JP2015173164A - ビーム露光装置 - Google Patents
ビーム露光装置 Download PDFInfo
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- JP2015173164A JP2015173164A JP2014047904A JP2014047904A JP2015173164A JP 2015173164 A JP2015173164 A JP 2015173164A JP 2014047904 A JP2014047904 A JP 2014047904A JP 2014047904 A JP2014047904 A JP 2014047904A JP 2015173164 A JP2015173164 A JP 2015173164A
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- Prior art keywords
- light
- unit
- optical system
- microlens array
- beam exposure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/47—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
- G03G15/04036—Details of illuminating systems, e.g. lamps, reflectors
- G03G15/04045—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers
- G03G15/04054—Details of illuminating systems, e.g. lamps, reflectors for exposing image information provided otherwise than by directly projecting the original image onto the photoconductive recording material, e.g. digital copiers by LED arrays
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Lenses (AREA)
Abstract
Description
一方向に所定間隔を空けて配置された複数の光出射位置から光ビームを出射する光出射部と、複数の光ビームによって露光される被露光面と前記光出射部の一方又は両方を前記一方向と交差する他方向に向けて相対的に移動する走査部と、前記光出射部が出射する光ビームのスポットを被露光面に集光する集光光学系と、複数の光ビームのビーム間を露光するように複数の光ビームを微小偏向する微小偏向部とを備え、前記集光光学系は、前記光出射部と前記微小偏向部との間に配置され、前記光出射部の光出射位置に対応するマイクロレンズを複数備えた第1マイクロレンズアレイと、前記微小偏向部と前記被露光面との間に配置され、前記光出射部の光出射位置に対応するマイクロレンズを複数備えた第2マイクロレンズアレイを備えることを特徴とするビーム露光装置。
2a:光出射位置,2f:(光出射位置の)像,
3:走査部,4:集光光学系,
41:第1マイクロレンズアレイ,41M:マイクロレンズ,
42:第2マイクロレンズアレイ,42M:マイクロレンズ,
43:投影光学系,43a:投影レンズ,43s:絞り,
44:リレーレンズ系,44a,44b:レンズ,
44c:アフォーカルレンズ系,44s:絞り,44x:光軸,
5:微小偏向部,D:回折面,Df,Dfe:(回折面の)像,
6:補正光学要素,
10:基板,11:基板支持部,
Lb:光ビーム,Ls:スポット,Ex:被露光面
Claims (7)
- 一方向に所定間隔を空けて配置された複数の光出射位置から光ビームを出射する光出射部と、
複数の光ビームによって露光される被露光面と前記光出射部の一方又は両方を前記一方向と交差する他方向に向けて相対的に移動する走査部と、
前記光出射部が出射する光ビームのスポットを被露光面に集光する集光光学系と、
複数の光ビームのビーム間を露光するように複数の光ビームを微小偏向する微小偏向部とを備え、
前記集光光学系は、
前記光出射部と前記微小偏向部との間に配置され、前記光出射部の光出射位置に対応するマイクロレンズを複数備えた第1マイクロレンズアレイと、
前記微小偏向部と前記被露光面との間に配置され、前記光出射部の光出射位置に対応するマイクロレンズを複数備えた第2マイクロレンズアレイを備えることを特徴とするビーム露光装置。 - 前記第1マイクロレンズアレイは、前記複数の光ビームをそれぞれ平行光にして前記微小偏向部に入射し、
前記第2マイクロレンズアレイは、前記複数の光ビームを個別に前記被露光面に集光することを特徴とする請求項1に記載のビーム露光装置。 - 前記第1マイクロレンズアレイの後方に前記光出射部の光出射位置の像を形成する投影光学系を備えることを特徴とする請求項1又は2記載のビーム露光装置。
- 前記投影光学系は拡大投影光学系であることを特徴とする請求項3記載のビーム露光装置。
- 前記微小偏向部は、音響光学素子によって構成されることを特徴とする請求項1〜4のいずれかに記載のビーム露光装置。
- 前記第2マイクロレンズアレイの近傍に前記微小偏向部の回折面の像を形成するリレーレンズ系を備えることを特徴とする請求項5に記載のビーム露光装置。
- 前記微小偏向部と前記リレーレンズ系との間に、前記回折面の像が前記第2マイクロレンズアレイの光軸に対して垂直になる補正光学要素を配置したことを特徴とする請求項6に記載のビーム露光装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014047904A JP6308523B2 (ja) | 2014-03-11 | 2014-03-11 | ビーム露光装置 |
PCT/JP2015/055524 WO2015137125A1 (ja) | 2014-03-11 | 2015-02-26 | ビーム露光装置 |
US15/124,701 US9964857B2 (en) | 2014-03-11 | 2015-02-26 | Beam exposure device |
CN201580007561.7A CN105980933B (zh) | 2014-03-11 | 2015-02-26 | 射束曝光装置 |
KR1020167021973A KR20160132376A (ko) | 2014-03-11 | 2015-02-26 | 빔 노광 장치 |
TW104107795A TWI654492B (zh) | 2014-03-11 | 2015-03-11 | Beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014047904A JP6308523B2 (ja) | 2014-03-11 | 2014-03-11 | ビーム露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015173164A true JP2015173164A (ja) | 2015-10-01 |
JP6308523B2 JP6308523B2 (ja) | 2018-04-11 |
Family
ID=54071573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014047904A Active JP6308523B2 (ja) | 2014-03-11 | 2014-03-11 | ビーム露光装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US9964857B2 (ja) |
JP (1) | JP6308523B2 (ja) |
KR (1) | KR20160132376A (ja) |
CN (1) | CN105980933B (ja) |
TW (1) | TWI654492B (ja) |
WO (1) | WO2015137125A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019096637A (ja) * | 2017-11-17 | 2019-06-20 | 株式会社小糸製作所 | レーザー光源ユニット |
CN109917544A (zh) * | 2019-03-19 | 2019-06-21 | 北京遥感设备研究所 | 一种透射式扫描稳像光学系统 |
EP4400912A1 (en) * | 2023-01-10 | 2024-07-17 | Mycronic Ab | Laser writer and method for operating a laser writer |
Citations (8)
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JP2001305449A (ja) * | 2000-04-21 | 2001-10-31 | Fuji Photo Film Co Ltd | マルチビーム露光装置 |
JP2004038051A (ja) * | 2002-07-08 | 2004-02-05 | Fuji Photo Film Co Ltd | 露光用レーザー光源 |
JP2008109132A (ja) * | 2006-10-17 | 2008-05-08 | Asml Netherlands Bv | 高速可変減衰器としての干渉計の使用 |
JP2008529037A (ja) * | 2005-01-31 | 2008-07-31 | オリンパス株式会社 | 照明光学装置及び光学装置 |
JP2010014797A (ja) * | 2008-07-01 | 2010-01-21 | Nsk Ltd | マスクレス露光装置 |
JP2010262000A (ja) * | 2009-04-30 | 2010-11-18 | Orc Mfg Co Ltd | 描画装置 |
JP2012104723A (ja) * | 2010-11-12 | 2012-05-31 | V Technology Co Ltd | 露光装置 |
WO2012136434A2 (en) * | 2011-04-08 | 2012-10-11 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
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US6204875B1 (en) * | 1998-10-07 | 2001-03-20 | Barco Graphics, Nv | Method and apparatus for light modulation and exposure at high exposure levels with high resolution |
US6961200B2 (en) * | 1999-07-27 | 2005-11-01 | Quantum Corporation | Optical servo track identification on tape storage media |
US20020126479A1 (en) * | 2001-03-08 | 2002-09-12 | Ball Semiconductor, Inc. | High power incoherent light source with laser array |
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JP2005277153A (ja) * | 2004-03-25 | 2005-10-06 | Fuji Photo Film Co Ltd | 画像露光装置 |
US7116404B2 (en) * | 2004-06-30 | 2006-10-03 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
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JP2010123724A (ja) * | 2008-11-19 | 2010-06-03 | Nikon Corp | 光学特性計測方法及び装置、並びに露光装置 |
-
2014
- 2014-03-11 JP JP2014047904A patent/JP6308523B2/ja active Active
-
2015
- 2015-02-26 CN CN201580007561.7A patent/CN105980933B/zh not_active Expired - Fee Related
- 2015-02-26 KR KR1020167021973A patent/KR20160132376A/ko not_active Application Discontinuation
- 2015-02-26 WO PCT/JP2015/055524 patent/WO2015137125A1/ja active Application Filing
- 2015-02-26 US US15/124,701 patent/US9964857B2/en not_active Expired - Fee Related
- 2015-03-11 TW TW104107795A patent/TWI654492B/zh not_active IP Right Cessation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001305449A (ja) * | 2000-04-21 | 2001-10-31 | Fuji Photo Film Co Ltd | マルチビーム露光装置 |
JP2004038051A (ja) * | 2002-07-08 | 2004-02-05 | Fuji Photo Film Co Ltd | 露光用レーザー光源 |
JP2008529037A (ja) * | 2005-01-31 | 2008-07-31 | オリンパス株式会社 | 照明光学装置及び光学装置 |
JP2008109132A (ja) * | 2006-10-17 | 2008-05-08 | Asml Netherlands Bv | 高速可変減衰器としての干渉計の使用 |
JP2010014797A (ja) * | 2008-07-01 | 2010-01-21 | Nsk Ltd | マスクレス露光装置 |
JP2010262000A (ja) * | 2009-04-30 | 2010-11-18 | Orc Mfg Co Ltd | 描画装置 |
JP2012104723A (ja) * | 2010-11-12 | 2012-05-31 | V Technology Co Ltd | 露光装置 |
WO2012136434A2 (en) * | 2011-04-08 | 2012-10-11 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
Also Published As
Publication number | Publication date |
---|---|
CN105980933B (zh) | 2018-06-22 |
TWI654492B (zh) | 2019-03-21 |
CN105980933A (zh) | 2016-09-28 |
WO2015137125A1 (ja) | 2015-09-17 |
US20170017163A1 (en) | 2017-01-19 |
KR20160132376A (ko) | 2016-11-18 |
TW201539150A (zh) | 2015-10-16 |
US9964857B2 (en) | 2018-05-08 |
JP6308523B2 (ja) | 2018-04-11 |
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