TWI476376B - 雙程干涉式編碼器系統 - Google Patents

雙程干涉式編碼器系統 Download PDF

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Publication number
TWI476376B
TWI476376B TW101141505A TW101141505A TWI476376B TW I476376 B TWI476376 B TW I476376B TW 101141505 A TW101141505 A TW 101141505A TW 101141505 A TW101141505 A TW 101141505A TW I476376 B TWI476376 B TW I476376B
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TW
Taiwan
Prior art keywords
encoder
encoder system
return
ruler
optical
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Application number
TW101141505A
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English (en)
Chinese (zh)
Other versions
TW201333432A (zh
Inventor
Ｅ 古魯特 彼德 Ｄ
珍 利森諾
Original Assignee
賽格股份有限公司
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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/266—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light by interferometric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Transform (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW101141505A 2011-11-09 2012-11-08 雙程干涉式編碼器系統 TWI476376B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201161557755P 2011-11-09 2011-11-09

Publications (2)

Publication Number Publication Date
TW201333432A TW201333432A (zh) 2013-08-16
TWI476376B true TWI476376B (zh) 2015-03-11

Family

ID=48223473

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101141505A TWI476376B (zh) 2011-11-09 2012-11-08 雙程干涉式編碼器系統

Country Status (7)

Country Link
US (2) US9025161B2 (enExample)
EP (1) EP2776792B1 (enExample)
JP (2) JP5714780B2 (enExample)
KR (1) KR101521146B1 (enExample)
CN (2) CN104040296B (enExample)
TW (1) TWI476376B (enExample)
WO (1) WO2013070871A1 (enExample)

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JP6156147B2 (ja) * 2011-11-17 2017-07-05 株式会社ニコン エンコーダ装置、光学装置、露光装置、及びデバイス製造方法
JP6222480B2 (ja) * 2012-04-26 2017-11-01 株式会社ニコン 光学系、エンコーダ装置、露光装置、及びデバイス製造方法
CN113204173B (zh) * 2014-08-28 2024-04-09 Asml荷兰有限公司 检查设备、检查方法和制造方法
WO2016030227A1 (en) * 2014-08-29 2016-03-03 Asml Netherlands B.V. Method for controlling a distance between two objects, inspection apparatus and method
EP3207339B1 (en) * 2014-10-13 2019-07-24 Zygo Corporation Interferometric encoder systems
DE102015203188A1 (de) * 2015-02-23 2016-08-25 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
US9739644B2 (en) * 2015-05-28 2017-08-22 The Boeing Company Interferometric rotary encoder
US9823061B2 (en) 2015-06-15 2017-11-21 Zygo Corporation Displacement measurement of deformable bodies
CN105606033B (zh) * 2016-03-18 2018-04-20 清华大学深圳研究生院 绝对式光栅尺、其主光栅及其测量方法
US10591826B2 (en) * 2016-04-11 2020-03-17 Nikon Corporation Encoder head with a birefringent lens element and exposure system utilizing the same
US10483107B2 (en) * 2016-04-11 2019-11-19 Nikon Corporation Encoder head with birefringent elements for forming imperfect retroreflection and exposure system utilizing the same
US10488228B2 (en) * 2016-04-11 2019-11-26 Nikon Corporation Transparent-block encoder head with isotropic wedged elements
US10162087B2 (en) * 2016-04-11 2018-12-25 Nikon Research Corporation Of America Optical system with a frustrated isotropic block
CN105758435B (zh) * 2016-04-14 2018-02-09 清华大学深圳研究生院 一种绝对式光栅尺
KR102488153B1 (ko) * 2016-05-31 2023-01-12 가부시키가이샤 니콘 마크 검출 장치 및 마크 검출 방법, 계측 장치, 노광 장치 및 노광 방법, 및, 디바이스 제조 방법
DE102016210434A1 (de) * 2016-06-13 2017-12-14 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
JP6643199B2 (ja) * 2016-07-15 2020-02-12 Dmg森精機株式会社 変位検出装置
CN110337580A (zh) * 2016-11-07 2019-10-15 加州理工学院 反射空间外差光谱仪的整体式组件
CN107167081B (zh) * 2017-06-02 2021-06-15 哈尔滨师范大学 一种野外鸟卵测量装置
CN107144298A (zh) * 2017-06-27 2017-09-08 常州瑞丰特科技有限公司 高容差光栅读数头
US10921718B2 (en) * 2017-12-15 2021-02-16 Nikon Corporation Two-dimensional position encoder
JP7208388B2 (ja) * 2018-11-13 2023-01-18 ブラックモア センサーズ アンド アナリティクス エルエルシー 位相エンコーディングｌｉｄａｒにおける内部反射減算のためのレーザー位相追跡方法およびシステム
JP7233305B2 (ja) * 2019-05-30 2023-03-06 Dmg森精機株式会社 光学式変位測定装置
TWI721719B (zh) 2019-12-19 2021-03-11 財團法人工業技術研究院 量測裝置
US11598629B2 (en) * 2020-04-14 2023-03-07 Mitutoyo Corporation Optical displacement sensor
NL2028788A (en) 2020-08-27 2022-04-29 Asml Netherlands Bv Compact dual pass interferometer for a plane mirror interferometer
CN112097651B (zh) * 2020-09-11 2022-07-22 中国科学院长春光学精密机械与物理研究所 外差二维光栅位移测量系统及测量方法
US11802796B2 (en) 2020-12-07 2023-10-31 California Institute Of Technology Monolithic assembly of miniature reflective cyclical spatial heterodyne spectrometer interferometry systems
CN114413945B (zh) * 2021-12-20 2025-02-21 四川云盾光电科技有限公司 一种亮度定位的绝对式编码器
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Also Published As

Publication number Publication date
WO2013070871A1 (en) 2013-05-16
JP6224019B2 (ja) 2017-11-01
JP2015501921A (ja) 2015-01-19
US9025161B2 (en) 2015-05-05
US9746348B2 (en) 2017-08-29
KR20140097326A (ko) 2014-08-06
JP2015111157A (ja) 2015-06-18
US20150292913A1 (en) 2015-10-15
CN104040296A (zh) 2014-09-10
EP2776792A1 (en) 2014-09-17
CN106289336A (zh) 2017-01-04
CN104040296B (zh) 2016-08-24
EP2776792A4 (en) 2015-08-12
EP2776792B1 (en) 2016-08-10
KR101521146B1 (ko) 2015-05-18
US20130114061A1 (en) 2013-05-09
CN106289336B (zh) 2019-07-09
JP5714780B2 (ja) 2015-05-07
TW201333432A (zh) 2013-08-16

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