JP2015092537A5 - - Google Patents

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Publication number
JP2015092537A5
JP2015092537A5 JP2014139197A JP2014139197A JP2015092537A5 JP 2015092537 A5 JP2015092537 A5 JP 2015092537A5 JP 2014139197 A JP2014139197 A JP 2014139197A JP 2014139197 A JP2014139197 A JP 2014139197A JP 2015092537 A5 JP2015092537 A5 JP 2015092537A5
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JP
Japan
Prior art keywords
substrate
volatile solvent
magnet
substrate processing
cleaning liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2014139197A
Other languages
English (en)
Japanese (ja)
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JP6426924B2 (ja
JP2015092537A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2014139197A external-priority patent/JP6426924B2/ja
Priority to JP2014139197A priority Critical patent/JP6426924B2/ja
Priority to KR1020140108213A priority patent/KR101624038B1/ko
Priority to US14/495,724 priority patent/US20150090298A1/en
Priority to CN201410515122.4A priority patent/CN104517875A/zh
Priority to TW103133985A priority patent/TW201523724A/zh
Priority to EP14187008.9A priority patent/EP2854165A1/en
Publication of JP2015092537A publication Critical patent/JP2015092537A/ja
Publication of JP2015092537A5 publication Critical patent/JP2015092537A5/ja
Publication of JP6426924B2 publication Critical patent/JP6426924B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014139197A 2013-09-30 2014-07-04 基板処理装置及び基板処理方法 Active JP6426924B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2014139197A JP6426924B2 (ja) 2013-09-30 2014-07-04 基板処理装置及び基板処理方法
KR1020140108213A KR101624038B1 (ko) 2013-09-30 2014-08-20 기판 처리 장치 및 기판 처리 방법
US14/495,724 US20150090298A1 (en) 2013-09-30 2014-09-24 Substrate processing device and substrate processing method
CN201410515122.4A CN104517875A (zh) 2013-09-30 2014-09-29 基板处理装置和基板处理方法
TW103133985A TW201523724A (zh) 2013-09-30 2014-09-30 基板處理裝置及基板處理方法
EP14187008.9A EP2854165A1 (en) 2013-09-30 2014-09-30 Substrate processing device and substrate processing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013205126 2013-09-30
JP2013205126 2013-09-30
JP2014139197A JP6426924B2 (ja) 2013-09-30 2014-07-04 基板処理装置及び基板処理方法

Publications (3)

Publication Number Publication Date
JP2015092537A JP2015092537A (ja) 2015-05-14
JP2015092537A5 true JP2015092537A5 (enExample) 2017-08-17
JP6426924B2 JP6426924B2 (ja) 2018-11-21

Family

ID=51730317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014139197A Active JP6426924B2 (ja) 2013-09-30 2014-07-04 基板処理装置及び基板処理方法

Country Status (6)

Country Link
US (1) US20150090298A1 (enExample)
EP (1) EP2854165A1 (enExample)
JP (1) JP6426924B2 (enExample)
KR (1) KR101624038B1 (enExample)
CN (1) CN104517875A (enExample)
TW (1) TW201523724A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6543534B2 (ja) 2015-08-26 2019-07-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6588819B2 (ja) 2015-12-24 2019-10-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7045867B2 (ja) * 2018-01-26 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
JP7064339B2 (ja) 2018-01-31 2022-05-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
TWI702373B (zh) * 2019-03-22 2020-08-21 由田新技股份有限公司 翻面式多軸機械手臂裝置及其光學檢測設備
GB201905138D0 (en) 2019-04-11 2019-05-29 Spts Technologies Ltd Apparatus and method for processing a substrate
CN111842283A (zh) * 2020-06-29 2020-10-30 北京信和洁能新能源技术服务有限公司 具有内置水箱的离子瀑空气净化机的自动清洗系统及方法
JP7453874B2 (ja) * 2020-07-30 2024-03-21 芝浦メカトロニクス株式会社 基板処理方法、および基板処理装置
JP7072623B1 (ja) * 2020-11-11 2022-05-20 芝浦機械株式会社 抽出乾燥装置
JP2024145228A (ja) * 2023-03-31 2024-10-15 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003205273A (ja) * 2002-01-16 2003-07-22 Mgchemical Kk 洗浄及び乾燥方法
WO2004107426A1 (ja) * 2003-05-27 2004-12-09 Personal Creation Ltd. 磁石を備えた基板の処理装置及び処理方法
JP2008034779A (ja) 2006-06-27 2008-02-14 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
JP4886544B2 (ja) 2007-02-09 2012-02-29 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
JP5448536B2 (ja) * 2009-04-08 2014-03-19 東京エレクトロン株式会社 レジスト塗布現像装置およびレジスト塗布現像方法、並びにレジスト膜処理装置およびレジスト膜処理方法
JP2011135009A (ja) * 2009-12-25 2011-07-07 Tokyo Electron Ltd 基板乾燥装置及び基板乾燥方法
JP2012200679A (ja) * 2011-03-25 2012-10-22 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法
US8715518B2 (en) * 2011-10-12 2014-05-06 Intermolecular, Inc. Gas barrier with vent ring for protecting a surface region from liquid

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