JP2013542153A5 - - Google Patents

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Publication number
JP2013542153A5
JP2013542153A5 JP2013506193A JP2013506193A JP2013542153A5 JP 2013542153 A5 JP2013542153 A5 JP 2013542153A5 JP 2013506193 A JP2013506193 A JP 2013506193A JP 2013506193 A JP2013506193 A JP 2013506193A JP 2013542153 A5 JP2013542153 A5 JP 2013542153A5
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JP
Japan
Prior art keywords
graphite
article
conductive coating
carbon
thickness
Prior art date
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Granted
Application number
JP2013506193A
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English (en)
Japanese (ja)
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JP5759534B2 (ja
JP2013542153A (ja
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Publication date
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Priority claimed from PCT/US2011/032662 external-priority patent/WO2011133417A2/en
Publication of JP2013542153A publication Critical patent/JP2013542153A/ja
Publication of JP2013542153A5 publication Critical patent/JP2013542153A5/ja
Application granted granted Critical
Publication of JP5759534B2 publication Critical patent/JP5759534B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013506193A 2010-04-21 2011-04-15 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生 Expired - Fee Related JP5759534B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US32646210P 2010-04-21 2010-04-21
US32647310P 2010-04-21 2010-04-21
US32646910P 2010-04-21 2010-04-21
US61/326,462 2010-04-21
US61/326,473 2010-04-21
US61/326,469 2010-04-21
PCT/US2011/032662 WO2011133417A2 (en) 2010-04-21 2011-04-15 Coated graphite article and reactive ion etch manufacturing and refurbishment of graphite article

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015044895A Division JP2015134716A (ja) 2010-04-21 2015-03-06 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生

Publications (3)

Publication Number Publication Date
JP2013542153A JP2013542153A (ja) 2013-11-21
JP2013542153A5 true JP2013542153A5 (enExample) 2015-04-23
JP5759534B2 JP5759534B2 (ja) 2015-08-05

Family

ID=44834734

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2013506193A Expired - Fee Related JP5759534B2 (ja) 2010-04-21 2011-04-15 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生
JP2015044895A Withdrawn JP2015134716A (ja) 2010-04-21 2015-03-06 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015044895A Withdrawn JP2015134716A (ja) 2010-04-21 2015-03-06 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生

Country Status (6)

Country Link
US (1) US20130108863A1 (enExample)
JP (2) JP5759534B2 (enExample)
KR (1) KR20130064050A (enExample)
CN (1) CN102918605B (enExample)
TW (1) TWI501285B (enExample)
WO (1) WO2011133417A2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
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US9384937B2 (en) * 2013-09-27 2016-07-05 Varian Semiconductor Equipment Associates, Inc. SiC coating in an ion implanter
US10973569B2 (en) * 2017-09-22 2021-04-13 Covidien Lp Electrosurgical tissue sealing device with non-stick coating
US10689752B2 (en) * 2017-11-16 2020-06-23 Axcelis Technologies, Inc. Film stabilization through novel materials modification of beamline components
TWI649775B (zh) * 2018-01-02 2019-02-01 台灣積體電路製造股份有限公司 離子佈植機及離子佈植機腔室的製造方法
CN108715557A (zh) * 2018-08-30 2018-10-30 东莞市鸿亿导热材料有限公司 具有导电和氧化稳定性涂层的石墨片的制造方法
CN115141036A (zh) * 2021-03-29 2022-10-04 翔名科技股份有限公司 石墨组件与其制造方法
CN113429224B (zh) * 2021-05-14 2022-10-04 中国工程物理研究院材料研究所 一种碳材料的表面刻蚀方法
CN114113182A (zh) * 2021-10-22 2022-03-01 合肥国轩高科动力能源有限公司 一种用于扫描电镜拍摄硅基负极材料的定位处理方法
WO2025013581A1 (ja) * 2023-07-07 2025-01-16 東京エレクトロン株式会社 プラズマ処理方法およびプラズマ処理装置
CN119307879A (zh) * 2024-10-14 2025-01-14 湖南德智新材料股份有限公司 一种制备碳化硅材料的方法及碳化硅材料

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GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
US4812212A (en) * 1987-09-08 1989-03-14 Harco Technologies Corporation Apparatus for cathodically protecting reinforcing members and method for installing same
JP2539917B2 (ja) * 1989-07-10 1996-10-02 セントラル硝子株式会社 フッ化塩素ガスによる炭素材料のクリ―ニング方法
CN1030338C (zh) * 1991-05-21 1995-11-22 北京科技大学 一种石墨电极表面形成合金化保护覆层的方法
JPH1045474A (ja) * 1996-08-01 1998-02-17 Toyo Tanso Kk 熱分解炭素被覆黒鉛材の製造方法
JP3608770B2 (ja) * 1998-10-27 2005-01-12 日清紡績株式会社 イオン注入機用カーボン部材及びその製造方法
TW556283B (en) * 2000-05-26 2003-10-01 Nisshin Spinning Silicon/graphite composite ring for supporting silicon wafer, and dry etching apparatus equipped with the same
US6506254B1 (en) * 2000-06-30 2003-01-14 Lam Research Corporation Semiconductor processing equipment having improved particle performance
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JP2004075493A (ja) * 2002-08-22 2004-03-11 Tokai Carbon Co Ltd ＣＶＤ−ＳｉＣ被覆黒鉛材及びその製造方法
JP2004158226A (ja) * 2002-11-05 2004-06-03 Toyo Tanso Kk イオン注入装置用黒鉛材料及びこれを用いたイオン注入装置用黒鉛部材
US20050064247A1 (en) * 2003-06-25 2005-03-24 Ajit Sane Composite refractory metal carbide coating on a substrate and method for making thereof
CN1232988C (zh) * 2003-10-24 2005-12-21 清华大学 一种制备核反应堆用石墨表面抗氧化涂层的方法
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US20100140508A1 (en) * 2008-12-04 2010-06-10 Blake Julian G Coated graphite liners

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