JP2015146317A - 密封型処理チャンバと電極への内部バスによる電気接続とを備えた多電極プラズマ処理システム - Google Patents
密封型処理チャンバと電極への内部バスによる電気接続とを備えた多電極プラズマ処理システム Download PDFInfo
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Abstract
【選択図】図3A
Description
Claims (13)
- 源ガスから発生したプラズマで製品を処理する装置であって、その装置は、
排気可能空間と、その排気可能空間と連通するポンプポートと、を具備する真空チャンバと、
排気可能空間内に設けられた複数の電極であって、その複数の電極は複数の隣接する対をなす並列配置を有し、前記電極の前記複数の隣接する対の各々は、ギャップによって隔てられて複数の処理チャンバの各々を形成し、前記複数の電極の各々は外周を具備する前記複数の電極と、
前記真空チャンバの内側に設けられた複数のガス分配管であって、前記複数のガス分配管の各々は、前記複数の電極の各々の外周の内部に配置される注入ポートであって、前記複数の処理チャンバの各々の中に源ガスを注入するように構成されている前記注入ポートを具備する前記ガス分配管と、
前記複数の電極と電気的に接続されるプラズマ励起源であって、前記複数の処理チャンバの各々内において、該源ガスからプラズマを発生させるために電力を供給するようになっている前記プラズマ励起源と、
複数の流れ制限部材であって、前記複数の流れ制限部材の各々は、前記複数の電極の隣接する対の各々の間にある前記ギャップに位置し、前記複数の流れ制限部材の各々は、前記処理チャンバの各々から前記ポンプポートへ出る源ガスの流れを制限するように動作する流れ制限部材と、
前記隣接する対の各々において、前記対の一方は第1の表面を有し、前記隣接する対の各々における前記対の他方は前記第1の表面に面する第2の表面を有し、前記製品の少なくとも一つは前記第1の表面と前記第2の表面との間に位置している装置。 - 請求項1に記載の装置であって、前記装置はさらに、
処理チャンバ内に製品を保持するように構成された複数の製品ホルダを有するラックを備え、
前記複数の製品ホルダの各々は、少なくとも一の製品を保持するように構成され、前記流れ制限部材の各々は、それぞれ1つの前記製品ホルダと物理的に結合されている装置。 - 請求項2に記載の装置であって、
前記ラックは、前記製品ホルダと前記ポンプポートとの間に前記処理チャンバに対して配置される底部板を有し、源ガスは、前記底部板の前記外周のまわりのそれぞれの前記処理チャンバから前記ポンプポートへ達するように流れ出るように制限される装置。 - 請求項2に記載の装置であって、
それぞれの前記流れ制限部材は、前記ギャップの部分に配置されたバーを備えたフレームを具備し、前記バーは前記ギャップよりも僅かに狭い幅を有している装置。 - 請求項4に記載の装置であって、
前記流れ制限部材の各々は、前記ギャップに配置されたバーを具備し、前記製品ホルダの各々は複数の十字部材を具備して少なくとも一の製品を支持するように構成され、前記バーは、少なくとも一の前記十字部材と前記隣接する対のそれぞれにおける前記電極の前記外周との間に配置されている装置。 - 請求項2に記載の装置であって、
前記流れ制限部材の各々は、前記ギャップに配置されたバーを備えたフレームと、前記バーを底部板に結合する複数の結合部材とを具備し、前記バーは前記隣接する対の各々において、前記電極の前記外周の内側に配置されている装置。 - 請求項1に記載の装置であって、
前記装置は、さらに、
前記真空チャンバの内側のガス分配マニホールドであって、前記ガス分配管と流体的に連通するように結合されている前記ガス分配マニホールドを備えている装置。 - 請求項7に記載の装置であって、
前記装置において、前記ガス分配マニホールドは、通路を具備し、前記ガス分配管の各々は前記通路と連通して結合され、
前記装置は、さらに、前記ガス分配マニホールドの前記通路に送られる源ガスの質量流量を調整するように構成された質量流量制御装置を備えている装置。 - 請求項8に記載の装置であって、
前記電極は一連の平行平面に配置され、前記ガス分配マニホールドの前記通路は前記一連の平行平面に対してほぼ垂直になっている装置。 - 請求項1に記載の装置であって、
前記ガス分配管の各々は、互いに斜めになっている複数の管状部分を具備する装置。 - 請求項1に記載の装置であって、
前記電極の各々は前記外周の内側に幾何学的中心を有し、前記ガス分配管の前記注入ポートは、前記電極の各々における前記幾何学的中心から1/2インチ内にある装置。 - 請求項1に記載の装置であって、
前記複数の電極の各々は、前記電極の前記第1の表面と前記第2の表面との間に前記電極内に前記外周から延在する通路と、その通路内に電気的絶縁材を具備する管状スリーブと、を有し、
それぞれが前記複数の電極の各々の前記通路に配置される複数の導電部材であって、前記複数の導電部材の各々は前記外周の内側の或る位置にて前記電極の各々に電気的に接続され、前記電極を前記プラズマ励起源と電気的に接続し、前記複数の導電部材の各々は前記複数の電極の一と前記外周の内側の前記或る位置にて電気的な接触をするように前記管状スリーブから突出している先端を有する前記複数の導電部材と、を備えている装置。 - 請求項12に記載の装置であって、
前記電極の各々は幾何学的中心を前記外周の内側に有し、前記導電部材の各々に対する前記或る位置は前記電極の各々の前記幾何学的中心から1/2インチ内にある装置。
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US12/123,954 US8372238B2 (en) | 2008-05-20 | 2008-05-20 | Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes |
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SG157301A1 (en) | 2009-12-29 |
CN101587827B (zh) | 2013-09-04 |
US20130139967A1 (en) | 2013-06-06 |
TW201004493A (en) | 2010-01-16 |
CN103474327A (zh) | 2013-12-25 |
KR20160095654A (ko) | 2016-08-11 |
US8372238B2 (en) | 2013-02-12 |
JP5713542B2 (ja) | 2015-05-07 |
US20090288773A1 (en) | 2009-11-26 |
KR101645191B1 (ko) | 2016-08-12 |
KR101695632B1 (ko) | 2017-01-13 |
CN103474327B (zh) | 2016-03-16 |
TWI519212B (zh) | 2016-01-21 |
US10109448B2 (en) | 2018-10-23 |
SG176502A1 (en) | 2011-12-29 |
JP6078571B2 (ja) | 2017-02-08 |
CN101587827A (zh) | 2009-11-25 |
JP2009295580A (ja) | 2009-12-17 |
KR20090121225A (ko) | 2009-11-25 |
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