JP6263800B2 - 結像光学ユニット - Google Patents

結像光学ユニット Download PDF

Info

Publication number
JP6263800B2
JP6263800B2 JP2014513130A JP2014513130A JP6263800B2 JP 6263800 B2 JP6263800 B2 JP 6263800B2 JP 2014513130 A JP2014513130 A JP 2014513130A JP 2014513130 A JP2014513130 A JP 2014513130A JP 6263800 B2 JP6263800 B2 JP 6263800B2
Authority
JP
Japan
Prior art keywords
optical unit
partial
imaging
imaging optical
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014513130A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014517349A (ja
JP2014517349A5 (enExample
Inventor
アレクサンダー ヴォルフ
アレクサンダー ヴォルフ
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2014517349A publication Critical patent/JP2014517349A/ja
Publication of JP2014517349A5 publication Critical patent/JP2014517349A5/ja
Application granted granted Critical
Publication of JP6263800B2 publication Critical patent/JP6263800B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014513130A 2011-05-31 2012-05-24 結像光学ユニット Active JP6263800B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161491523P 2011-05-31 2011-05-31
DE102011076752A DE102011076752A1 (de) 2011-05-31 2011-05-31 Abbildende Optik
US61/491523 2011-05-31
DE102011076752.5 2011-05-31
PCT/EP2012/059697 WO2012163794A1 (en) 2011-05-31 2012-05-24 Imaging optical unit

Publications (3)

Publication Number Publication Date
JP2014517349A JP2014517349A (ja) 2014-07-17
JP2014517349A5 JP2014517349A5 (enExample) 2015-07-16
JP6263800B2 true JP6263800B2 (ja) 2018-01-24

Family

ID=47173165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014513130A Active JP6263800B2 (ja) 2011-05-31 2012-05-24 結像光学ユニット

Country Status (7)

Country Link
US (1) US9377608B2 (enExample)
EP (1) EP2715452B1 (enExample)
JP (1) JP6263800B2 (enExample)
KR (1) KR102092363B1 (enExample)
CN (1) CN103635859B (enExample)
DE (1) DE102011076752A1 (enExample)
WO (1) WO2012163794A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9291751B2 (en) * 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102018201170A1 (de) * 2018-01-25 2019-07-25 Carl Zeiss Smt Gmbh Abbildende Optik für die EUV-Mikrolithographie
DE102023203224A1 (de) * 2023-04-06 2024-10-10 Carl Zeiss Smt Gmbh Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
JPS6314113A (ja) * 1986-07-07 1988-01-21 Matsushita Electric Ind Co Ltd 微細パタ−ン投影光学系
JPH1114913A (ja) * 1997-06-23 1999-01-22 Kazuo Kosho 第１面に凹球面反射鏡を使用した望遠鏡。
DE19809055A1 (de) * 1998-03-04 1999-09-16 Ernst Brinkmeyer Zweistrahl-Interferometer zur Gitterherstellung in photosensitiven Materialien
US6307682B1 (en) * 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
US6943946B2 (en) * 2003-05-01 2005-09-13 Itt Manufacturing Enterprises, Inc. Multiple aperture imaging system
JP4495942B2 (ja) * 2003-10-20 2010-07-07 リコー光学株式会社 結像光学系・画像形成装置・プリンターおよび画像読取装置
TWI366004B (en) 2005-09-13 2012-06-11 Zeiss Carl Smt Gmbh Microlithography projection optical system, microlithographic tool comprising such an optical system, method for microlithographic production of microstructured components using such a microlithographic tool, microstructured component being produced by s
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
KR20090007277A (ko) * 2006-04-14 2009-01-16 가부시키가이샤 니콘 노광 장치, 디바이스 제조 방법 및 노광 방법
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
WO2009052932A1 (en) 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
KR20100117281A (ko) * 2009-04-24 2010-11-03 주식회사 프로텍 Ｌｄｉ용 다중 광 분할방법 및 장치
JP5328512B2 (ja) * 2009-06-24 2013-10-30 富士フイルム株式会社 露光装置
DE102010039745A1 (de) * 2010-08-25 2012-03-01 Carl Zeiss Smt Gmbh Abbildende Optik

Also Published As

Publication number Publication date
EP2715452B1 (en) 2020-12-16
WO2012163794A1 (en) 2012-12-06
DE102011076752A1 (de) 2012-12-06
EP2715452A1 (en) 2014-04-09
JP2014517349A (ja) 2014-07-17
KR102092363B1 (ko) 2020-03-24
CN103635859B (zh) 2016-12-14
CN103635859A (zh) 2014-03-12
KR20140043732A (ko) 2014-04-10
US9377608B2 (en) 2016-06-28
US20140071418A1 (en) 2014-03-13

Similar Documents

Publication Publication Date Title
JP5319789B2 (ja) 結像光学系及びこの種の結像光学系を有するマイクロリソグラフィ用の投影露光装置
KR101645142B1 (ko) 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치
KR101515663B1 (ko) 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치
JP6010032B2 (ja) Ｅｕｖ投影露光系のためのミラー、光学系、及び構成要素を生成する方法
KR101388330B1 (ko) 이미징 광학기기 및 이러한 유형의 이미징 광학기기를 갖는 마이크로리소그래피용 투영 노광 설비
JP6221160B2 (ja) ミラーの配置
JP5643755B2 (ja) 結像光学系
KR20160018817A (ko) 결상 광학 시스템 및 투영 노광 장치
JP2018534639A (ja) 物体視野を像視野内に結像するための結像光学ユニット及びそのような結像光学ユニットを含む投影露光装置
TW201544917A (zh) 光學積分器
KR20160054580A (ko) 조명 시스템
TWI443474B (zh) 光學系統、包含此類型光學系統之用於微蝕刻的投影曝光裝置、以及以此類型投影曝光裝置製造微結構組件之方法
TWI461733B (zh) 成像光學系統、具有此類型成像光學系統之用於微影的投射曝光設備以及用於製造結構化組件的方法
TW201226968A (en) Imaging optics, and a projection exposure apparatus for microlithography having such an imaging optics
CN111656245B (zh) 投射光刻的照明光学单元
JP6263800B2 (ja) 結像光学ユニット
KR20180095134A (ko) 반사 결상 광학계, 노광 장치 및 디바이스 제조 방법
JP7284766B2 (ja) Ｅｕｖマイクロリソグラフィ用の結像光学ユニット
WO2012137699A1 (ja) 光学装置、露光装置、およびデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150525

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150525

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160411

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160511

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20160727

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161110

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170508

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20170713

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171108

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20171122

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20171130

R150 Certificate of patent or registration of utility model

Ref document number: 6263800

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250