JP2014017499A5 - - Google Patents

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JP2014017499A5
JP2014017499A5 JP2013173501A JP2013173501A JP2014017499A5 JP 2014017499 A5 JP2014017499 A5 JP 2014017499A5 JP 2013173501 A JP2013173501 A JP 2013173501A JP 2013173501 A JP2013173501 A JP 2013173501A JP 2014017499 A5 JP2014017499 A5 JP 2014017499A5
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substrate
cleaning
holding means
substrate holding
cover member
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JP5641110B2 (en
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本発明に係る基板洗浄装置は、基板を洗浄処理する基板洗浄装置において、
基板に洗浄液を供給する洗浄液供給手段と、
基板に洗浄部材を当接させて洗浄する洗浄手段と、
前記基板の洗浄中、基板を保持する第１の基板保持手段と、
前記第１の基板保持手段により基板を保持する位置よりも下方側の退避位置と、当該第１の基板保持手段との間で基板の受け渡しを行う前記退避位置よりも上方側の受け渡し位置との間で昇降を行う昇降機構を備えた第２の基板保持手段と、
前記第２の基板保持手段への洗浄液の滴下を防止するため、前記退避位置に退避した第２の基板保持手段の上面を覆うカバー部材と、を備えたことを特徴とする。 A substrate cleaning apparatus according to the present invention is a substrate cleaning apparatus for cleaning a substrate.
Cleaning liquid supply means for supplying a cleaning liquid to the substrate;
Cleaning means for cleaning by bringing a cleaning member into contact with the substrate;
A first substrate holding means for holding the substrate during cleaning of the substrate;
A retreat position below a position where the substrate is held by the first substrate holding means, and a transfer position above the retreat position where the substrate is transferred to and from the first substrate holding means. A second substrate holding means provided with an elevating mechanism for elevating between them,
In order to prevent the cleaning liquid from dripping onto the second substrate holding means, a cover member is provided which covers the upper surface of the second substrate holding means retracted to the retracted position.

前記基板洗浄装置は、以下の構成を備えていてもよい。The substrate cleaning apparatus may have the following configuration.
（ａ）前記カバー部材は、前記第２の基板保持手段の側方へ退避した位置と、当該第２の基板保持手段の上面を覆う位置との間を横方向に移動させる支持部に支持されていること。(A) The cover member is supported by a support portion that moves in a lateral direction between a position retracted to the side of the second substrate holding means and a position covering the upper surface of the second substrate holding means. That.
（ｂ）前記カバー部材の上面には、当該カバー部材の中央側から周縁側へ向けて低くなる傾斜面が形成されていること。(B) The upper surface of the cover member is formed with an inclined surface that decreases from the center side to the peripheral side of the cover member.

本発明に係る基板洗浄装置によれば、第１の基板保持手段が基板を保持する位置よりも下方側に退避した第２の基板保持手段の上面をカバー部材により覆うので、当該第２の基板保持手段の上面への洗浄液の滴下を防止し、清浄な状態に維持することができる。 According to the substrate cleaning apparatus of the present invention, the upper surface of the second substrate holding means retracted below the position where the first substrate holding means holds the substrate is covered with the cover member. It is possible to prevent the cleaning liquid from dripping onto the upper surface of the holding means and to maintain a clean state.

Claims (3)

基板を洗浄処理する基板洗浄装置において、
基板に洗浄液を供給する洗浄液供給手段と、
基板に洗浄部材を当接させて洗浄する洗浄手段と、
前記基板の洗浄中、基板を保持する第１の基板保持手段と、
前記第１の基板保持手段により基板を保持する位置よりも下方側の退避位置と、当該第１の基板保持手段との間で基板の受け渡しを行う前記退避位置よりも上方側の受け渡し位置との間で昇降を行う昇降機構を備えた第２の基板保持手段と、
前記第２の基板保持手段への洗浄液の滴下を防止するため、前記退避位置に退避した第２の基板保持手段の上面を覆うカバー部材と、を備えたことを特徴とする基板洗浄装置。 In a substrate cleaning apparatus for cleaning a substrate,
Cleaning liquid supply means for supplying a cleaning liquid to the substrate;
Cleaning means for cleaning by bringing a cleaning member into contact with the substrate;
A first substrate holding means for holding the substrate during cleaning of the substrate;
A retreat position below a position where the substrate is held by the first substrate holding means, and a transfer position above the retreat position where the substrate is transferred to and from the first substrate holding means. A second substrate holding means provided with an elevating mechanism for elevating between them,
A substrate cleaning apparatus, comprising: a cover member that covers an upper surface of the second substrate holding means retracted to the retracted position in order to prevent the cleaning liquid from dripping onto the second substrate holding means. 前記カバー部材は、前記第２の基板保持手段の側方へ退避した位置と、当該第２の基板保持手段の上面を覆う位置との間を横方向に移動させる支持部に支持されていることを特徴とする請求項１に記載の基板洗浄装置。  The cover member is supported by a support portion that moves in a lateral direction between a position retracted to the side of the second substrate holding means and a position covering the upper surface of the second substrate holding means. The substrate cleaning apparatus according to claim 1. 前記カバー部材の上面には、当該カバー部材の中央側から周縁側へ向けて低くなる傾斜面が形成されていることを特徴とする請求項１または２に記載の基板洗浄装置。  The substrate cleaning apparatus according to claim 1, wherein an inclined surface that is lowered from a center side to a peripheral side of the cover member is formed on an upper surface of the cover member.
JP2013173501A 2006-12-20 2013-08-23 Substrate cleaning apparatus, substrate cleaning method, and storage medium Active JP5641110B2 (en)

Priority Applications (1)

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JP2013173501A JP5641110B2 (en) 2006-12-20 2013-08-23 Substrate cleaning apparatus, substrate cleaning method, and storage medium

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JP2006343309 2006-12-20
JP2006343309 2006-12-20
JP2013173501A JP5641110B2 (en) 2006-12-20 2013-08-23 Substrate cleaning apparatus, substrate cleaning method, and storage medium

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JP2014017499A JP2014017499A (en) 2014-01-30
JP2014017499A5 true JP2014017499A5 (en) 2014-03-13
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