JP2015070057A5 - - Google Patents

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Publication number
JP2015070057A5
JP2015070057A5 JP2013201876A JP2013201876A JP2015070057A5 JP 2015070057 A5 JP2015070057 A5 JP 2015070057A5 JP 2013201876 A JP2013201876 A JP 2013201876A JP 2013201876 A JP2013201876 A JP 2013201876A JP 2015070057 A5 JP2015070057 A5 JP 2015070057A5
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Japan
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substrate
pattern formation
formation region
original
pattern
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JP2013201876A
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English (en)
Japanese (ja)
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JP6399739B2 (ja
JP2015070057A (ja
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Priority to JP2013201876A priority Critical patent/JP6399739B2/ja
Priority claimed from JP2013201876A external-priority patent/JP6399739B2/ja
Priority to US14/494,050 priority patent/US9400434B2/en
Priority to KR1020140128984A priority patent/KR101870001B1/ko
Priority to CN201410503036.1A priority patent/CN104516213B/zh
Publication of JP2015070057A publication Critical patent/JP2015070057A/ja
Publication of JP2015070057A5 publication Critical patent/JP2015070057A5/ja
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Publication of JP6399739B2 publication Critical patent/JP6399739B2/ja
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JP2013201876A 2013-09-27 2013-09-27 露光装置、露光方法、およびデバイスの製造方法 Active JP6399739B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2013201876A JP6399739B2 (ja) 2013-09-27 2013-09-27 露光装置、露光方法、およびデバイスの製造方法
US14/494,050 US9400434B2 (en) 2013-09-27 2014-09-23 Exposure apparatus, exposure method, and device manufacturing method
KR1020140128984A KR101870001B1 (ko) 2013-09-27 2014-09-26 노광 장치, 노광 방법 및 디바이스의 제조 방법
CN201410503036.1A CN104516213B (zh) 2013-09-27 2014-09-26 曝光装置、曝光方法以及装置制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013201876A JP6399739B2 (ja) 2013-09-27 2013-09-27 露光装置、露光方法、およびデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2015070057A JP2015070057A (ja) 2015-04-13
JP2015070057A5 true JP2015070057A5 (enExample) 2016-11-10
JP6399739B2 JP6399739B2 (ja) 2018-10-03

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ID=52739843

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JP2013201876A Active JP6399739B2 (ja) 2013-09-27 2013-09-27 露光装置、露光方法、およびデバイスの製造方法

Country Status (4)

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US (1) US9400434B2 (enExample)
JP (1) JP6399739B2 (enExample)
KR (1) KR101870001B1 (enExample)
CN (1) CN104516213B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107278279B (zh) * 2015-02-23 2020-07-03 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
CN105137721B (zh) * 2015-09-24 2017-04-12 山东科技大学 扫描工作台各速度段进行激光直写二值图案的方法与装置
CN111694220B (zh) * 2019-03-11 2022-08-26 苏州微影激光技术有限公司 扫描式激光直接成像的同步方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5281996A (en) * 1992-09-04 1994-01-25 General Signal Corporation Photolithographic reduction imaging of extended field
JPH08222495A (ja) * 1995-02-09 1996-08-30 Nikon Corp 走査型投影露光方法及び装置
JP3624919B2 (ja) * 1995-08-04 2005-03-02 株式会社ニコン 露光方法
JPH10229039A (ja) * 1997-02-17 1998-08-25 Nikon Corp 露光方法
JP3320262B2 (ja) 1995-07-07 2002-09-03 キヤノン株式会社 走査露光装置及び方法並びにそれを用いたデバイス製造方法
JPH09115817A (ja) * 1995-10-13 1997-05-02 Nikon Corp 露光方法及び装置
JPH10209039A (ja) 1997-01-27 1998-08-07 Nikon Corp 投影露光方法及び投影露光装置
JP3969855B2 (ja) * 1998-07-02 2007-09-05 キヤノン株式会社 露光方法および露光装置
JP2000228344A (ja) * 1999-02-04 2000-08-15 Canon Inc 走査露光装置およびデバイス製造方法
JP2002099097A (ja) * 2000-09-25 2002-04-05 Nikon Corp 走査露光方法および走査型露光装置
JP2004279670A (ja) * 2003-03-14 2004-10-07 Nikon Corp 露光方法
US8638422B2 (en) 2005-03-18 2014-01-28 Nikon Corporation Exposure method, exposure apparatus, method for producing device, and method for evaluating exposure apparatus
JP4522329B2 (ja) * 2005-06-24 2010-08-11 株式会社Sokudo 基板処理装置
US8125613B2 (en) * 2006-04-21 2012-02-28 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
CN100570491C (zh) 2006-06-26 2009-12-16 志圣科技（广州）有限公司 步进式曝光机的图案影像设定及倍率误差补偿方法
TWI432914B (zh) 2007-01-04 2014-04-01 尼康股份有限公司 投影光學裝置、投影曝光裝置、曝光方法、以及元件製造方法
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US20110075120A1 (en) 2009-09-30 2011-03-31 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
CN102692820B (zh) 2011-03-21 2014-12-17 上海微电子装备有限公司 一种测量投影物镜畸变的装置及方法

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