JP2015115472A - スピンナー洗浄装置 - Google Patents
スピンナー洗浄装置 Download PDFInfo
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- JP2015115472A JP2015115472A JP2013256621A JP2013256621A JP2015115472A JP 2015115472 A JP2015115472 A JP 2015115472A JP 2013256621 A JP2013256621 A JP 2013256621A JP 2013256621 A JP2013256621 A JP 2013256621A JP 2015115472 A JP2015115472 A JP 2015115472A
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- plate
- holding table
- cleaning
- nozzle
- dry air
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- 238000004140 cleaning Methods 0.000 title claims abstract description 119
- 238000002347 injection Methods 0.000 claims abstract description 46
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- 239000007788 liquid Substances 0.000 claims abstract description 32
- 238000005507 spraying Methods 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 238000001035 drying Methods 0.000 abstract description 18
- 239000000463 material Substances 0.000 abstract description 17
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- 238000000034 method Methods 0.000 description 5
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- 238000005452 bending Methods 0.000 description 1
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- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
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- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
42 保持テーブル
44 エアー噴射手段
52 吸着面
54 回転手段
62 洗浄ノズル
63 噴射孔
64 洗浄ノズル移動手段
66 線状ノズル
67 噴射口
68 線状ノズル移動部
71 エアー噴射領域
72 ワイパー
73 屈曲部分
75 板状物の表面
76 板状物の裏面
W 板状物
Claims (1)
- 板状物を上面に保持する保持テーブルと、該保持テーブルを回転させる回転手段と、該保持テーブルに保持された板状物に対して噴射孔から洗浄液を噴射する洗浄ノズルと、該洗浄ノズルを該保持テーブルの中心を通り径方向に移動させる洗浄ノズル移動手段と、該保持テーブルに保持された洗浄後の板状物に対して噴射口から乾燥エアーを噴射して板状物表面を乾燥するエアー噴射手段と、を備えるスピンナー洗浄装置であって、
該エアー噴射手段は、該噴射口から板状物表面に噴射されたエアー噴射領域が少なくとも板状物の半径以上の長さの線状に噴射されるように該噴射口が形成された線状ノズルと、該線状ノズルを保持テーブルに対して移動させる線状ノズル移動部と、を備え、
該エアー噴射領域が板状物の外周側から該保持テーブルの回転中心に至るように該噴射口を板状物に対して位置づけ且つ該保持テーブルの回転方向に対して対向する方向に該噴射口を向けて乾燥エアーを噴射しつつ該保持テーブルを回転させて洗浄後の板状物表面を乾燥する、スピンナー洗浄装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013256621A JP6276982B2 (ja) | 2013-12-12 | 2013-12-12 | スピンナー洗浄装置 |
Applications Claiming Priority (1)
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JP2013256621A JP6276982B2 (ja) | 2013-12-12 | 2013-12-12 | スピンナー洗浄装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015115472A true JP2015115472A (ja) | 2015-06-22 |
JP6276982B2 JP6276982B2 (ja) | 2018-02-07 |
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Application Number | Title | Priority Date | Filing Date |
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JP2013256621A Active JP6276982B2 (ja) | 2013-12-12 | 2013-12-12 | スピンナー洗浄装置 |
Country Status (1)
Country | Link |
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JP (1) | JP6276982B2 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003007669A (ja) * | 2001-06-25 | 2003-01-10 | Tokyo Electron Ltd | 基板の処理装置 |
JP2003077808A (ja) * | 2001-09-04 | 2003-03-14 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2005064043A (ja) * | 2003-08-13 | 2005-03-10 | Fuji Electric Holdings Co Ltd | 基板乾燥方法および基板乾燥装置 |
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2013
- 2013-12-12 JP JP2013256621A patent/JP6276982B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003007669A (ja) * | 2001-06-25 | 2003-01-10 | Tokyo Electron Ltd | 基板の処理装置 |
JP2003077808A (ja) * | 2001-09-04 | 2003-03-14 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
JP2005064043A (ja) * | 2003-08-13 | 2005-03-10 | Fuji Electric Holdings Co Ltd | 基板乾燥方法および基板乾燥装置 |
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