JP2014118633A - 蒸着装置、薄膜形成方法及び有機発光表示装置の製造方法 - Google Patents
蒸着装置、薄膜形成方法及び有機発光表示装置の製造方法 Download PDFInfo
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 73
- 239000010409 thin film Substances 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 4
- 239000000758 substrate Substances 0.000 claims abstract description 192
- 238000005019 vapor deposition process Methods 0.000 claims abstract description 16
- 238000012790 confirmation Methods 0.000 claims description 54
- 239000010408 film Substances 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 23
- 238000000151 deposition Methods 0.000 claims description 20
- 230000008021 deposition Effects 0.000 claims description 20
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- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000002994 raw material Substances 0.000 abstract description 14
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- 239000004065 semiconductor Substances 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
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- 230000007261 regionalization Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/52—Controlling or regulating the coating process
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Abstract
【解決手段】基板に対してマスクを利用して蒸着工程を進めるための蒸着装置であって、チャンバと、前記チャンバ内に配され、前記基板を配するように形成され、第1ホールを備える支持部と、前記基板方向に一つ以上の蒸着原料物質を供給する供給部と、前記支持部の前記第1ホールを貫通するように配され、前記マスクを支持したまま運動して、前記マスクを前記基板に整列させる整列部材と、を備えることを特徴とする、蒸着装置。
【選択図】図1
Description
100 蒸着装置
101 チャンバ
110 支持部
120 供給部
130 マスク
140 整列部材
150 整列確認部材
200 蒸着装置
201 チャンバ
210 支持部
220 供給部
230 マスク
240 整列部材
250 整列確認部材
30 基板
Claims (31)
- 基板に対してマスクを利用して蒸着工程を進めるための蒸着装置であって、
チャンバと、
前記チャンバ内に配され、前記基板を配するように形成され、第1ホールを備える支持部と、
前記基板方向に一つ以上の蒸着原料物質を供給する供給部と、
前記支持部の前記第1ホールを貫通するように配され、前記マスクを支持したまま運動して、前記マスクを前記基板に整列させる整列部材と、
を備える蒸着装置。 - 前記基板及び前記マスクの整列状態を確認する整列確認部材をさらに備え、
前記支持部は、第2ホールをさらに備え、
前記整列確認部材は、前記第2ホールを通じて、前記基板及び前記マスクの整列状態を確認することを特徴とする、請求項1に記載の蒸着装置。 - 前記整列確認部材は、前記基板及び前記マスクのそれぞれに備えられた整列マークを確認して、前記基板及び前記マスクの整列状態を確認することを特徴とする、請求項2に記載の蒸着装置。
- 前記第2ホールは、前記第1ホールに比べて、前記支持部の中央領域のさらに近くに形成されることを特徴とする、請求項2または3に記載の蒸着装置。
- 前記整列確認部材は、前記支持部に比べて、前記供給部からさらに遠く離隔して配されることを特徴とする、請求項2〜4のいずれか1項に記載の蒸着装置。
- 前記整列確認部材は、前記支持部を基準として前記支持部の下部に配され、
前記供給部は、前記支持部の上部に配されることを特徴とする、請求項2〜5のいずれか1項に記載の蒸着装置。 - 前記チャンバは、前記第2ホールに対応する透過窓を備え、
前記整列確認部材は、前記透過窓を通じて、前記基板及び前記マスクの整列状態を確認することを特徴とする、請求項2〜6のいずれか1項に記載の蒸着装置。 - 前記整列部材が前記第1ホール内で3次元運動が可能であるように、
前記整列部材の断面積は、前記第1ホールのサイズより小さいことを特徴とする、請求項1〜7のいずれか1項に記載の蒸着装置。 - 前記整列部材は、前記マスクを支持したまま、前記マスクの上面と平行した方向への平面運動及び前記マスクの上面の垂直方向への直線運動を通じて、前記基板に対する前記マスクの整列作業を行うことを特徴とする、請求項1〜8のいずれか1項に記載の蒸着装置。
- 前記支持部の上面は、屈曲した形態を有することを特徴とする、請求項1〜9のいずれか1項に記載の蒸着装置。
- 前記支持部の上面の領域のうち中央領域は、端部より突出して形成されることを特徴とする、請求項10に記載の蒸着装置。
- 前記支持部の下面は、前記上面に対応するように屈曲した形態を有することを特徴とする、請求項10または11に記載の蒸着装置。
- 前記支持部の下面は、平坦面を有することを特徴とする、請求項10または11に記載の蒸着装置。
- 前記基板を支持するように配され、昇降運動を通じて、前記基板を前記支持部に配するリフトピンをさらに備え、
前記支持部は、第3ホールをさらに備え、
前記リフトピンは、前記第3ホールを貫通するように配されることを特徴とする、請求項1〜13のいずれか1項に記載の蒸着装置。 - 前記第3ホールは、前記第1ホールに比べて、前記支持部の中央領域のさらに近くに形成されることを特徴とする、請求項14に記載の蒸着装置。
- 前記供給部を支持し、前記供給部に比べて、前記支持部からさらに遠く離隔して配されたベースプレートをさらに備えることを特徴とする、請求項1〜15のいずれか1項に記載の蒸着装置。
- 前記供給部と前記支持部との間にプラズマを発生させるように、電圧を印加する電源部をさらに備えることを特徴とする、請求項1〜16のいずれか1項に記載の蒸着装置。
- 前記チャンバ内を洗浄するようにプラズマを発生させて、チャンバ内に注入する洗浄部をさらに備えることを特徴とする、請求項1〜17のいずれか1項に記載の蒸着装置。
- 前記支持部は、昇降運動を行うように形成されることを特徴とする、請求項1〜18のいずれか1項に記載の蒸着装置。
- 前記チャンバは、側面に前記基板及び前記マスクの出入りのための少なくとも一つの出入口を備えることを特徴とする、請求項1〜19のいずれか1項に記載の蒸着装置。
- 蒸着装置を利用して基板に薄膜を形成する方法であって、
チャンバ内に前記基板を投入するステップと、
第1ホールを備える支持部に前記基板を配するステップと、
前記支持部の前記第1ホールを貫通するように配された整列部材でマスクを支持したまま、前記マスクを前記基板に整列させるステップと、
供給部から前記基板方向に薄膜を形成するための一つ以上の蒸着原料物質を供給するステップと、
前記基板に薄膜を形成するステップと、
を含む薄膜形成方法。 - 前記マスクを前記基板に整列させるステップは、
前記支持部に備えられた第2ホールを通じて、整列確認部材を利用して、前記基板及び前記マスクの整列状態をリアルタイムで確認するステップを含むことを特徴とする、請求項21に記載の薄膜形成方法。 - 前記整列確認部材を利用して、前記マスク及び前記基板のそれぞれの整列マークを確認するステップを含むことを特徴とする、請求項22に記載の薄膜形成方法。
- 前記支持部に前記基板を配するステップは、
前記支持部の第3ホールを貫通するように配されたリフトピンが、前記基板を支持したまま、前記支持部方向に下降するステップを含むことを特徴とする、請求項21〜23のいずれか1項に記載の薄膜形成方法。 - 前記マスクを前記基板に整列させるステップの後に、前記支持部が昇降運動して、前記基板と前記供給部との間隔を制御するステップを含むことを特徴とする、請求項21〜24のいずれか1項に記載の薄膜形成方法。
- 前記薄膜を形成するステップの後に、
前記チャンバに連結された洗浄部からリモートプラズマを発生させ、前記チャンバ内に注入して前記チャンバを洗浄するステップを含むことを特徴とする、請求項21〜25のいずれか1項に記載の薄膜形成方法。 - 蒸着装置を利用して有機発光表示装置を製造する方法であって、
チャンバ内に前記有機発光表示装置を形成するための基板を投入する工程と、
第1ホールを備える支持部に前記基板を配する工程と、
前記支持部の前記第1ホールを貫通するように配された整列部材でマスクを支持したまま、前記マスクを前記基板に整列させる工程と、
供給部から前記基板方向に薄膜を形成するための一つ以上の蒸着原料物質を供給する工程と、
を含む有機発光表示装置の製造方法。 - 前記マスクを前記基板に整列させる工程は、
前記支持部に備えられた第2ホールを通じて、整列確認部材を利用して前記基板及び前記マスクの整列状態をリアルタイムで確認する工程を含むことを特徴とする、請求項27に記載の有機発光表示装置の製造方法。 - 前記蒸着原料物質を供給する工程の後に、前記基板に薄膜を形成する工程をさらに含み、
前記有機発光表示装置は、前記基板上に、第1電極、有機発光層を備える中間層、第2電極及び封止層を備え、
前記薄膜を形成する工程は、前記封止層を形成することを特徴とする、請求項27または28に記載の有機発光表示装置の製造方法。 - 前記蒸着原料物質を供給する工程の後に、前記基板に薄膜を形成する工程をさらに含み、
前記薄膜を形成する工程は、絶縁膜を形成することを特徴とする、請求項27〜29のいずれか1項に記載の有機発光表示装置の製造方法。 - 前記蒸着原料物質を供給する工程の後に、前記基板に薄膜を形成する工程をさらに含み、
前記薄膜を形成する工程は、導電膜を形成することを特徴とする、請求項27〜30のいずれか1項に記載の有機発光表示装置の製造方法。
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