JPS6476724A - High pressure jet cleaning apparatus - Google Patents

High pressure jet cleaning apparatus

Info

Publication number
JPS6476724A
JPS6476724A JP23202987A JP23202987A JPS6476724A JP S6476724 A JPS6476724 A JP S6476724A JP 23202987 A JP23202987 A JP 23202987A JP 23202987 A JP23202987 A JP 23202987A JP S6476724 A JPS6476724 A JP S6476724A
Authority
JP
Japan
Prior art keywords
article
high pressure
nozzle
relative speeds
pressure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23202987A
Other languages
Japanese (ja)
Inventor
Seiji Fujikura
Isamu Akiba
Makoto Hiyama
Tomoyoshi Ogoshi
Kazumasa Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP23202987A priority Critical patent/JPS6476724A/en
Publication of JPS6476724A publication Critical patent/JPS6476724A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a high pressure jet cleaning apparatus which can obtain uniform cleaning effect by equalizing high pressure water amount per unit angle for receiving an article to be cleaned and secured on a rotary cleaning table and relative speeds at its rotary center and its periphery. CONSTITUTION:The minimum condition for cleaning the whole face of an article 1 to be cleaned needs at least one revolution of the article 1 while a nozzle 4 moves at the spot diameter (d) of high pressure water. However, since the distances from the rotating center O are different at the points of r1 and r2, the quantities of the high pressure waters per unit angle are different. Therefore, the scanning velocity of the nozzle 4 is decelerated from the rotating center of the article 1 toward the outer periphery. However, if the rotating speed of the article 1 is constant, the angular velocity directly under the nozzle 4 becomes v1= r1omega, v2 =r2omega, and the relative speeds of the high pressure water and the article 1 are varied. Then, the rotating speed of the article 1 is accelerated or decelerated according to the position of the nozzle 4. Thus, since the angular velocities become the same, the relative speeds become the same at any surfaces of the article 1.
JP23202987A 1987-09-18 1987-09-18 High pressure jet cleaning apparatus Pending JPS6476724A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23202987A JPS6476724A (en) 1987-09-18 1987-09-18 High pressure jet cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23202987A JPS6476724A (en) 1987-09-18 1987-09-18 High pressure jet cleaning apparatus

Publications (1)

Publication Number Publication Date
JPS6476724A true JPS6476724A (en) 1989-03-22

Family

ID=16932851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23202987A Pending JPS6476724A (en) 1987-09-18 1987-09-18 High pressure jet cleaning apparatus

Country Status (1)

Country Link
JP (1) JPS6476724A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0322428A (en) * 1989-06-19 1991-01-30 Nec Kyushu Ltd Manufacturing apparatus for semiconductor device
JP2014154776A (en) * 2013-02-12 2014-08-25 Toshiba Corp Substrate processing apparatus
US9511394B2 (en) 2011-09-09 2016-12-06 Olympus Corporation Cleaning apparatus
JP2017216416A (en) * 2016-06-02 2017-12-07 株式会社ディスコ Washing device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0322428A (en) * 1989-06-19 1991-01-30 Nec Kyushu Ltd Manufacturing apparatus for semiconductor device
US9511394B2 (en) 2011-09-09 2016-12-06 Olympus Corporation Cleaning apparatus
JP2014154776A (en) * 2013-02-12 2014-08-25 Toshiba Corp Substrate processing apparatus
JP2017216416A (en) * 2016-06-02 2017-12-07 株式会社ディスコ Washing device

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