JP2015056628A - 配線基板及びその製造方法 - Google Patents
配線基板及びその製造方法 Download PDFInfo
- Publication number
- JP2015056628A JP2015056628A JP2013191018A JP2013191018A JP2015056628A JP 2015056628 A JP2015056628 A JP 2015056628A JP 2013191018 A JP2013191018 A JP 2013191018A JP 2013191018 A JP2013191018 A JP 2013191018A JP 2015056628 A JP2015056628 A JP 2015056628A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- insulating layer
- coil
- insulating
- wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000007747 plating Methods 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 claims description 31
- 229920005989 resin Polymers 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 26
- 230000008569 process Effects 0.000 claims description 13
- 238000004804 winding Methods 0.000 claims description 10
- 239000012762 magnetic filler Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 92
- 239000000758 substrate Substances 0.000 description 28
- 239000000463 material Substances 0.000 description 22
- 239000010949 copper Substances 0.000 description 14
- 230000004048 modification Effects 0.000 description 13
- 238000012986 modification Methods 0.000 description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000000945 filler Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 229910000859 α-Fe Inorganic materials 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910001297 Zn alloy Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910000914 Mn alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910001308 Zinc ferrite Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000011837 pasties Nutrition 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- WGEATSXPYVGFCC-UHFFFAOYSA-N zinc ferrite Chemical compound O=[Zn].O=[Fe]O[Fe]=O WGEATSXPYVGFCC-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/001—Magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
- H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
- H01F2017/0066—Printed inductances with a magnetic layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/0006—Printed inductances
- H01F2017/0073—Printed inductances with a special conductive pattern, e.g. flat spiral
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Electrochemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Coils Or Transformers For Communication (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
Abstract
Description
[第1の実施の形態に係る配線基板の構造]
まず、第1の実施の形態に係る配線基板の構造について説明する。図1は、第1の実施の形態に係る配線基板を例示する図である。なお、図1(b)は平面図であり、図1(a)は図1(b)のA−A線に沿う断面図である。但し、図1(b)では、絶縁層44より上側の層の図示は省略されている。
次に、第1の実施の形態に係る配線基板の製造方法について説明する。図2〜図5は、第1の実施の形態に係る配線基板の製造工程を例示する図である。
第1の実施の形態の変形例では、配線基板1に更に絶縁膜を追加する例を示す。なお、第1の実施の形態の変形例において、既に説明した実施の形態と同一構成部についての説明は省略する。
10 コア基板
20、60、70、110 配線層
30、44、50、90、100 絶縁層
40、40A コイル
41 第1磁性体層
42、45、47、49 絶縁膜
43 コイル部
43A コイル部の一端
43B コイル部の他端
46 第2磁性体層
60x、60y、60z、100x ビアホール
61、62、63 配線
80 貫通電極
Claims (10)
- 第1絶縁層と、前記第1絶縁層上に形成されたコイルと、を有し、
前記コイルは、
前記第1絶縁層上にめっき膜で形成された第1磁性体層と、
前記第1磁性体層上に形成されたコイル部と、
前記第1磁性体層及び前記コイル部を覆うように前記第1絶縁層上に形成された第2絶縁層と、
前記第2絶縁層上にめっき膜で形成された第2磁性体層と、を含む配線基板。 - 前記第2絶縁層の上面は平坦面である請求項1記載の配線基板。
- 前記第2磁性体層は、絶縁膜を介して、前記第2絶縁層の上面に形成されている請求項2記載の配線基板。
- 前記第2絶縁層は、樹脂から形成されている請求項1乃至3の何れか一項記載の配線基板。
- 前記樹脂は磁性体のフィラーを含有する請求項4記載の配線基板。
- 前記コイル部はめっき膜で形成されている請求項1乃至5の何れか一項記載の配線基板。
- 前記コイルは、
前記第1絶縁層と前記第1磁性体層との間に形成された絶縁膜を含む請求項1乃至6の何れか一項記載の配線基板。 - 第1絶縁層上にコイルを形成する工程を有し、
前記コイルを形成する工程は、
前記第1絶縁層上にめっき処理で第1磁性体層を形成する工程と、
前記第1磁性体層上にコイル部を形成する工程と、
前記コイル部を覆うように前記第1絶縁層上に第2絶縁層を形成する工程と、
前記第2絶縁層上にめっき処理で第2磁性体層を形成する工程と、を含む、配線基板の製造方法。 - 前記第2絶縁層を形成する工程では、
前記コイル部を覆うように半硬化状態の樹脂フィルムを配置し、
前記半硬化状態の樹脂フィルムを加熱しながら前記第1絶縁層側に加圧し、前記コイル部の巻線同士の間に形成される隙間部分を埋めて上面が平坦面である前記第2絶縁層を形成する請求項8記載の配線基板の製造方法。 - 前記コイル部を形成する工程では、めっき処理で前記コイルを形成する請求項8又は9記載の配線基板の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013191018A JP6170790B2 (ja) | 2013-09-13 | 2013-09-13 | 配線基板及びその製造方法 |
US14/469,690 US9399825B2 (en) | 2013-09-13 | 2014-08-27 | Wiring board and method of manufacturing wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013191018A JP6170790B2 (ja) | 2013-09-13 | 2013-09-13 | 配線基板及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015056628A true JP2015056628A (ja) | 2015-03-23 |
JP6170790B2 JP6170790B2 (ja) | 2017-07-26 |
Family
ID=52667444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013191018A Active JP6170790B2 (ja) | 2013-09-13 | 2013-09-13 | 配線基板及びその製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US9399825B2 (ja) |
JP (1) | JP6170790B2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160141318A1 (en) * | 2013-06-28 | 2016-05-19 | Teledyne Dalsa, Inc. | Method and system for assembly of radiological imaging sensor |
KR101832587B1 (ko) * | 2016-01-11 | 2018-02-26 | 삼성전기주식회사 | 인덕터 및 그 제조방법 |
JP6536751B2 (ja) * | 2016-08-18 | 2019-07-03 | 株式会社村田製作所 | 積層コイルおよびその製造方法 |
US11450475B2 (en) * | 2017-08-28 | 2022-09-20 | Tdk Corporation | Coil component and manufacturing method therefor |
US11495555B2 (en) * | 2018-03-14 | 2022-11-08 | Intel Corporation | Magnetic bilayer structure for a cored or coreless semiconductor package |
JP7352363B2 (ja) * | 2018-03-16 | 2023-09-28 | 日東電工株式会社 | 磁性配線回路基板およびその製造方法 |
JP2019204843A (ja) * | 2018-05-22 | 2019-11-28 | イビデン株式会社 | プリント配線板及びプリント配線板の製造方法 |
JP7066528B2 (ja) * | 2018-05-31 | 2022-05-13 | 日東電工株式会社 | 配線回路基板、その製造方法および配線回路シート |
US11538617B2 (en) * | 2018-06-29 | 2022-12-27 | Intel Corporation | Integrated magnetic core inductors on glass core substrates |
US11380472B2 (en) * | 2018-09-25 | 2022-07-05 | Intel Corporation | High-permeability magnetic-dielectric film-based inductors |
CN113973431B (zh) * | 2020-07-23 | 2023-08-18 | 宏启胜精密电子(秦皇岛)有限公司 | 电路板及其制作方法 |
US20220293327A1 (en) * | 2021-03-11 | 2022-09-15 | Intel Corporation | Coreless electronic substrates having embedded inductors |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09180937A (ja) * | 1995-12-22 | 1997-07-11 | Toshiba Corp | 平面インダクタおよび平面インダクタの製造方法 |
JPH09270323A (ja) * | 1996-03-29 | 1997-10-14 | Toshiba Corp | 電子デバイス、電子デバイスの製造方法、および平面インダクタ |
JP2000114045A (ja) * | 1998-10-02 | 2000-04-21 | Alps Electric Co Ltd | 薄膜インダクタ及び薄膜インダクタの製造方法 |
JP2000306730A (ja) * | 1999-04-21 | 2000-11-02 | Fuji Electric Co Ltd | 平面型磁気素子 |
JP2004214633A (ja) * | 2002-12-18 | 2004-07-29 | Tdk Corp | 基板及びその製造方法 |
JP2004356119A (ja) * | 2003-05-26 | 2004-12-16 | Oki Electric Ind Co Ltd | 半導体装置及びその製造方法 |
WO2007040064A1 (ja) * | 2005-09-30 | 2007-04-12 | Matsushita Electric Industrial Co., Ltd. | シート状複合電子部品とその製造方法 |
WO2013105397A1 (ja) * | 2012-01-11 | 2013-07-18 | 株式会社村田製作所 | 高周波モジュール |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5856898A (en) * | 1988-02-29 | 1999-01-05 | Nec Corporation | Spiral coil pattern including same layer spiral patterns suitable for use in a thin film head |
JP2000011323A (ja) * | 1998-06-16 | 2000-01-14 | Hitachi Metals Ltd | 薄膜磁気ヘッド |
JP2001077538A (ja) | 1999-09-02 | 2001-03-23 | Fuji Photo Film Co Ltd | プリント基板のパターンコイル |
JP2006286931A (ja) * | 2005-03-31 | 2006-10-19 | Tdk Corp | 薄膜デバイス |
JP5390099B2 (ja) * | 2005-11-01 | 2014-01-15 | 株式会社東芝 | 平面磁気素子 |
US8304657B2 (en) * | 2010-03-25 | 2012-11-06 | Ibiden Co., Ltd. | Printed wiring board and method for manufacturing printed wiring board |
-
2013
- 2013-09-13 JP JP2013191018A patent/JP6170790B2/ja active Active
-
2014
- 2014-08-27 US US14/469,690 patent/US9399825B2/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09180937A (ja) * | 1995-12-22 | 1997-07-11 | Toshiba Corp | 平面インダクタおよび平面インダクタの製造方法 |
JPH09270323A (ja) * | 1996-03-29 | 1997-10-14 | Toshiba Corp | 電子デバイス、電子デバイスの製造方法、および平面インダクタ |
JP2000114045A (ja) * | 1998-10-02 | 2000-04-21 | Alps Electric Co Ltd | 薄膜インダクタ及び薄膜インダクタの製造方法 |
JP2000306730A (ja) * | 1999-04-21 | 2000-11-02 | Fuji Electric Co Ltd | 平面型磁気素子 |
JP2004214633A (ja) * | 2002-12-18 | 2004-07-29 | Tdk Corp | 基板及びその製造方法 |
JP2004356119A (ja) * | 2003-05-26 | 2004-12-16 | Oki Electric Ind Co Ltd | 半導体装置及びその製造方法 |
WO2007040064A1 (ja) * | 2005-09-30 | 2007-04-12 | Matsushita Electric Industrial Co., Ltd. | シート状複合電子部品とその製造方法 |
WO2013105397A1 (ja) * | 2012-01-11 | 2013-07-18 | 株式会社村田製作所 | 高周波モジュール |
Also Published As
Publication number | Publication date |
---|---|
US20150077209A1 (en) | 2015-03-19 |
US9399825B2 (en) | 2016-07-26 |
JP6170790B2 (ja) | 2017-07-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6170790B2 (ja) | 配線基板及びその製造方法 | |
US11276520B2 (en) | Multilayer seed pattern inductor, manufacturing method thereof, and board having the same | |
CN102918939B (zh) | 电路板及其制造方法 | |
US10847300B2 (en) | Inductor and method of manufacturing the same | |
US20150213946A1 (en) | Printed wiring board | |
US7921550B2 (en) | Process of fabricating circuit structure | |
US10966324B2 (en) | Wiring board, multilayer wiring board, and method of manufacturing wiring board | |
JP2015015285A (ja) | 配線基板及び配線基板の製造方法 | |
JP5576546B2 (ja) | 配線基板の製造方法 | |
JP2007324559A (ja) | ファインピッチを有するマルチレイヤー回路板及びその製作方法 | |
US10115521B2 (en) | Manufacturing method for electronic component | |
JP2016225611A (ja) | チップインダクター | |
JP6283158B2 (ja) | 配線基板、及び、配線基板の製造方法 | |
JP2017073531A (ja) | プリント回路基板及びその製造方法 | |
JP2010073809A (ja) | プリント配線板の製造方法 | |
JP5432800B2 (ja) | 配線基板の製造方法 | |
US20150000958A1 (en) | Printed circuit board and method of fabricating the same | |
JP5289241B2 (ja) | 配線基板およびその製造方法 | |
JP2013080823A (ja) | プリント配線板及びその製造方法 | |
JP6626687B2 (ja) | 配線基板、半導体装置及び配線基板の製造方法 | |
JP5860303B2 (ja) | 配線基板およびその製造方法 | |
JP5565951B2 (ja) | 配線基板およびその製造方法 | |
KR101184792B1 (ko) | 범프 형성용 마스크 및 이의 제조 방법 | |
JP2016143860A (ja) | 半導体装置及びその製造方法 | |
JP6197420B2 (ja) | 配線基板 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160602 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170210 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170214 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170407 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170509 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170613 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170627 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170703 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6170790 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |