JP2015501921A5 - - Google Patents
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- Publication number
- JP2015501921A5 JP2015501921A5 JP2014541253A JP2014541253A JP2015501921A5 JP 2015501921 A5 JP2015501921 A5 JP 2015501921A5 JP 2014541253 A JP2014541253 A JP 2014541253A JP 2014541253 A JP2014541253 A JP 2014541253A JP 2015501921 A5 JP2015501921 A5 JP 2015501921A5
- Authority
- JP
- Japan
- Prior art keywords
- encoder
- encoder system
- regression
- diffractive
- optical component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 26
- 238000000926 separation method Methods 0.000 claims 6
- 238000001459 lithography Methods 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 3
- 238000006073 displacement reaction Methods 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161557755P | 2011-11-09 | 2011-11-09 | |
| US61/557,755 | 2011-11-09 | ||
| PCT/US2012/064086 WO2013070871A1 (en) | 2011-11-09 | 2012-11-08 | Double pass interferometric encoder system |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015048528A Division JP6224019B2 (ja) | 2011-11-09 | 2015-03-11 | ダブルパス干渉方式エンコーダシステムを用いた物体の位置判定方法。 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015501921A JP2015501921A (ja) | 2015-01-19 |
| JP2015501921A5 true JP2015501921A5 (enExample) | 2015-02-26 |
| JP5714780B2 JP5714780B2 (ja) | 2015-05-07 |
Family
ID=48223473
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014541253A Active JP5714780B2 (ja) | 2011-11-09 | 2012-11-08 | ダブルパス干渉方式エンコーダシステム |
| JP2015048528A Active JP6224019B2 (ja) | 2011-11-09 | 2015-03-11 | ダブルパス干渉方式エンコーダシステムを用いた物体の位置判定方法。 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015048528A Active JP6224019B2 (ja) | 2011-11-09 | 2015-03-11 | ダブルパス干渉方式エンコーダシステムを用いた物体の位置判定方法。 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US9025161B2 (enExample) |
| EP (1) | EP2776792B1 (enExample) |
| JP (2) | JP5714780B2 (enExample) |
| KR (1) | KR101521146B1 (enExample) |
| CN (2) | CN106289336B (enExample) |
| TW (1) | TWI476376B (enExample) |
| WO (1) | WO2013070871A1 (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2776792B1 (en) * | 2011-11-09 | 2016-08-10 | Zygo Corporation | Double pass interferometric encoder system |
| WO2013073538A1 (ja) * | 2011-11-17 | 2013-05-23 | 株式会社ニコン | エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置 |
| US9983028B2 (en) * | 2012-04-26 | 2018-05-29 | Nikon Corporation | Measurement method and encoder device, and exposure method and device |
| CN107924132B (zh) | 2014-08-28 | 2021-02-12 | Asml荷兰有限公司 | 检查设备、检查方法和制造方法 |
| WO2016030227A1 (en) * | 2014-08-29 | 2016-03-03 | Asml Netherlands B.V. | Method for controlling a distance between two objects, inspection apparatus and method |
| WO2016060992A1 (en) * | 2014-10-13 | 2016-04-21 | Zygo Corporation | Interferometric encoder systems |
| DE102015203188A1 (de) * | 2015-02-23 | 2016-08-25 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| US9739644B2 (en) * | 2015-05-28 | 2017-08-22 | The Boeing Company | Interferometric rotary encoder |
| JP2018526812A (ja) | 2015-06-15 | 2018-09-13 | ザイゴ コーポレーションZygo Corporation | 変形体の変位測定 |
| CN105606033B (zh) * | 2016-03-18 | 2018-04-20 | 清华大学深圳研究生院 | 绝对式光栅尺、其主光栅及其测量方法 |
| US10488228B2 (en) * | 2016-04-11 | 2019-11-26 | Nikon Corporation | Transparent-block encoder head with isotropic wedged elements |
| US10483107B2 (en) * | 2016-04-11 | 2019-11-19 | Nikon Corporation | Encoder head with birefringent elements for forming imperfect retroreflection and exposure system utilizing the same |
| US10162087B2 (en) * | 2016-04-11 | 2018-12-25 | Nikon Research Corporation Of America | Optical system with a frustrated isotropic block |
| US10591826B2 (en) * | 2016-04-11 | 2020-03-17 | Nikon Corporation | Encoder head with a birefringent lens element and exposure system utilizing the same |
| CN105758435B (zh) * | 2016-04-14 | 2018-02-09 | 清华大学深圳研究生院 | 一种绝对式光栅尺 |
| KR102488153B1 (ko) * | 2016-05-31 | 2023-01-12 | 가부시키가이샤 니콘 | 마크 검출 장치 및 마크 검출 방법, 계측 장치, 노광 장치 및 노광 방법, 및, 디바이스 제조 방법 |
| DE102016210434A1 (de) * | 2016-06-13 | 2017-12-14 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| JP6643199B2 (ja) * | 2016-07-15 | 2020-02-12 | Dmg森精機株式会社 | 変位検出装置 |
| CN110337580A (zh) * | 2016-11-07 | 2019-10-15 | 加州理工学院 | 反射空间外差光谱仪的整体式组件 |
| CN107167081B (zh) * | 2017-06-02 | 2021-06-15 | 哈尔滨师范大学 | 一种野外鸟卵测量装置 |
| CN107144298A (zh) * | 2017-06-27 | 2017-09-08 | 常州瑞丰特科技有限公司 | 高容差光栅读数头 |
| US10921718B2 (en) * | 2017-12-15 | 2021-02-16 | Nikon Corporation | Two-dimensional position encoder |
| KR102352325B1 (ko) * | 2018-11-13 | 2022-01-14 | 블랙모어 센서스 앤드 애널리틱스, 엘엘씨 | 위상 인코딩 lidar에서의 내부 반사 감산을 위한 레이저 위상 추적 방법 및 시스템 |
| JP7233305B2 (ja) * | 2019-05-30 | 2023-03-06 | Dmg森精機株式会社 | 光学式変位測定装置 |
| TWI721719B (zh) | 2019-12-19 | 2021-03-11 | 財團法人工業技術研究院 | 量測裝置 |
| US11598629B2 (en) * | 2020-04-14 | 2023-03-07 | Mitutoyo Corporation | Optical displacement sensor |
| WO2022042947A1 (en) * | 2020-08-27 | 2022-03-03 | Asml Netherlands B.V. | Compact dual pass interferometer for a plane mirror interferometer |
| CN112097651B (zh) * | 2020-09-11 | 2022-07-22 | 中国科学院长春光学精密机械与物理研究所 | 外差二维光栅位移测量系统及测量方法 |
| US11802796B2 (en) | 2020-12-07 | 2023-10-31 | California Institute Of Technology | Monolithic assembly of miniature reflective cyclical spatial heterodyne spectrometer interferometry systems |
| CN114413945B (zh) * | 2021-12-20 | 2025-02-21 | 四川云盾光电科技有限公司 | 一种亮度定位的绝对式编码器 |
| US11821791B1 (en) * | 2022-06-27 | 2023-11-21 | Viavi Solutions Inc. | Techniques for reducing optical ghosts in a gratings-based optical spectrum analyzer (OSA) |
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|---|---|---|---|---|
| US4629886A (en) | 1983-03-23 | 1986-12-16 | Yokogawa Hokushin Electric Corporation | High resolution digital diffraction grating scale encoder |
| EP0313681A1 (en) | 1987-10-30 | 1989-05-03 | Ibm Deutschland Gmbh | Phase-sensitive interferometric mask-wafer alignment |
| JPH02504553A (ja) * | 1987-12-15 | 1990-12-20 | レニショウ パブリック リミテッド カンパニー | 光電スケール読取装置 |
| US5035507A (en) | 1988-12-21 | 1991-07-30 | Mitutoyo Corporation | Grating-interference type displacement meter apparatus |
| JP2683098B2 (ja) * | 1989-05-12 | 1997-11-26 | キヤノン株式会社 | エンコーダー |
| US5104225A (en) * | 1991-01-25 | 1992-04-14 | Mitutoyo Corporation | Position detector and method of measuring position |
| JPH05126603A (ja) * | 1991-11-05 | 1993-05-21 | Canon Inc | 格子干渉測定装置 |
| JP3478567B2 (ja) * | 1992-09-25 | 2003-12-15 | キヤノン株式会社 | 回転情報検出装置 |
| JP3144143B2 (ja) * | 1993-04-13 | 2001-03-12 | ソニー・プレシジョン・テクノロジー株式会社 | 光学式変位測定装置 |
| JP3219349B2 (ja) * | 1993-06-30 | 2001-10-15 | キヤノン株式会社 | 波長コンペンセータ、該波長コンペンセータを用いたレーザ干渉測定装置、該レーザ干渉測定装置を有するステージ装置、該ステージ装置を有する露光システム、および該露光システムを用いたデバイスの製造方法 |
| US5442172A (en) | 1994-05-27 | 1995-08-15 | International Business Machines Corporation | Wavefront reconstruction optics for use in a disk drive position measurement system |
| JP2001004411A (ja) * | 1999-06-17 | 2001-01-12 | Canon Inc | 光学式エンコーダ |
| JP3695398B2 (ja) * | 2002-01-30 | 2005-09-14 | 富士ゼロックス株式会社 | 光学式エンコーダ及びエンコーダ用スケール |
| JP4153234B2 (ja) * | 2002-04-26 | 2008-09-24 | ソニーマニュファクチュアリングシステムズ株式会社 | 受発光複合ユニット及びその製造方法、変位検出装置 |
| US7375823B2 (en) * | 2004-04-22 | 2008-05-20 | Zygo Corporation | Interferometry systems and methods of using interferometry systems |
| GB0413710D0 (en) | 2004-06-21 | 2004-07-21 | Renishaw Plc | Scale reading apparatus |
| US7317539B2 (en) | 2004-08-23 | 2008-01-08 | Asml Netherlands B.V. | Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method |
| DE102004053082A1 (de) * | 2004-11-03 | 2006-05-04 | Dr. Johannes Heidenhain Gmbh | Positionsmesssystem |
| JP4722474B2 (ja) * | 2004-12-24 | 2011-07-13 | 株式会社ミツトヨ | 変位検出装置 |
| DE102005029917A1 (de) | 2005-06-28 | 2007-01-04 | Dr. Johannes Heidenhain Gmbh | Positionsmesseinrichtung |
| WO2007030731A2 (en) | 2005-09-07 | 2007-03-15 | Nr Laboratories, Llc | Positional sensing system and method |
| US7440113B2 (en) * | 2005-12-23 | 2008-10-21 | Agilent Technologies, Inc. | Littrow interferometer |
| US7636165B2 (en) | 2006-03-21 | 2009-12-22 | Asml Netherlands B.V. | Displacement measurement systems lithographic apparatus and device manufacturing method |
| WO2008073454A2 (en) * | 2006-12-11 | 2008-06-19 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
| US7894075B2 (en) * | 2006-12-11 | 2011-02-22 | Zygo Corporation | Multiple-degree of freedom interferometer with compensation for gas effects |
| US7545507B2 (en) * | 2007-03-15 | 2009-06-09 | Agilent Technologies, Inc. | Displacement measurement system |
| US7561280B2 (en) * | 2007-03-15 | 2009-07-14 | Agilent Technologies, Inc. | Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components |
| US7864336B2 (en) | 2008-04-28 | 2011-01-04 | Agilent Technologies, Inc. | Compact Littrow encoder |
| JP5235554B2 (ja) * | 2008-08-01 | 2013-07-10 | 株式会社森精機製作所 | 光学式変位測定装置 |
| JP5113000B2 (ja) * | 2008-09-19 | 2013-01-09 | 株式会社ミツトヨ | 光電式エンコーダ |
| US8004688B2 (en) | 2008-11-26 | 2011-08-23 | Zygo Corporation | Scan error correction in low coherence scanning interferometry |
| US8334983B2 (en) | 2009-05-22 | 2012-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP3006902B1 (en) * | 2010-03-30 | 2018-04-11 | Zygo Corporation | Lithography method and lithography system |
| US8829420B2 (en) | 2010-06-09 | 2014-09-09 | Nikon Corporation | Two dimensional encoder system and method |
| WO2012082555A2 (en) | 2010-12-16 | 2012-06-21 | Zygo Corporation | Cyclic error compensation in inteferometric encoder systems |
| JP5849103B2 (ja) | 2011-02-01 | 2016-01-27 | ザイゴ コーポレーションZygo Corporation | 干渉ヘテロダイン光学エンコーダシステム |
| EP2776792B1 (en) * | 2011-11-09 | 2016-08-10 | Zygo Corporation | Double pass interferometric encoder system |
| WO2013073538A1 (ja) | 2011-11-17 | 2013-05-23 | 株式会社ニコン | エンコーダ装置、移動量計測方法、光学装置、並びに露光方法及び装置 |
-
2012
- 2012-11-08 EP EP12847106.7A patent/EP2776792B1/en active Active
- 2012-11-08 US US13/671,920 patent/US9025161B2/en active Active
- 2012-11-08 WO PCT/US2012/064086 patent/WO2013070871A1/en not_active Ceased
- 2012-11-08 CN CN201610602780.6A patent/CN106289336B/zh active Active
- 2012-11-08 JP JP2014541253A patent/JP5714780B2/ja active Active
- 2012-11-08 CN CN201280066526.9A patent/CN104040296B/zh active Active
- 2012-11-08 KR KR1020147015505A patent/KR101521146B1/ko active Active
- 2012-11-08 TW TW101141505A patent/TWI476376B/zh active
-
2015
- 2015-03-11 JP JP2015048528A patent/JP6224019B2/ja active Active
- 2015-03-24 US US14/666,782 patent/US9746348B2/en active Active
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