JP2014517349A5 - - Google Patents

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Publication number
JP2014517349A5
JP2014517349A5 JP2014513130A JP2014513130A JP2014517349A5 JP 2014517349 A5 JP2014517349 A5 JP 2014517349A5 JP 2014513130 A JP2014513130 A JP 2014513130A JP 2014513130 A JP2014513130 A JP 2014513130A JP 2014517349 A5 JP2014517349 A5 JP 2014517349A5
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JP
Japan
Prior art keywords
optical unit
imaging
partial
imaging optical
unit according
Prior art date
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Application number
JP2014513130A
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English (en)
Japanese (ja)
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JP2014517349A (ja
JP6263800B2 (ja
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Publication date
Priority claimed from DE102011076752A external-priority patent/DE102011076752A1/de
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Publication of JP2014517349A publication Critical patent/JP2014517349A/ja
Publication of JP2014517349A5 publication Critical patent/JP2014517349A5/ja
Application granted granted Critical
Publication of JP6263800B2 publication Critical patent/JP6263800B2/ja
Active legal-status Critical Current
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JP2014513130A 2011-05-31 2012-05-24 結像光学ユニット Active JP6263800B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161491523P 2011-05-31 2011-05-31
DE102011076752A DE102011076752A1 (de) 2011-05-31 2011-05-31 Abbildende Optik
US61/491523 2011-05-31
DE102011076752.5 2011-05-31
PCT/EP2012/059697 WO2012163794A1 (en) 2011-05-31 2012-05-24 Imaging optical unit

Publications (3)

Publication Number Publication Date
JP2014517349A JP2014517349A (ja) 2014-07-17
JP2014517349A5 true JP2014517349A5 (enExample) 2015-07-16
JP6263800B2 JP6263800B2 (ja) 2018-01-24

Family

ID=47173165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014513130A Active JP6263800B2 (ja) 2011-05-31 2012-05-24 結像光学ユニット

Country Status (7)

Country Link
US (1) US9377608B2 (enExample)
EP (1) EP2715452B1 (enExample)
JP (1) JP6263800B2 (enExample)
KR (1) KR102092363B1 (enExample)
CN (1) CN103635859B (enExample)
DE (1) DE102011076752A1 (enExample)
WO (1) WO2012163794A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9291751B2 (en) * 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102018201170A1 (de) * 2018-01-25 2019-07-25 Carl Zeiss Smt Gmbh Abbildende Optik für die EUV-Mikrolithographie
DE102023203224A1 (de) * 2023-04-06 2024-10-10 Carl Zeiss Smt Gmbh Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
JPS6314113A (ja) * 1986-07-07 1988-01-21 Matsushita Electric Ind Co Ltd 微細パタ−ン投影光学系
JPH1114913A (ja) * 1997-06-23 1999-01-22 Kazuo Kosho 第１面に凹球面反射鏡を使用した望遠鏡。
DE19809055A1 (de) * 1998-03-04 1999-09-16 Ernst Brinkmeyer Zweistrahl-Interferometer zur Gitterherstellung in photosensitiven Materialien
US6307682B1 (en) * 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
US6943946B2 (en) * 2003-05-01 2005-09-13 Itt Manufacturing Enterprises, Inc. Multiple aperture imaging system
JP4495942B2 (ja) * 2003-10-20 2010-07-07 リコー光学株式会社 結像光学系・画像形成装置・プリンターおよび画像読取装置
TWI366004B (en) 2005-09-13 2012-06-11 Zeiss Carl Smt Gmbh Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
KR20090007277A (ko) * 2006-04-14 2009-01-16 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법 및 노광 방법
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
WO2009052932A1 (en) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
KR20100117281A (ko) * 2009-04-24 2010-11-03 주식회사 프로텍 Ｌｄｉ용 다중 광 분할방법 및 장치
JP5328512B2 (ja) * 2009-06-24 2013-10-30 富士フイルム株式会社 露光装置
DE102010039745A1 (de) * 2010-08-25 2012-03-01 Carl Zeiss Smt Gmbh Abbildende Optik

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