JP2015184267A - Icp発光分光分析装置 - Google Patents
Icp発光分光分析装置 Download PDFInfo
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- JP2015184267A JP2015184267A JP2014063959A JP2014063959A JP2015184267A JP 2015184267 A JP2015184267 A JP 2015184267A JP 2014063959 A JP2014063959 A JP 2014063959A JP 2014063959 A JP2014063959 A JP 2014063959A JP 2015184267 A JP2015184267 A JP 2015184267A
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- 238000004458 analytical method Methods 0.000 claims abstract description 74
- 238000009616 inductively coupled plasma Methods 0.000 claims abstract description 54
- 238000004611 spectroscopical analysis Methods 0.000 claims description 11
- 238000004993 emission spectroscopy Methods 0.000 claims 1
- 230000003321 amplification Effects 0.000 abstract description 12
- 238000003199 nucleic acid amplification method Methods 0.000 abstract description 12
- 229910052729 chemical element Inorganic materials 0.000 abstract 1
- 238000004445 quantitative analysis Methods 0.000 description 35
- 238000005259 measurement Methods 0.000 description 24
- 238000010183 spectrum analysis Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000006641 stabilisation Effects 0.000 description 6
- 238000011105 stabilization Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 239000006199 nebulizer Substances 0.000 description 4
- 238000012937 correction Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000004451 qualitative analysis Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/443—Emission spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
【課題】予め光電子増倍管に電圧を印加して速やかに本分析に移行することができるICP発光分光分析装置を提供する。
【解決手段】ICP発光分光分析装置1は、誘導結合プラズマ発生部10と、集光部20と、分光器30と、検出器40と、制御部60とから概略構成されている。また、検出器40には、光電子増倍管70が備えられ、検出器制御部41と入力部42とを有している。光電子増倍管70には分圧抵抗r1〜rnがあるため光電子増倍管70に印加される印加電圧Veの変化により増幅率が直ぐには一定にならないが、予め入力部42への分析条件の入力後から、分析対象の元素を含む試料の誘導結合プラズマ装置10への導入の前までの期間において、検出器制御部41が空転電圧と空転電圧印加時間を制御して、倍増率を一定にさせる。
【選択図】図1
Description
発熱量Q=電力P×時間t(単位時間なら1)=電流I×電圧V×t=V2/R(分圧抵抗の抵抗)×t
であり、所定時間に印加する印加電圧Veによる発熱が平均してみれば一定になるようにすれば良いことになる。
10:誘導結合プラズマ発生部
18:誘導結合プラズマ
20:集光部
23:入射窓
30:分光器
40:検出器
41:検出器制御部
42:入力部
43:検出器電源
44:検出器電源制御部
60:制御部
70:光電子増倍管
73:電子増倍部
74:光電面
75:ダイノード
r1〜rn:分圧抵抗
Ve:印加電圧(分析電圧)
Claims (4)
- 分析対象の元素を誘導結合プラズマにより原子化またはイオン化し、原子発光線を得る誘導結合プラズマ発生部と、
前記原子発光線を集光する集光部と、
前記原子発光線を入射窓を介して取り入れた後、分光して検出する分光器と、
前記分光器を通過した光を検出する検出器と、
前記検出器に印加される電圧と当該電圧の印加時間を制御する検出器制御部と、
前記分析対象の元素に応じた分析条件の操作入力を受け付ける入力部と、
を備えるICP発光分光分析装置であって、
前記検出器制御部は、前記入力部への分析条件の入力後から、分析対象の元素を含む試料の前記誘導結合プラズマ発生部への導入の前までの期間において、前記分析条件の下で前記検出器に印加される分析電圧と当該分析電圧の分析電圧印加時間から求められる想定電力量に応じた空転電圧および当該空転電圧の空転電圧印加時間に基づき、前記検出器を制御する、ICP発光分光分析装置。 - 請求項1に記載のICP発光分光分析装置であって、
前記検出器制御部は、前記分析電圧および前記分析電圧印加時間から定まる電圧印加サイクルと同一の電圧印加サイクルになるよう、前記空転電圧および前記空転電圧印加時間を設定する、ICP発光分光分析装置。 - 請求項1に記載のICP発光分光分析装置であって、
前記検出器制御部は、前記分析電圧における高電圧および低電圧ならびにそれぞれの印加時間割合と同一の高電圧および低電圧ならびにそれぞれの印加時間割合をもつ前記空転電圧および前記空転電圧印加時間を設定する、ICP発光分光分析装置。 - 請求項1に記載のICP発光分光分析装置であって、
前記検出器制御部は、前記分析電圧および前記分析電圧印加時間から定まる平均電力量と同一の電力量となるような一定電圧を前記空転電圧として設定する、ICP発光分光分析装置。
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JP2014063959A JP6219760B2 (ja) | 2014-03-26 | 2014-03-26 | Icp発光分光分析装置 |
US14/668,480 US9726611B2 (en) | 2014-03-26 | 2015-03-25 | Stabilized ICP emission spectrometer and method of using |
CN201510135146.1A CN104949963B (zh) | 2014-03-26 | 2015-03-26 | Icp发光分光分析装置 |
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JP2014063959A JP6219760B2 (ja) | 2014-03-26 | 2014-03-26 | Icp発光分光分析装置 |
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JP2015184267A true JP2015184267A (ja) | 2015-10-22 |
JP6219760B2 JP6219760B2 (ja) | 2017-10-25 |
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JP (1) | JP6219760B2 (ja) |
CN (1) | CN104949963B (ja) |
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US10281406B1 (en) * | 2014-09-26 | 2019-05-07 | Applied Spectra, Inc. | Method for elemental analysis in a production line |
CN112291040B (zh) | 2015-03-02 | 2024-01-26 | 三星电子株式会社 | 发送方法和接收方法 |
JP7226775B2 (ja) * | 2019-01-18 | 2023-02-21 | 国立研究開発法人産業技術総合研究所 | 誘導結合プラズマ分析システム及び誘導結合プラズマ分析方法 |
RU206533U1 (ru) * | 2021-03-09 | 2021-09-15 | Александр Михайлович Панин | Фотометр для спектрального анализа |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0650894A (ja) * | 1992-08-03 | 1994-02-25 | Aloka Co Ltd | 光学的試料測定装置 |
JPH0668467B2 (ja) * | 1986-03-18 | 1994-08-31 | 株式会社島津製作所 | 発光分光分析用測光装置 |
JPH0668468B2 (ja) * | 1986-08-20 | 1994-08-31 | 株式会社島津製作所 | Icp発光分析装置における光電子増倍管のゲイン較正方法 |
US20040223153A1 (en) * | 2003-04-25 | 2004-11-11 | Shimadzu Corporation | Atomic absorption spectrophotometer |
US20060126170A1 (en) * | 2004-12-10 | 2006-06-15 | Olympus Corporation | Microscope apparatus, sensitivity setting method for photo detector, control unit, and storage medium |
JP2006171028A (ja) * | 2004-12-10 | 2006-06-29 | Olympus Corp | レーザ走査顕微鏡および光検出器の感度設定方法 |
JP2006300731A (ja) * | 2005-04-20 | 2006-11-02 | Horiba Ltd | グロー放電発光分析装置及びグロー放電発光分析方法 |
JP2007010314A (ja) * | 2005-06-28 | 2007-01-18 | Shimadzu Corp | フレーム式原子吸光分光光度計 |
JP2012068146A (ja) * | 2010-09-24 | 2012-04-05 | Shimadzu Corp | 分光蛍光光度計 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3650551B2 (ja) * | 1999-09-14 | 2005-05-18 | 株式会社日立製作所 | 質量分析計 |
JP3800621B2 (ja) * | 2002-01-18 | 2006-07-26 | 株式会社島津製作所 | Icp分析装置 |
US7440097B2 (en) * | 2006-06-27 | 2008-10-21 | General Electric Company | Laser plasma spectroscopy apparatus and method for in situ depth profiling |
JP5251729B2 (ja) * | 2008-06-20 | 2013-07-31 | 株式会社島津製作所 | 分光光度計 |
US20100014741A1 (en) * | 2008-07-10 | 2010-01-21 | Banville Steven C | Methods and apparatus related to gate boundaries within a data space |
US9183237B2 (en) * | 2008-07-10 | 2015-11-10 | Nodality, Inc. | Methods and apparatus related to gate boundaries within a data space |
US20100030719A1 (en) * | 2008-07-10 | 2010-02-04 | Covey Todd M | Methods and apparatus related to bioinformatics data analysis |
JP5497615B2 (ja) * | 2010-11-08 | 2014-05-21 | 株式会社日立ハイテクノロジーズ | 質量分析装置 |
CN202126403U (zh) * | 2011-06-05 | 2012-01-25 | 陈国颖 | 基于分辨荧光光谱激发时间特性的抗生素分析装置 |
JP2013125049A (ja) * | 2011-12-13 | 2013-06-24 | Semiconductor Components Industries Llc | 光検出回路 |
JP6025406B2 (ja) * | 2012-06-04 | 2016-11-16 | 株式会社日立ハイテクノロジーズ | 質量分析装置 |
JP2014055785A (ja) * | 2012-09-11 | 2014-03-27 | Shimadzu Corp | プラズマ用高周波電源及びそれを用いたicp発光分光分析装置 |
JP6017916B2 (ja) * | 2012-10-16 | 2016-11-02 | 株式会社豊田中央研究所 | 光検出器 |
JP6048068B2 (ja) * | 2012-10-25 | 2016-12-21 | 株式会社島津製作所 | プラズマ用高周波電源及びそれを用いたicp発光分光分析装置 |
EP2928521B1 (en) * | 2012-12-05 | 2018-02-14 | Bracco Imaging S.p.A | Validation techniques for fluid delivery systems |
WO2015103492A1 (en) * | 2014-01-06 | 2015-07-09 | Teledyne Instruments, Inc. | Laser-ablation-based material analysis system with a power/energy detector |
JP2015179039A (ja) * | 2014-03-19 | 2015-10-08 | 株式会社日立ハイテクサイエンス | Icp発光分光分析装置 |
JP6316064B2 (ja) * | 2014-03-31 | 2018-04-25 | 株式会社日立ハイテクサイエンス | Icp発光分光分析装置 |
-
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- 2014-03-26 JP JP2014063959A patent/JP6219760B2/ja active Active
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- 2015-03-25 US US14/668,480 patent/US9726611B2/en active Active
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Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0668467B2 (ja) * | 1986-03-18 | 1994-08-31 | 株式会社島津製作所 | 発光分光分析用測光装置 |
JPH0668468B2 (ja) * | 1986-08-20 | 1994-08-31 | 株式会社島津製作所 | Icp発光分析装置における光電子増倍管のゲイン較正方法 |
JPH0650894A (ja) * | 1992-08-03 | 1994-02-25 | Aloka Co Ltd | 光学的試料測定装置 |
US20040223153A1 (en) * | 2003-04-25 | 2004-11-11 | Shimadzu Corporation | Atomic absorption spectrophotometer |
JP2004325341A (ja) * | 2003-04-25 | 2004-11-18 | Shimadzu Corp | 原子吸光分光光度計 |
US20060126170A1 (en) * | 2004-12-10 | 2006-06-15 | Olympus Corporation | Microscope apparatus, sensitivity setting method for photo detector, control unit, and storage medium |
JP2006171028A (ja) * | 2004-12-10 | 2006-06-29 | Olympus Corp | レーザ走査顕微鏡および光検出器の感度設定方法 |
JP2006300731A (ja) * | 2005-04-20 | 2006-11-02 | Horiba Ltd | グロー放電発光分析装置及びグロー放電発光分析方法 |
JP2007010314A (ja) * | 2005-06-28 | 2007-01-18 | Shimadzu Corp | フレーム式原子吸光分光光度計 |
JP2012068146A (ja) * | 2010-09-24 | 2012-04-05 | Shimadzu Corp | 分光蛍光光度計 |
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US9726611B2 (en) | 2017-08-08 |
US20150276611A1 (en) | 2015-10-01 |
JP6219760B2 (ja) | 2017-10-25 |
CN104949963A (zh) | 2015-09-30 |
CN104949963B (zh) | 2019-06-18 |
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