JP2014525384A5 - - Google Patents
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- Publication number
- JP2014525384A5 JP2014525384A5 JP2014527567A JP2014527567A JP2014525384A5 JP 2014525384 A5 JP2014525384 A5 JP 2014525384A5 JP 2014527567 A JP2014527567 A JP 2014527567A JP 2014527567 A JP2014527567 A JP 2014527567A JP 2014525384 A5 JP2014525384 A5 JP 2014525384A5
- Authority
- JP
- Japan
- Prior art keywords
- sio
- dopant
- coating suspension
- release layer
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000725 suspension Substances 0.000 claims description 30
- 239000011248 coating agent Substances 0.000 claims description 28
- 238000000576 coating method Methods 0.000 claims description 28
- 239000002019 doping agent Substances 0.000 claims description 24
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 23
- 239000011230 binding agent Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 12
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 10
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 10
- 238000005245 sintering Methods 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000002612 dispersion medium Substances 0.000 claims description 8
- 230000004907 flux Effects 0.000 claims description 8
- 239000002243 precursor Substances 0.000 claims description 8
- 150000003388 sodium compounds Chemical class 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 239000012752 auxiliary agent Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 239000002994 raw material Substances 0.000 claims description 4
- 239000000155 melt Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000005350 fused silica glass Substances 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 230000001376 precipitating effect Effects 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 2
- 238000000265 homogenisation Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161529552P | 2011-08-31 | 2011-08-31 | |
| US61/529,552 | 2011-08-31 | ||
| PCT/EP2012/065182 WO2013029920A1 (de) | 2011-08-31 | 2012-08-02 | Siliziumnitridhaltige trennschicht hoher härte |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017125061A Division JP2018008870A (ja) | 2011-08-31 | 2017-06-27 | 優れた硬度の窒化ケイ素含有剥離層 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014525384A JP2014525384A (ja) | 2014-09-29 |
| JP2014525384A5 true JP2014525384A5 (https=) | 2016-04-14 |
Family
ID=46690481
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014527567A Pending JP2014525384A (ja) | 2011-08-31 | 2012-08-02 | 優れた硬度の窒化ケイ素含有剥離層 |
| JP2017125061A Withdrawn JP2018008870A (ja) | 2011-08-31 | 2017-06-27 | 優れた硬度の窒化ケイ素含有剥離層 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017125061A Withdrawn JP2018008870A (ja) | 2011-08-31 | 2017-06-27 | 優れた硬度の窒化ケイ素含有剥離層 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9625213B2 (https=) |
| EP (1) | EP2751302B1 (https=) |
| JP (2) | JP2014525384A (https=) |
| KR (1) | KR20140060549A (https=) |
| CN (1) | CN103827351B (https=) |
| MY (1) | MY165455A (https=) |
| WO (1) | WO2013029920A1 (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3019189B1 (fr) * | 2014-03-31 | 2018-07-27 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Creuset, procede de fabrication du creuset, et procede de fabrication d'un materiau cristallin au moyen d'un tel creuset |
| TWI663126B (zh) * | 2014-07-09 | 2019-06-21 | 法商維蘇威法國公司 | 包含可磨塗層之輥、其製造方法及其用途 |
| DE102015216734A1 (de) * | 2015-09-02 | 2017-03-02 | Alzchem Ag | Tiegel zur Herstellung von Silicium-Ingots, Verfahren zu dessen Herstellung sowie Silicium-Ingot |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| WO2017103115A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
| WO2017103160A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| EP3390290B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines opaken quarzglaskörpers |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
| CN107400922A (zh) * | 2017-07-18 | 2017-11-28 | 镇江仁德新能源科技有限公司 | 一种石英坩埚涂层及其制备方法和用途 |
| KR102373824B1 (ko) * | 2017-09-06 | 2022-03-15 | 삼성전자주식회사 | 조리장치 및 그 제조방법 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3149149B2 (ja) | 1993-06-30 | 2001-03-26 | キヤノン株式会社 | 光学素子成形用型 |
| WO1998035075A1 (de) | 1997-02-06 | 1998-08-13 | Bayer Aktiengesellschaft | Mit siliciumschutzschichten versehene schmelztiegel, ein verfahren zum aufbringen der siliciumschutzschicht und deren verwendung |
| ATE398196T1 (de) * | 2004-04-29 | 2008-07-15 | Vesuvius Crucible Co | Tiegel für die kristallisation von silicium |
| TWI400369B (zh) * | 2005-10-06 | 2013-07-01 | Vesuvius Crucible Co | 用於矽結晶的坩堝及其製造方法 |
| DE102005050593A1 (de) | 2005-10-21 | 2007-04-26 | Esk Ceramics Gmbh & Co. Kg | Dauerhafte siliciumnitridhaltige Hartbeschichtung |
| DE102006003819A1 (de) | 2006-01-26 | 2007-08-02 | Wacker Chemie Ag | Keramischer Formkörper mit hochreiner Si3N4-Beschichtung, Verfahren zu seiner Herstellung und Verwendung |
| DE102007053284A1 (de) | 2007-11-08 | 2009-05-20 | Esk Ceramics Gmbh & Co. Kg | Fest haftende siliciumnitridhaltige Trennschicht |
| CN101508590B (zh) * | 2009-03-20 | 2012-07-04 | 江西赛维Ldk太阳能高科技有限公司 | 一种多晶硅铸锭用坩埚涂层以及制备方法 |
| CN201857440U (zh) | 2010-11-02 | 2011-06-08 | 上海普罗新能源有限公司 | 太阳能级多晶硅提纯铸锭用的坩埚 |
-
2012
- 2012-08-02 MY MYPI2014000512A patent/MY165455A/en unknown
- 2012-08-02 WO PCT/EP2012/065182 patent/WO2013029920A1/de not_active Ceased
- 2012-08-02 JP JP2014527567A patent/JP2014525384A/ja active Pending
- 2012-08-02 CN CN201280042094.8A patent/CN103827351B/zh not_active Expired - Fee Related
- 2012-08-02 EP EP12748180.2A patent/EP2751302B1/de not_active Not-in-force
- 2012-08-02 US US14/342,001 patent/US9625213B2/en not_active Expired - Fee Related
- 2012-08-02 KR KR1020147008143A patent/KR20140060549A/ko not_active Ceased
-
2017
- 2017-06-27 JP JP2017125061A patent/JP2018008870A/ja not_active Withdrawn
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