JP2014524666A - 酸化物tftアレイ基板及びその製造方法並びに電子デバイス - Google Patents
酸化物tftアレイ基板及びその製造方法並びに電子デバイス Download PDFInfo
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
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Abstract
Description
(M1)ベース基板上にゲート電極とゲート電極絶縁層とを順次成膜するステップと、
(M2)活性層とエッチストップ層とを成膜するステップと、
(M3)ソース電極、ドレイン電極、データライン、電源ライン、ビアホール、及び画素電極を作製するステップと、
を含み、
前記ステップM2は、
(S305)前記ゲート電極絶縁層上に前記活性層を形成するステップであって、前記活性層が酸化物半導体材料を含むステップと、
(S306)前記活性層上に前記エッチストップ層を形成するステップと、
(S307)前記活性層と前記エッチストップ層との積層体に対してパターニングを行うステップと、
(S308)前記エッチストップ層に対して二次パターニングを行うステップと、 を含むことを特徴とする酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法を提供する。
402 ゲート電極金属層
402a ゲート電極
402b 補助電極ライン
403 ゲート電極絶縁層
4041 活性層
404 活性層
4051 エッチストップ層
4052 エッチストップ層
405 エッチストップ層
406 金属層
406a ドレイン電極
406b ソース電極
407 パッシベーション層
407a ビアホール
408 画素電極層
408a 接触電極
408b 画素電極
Claims (10)
- 酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法であって、
(M1)ベース基板上にゲート電極とゲート電極絶縁層とを順次成膜するステップと、
(M2)活性層とエッチストップ層とを成膜するステップと、
(M3)ソース電極、ドレイン電極、データライン、電源ライン、ビアホール、及び画素電極を作製するステップと、
を含み、
前記ステップM2は、
(S305)前記ゲート電極絶縁層上に前記活性層を形成するステップであって、前記活性層が酸化物半導体材料を含むステップと、
(S306)前記活性層上に前記エッチストップ層を形成するステップと、
(S307)前記活性層と前記エッチストップ層との積層体に対してパターニングを行うステップと、
(S308)前記エッチストップ層に対して二次パターニングを行うステップと、
を含むことを特徴とする、酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法。 - 前記ステップS307において、活性層パターンのマスクを用いて、前記活性層と前記エッチストップ層との積層体に対してパターニングを行うことを特徴とする、請求項1に記載の酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法。
- 前記ステップS308において、エッチストップ層パターンのマスクを用いて、前記エッチストップ層に対して二次パターニングを行うことを特徴とする、請求項1又は2に記載の酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法。
- 前記ステップS307において、ドライエッチング又はウェットエッチングを用いて、前記活性層と前記エッチストップ層との積層体に対してパターニングを行うことを特徴とする、請求項1〜3の何れか一項に記載の酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法。
- 前記ステップS308において、ドライエッチング又はウェットエッチングを用いて前記エッチストップ層に対して二次パターニングを行うことを特徴とする、請求項1〜4の何れか一項に記載の酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法。
- 前記ステップS305において、マグネトロンスパッタリング堆積法又は溶液法により、前記ゲート電極絶縁層上に、前記活性層を形成することを特徴とする、請求項1〜5の何れか一項に記載の酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法。
- 前記活性層の酸化物半導体材料が、IGZO又はITGOであることを特徴とする、請求項1〜6の何れか一項に記載の酸化物薄膜トランジスタ(TFT)アレイ基板の製造方法
- ゲート電極、ソース電極、ドレイン電極、ゲート電極絶縁層、活性層、エッチストップ層、データライン及び画素電極を含み、前記活性層及び前記エッチストップ層は互いに隣接し、且つシングルステップ連続的エッチング工程によりパターニングを実現し、前記活性層は酸化物半導体材料を含むことを特徴とする、酸化物TFTアレイ基板。
- 前記活性層の酸化物半導体材料は、IGZO又はITGOであることを特徴とする、請求項8に記載の酸化物TFTアレイ基板。
- 請求項8又は9に記載の酸化物TFTアレイ基板を含む、電子デバイス。
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CN201110241809XA CN102629574A (zh) | 2011-08-22 | 2011-08-22 | 一种氧化物tft阵列基板及其制造方法和电子器件 |
CN201110241809.X | 2011-08-22 | ||
PCT/CN2012/080380 WO2013026382A1 (zh) | 2011-08-22 | 2012-08-20 | 氧化物tft阵列基板及其制造方法和电子器件 |
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CN102629574A (zh) * | 2011-08-22 | 2012-08-08 | 京东方科技集团股份有限公司 | 一种氧化物tft阵列基板及其制造方法和电子器件 |
CN102956714A (zh) * | 2012-10-19 | 2013-03-06 | 京东方科技集团股份有限公司 | 氧化物薄膜晶体管及其制造方法、阵列基板及显示装置 |
CN104167365A (zh) * | 2014-08-06 | 2014-11-26 | 京东方科技集团股份有限公司 | 金属氧化物薄膜晶体管、阵列基板及制作方法、显示装置 |
CN104392928A (zh) * | 2014-11-20 | 2015-03-04 | 深圳市华星光电技术有限公司 | 薄膜晶体管的制造方法 |
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KR101291488B1 (ko) * | 2009-10-21 | 2013-07-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
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- 2012-08-20 US US13/702,393 patent/US20130207100A1/en not_active Abandoned
- 2012-08-20 EP EP12794159.9A patent/EP2743977A4/en not_active Withdrawn
- 2012-08-20 JP JP2014526372A patent/JP2014524666A/ja active Pending
- 2012-08-20 KR KR1020127031369A patent/KR20130043634A/ko not_active Application Discontinuation
- 2012-08-20 WO PCT/CN2012/080380 patent/WO2013026382A1/zh active Application Filing
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Also Published As
Publication number | Publication date |
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EP2743977A4 (en) | 2015-03-25 |
KR20130043634A (ko) | 2013-04-30 |
WO2013026382A1 (zh) | 2013-02-28 |
CN102629574A (zh) | 2012-08-08 |
US20130207100A1 (en) | 2013-08-15 |
EP2743977A1 (en) | 2014-06-18 |
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