (en) 2001-09-28 2004-04-06 Infineon Technologies Ag Low temperature sidewall oxidation of W/WN/poly-gatestack
US6812515B2 (en) 2001-11-26 2004-11-02 Hynix Semiconductor, Inc. Polysilicon layers structure and method of forming same
US7220312B2 (en) 2002-03-13 2007-05-22 Micron Technology, Inc. Methods for treating semiconductor substrates
TWI225668B (en) 2002-05-13 2004-12-21 Tokyo Electron Ltd Substrate processing method
US20030232507A1 (en) 2002-06-12 2003-12-18 Macronix International Co., Ltd. Method for fabricating a semiconductor device having an ONO film
US7566929B2 (en) 2002-07-05 2009-07-28 Samsung Electronics Co., Ltd. Nonvolatile memory devices having floating gate electrodes with nitrogen-doped layers on portions thereof
US20040077142A1 (en) 2002-10-17 2004-04-22 Taiwan Semiconductor Manufacturing Co., Ltd. Atomic layer deposition and plasma treatment method for forming microelectronic capacitor structure with aluminum oxide containing dual dielectric layer
US6803275B1 (en) 2002-12-03 2004-10-12 Fasl, Llc ONO fabrication process for reducing oxygen vacancy content in bottom oxide layer in flash memory devices
US6806202B2 (en) 2002-12-03 2004-10-19 Motorola, Inc. Method of removing silicon oxide from a surface of a substrate
US7189652B1 (en) 2002-12-06 2007-03-13 Cypress Semiconductor Corporation Selective oxidation of gate stack
KR100497607B1 (ko) 2003-02-17 2005-07-01 삼성전자주식회사 박막 형성 방법 및 박막 증착 장치
JP2004335957A (ja) * 2003-05-12 2004-11-25 Trecenti Technologies Inc 半導体装置の製造方法
JP4694108B2 (ja) 2003-05-23 2011-06-08 東京エレクトロン株式会社 酸化膜形成方法、酸化膜形成装置および電子デバイス材料
US6958112B2 (en) 2003-05-27 2005-10-25 Applied Materials, Inc. Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation
US7179754B2 (en) 2003-05-28 2007-02-20 Applied Materials, Inc. Method and apparatus for plasma nitridation of gate dielectrics using amplitude modulated radio-frequency energy
US7534709B2 (en) 2003-05-29 2009-05-19 Samsung Electronics Co., Ltd. Semiconductor device and method of manufacturing the same
KR100471407B1 (ko) 2003-06-30 2005-03-14 주식회사 하이닉스반도체 폴리메탈 게이트 전극을 갖는 트랜지스터 제조 방법
KR100616498B1 (ko) 2003-07-26 2006-08-25 주식회사 하이닉스반도체 폴리/텅스텐 게이트 전극을 갖는 반도체 소자의 제조방법
US6982196B2 (en) 2003-11-04 2006-01-03 International Business Machines Corporation Oxidation method for altering a film structure and CMOS transistor structure formed therewith
US6955964B2 (en) 2003-11-05 2005-10-18 Promos Technologies, Inc. Formation of a double gate structure
US20050101147A1 (en) 2003-11-08 2005-05-12 Advanced Micro Devices, Inc. Method for integrating a high-k gate dielectric in a transistor fabrication process
US7115530B2 (en) 2003-12-03 2006-10-03 Texas Instruments Incorporated Top surface roughness reduction of high-k dielectric materials using plasma based processes
US8227019B2 (en) * 2003-12-15 2012-07-24 Superpower Inc. High-throughput ex-situ method for rare-earth-barium-copper-oxide (REBCO) film growth
WO2005083795A1 (ja) 2004-03-01 2005-09-09 Tokyo Electron Limited 半導体装置の製造方法及びプラズマ酸化処理方法
US7497959B2 (en) 2004-05-11 2009-03-03 International Business Machines Corporation Methods and structures for protecting one area while processing another area on a chip
US7229931B2 (en) 2004-06-16 2007-06-12 Applied Materials, Inc. Oxygen plasma treatment for enhanced HDP-CVD gapfill
WO2006016642A1 (ja) 2004-08-13 2006-02-16 Tokyo Electron Limited 半導体装置の製造方法およびプラズマ酸化処理方法
KR100580587B1 (ko) 2004-09-07 2006-05-16 삼성전자주식회사 반도체 장치의 제조 방법
US7521316B2 (en) 2004-09-09 2009-04-21 Samsung Electronics Co., Ltd. Methods of forming gate structures for semiconductor devices
US20060105114A1 (en) 2004-11-16 2006-05-18 White John M Multi-layer high quality gate dielectric for low-temperature poly-silicon TFTs
US7214628B2 (en) 2005-02-02 2007-05-08 Applied Materials, Inc. Plasma gate oxidation process using pulsed RF source power
US7141514B2 (en) 2005-02-02 2006-11-28 Applied Materials, Inc. Selective plasma re-oxidation process using pulsed RF source power
KR100966086B1 (ko) * 2005-03-08 2010-06-28 가부시키가이샤 히다치 고쿠사이 덴키 반도체장치의 제조 방법 및 기판처리장치
JPWO2006098300A1 (ja) 2005-03-16 2008-08-21 株式会社日立国際電気 基板処理方法及び基板処理装置
US7972441B2 (en) 2005-04-05 2011-07-05 Applied Materials, Inc. Thermal oxidation of silicon using ozone
KR100678632B1 (ko) 2005-06-23 2007-02-05 삼성전자주식회사 반도체 집적 회로 장치의 제조 방법
US7355240B2 (en) 2005-09-22 2008-04-08 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor product including logic, non-volatile memory and volatile memory devices and method for fabrication thereof
KR100689679B1 (ko) 2005-09-22 2007-03-09 주식회사 하이닉스반도체 반도체 소자 제조 방법
US7727828B2 (en) * 2005-10-20 2010-06-01 Applied Materials, Inc. Method for fabricating a gate dielectric of a field effect transistor
US7888217B2 (en) 2005-10-20 2011-02-15 Applied Materials, Inc. Method for fabricating a gate dielectric of a field effect transistor
US20080011426A1 (en) 2006-01-30 2008-01-17 Applied Materials, Inc. Plasma reactor with inductively coupled source power applicator and a high temperature heated workpiece support
TWI396234B (zh) 2006-02-28 2013-05-11 Tokyo Electron Ltd A plasma oxidation treatment method and a manufacturing method of a semiconductor device
US7799637B2 (en) 2006-06-26 2010-09-21 Sandisk Corporation Scaled dielectric enabled by stack sidewall process
US7407871B2 (en) 2006-09-05 2008-08-05 Tech Semiconductor Singapore Pte Ltd Method for passivation of plasma etch defects in DRAM devices
KR100757333B1 (ko) 2006-10-12 2007-09-11 삼성전자주식회사 불휘발성 메모리 장치의 제조 방법
US7976634B2 (en) 2006-11-21 2011-07-12 Applied Materials, Inc. Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
JP5283147B2 (ja) 2006-12-08 2013-09-04 国立大学法人東北大学 半導体装置および半導体装置の製造方法
JP2009010144A (ja) * 2007-06-27 2009-01-15 Hitachi Kokusai Electric Inc 基板処理装置
JP5343391B2 (ja) 2007-07-17 2013-11-13 デクセリアルズ株式会社 樹脂組成物及び画像表示装置
US7645709B2 (en) 2007-07-30 2010-01-12 Applied Materials, Inc. Methods for low temperature oxidation of a semiconductor device
US7951728B2 (en) 2007-09-24 2011-05-31 Applied Materials, Inc. Method of improving oxide growth rate of selective oxidation processes
US7749849B2 (en) 2007-12-18 2010-07-06 Micron Technology, Inc. Methods of selectively oxidizing semiconductor structures, and structures resulting therefrom
JP5226082B2 (ja) 2007-12-20 2013-07-03 アプライド マテリアルズ インコーポレイテッド ガス流分布が改善された熱反応器
US7947561B2 (en) 2008-03-14 2011-05-24 Applied Materials, Inc. Methods for oxidation of a semiconductor device
US20090269939A1 (en) 2008-04-25 2009-10-29 Asm International, N.V. Cyclical oxidation process
US20090311877A1 (en) 2008-06-14 2009-12-17 Applied Materials, Inc. Post oxidation annealing of low temperature thermal or plasma based oxidation
US8236706B2 (en) 2008-12-12 2012-08-07 Mattson Technology, Inc. Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures
US20100297854A1 (en) 2009-04-22 2010-11-25 Applied Materials, Inc. High throughput selective oxidation of silicon and polysilicon using plasma at room temperature
US20110061812A1 (en) * 2009-09-11 2011-03-17 Applied Materials, Inc. Apparatus and Methods for Cyclical Oxidation and Etching
US20110061810A1 (en) * 2009-09-11 2011-03-17 Applied Materials, Inc. Apparatus and Methods for Cyclical Oxidation and Etching
WO2011097178A2 (en) 2010-02-02 2011-08-11 Applied Materials, Inc. Methods for nitridation and oxidation

Similar Documents

Publication Publication Date Title
JP2015511403A5 (cg-RX-API-DMAC7.html)
JP6254098B2 (ja) 基板の選択性酸化のための方法および装置
US8354623B2 (en) Treatment apparatus, treatment method, and storage medium
JP2013522884A5 (cg-RX-API-DMAC7.html)
JP2011139068A5 (cg-RX-API-DMAC7.html)
TW201007869A (en) Substrate processing apparatus, heating device and semiconductor device manufacturing method
JP6091496B2 (ja) 基板を支持および制御する装置および方法
JP2013232621A5 (cg-RX-API-DMAC7.html)
KR102574745B1 (ko) 복사식 버너
WO2016173471A1 (zh) 辊道式太阳电池辐照退火炉
CN107851682A (zh) 烧结炉的冷却室中的光退火
KR101289013B1 (ko) 급속 온도 제어 및 분위기 제어 가능한 진공 열처리 장치
CN103540914A (zh) 一种使用射频加热的桶式cvd设备反应室
TWM573071U (zh) 用於熱處理腔室的旋轉器蓋與用於處理基板的設備
JP2001267264A (ja) 熱処理装置および熱処理方法
KR20140121664A (ko) 롤투롤 방식의 박막 제작 장치
JP2016501356A (ja) 二次ガス圧力波焼成による改善された雰囲気制御の方法
JP2009112982A (ja) 二酸化炭素吸収装置
CN114402425B (zh) 具有冷却系统的快速热处理系统
JP2015015370A5 (cg-RX-API-DMAC7.html)
JP2007158123A (ja) 加熱装置
CN106637139A (zh) 一种稳流室空腔可控温基体托架结构
JP2003243380A5 (cg-RX-API-DMAC7.html)
CN106012026A (zh) 一种用于led晶片制作的退火装置
JP2005243736A5 (cg-RX-API-DMAC7.html)