JP2014087781A - 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム - Google Patents
基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム Download PDFInfo
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Abstract
【解決手段】第1のポリマーと第2のポリマーとを含むブロック共重合体を用いて、ウェハを処理する方法であって、ブロック共重合体をウェハ上に塗布するブロック共重合体塗布工程と、ウェハ上のブロック共重合体を非酸化性ガス雰囲気で熱処理して、ブロック共重合体を前記第1のポリマーと前記第2のポリマーに相分離させるポリマー分離工程と、を有する。その後、相分離したブロック共重合体から、親水性ポリマーを選択的に除去する。
【選択図】図8
Description
2 塗布現像処理装置
3 エッチング処理装置
30 現像装置
31 洗浄装置
32 反射防止膜形成装置
33 中性層形成装置
34 レジスト塗布装置
35 ブロック共重合体塗布装置
40 熱処理装置
41 紫外線照射装置
42 アドヒージョン装置
43 周辺露光装置
44 ポリマー分離装置
202〜205 エッチング装置
300 制御部
400 反射防止膜
401 中性層
402 レジストパターン
402a ライン部
402b、402c スペース部
403 親水性領域
404 ブロック共重合体
405 親水性ポリマー
406 疎水性ポリマー
W ウェハ
Claims (27)
- 第1のポリマーと第2のポリマーとを含むブロック共重合体を用いて、基板を処理する方法であって、
前記ブロック共重合体を、基板上又は前記基板上に塗布された下地膜上に塗布するブロック共重合体塗布工程と、
前記基板上の前記ブロック共重合体を非酸化性ガス雰囲気で熱処理して、前記ブロック共重合体を前記第1のポリマーと前記第2のポリマーに相分離させるポリマー分離工程と、を有することを特徴とする、基板処理方法。 - 前記ポリマー分離工程では、第1の温度で加熱して前記ブロック共重合体の第1のポリマーと第2のポリマーを拡散させ、その後前記第1の温度より低い第2の温度で加熱して第1のポリマーと第2のポリマーを相分離させることを特徴とする、請求項1に記載の基板処理方法。
- 前記相分離したブロック共重合体から、前記第1のポリマー又は前記第2のポリマーのいずれかを選択的に除去するポリマー除去工程を有していることを特徴とする、請求項2に記載の基板処理方法。
- 前記ポリマー除去工程では、プラズマエッチング処理、または有機溶剤の供給により前記第1のポリマー又は前記第2のポリマーのいずれかを選択的に除去することを特徴とする、請求項3に記載の基板処理方法。
- 前記第1のポリマーは親水性を有する親水性ポリマーであり、前記第2のポリマーは、疎水性を有する疎水性ポリマーであることを特徴とする、請求項1〜4のいずれか一項に記載の基板処理方法。
- 前記親水性ポリマーはポリメタクリル酸メチルであり、
前記疎水性ポリマーはポリスチレンであることを特徴とする、請求項5に記載の基板処理方法。 - 前記親水性ポリマーはポリジメチルシロキサンであり、
前記疎水性ポリマーはポリスチレンであることを特徴とする、請求項5に記載の基板処理方法。 - 前記下地膜は、ブロック共重合体塗布工程の前に基板上に前記親水性ポリマーと前記疎水性ポリマーに対して中間の親和性を有する中性剤を塗布し、当該中性剤を非酸化性ガス雰囲気において所定の温度で加熱して形成された中性層であることを特徴とする、請求項6または7のいずれか一項に記載の基板処理方法。
- 前記ポリマー分離工程では、内部を密閉可能な処理容器内に設けられた、基板を載置面に載置して熱処理する載置台から、当該基板を所定の距離離間した状態で前記載置面を所定の期間加熱し、
前記所定の期間経過後、基板を前記載置台に載置して加熱することを特徴とする、請求項1〜8のいずれか一項に記載の基板処理方法。 - 前記ポリマー分離工程では、前記処理容器内の酸素濃度を測定し、
前記処理容器内の酸素濃度が所定の濃度以下となった後に、基板を載置台に載置して加熱することを特徴とする、請求項9に記載の基板処理方法。 - 前記下地膜は、ブロック共重合体塗布工程の前に基板上にポリスチレンを塗布し、当該ポリスチレンを非酸化性ガス雰囲気において所定の温度で加熱して形成されたものであることを特徴とする、請求項6または7のいずれか一項に記載の基板処理方法。
- 前記ポリスチレンの所定の温度での加熱は、
内部を密閉可能な処理容器内に設けられた、基板を載置面に載置して熱処理する載置台から、当該基板を所定の距離離間した状態で前記載置面を所定の期間加熱し、
前記所定の期間経過後、基板を載置台に載置して加熱することで行われることを特徴とする、請求項11に記載の基板処理方法。 - 前記ポリスチレンの所定の温度での加熱においては、
前記処理容器内の酸素濃度を測定し、
前記処理容器内の酸素濃度が所定の濃度以下となった後に、基板を前記載置台に載置して加熱することを特徴とする、請求項12に記載の基板処理方法。 - 請求項1〜13のいずれか一項に記載の基板処理方法を基板処理システムによって実行させるために、当該基板処理システムを制御する制御部のコンピュータ上で動作するプログラム。
- 請求項14に記載のプログラムを格納した読み取り可能なコンピュータ記憶媒体。
- 第1のポリマーと第2のポリマーとを含むブロック共重合体を用いて、基板を処理するシステムであって、
前記ブロック共重合体を、基板上又は前記基板上に塗布された下地膜上に塗布するブロック共重合体塗布装置と、
前記基板上の前記ブロック共重合体を非酸化性ガス雰囲気で熱処理して、前記ブロック共重合体を前記第1のポリマーと前記第2のポリマーに相分離させるポリマー分離装置と、を有することを特徴とする、基板処理システム。 - 前記ポリマー分離装置では、第1の温度で加熱して前記ブロック共重合体の第1のポリマーと第2のポリマーを拡散させ、その後前記第1の温度より低い第2の温度で加熱して第1のポリマーと第2のポリマーを相分離させることを特徴とする、請求項16に記載の基板処理システム。
- 前記相分離したブロック共重合体から、前記第1のポリマー又は前記第2のポリマーのいずれかを選択的に除去するポリマー除去装置を有していることを特徴とする、請求項17に記載の基板処理システム。
- 前記ポリマー除去装置は、プラズマエッチング処理装置、または有機溶剤を供給して前記第1のポリマー又は前記第2のポリマーのいずれかを選択的に除去する溶剤供給装置であることを特徴とする、請求項18に記載の基板処理システム。
- 前記第1のポリマーは親水性を有する親水性ポリマーであり、前記第2のポリマーは、疎水性を有する疎水性ポリマーであることを特徴とする、請求項16〜19のいずれか一項に記載の基板処理システム。
- 前記親水性ポリマーはポリメタクリル酸メチルであり、
前記疎水性ポリマーはポリスチレンであることを特徴とする、請求項20に記載の基板処理システム。 - 前記親水性ポリマーはポリジメチルシロキサンであり、
前記疎水性ポリマーはポリスチレンであることを特徴とする、請求項20に記載の基板処理システム。 - 前記下地膜は、前記親水性ポリマーと前記疎水性ポリマーに対して中間の親和性を有する中性層を所定の温度で加熱したものであり、
ブロック共重合体が塗布される前の基板上に中性剤を塗布して中性層を形成する中性層形成装置と、
前記中性層を所定の温度で加熱して前記下地膜を形成する下地膜形成装置と、をさらに有し、
前記下地膜形成装置は、
内部を密閉可能な処理容器と、
前記処理容器内に設けられ、基板を載置する載置台と、
前記載置台における基板の載置面を加熱する加熱機構と、
前記処理容器内に非酸化性ガスを供給するガス供給源と、
基板を保持し、当該保持した基板を、前記載置台の載置面に対して相対的に上下動させる昇降機構と、
前記昇降機構との間で基板の受け渡しを行う搬送機構と、
前記処理容器内に非酸化性ガスを供給するようにガス供給源を制御すると共に、前記昇降機構に基板を受け渡すように前記搬送機構を制御し、
次いで、基板が載置台の載置面から所定の距離離間した状態で、前記載置台の載置面を所定の期間加熱するように、前記昇降機構及び前記加熱機構を制御し、
前記所定の期間経過後、基板を載置台に載置して加熱するように、前記昇降機構及び前記加熱機構をさらに制御する制御を行う、制御部と、を有することを特徴とする、請求項21または22のいずれか一項に記載の基板処理システム。 - 前記ポリマー分離装置は、
内部を密閉可能な処理容器と、
前記処理容器内に設けられ、基板を載置する載置台と、
前記載置台における基板の載置面を加熱する加熱機構と、
前記処理容器内に非酸化性ガスを供給するガス供給源と、
基板を保持し、当該保持した基板を、前記載置台の載置面に対して相対的に上下動させる昇降機構と、
前記昇降機構との間で基板の受け渡しを行う搬送機構と、
前記処理容器内に非酸化性ガスを供給するようにガス供給源を制御すると共に、前記昇降機構に基板を受け渡すように前記搬送機構を制御し、
次いで、基板が載置台の載置面から所定の距離離間した状態で、前記載置台の載置面を所定の期間加熱するように、前記昇降機構及び前記加熱機構を制御し、
前記所定の期間経過後、基板を載置台に載置して加熱するように、前記昇降機構及び前記加熱機構をさらに制御する制御を行う、制御部と、を有することを特徴とする、請求項16〜23のいずれか一項に記載の基板処理システム。 - 前記ポリマー分離装置は、前記処理容器内の酸素濃度を検出する酸素濃度検出機構をさらに有し、
前記制御部は、前記処理容器内の酸素濃度が所定の濃度以下となった後に、基板を載置台に載置して加熱するように、前記昇降機構及び前記加熱機構を制御することを特徴とする、請求項24に記載の基板処理システム。 - 前記下地膜は、所定の温度で加熱されたポリスチレンであり、
ブロック共重合体が塗布される前の基板上にポリスチレンを塗布してポリスチレン膜を形成するポリスチレン塗布装置と、
前記ポリスチレン膜を所定の温度で加熱して前記下地膜を形成する下地膜形成装置と、をさらに有し、
前記下地膜形成装置は、
内部を密閉可能な処理容器と、
前記処理容器内に設けられ、基板を載置する載置台と、
前記載置台における基板の載置面を加熱する加熱機構と、
前記処理容器内に非酸化性ガスを供給するガス供給源と、
基板を保持し、当該保持した基板を、前記載置台の載置面に対して相対的に上下動させる昇降機構と、
前記昇降機構との間で基板の受け渡しを行う搬送機構と、
前記処理容器内に非酸化性ガスを供給するようにガス供給源を制御すると共に、前記昇降機構に基板を受け渡すように前記搬送機構を制御し、
次いで、基板が載置台の載置面から所定の距離離間した状態で、前記載置台の載置面を所定の期間加熱するように、前記昇降機構及び前記加熱機構を制御し、
前記所定の期間経過後、基板を載置台に載置して加熱するように、前記昇降機構及び前記加熱機構をさらに制御する制御を行う、制御部と、を有することを特徴とする、請求項21または22のいずれか一項に記載の基板処理システム。 - 前記ポリマー分離装置は、前記処理容器内の酸素濃度を検出する酸素濃度検出機構をさらに有し、
前記制御部は、前記処理容器内の酸素濃度が所定の濃度以下となった後に、基板を載置台に載置して加熱するように、前記昇降機構及び前記加熱機構を制御することを特徴とする、請求項26に記載の基板処理システム。
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JP2018133406A (ja) * | 2017-02-14 | 2018-08-23 | 株式会社Screenホールディングス | 基板処理方法 |
JP2018133409A (ja) * | 2017-02-14 | 2018-08-23 | 株式会社Screenホールディングス | 基板処理方法 |
JP2018133405A (ja) * | 2017-02-14 | 2018-08-23 | 株式会社Screenホールディングス | 基板処理方法及びその装置 |
US10900126B2 (en) | 2017-02-14 | 2021-01-26 | SCREEN Holdings Co., Ltd. | Substrate treating method and apparatus used therefor |
US10915025B2 (en) | 2017-02-14 | 2021-02-09 | SCREEN Holdings Co., Ltd. | Substrate treating method |
US10941492B2 (en) | 2017-02-14 | 2021-03-09 | SCREEN Holdings Co., Ltd. | Substrate treating method |
JP7030414B2 (ja) | 2017-02-14 | 2022-03-07 | 株式会社Screenホールディングス | 基板処理方法及びその装置 |
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TW201430905A (zh) | 2014-08-01 |
KR20150060741A (ko) | 2015-06-03 |
WO2014054570A1 (ja) | 2014-04-10 |
KR101967503B1 (ko) | 2019-04-09 |
JP6141144B2 (ja) | 2017-06-07 |
US20150228512A1 (en) | 2015-08-13 |
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