JP2015088523A - 半導体発光装置 - Google Patents
半導体発光装置 Download PDFInfo
- Publication number
- JP2015088523A JP2015088523A JP2013223445A JP2013223445A JP2015088523A JP 2015088523 A JP2015088523 A JP 2015088523A JP 2013223445 A JP2013223445 A JP 2013223445A JP 2013223445 A JP2013223445 A JP 2013223445A JP 2015088523 A JP2015088523 A JP 2015088523A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- side electrode
- light emitting
- semiconductor layer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 266
- 230000003287 optical effect Effects 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims description 110
- 239000002184 metal Substances 0.000 claims description 110
- 239000000758 substrate Substances 0.000 claims description 61
- 229920005989 resin Polymers 0.000 claims description 57
- 239000011347 resin Substances 0.000 claims description 57
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 51
- 239000011230 binding agent Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 description 25
- 239000010953 base metal Substances 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 239000010949 copper Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 229910052802 copper Inorganic materials 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000005530 etching Methods 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 229910052814 silicon oxide Inorganic materials 0.000 description 9
- 229910002601 GaN Inorganic materials 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000000605 extraction Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/505—Wavelength conversion elements characterised by the shape, e.g. plate or foil
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
Description
図2(a)は、実施形態の半導体発光装置におけるp側電極16とn側電極17の平面レイアウトの一例を示す模式平面図である。図1は、図2(a)におけるA−A断面に対応する。
図2(b)は、図2(a)におけるB−B断面図である。
図3(b)は、図3(a)におけるC−C断面図を表す。
図16(c)は、図4(a)におけるD−D断面図を表す。
図17(b)は、図17(a)におけるE−E断面図を表す。
図22(b)は、サイドビュータイプの半導体発光装置を実装基板310上に実装した構成を有する発光モジュールの模式断面図である。
Claims (14)
- 第1の面と、前記第1の面の反対側の第2の面とを持ち、発光層を有する半導体層と、
前記第2の面側において前記半導体層に設けられたp側電極と、
前記第2の面側において前記半導体層に設けられたn側電極であって、異なる方向に延びる複数の直線部と、前記複数の直線部を接続する角部とを有するn側電極と、
前記第2の面側に設けられ、前記p側電極に接続されたp側配線部と、
前記第2の面側に設けられ、前記n側電極に接続されたn側配線部と、
前記p側配線部と前記n側配線部との間に設けられた樹脂層と、
を備え、
前記n側電極の前記角部と前記半導体層との間に第1の絶縁膜が設けられ、前記角部は前記半導体層に接しておらず、前記n側電極の前記直線部が前記半導体層に接している半導体発光装置。 - 前記n側電極は、前記直線部の幅方向に突出して設けられ、前記n側配線部と接続されるコンタクト部を有し、
前記コンタクト部と前記半導体層との間に第2の絶縁膜が設けられ、前記コンタクト部は前記半導体層に接していない請求項1記載の半導体発光装置。 - 前記n側電極の一部は、第3の絶縁膜を介して前記p側電極上に重ねられている請求項1記載の半導体発光装置。
- 前記n側電極は、前記直線部の幅方向に突出して設けられ、前記n側配線部と接続されるコンタクト部を有し、
前記n側電極の前記コンタクト部が、前記第3の絶縁膜を介して前記p側電極上に重ねられている請求項3記載の半導体発光装置。 - 第1の面と、前記第1の面の反対側の第2の面とを持ち、発光層を有する半導体層と、
前記第2の面側において前記半導体層に設けられたp側電極と、
前記p側電極上に設けられた絶縁膜と、
前記第2の面側において前記半導体層に設けられるとともに、一部が前記絶縁膜を介して前記p側電極上に重ねられたn側電極と、
前記第2の面側に設けられ、前記p側電極に接続されたp側配線部と、
前記第2の面側に設けられ、前記n側電極に接続されたn側配線部と、
前記p側配線部と前記n側配線部との間に設けられた樹脂層と、
を備えた半導体発光装置。 - 前記n側電極は、前記絶縁膜を介して前記p側電極の上で直線状に延びる直線部を有する請求項5記載の半導体発光装置。
- 前記n側電極の前記直線部の下に、前記p側電極及び前記発光層を含まないn側コンタクト領域が設けられ、
前記n側コンタクト領域において、前記直線部の一部が前記絶縁膜を貫通して、前記半導体層における前記発光層を含まない部分に接している請求項5または6に記載の半導体発光装置。 - 前記p側配線部は、前記p側電極に接続されたp側配線層と、前記p側配線層に接続され、前記p側配線層よりも厚いp側金属ピラーとを有し、
前記n側配線部は、前記n側電極に接続されたn側配線層と、前記n側配線層に接続され、前記n側配線層よりも厚いn側金属ピラーとを有する請求項1〜7のいずれか1つに記載の半導体発光装置。 - 前記p側金属ピラー及び前記n側金属ピラーのそれぞれは、同じ面内で並んだ外部接続可能な端部を有する請求項8記載の半導体発光装置。
- 前記第1の面側に設けられ、前記発光層の放射光に対して透過性を有する光学層をさらに備えた請求項1〜9のいずれか1つに記載の半導体発光装置。
- 前記光学層は、
前記発光層の放射光により励起され前記発光層の放射光とは異なる波長の光を放射する複数の蛍光体と、
前記複数の蛍光体を一体化し、前記発光層の放射光及び前記蛍光体の放射光を透過させる結合材と、
を含む蛍光体層である請求項10記載の半導体発光装置。 - 前記半導体層は前記第1の面側に基板を含まず、
前記蛍光体層は、前記半導体層との間に基板を介することなく前記第1の面側に設けられている請求項11記載の半導体発光装置。 - 前記半導体層における前記第1の面に続く側面を覆う金属膜をさらに備えた請求項12記載の半導体発光装置。
- 前記樹脂層は、前記発光層の放射光に対して遮光性を有する請求項1〜13のいずれか1つに記載の半導体発光装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013223445A JP6182050B2 (ja) | 2013-10-28 | 2013-10-28 | 半導体発光装置 |
TW103104256A TWI543399B (zh) | 2013-10-28 | 2014-02-10 | 半導體發光裝置 |
US14/202,045 US9837580B2 (en) | 2013-10-28 | 2014-03-10 | Semiconductor light emitting device |
EP14158534.9A EP2866269B1 (en) | 2013-10-28 | 2014-03-10 | Semiconductor light emitting device |
HK15107903.4A HK1207470A1 (en) | 2013-10-28 | 2015-08-17 | Semiconductor light emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013223445A JP6182050B2 (ja) | 2013-10-28 | 2013-10-28 | 半導体発光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015088523A true JP2015088523A (ja) | 2015-05-07 |
JP6182050B2 JP6182050B2 (ja) | 2017-08-16 |
Family
ID=50236084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013223445A Active JP6182050B2 (ja) | 2013-10-28 | 2013-10-28 | 半導体発光装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9837580B2 (ja) |
EP (1) | EP2866269B1 (ja) |
JP (1) | JP6182050B2 (ja) |
HK (1) | HK1207470A1 (ja) |
TW (1) | TWI543399B (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017041612A (ja) * | 2015-08-21 | 2017-02-23 | 株式会社東芝 | 半導体発光装置 |
JP2017045958A (ja) * | 2015-08-28 | 2017-03-02 | 株式会社東芝 | 半導体発光装置 |
JP2017157723A (ja) * | 2016-03-02 | 2017-09-07 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
JPWO2017154975A1 (ja) * | 2016-03-08 | 2019-01-24 | アルパッド株式会社 | 半導体発光装置 |
KR20220112373A (ko) * | 2021-02-04 | 2022-08-11 | 웨이브로드 주식회사 | 엘이디 패키지를 제조하는 방법 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10439111B2 (en) | 2014-05-14 | 2019-10-08 | Genesis Photonics Inc. | Light emitting device and manufacturing method thereof |
US9997676B2 (en) * | 2014-05-14 | 2018-06-12 | Genesis Photonics Inc. | Light emitting device and manufacturing method thereof |
TWI557952B (zh) | 2014-06-12 | 2016-11-11 | 新世紀光電股份有限公司 | 發光元件 |
TWI578574B (zh) * | 2014-07-14 | 2017-04-11 | 新世紀光電股份有限公司 | 發光元件結構 |
TWI657597B (zh) | 2015-03-18 | 2019-04-21 | 新世紀光電股份有限公司 | 側照式發光二極體結構及其製造方法 |
KR102373677B1 (ko) * | 2015-08-24 | 2022-03-14 | 쑤저우 레킨 세미컨덕터 컴퍼니 리미티드 | 발광소자 |
US9922963B2 (en) | 2015-09-18 | 2018-03-20 | Genesis Photonics Inc. | Light-emitting device |
CN107968142A (zh) | 2016-10-19 | 2018-04-27 | 新世纪光电股份有限公司 | 发光装置及其制造方法 |
US10784423B2 (en) | 2017-11-05 | 2020-09-22 | Genesis Photonics Inc. | Light emitting device |
CN109755220B (zh) | 2017-11-05 | 2022-09-02 | 新世纪光电股份有限公司 | 发光装置及其制作方法 |
DE102018123930A1 (de) * | 2018-09-27 | 2020-04-02 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip mit erstem und zweitem Kontaktelement und Verfahren zur Herstellung des optoelektronischen Halbleiterchips |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007281426A (ja) * | 2006-04-04 | 2007-10-25 | Samsung Electro-Mechanics Co Ltd | 窒化物系半導体発光素子 |
WO2009041318A1 (ja) * | 2007-09-26 | 2009-04-02 | Nichia Corporation | 発光素子及びそれを用いた発光装置 |
WO2010024375A1 (ja) * | 2008-08-29 | 2010-03-04 | 日亜化学工業株式会社 | 半導体発光素子及び半導体発光装置 |
JP2010507246A (ja) * | 2006-10-18 | 2010-03-04 | フィリップス ルミレッズ ライティング カンパニー リミテッド ライアビリティ カンパニー | 半導体発光装置のための電気的コンタクト |
JP2011071272A (ja) * | 2009-09-25 | 2011-04-07 | Toshiba Corp | 半導体発光装置及びその製造方法 |
JP2011258670A (ja) * | 2010-06-07 | 2011-12-22 | Toshiba Corp | 半導体発光装置 |
JP2012049366A (ja) * | 2010-08-27 | 2012-03-08 | Toyoda Gosei Co Ltd | 発光素子 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3969751A (en) * | 1974-12-18 | 1976-07-13 | Rca Corporation | Light shield for a semiconductor device comprising blackened photoresist |
JP2000244012A (ja) | 1998-12-22 | 2000-09-08 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子の製造方法 |
TWI220578B (en) * | 2003-09-16 | 2004-08-21 | Opto Tech Corp | Light-emitting device capable of increasing light-emitting active region |
KR100616693B1 (ko) | 2005-08-09 | 2006-08-28 | 삼성전기주식회사 | 질화물 반도체 발광 소자 |
US8877524B2 (en) * | 2008-03-31 | 2014-11-04 | Cree, Inc. | Emission tuning methods and devices fabricated utilizing methods |
JP4724222B2 (ja) | 2008-12-12 | 2011-07-13 | 株式会社東芝 | 発光装置の製造方法 |
JP5414579B2 (ja) * | 2009-11-19 | 2014-02-12 | 株式会社東芝 | 半導体発光装置 |
US20120037946A1 (en) | 2010-08-12 | 2012-02-16 | Chi Mei Lighting Technology Corporation | Light emitting devices |
JP5633477B2 (ja) | 2010-08-27 | 2014-12-03 | 豊田合成株式会社 | 発光素子 |
US8592847B2 (en) * | 2011-04-15 | 2013-11-26 | Epistar Corporation | Light-emitting device |
-
2013
- 2013-10-28 JP JP2013223445A patent/JP6182050B2/ja active Active
-
2014
- 2014-02-10 TW TW103104256A patent/TWI543399B/zh active
- 2014-03-10 EP EP14158534.9A patent/EP2866269B1/en active Active
- 2014-03-10 US US14/202,045 patent/US9837580B2/en active Active
-
2015
- 2015-08-17 HK HK15107903.4A patent/HK1207470A1/xx unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007281426A (ja) * | 2006-04-04 | 2007-10-25 | Samsung Electro-Mechanics Co Ltd | 窒化物系半導体発光素子 |
JP2010507246A (ja) * | 2006-10-18 | 2010-03-04 | フィリップス ルミレッズ ライティング カンパニー リミテッド ライアビリティ カンパニー | 半導体発光装置のための電気的コンタクト |
WO2009041318A1 (ja) * | 2007-09-26 | 2009-04-02 | Nichia Corporation | 発光素子及びそれを用いた発光装置 |
WO2010024375A1 (ja) * | 2008-08-29 | 2010-03-04 | 日亜化学工業株式会社 | 半導体発光素子及び半導体発光装置 |
JP2011071272A (ja) * | 2009-09-25 | 2011-04-07 | Toshiba Corp | 半導体発光装置及びその製造方法 |
JP2011258670A (ja) * | 2010-06-07 | 2011-12-22 | Toshiba Corp | 半導体発光装置 |
JP2012049366A (ja) * | 2010-08-27 | 2012-03-08 | Toyoda Gosei Co Ltd | 発光素子 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017041612A (ja) * | 2015-08-21 | 2017-02-23 | 株式会社東芝 | 半導体発光装置 |
JP2017045958A (ja) * | 2015-08-28 | 2017-03-02 | 株式会社東芝 | 半導体発光装置 |
JP2017157723A (ja) * | 2016-03-02 | 2017-09-07 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
JPWO2017154975A1 (ja) * | 2016-03-08 | 2019-01-24 | アルパッド株式会社 | 半導体発光装置 |
KR20220112373A (ko) * | 2021-02-04 | 2022-08-11 | 웨이브로드 주식회사 | 엘이디 패키지를 제조하는 방법 |
KR102530795B1 (ko) | 2021-02-04 | 2023-05-10 | 웨이브로드 주식회사 | 엘이디 패키지를 제조하는 방법 |
Also Published As
Publication number | Publication date |
---|---|
TWI543399B (zh) | 2016-07-21 |
HK1207470A1 (en) | 2016-01-29 |
US20150115300A1 (en) | 2015-04-30 |
JP6182050B2 (ja) | 2017-08-16 |
EP2866269B1 (en) | 2021-08-18 |
US9837580B2 (en) | 2017-12-05 |
TW201517310A (zh) | 2015-05-01 |
EP2866269A1 (en) | 2015-04-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6182050B2 (ja) | 半導体発光装置 | |
JP6106120B2 (ja) | 半導体発光装置 | |
JP6045999B2 (ja) | 半導体発光装置及びその製造方法 | |
US10707378B2 (en) | Semiconductor light-emitting device | |
JP6604786B2 (ja) | 半導体発光装置およびその製造方法 | |
US9202992B2 (en) | Semiconductor light emitting device having a fluorescent substance layer | |
JP2015195332A (ja) | 半導体発光装置及びその製造方法 | |
JP6185415B2 (ja) | 半導体発光装置 | |
JP2014160736A (ja) | 半導体発光装置及び発光装置 | |
JP2013232479A (ja) | 半導体発光装置 | |
JP6649726B2 (ja) | 半導体発光装置およびその製造方法 | |
JP2015088524A (ja) | 半導体発光装置 | |
JP2014157991A (ja) | 半導体発光装置及びその製造方法 | |
JP5837456B2 (ja) | 半導体発光装置及び発光モジュール | |
JP5845134B2 (ja) | 波長変換体および半導体発光装置 | |
JPWO2017154975A1 (ja) | 半導体発光装置 | |
JP2015188039A (ja) | 半導体発光装置およびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160229 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20161124 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161130 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170123 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170622 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170721 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 6182050 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |