CN103635859B - 成像光学单元 - Google Patents

成像光学单元 Download PDF

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Publication number
CN103635859B
CN103635859B CN201280026502.0A CN201280026502A CN103635859B CN 103635859 B CN103635859 B CN 103635859B CN 201280026502 A CN201280026502 A CN 201280026502A CN 103635859 B CN103635859 B CN 103635859B
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CN
China
Prior art keywords
optical unit
imaging
imaging optical
plane
pupil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201280026502.0A
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English (en)
Chinese (zh)
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CN103635859A (zh
Inventor
A.沃尔夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of CN103635859A publication Critical patent/CN103635859A/zh
Application granted granted Critical
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0081—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. enlarging, the entrance or exit pupil
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • H10P76/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201280026502.0A 2011-05-31 2012-05-24 成像光学单元 Active CN103635859B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161491523P 2011-05-31 2011-05-31
DE102011076752A DE102011076752A1 (de) 2011-05-31 2011-05-31 Abbildende Optik
US61/491,523 2011-05-31
DE102011076752.5 2011-05-31
PCT/EP2012/059697 WO2012163794A1 (en) 2011-05-31 2012-05-24 Imaging optical unit

Publications (2)

Publication Number Publication Date
CN103635859A CN103635859A (zh) 2014-03-12
CN103635859B true CN103635859B (zh) 2016-12-14

Family

ID=47173165

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280026502.0A Active CN103635859B (zh) 2011-05-31 2012-05-24 成像光学单元

Country Status (7)

Country Link
US (1) US9377608B2 (enExample)
EP (1) EP2715452B1 (enExample)
JP (1) JP6263800B2 (enExample)
KR (1) KR102092363B1 (enExample)
CN (1) CN103635859B (enExample)
DE (1) DE102011076752A1 (enExample)
WO (1) WO2012163794A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9291751B2 (en) * 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102018201170A1 (de) 2018-01-25 2019-07-25 Carl Zeiss Smt Gmbh Abbildende Optik für die EUV-Mikrolithographie
DE102023203224A1 (de) * 2023-04-06 2024-10-10 Carl Zeiss Smt Gmbh Abbildende EUV-Optik zur Abbildung eines Objektfeldes in ein Bildfeld

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6307682B1 (en) * 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
CN101836151A (zh) * 2007-10-26 2010-09-15 卡尔蔡司Smt股份公司 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法
CN103080841A (zh) * 2010-08-25 2013-05-01 卡尔蔡司Smt有限责任公司 成像光学系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861148A (en) * 1986-03-12 1989-08-29 Matsushita Electric Industrial Co., Inc. Projection optical system for use in precise copy
JPS6314113A (ja) * 1986-07-07 1988-01-21 Matsushita Electric Ind Co Ltd 微細パタ−ン投影光学系
JPH1114913A (ja) * 1997-06-23 1999-01-22 Kazuo Kosho 第１面に凹球面反射鏡を使用した望遠鏡。
DE19809055A1 (de) * 1998-03-04 1999-09-16 Ernst Brinkmeyer Zweistrahl-Interferometer zur Gitterherstellung in photosensitiven Materialien
US6943946B2 (en) * 2003-05-01 2005-09-13 Itt Manufacturing Enterprises, Inc. Multiple aperture imaging system
JP4495942B2 (ja) * 2003-10-20 2010-07-07 リコー光学株式会社 結像光学系・画像形成装置・プリンターおよび画像読取装置
CN103076723A (zh) 2005-09-13 2013-05-01 卡尔蔡司Smt有限责任公司 微光刻投影光学系统
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
JP4998803B2 (ja) * 2006-04-14 2012-08-15 株式会社ニコン 露光装置、デバイス製造方法、および露光方法
CN101836164B (zh) 2007-10-26 2013-03-13 卡尔蔡司Smt有限责任公司 成像光学系统和具有该类型的成像光学系统的微光刻投射曝光设备
KR20100117281A (ko) * 2009-04-24 2010-11-03 주식회사 프로텍 Ｌｄｉ용 다중 광 분할방법 및 장치
JP5328512B2 (ja) * 2009-06-24 2013-10-30 富士フイルム株式会社 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6307682B1 (en) * 2000-02-16 2001-10-23 Silicon Valley Group, Inc. Zoom illumination system for use in photolithography
CN101836151A (zh) * 2007-10-26 2010-09-15 卡尔蔡司Smt股份公司 成像光学系统、包括该类型的成像光学系统的用于微光刻的投射曝光设备、以及利用该类型的投射曝光设备生产微结构部件的方法
CN103080841A (zh) * 2010-08-25 2013-05-01 卡尔蔡司Smt有限责任公司 成像光学系统

Also Published As

Publication number Publication date
US9377608B2 (en) 2016-06-28
EP2715452A1 (en) 2014-04-09
US20140071418A1 (en) 2014-03-13
CN103635859A (zh) 2014-03-12
KR20140043732A (ko) 2014-04-10
DE102011076752A1 (de) 2012-12-06
EP2715452B1 (en) 2020-12-16
WO2012163794A1 (en) 2012-12-06
KR102092363B1 (ko) 2020-03-24
JP2014517349A (ja) 2014-07-17
JP6263800B2 (ja) 2018-01-24

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