JP2014154776A - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP2014154776A JP2014154776A JP2013024831A JP2013024831A JP2014154776A JP 2014154776 A JP2014154776 A JP 2014154776A JP 2013024831 A JP2013024831 A JP 2013024831A JP 2013024831 A JP2013024831 A JP 2013024831A JP 2014154776 A JP2014154776 A JP 2014154776A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/11—Vacuum
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Weting (AREA)
Abstract
【解決手段】実施形態に係る基板処理装置には、被処理基板を保持する基板保持手段が設けられる。基板保持手段には、被処理基板を保持する保持部と、保持部を周縁部上に有するベース部と、保持部及び前記ベース部とともに回転可能であり、ガス供給経路を備えた中空の回転軸と、が設けられる。ガス供給経路から供給されるガスを被処理基板に噴出させることにより被処理基板を保持される。回転軸にベルトを介して接続され、基板保持手段を回転させる基板回転手段が設けられる。基板回転手段の表面に接するように設けられ、回転する基板保持手段の回転数又は回転加速度を測定することにより、基板保持手段に基板が保持されているか否かを検出する第1の基板保持検出手段が設けられる。
【選択図】図1
Description
2…基板保持手段
21…保持部
22…ベース部
23…回転軸
31…ベルト
32、33…プーリー
4…回転手段(モーター)
5…基板保持検出手段
6…制御部
7…光学センサ
8…光照射部
W…被処理基板
Claims (5)
- 被処理基板を保持する保持部と、前記保持部を周縁部上に有するベース部と、前記保持部及び前記ベース部とともに回転可能であり、ガス供給経路を備えた中空の回転軸と、を備え、前記ガス供給経路から供給されるガスを前記被処理基板に供給させることにより前記被処理基板を保持する基板保持手段と、
前記回転軸にベルトを介して接続され、前記基板保持手段を回転させる基板回転手段と、
前記基板回転手段に接続され、回転する前記基板保持手段の回転数又は回転加速度を測定することにより、前記基板保持手段に基板が保持されているか否かを検出する第1の基板保持検出手段と、
を備えた基板処理装置。 - 前記第1の基板保持検出手段に測定された回転数又は回転加速度の大きさが、前記基板保持手段により前記被処理基板が保持されているときと比較して、所定の値より大きい場合には、前記回転手段の回転を停止する制御手段が設けられたことを特徴とする請求項1に記載の基板処理装置。
- 前記基板保持手段に前記被処理基板が保持されているか否かを検出するために、前記基板保持手段において前記被処理基板と前記ベース部との間に照射された光を測定する第2の基板保持検出手段がさらに設けられたことを特徴とする請求項1又は請求項2に記載の基板処理装置。
- 前記ベルトは、前記回転部の下端に設けられた第1のプーリーと、前記回転手段に接続されるよう設けられた第2のプーリ―を周回するように設けられたことを特徴とする請求項1乃至請求項3のいずれか1項に記載の基板処理装置。
- 前記被処理基板は、ベルヌーイ効果によって前記基板保持手段により保持されていることを特徴とする請求項1乃至請求項4のいずれか1項に記載の基板処理装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013024831A JP2014154776A (ja) | 2013-02-12 | 2013-02-12 | 基板処理装置 |
US14/021,341 US20140225335A1 (en) | 2013-02-12 | 2013-09-09 | Substrate treatment apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013024831A JP2014154776A (ja) | 2013-02-12 | 2013-02-12 | 基板処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2014154776A true JP2014154776A (ja) | 2014-08-25 |
Family
ID=51296962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013024831A Pending JP2014154776A (ja) | 2013-02-12 | 2013-02-12 | 基板処理装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US20140225335A1 (ja) |
JP (1) | JP2014154776A (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10937683B1 (en) | 2019-09-30 | 2021-03-02 | Applied Materials, Inc. | Conveyor inspection system, substrate rotator, and test system having the same |
WO2021066986A1 (en) * | 2019-09-30 | 2021-04-08 | Applied Materials, Inc. | Conveyor inspection system, substrate rotator, and test system having the same |
US20220316066A1 (en) * | 2021-03-31 | 2022-10-06 | Applied Materials, Inc. | Level monitoring and active adjustment of a substrate support assembly |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6476724A (en) * | 1987-09-18 | 1989-03-22 | Hitachi Ltd | High pressure jet cleaning apparatus |
JPH08316290A (ja) * | 1995-05-15 | 1996-11-29 | Dainippon Screen Mfg Co Ltd | 回転式基板処理装置 |
JPH09107022A (ja) * | 1995-10-13 | 1997-04-22 | Toshiba Microelectron Corp | 回転保持装置及び方法 |
US20020005212A1 (en) * | 1999-01-04 | 2002-01-17 | International Business Machines Corporation | Post CMP clean brush with torque monitor |
JP2003229403A (ja) * | 2002-02-04 | 2003-08-15 | Shibaura Mechatronics Corp | スピン処理装置及びスピン処理方法 |
JP2004134431A (ja) * | 2002-10-08 | 2004-04-30 | Sprout Co Ltd | 基板処理装置およびその製造方法 |
JP2010087338A (ja) * | 2008-10-01 | 2010-04-15 | Panasonic Corp | 半導体装置の製造方法および半導体製造装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3753569B2 (ja) * | 1999-08-24 | 2006-03-08 | 株式会社荏原製作所 | ポリッシング装置 |
US20080268753A1 (en) * | 2007-04-24 | 2008-10-30 | Tetsuya Ishikawa | Non-contact wet wafer holder |
KR100912701B1 (ko) * | 2007-10-22 | 2009-08-19 | 세메스 주식회사 | 웨이퍼 스핀 척과 스핀 척을 구비한 에칭 장치 |
KR101489963B1 (ko) * | 2007-12-13 | 2015-02-04 | 한국에이에스엠지니텍 주식회사 | 박막 증착 장치 및 이를 이용한 증착 방법 |
-
2013
- 2013-02-12 JP JP2013024831A patent/JP2014154776A/ja active Pending
- 2013-09-09 US US14/021,341 patent/US20140225335A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6476724A (en) * | 1987-09-18 | 1989-03-22 | Hitachi Ltd | High pressure jet cleaning apparatus |
JPH08316290A (ja) * | 1995-05-15 | 1996-11-29 | Dainippon Screen Mfg Co Ltd | 回転式基板処理装置 |
JPH09107022A (ja) * | 1995-10-13 | 1997-04-22 | Toshiba Microelectron Corp | 回転保持装置及び方法 |
US20020005212A1 (en) * | 1999-01-04 | 2002-01-17 | International Business Machines Corporation | Post CMP clean brush with torque monitor |
JP2003229403A (ja) * | 2002-02-04 | 2003-08-15 | Shibaura Mechatronics Corp | スピン処理装置及びスピン処理方法 |
JP2004134431A (ja) * | 2002-10-08 | 2004-04-30 | Sprout Co Ltd | 基板処理装置およびその製造方法 |
JP2010087338A (ja) * | 2008-10-01 | 2010-04-15 | Panasonic Corp | 半導体装置の製造方法および半導体製造装置 |
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US20140225335A1 (en) | 2014-08-14 |
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