JP2015222773A5 - - Google Patents

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Publication number
JP2015222773A5
JP2015222773A5 JP2014106457A JP2014106457A JP2015222773A5 JP 2015222773 A5 JP2015222773 A5 JP 2015222773A5 JP 2014106457 A JP2014106457 A JP 2014106457A JP 2014106457 A JP2014106457 A JP 2014106457A JP 2015222773 A5 JP2015222773 A5 JP 2015222773A5
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JP
Japan
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exposure
shot
shape
divided
control unit
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JP2014106457A
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English (en)
Japanese (ja)
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JP6448220B2 (ja
JP2015222773A (ja
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Priority to JP2014106457A priority Critical patent/JP6448220B2/ja
Priority claimed from JP2014106457A external-priority patent/JP6448220B2/ja
Priority to TW104112573A priority patent/TWI572991B/zh
Priority to KR1020150066380A priority patent/KR101879263B1/ko
Priority to US14/715,875 priority patent/US9575413B2/en
Publication of JP2015222773A publication Critical patent/JP2015222773A/ja
Publication of JP2015222773A5 publication Critical patent/JP2015222773A5/ja
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JP2014106457A 2014-05-22 2014-05-22 露光装置、露光方法及びデバイスの製造方法 Active JP6448220B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014106457A JP6448220B2 (ja) 2014-05-22 2014-05-22 露光装置、露光方法及びデバイスの製造方法
TW104112573A TWI572991B (zh) 2014-05-22 2015-04-20 曝光設備、曝光方法、和製造裝置的方法
KR1020150066380A KR101879263B1 (ko) 2014-05-22 2015-05-13 노광장치, 노광방법 및 디바이스 제조방법
US14/715,875 US9575413B2 (en) 2014-05-22 2015-05-19 Exposure apparatus, exposure method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014106457A JP6448220B2 (ja) 2014-05-22 2014-05-22 露光装置、露光方法及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2015222773A JP2015222773A (ja) 2015-12-10
JP2015222773A5 true JP2015222773A5 (enExample) 2017-06-29
JP6448220B2 JP6448220B2 (ja) 2019-01-09

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ID=54555966

Family Applications (1)

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JP2014106457A Active JP6448220B2 (ja) 2014-05-22 2014-05-22 露光装置、露光方法及びデバイスの製造方法

Country Status (4)

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US (1) US9575413B2 (enExample)
JP (1) JP6448220B2 (enExample)
KR (1) KR101879263B1 (enExample)
TW (1) TWI572991B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10295911B2 (en) 2016-05-19 2019-05-21 Nikon Corporation Extreme ultraviolet lithography system that utilizes pattern stitching

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07283106A (ja) * 1994-04-07 1995-10-27 Rohm Co Ltd 露光装置及び露光方法
JPH10256114A (ja) * 1997-03-10 1998-09-25 Sony Corp フォトレジスト膜のパターン形成方法
WO1998048452A1 (en) * 1997-04-18 1998-10-29 Nikon Corporation Method and device for exposure control, method and device for exposure, and method of manufacture of device
JP4548969B2 (ja) * 2001-04-20 2010-09-22 パナソニック株式会社 露光装置、及び露光方法
JP2003092252A (ja) 2001-09-18 2003-03-28 Canon Inc 半導体露光方法および半導体露光装置
JP2004281434A (ja) * 2003-03-12 2004-10-07 Toshiba Corp ショットマップ作成方法、露光方法、プロセッサ、半導体装置の製造方法及びプログラム
JP2004335864A (ja) * 2003-05-09 2004-11-25 Nikon Corp 露光装置及び露光方法
JP4342844B2 (ja) 2003-06-12 2009-10-14 株式会社アドテックエンジニアリング 露光装置
JP4688525B2 (ja) * 2004-09-27 2011-05-25 株式会社 日立ディスプレイズ パターン修正装置および表示装置の製造方法
EP1918983A4 (en) * 2005-08-05 2010-03-31 Nikon Corp STAGE EQUIPMENT AND EXPOSURE DEVICE
JP2009026962A (ja) * 2007-07-19 2009-02-05 Canon Inc 露光装置、情報処理装置及びデバイス製造方法
JP2010258085A (ja) * 2009-04-22 2010-11-11 Canon Inc 面位置検出方法
JP2012146701A (ja) * 2011-01-06 2012-08-02 Nikon Corp 露光方法及び露光装置

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