JP2015006731A5 - - Google Patents

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Publication number
JP2015006731A5
JP2015006731A5 JP2014209683A JP2014209683A JP2015006731A5 JP 2015006731 A5 JP2015006731 A5 JP 2015006731A5 JP 2014209683 A JP2014209683 A JP 2014209683A JP 2014209683 A JP2014209683 A JP 2014209683A JP 2015006731 A5 JP2015006731 A5 JP 2015006731A5
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protrusions
uniform body
mixture
forming
hardness
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JP2014209683A
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Japanese (ja)
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JP5965453B2 (ja
JP2015006731A (ja
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Priority claimed from US13/113,655 external-priority patent/US20120302148A1/en
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JP2014209683A 2011-05-23 2014-10-14 上に別個の突起を有する均一な本体を有する研磨パッド Active JP5965453B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/113,655 2011-05-23
US13/113,655 US20120302148A1 (en) 2011-05-23 2011-05-23 Polishing pad with homogeneous body having discrete protrusions thereon

Related Parent Applications (1)

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JP2014511502A Division JP5657178B2 (ja) 2011-05-23 2012-05-16 上に別個の突起を有する均一な本体を有する研磨パッド

Related Child Applications (1)

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JP2016083450A Division JP6309559B2 (ja) 2011-05-23 2016-04-19 上に別個の突起を有する均一な本体を有する研磨パッド

Publications (3)

Publication Number Publication Date
JP2015006731A JP2015006731A (ja) 2015-01-15
JP2015006731A5 true JP2015006731A5 (enExample) 2015-06-18
JP5965453B2 JP5965453B2 (ja) 2016-08-03

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JP2014511502A Active JP5657178B2 (ja) 2011-05-23 2012-05-16 上に別個の突起を有する均一な本体を有する研磨パッド
JP2014209683A Active JP5965453B2 (ja) 2011-05-23 2014-10-14 上に別個の突起を有する均一な本体を有する研磨パッド
JP2016083450A Active JP6309559B2 (ja) 2011-05-23 2016-04-19 上に別個の突起を有する均一な本体を有する研磨パッド

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JP2014511502A Active JP5657178B2 (ja) 2011-05-23 2012-05-16 上に別個の突起を有する均一な本体を有する研磨パッド

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JP2016083450A Active JP6309559B2 (ja) 2011-05-23 2016-04-19 上に別個の突起を有する均一な本体を有する研磨パッド

Country Status (7)

Country Link
US (2) US20120302148A1 (enExample)
EP (2) EP2714331B1 (enExample)
JP (3) JP5657178B2 (enExample)
KR (2) KR101621789B1 (enExample)
CN (1) CN103561907B (enExample)
TW (2) TWI504479B (enExample)
WO (1) WO2012162066A1 (enExample)

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CN108972319A (zh) * 2018-09-18 2018-12-11 长鑫存储技术有限公司 化学机械研磨垫及其制备方法
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CN110614580B (zh) * 2019-10-22 2021-11-19 西安奕斯伟材料科技有限公司 抛光垫及其制备方法、化学机械研磨设备
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CN116922262A (zh) * 2022-06-09 2023-10-24 台湾积体电路制造股份有限公司 用于化学机械抛光的抛光垫及其形成方法
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