JP5759534B2 - 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生 - Google Patents

被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生 Download PDF

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Publication number
JP5759534B2
JP5759534B2 JP2013506193A JP2013506193A JP5759534B2 JP 5759534 B2 JP5759534 B2 JP 5759534B2 JP 2013506193 A JP2013506193 A JP 2013506193A JP 2013506193 A JP2013506193 A JP 2013506193A JP 5759534 B2 JP5759534 B2 JP 5759534B2
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Japan
Prior art keywords
graphite
conductive coating
article
carbon
reactive ion
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Expired - Fee Related
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JP2013506193A
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English (en)
Japanese (ja)
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JP2013542153A (ja
JP2013542153A5 (enExample
Inventor
クツク，リチヤード・エイ
グンダ，ニレシユ
ドネル，ステイーブン
リウ，イエン
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Entegris Inc
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Entegris Inc
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Publication of JP2013542153A5 publication Critical patent/JP2013542153A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2013506193A 2010-04-21 2011-04-15 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生 Expired - Fee Related JP5759534B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US32646910P 2010-04-21 2010-04-21
US32646210P 2010-04-21 2010-04-21
US32647310P 2010-04-21 2010-04-21
US61/326,469 2010-04-21
US61/326,462 2010-04-21
US61/326,473 2010-04-21
PCT/US2011/032662 WO2011133417A2 (en) 2010-04-21 2011-04-15 Coated graphite article and reactive ion etch manufacturing and refurbishment of graphite article

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015044895A Division JP2015134716A (ja) 2010-04-21 2015-03-06 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生

Publications (3)

Publication Number Publication Date
JP2013542153A JP2013542153A (ja) 2013-11-21
JP2013542153A5 JP2013542153A5 (enExample) 2015-04-23
JP5759534B2 true JP5759534B2 (ja) 2015-08-05

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JP2013506193A Expired - Fee Related JP5759534B2 (ja) 2010-04-21 2011-04-15 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生
JP2015044895A Withdrawn JP2015134716A (ja) 2010-04-21 2015-03-06 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生

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JP2015044895A Withdrawn JP2015134716A (ja) 2010-04-21 2015-03-06 被覆黒鉛物品、ならびに反応性イオンエッチングによる黒鉛物品の製造および再生

Country Status (6)

Country Link
US (1) US20130108863A1 (enExample)
JP (2) JP5759534B2 (enExample)
KR (1) KR20130064050A (enExample)
CN (1) CN102918605B (enExample)
TW (1) TWI501285B (enExample)
WO (1) WO2011133417A2 (enExample)

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* Cited by examiner, † Cited by third party
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US9384937B2 (en) * 2013-09-27 2016-07-05 Varian Semiconductor Equipment Associates, Inc. SiC coating in an ion implanter
US11432869B2 (en) * 2017-09-22 2022-09-06 Covidien Lp Method for coating electrosurgical tissue sealing device with non-stick coating
US10689752B2 (en) * 2017-11-16 2020-06-23 Axcelis Technologies, Inc. Film stabilization through novel materials modification of beamline components
TWI649775B (zh) * 2018-01-02 2019-02-01 台灣積體電路製造股份有限公司 離子佈植機及離子佈植機腔室的製造方法
CN108715557A (zh) * 2018-08-30 2018-10-30 东莞市鸿亿导热材料有限公司 具有导电和氧化稳定性涂层的石墨片的制造方法
CN218025871U (zh) * 2021-03-29 2022-12-13 翔名科技股份有限公司 石墨组件
CN113429224B (zh) * 2021-05-14 2022-10-04 中国工程物理研究院材料研究所 一种碳材料的表面刻蚀方法
CN114113182A (zh) * 2021-10-22 2022-03-01 合肥国轩高科动力能源有限公司 一种用于扫描电镜拍摄硅基负极材料的定位处理方法
WO2025013581A1 (ja) * 2023-07-07 2025-01-16 東京エレクトロン株式会社 プラズマ処理方法およびプラズマ処理装置
CN119307879A (zh) * 2024-10-14 2025-01-14 湖南德智新材料股份有限公司 一种制备碳化硅材料的方法及碳化硅材料

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US3925577A (en) * 1972-11-24 1975-12-09 Westinghouse Electric Corp Silicon carbide coated graphite members and process for producing the same
GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
US4812212A (en) * 1987-09-08 1989-03-14 Harco Technologies Corporation Apparatus for cathodically protecting reinforcing members and method for installing same
JP2539917B2 (ja) * 1989-07-10 1996-10-02 セントラル硝子株式会社 フッ化塩素ガスによる炭素材料のクリ―ニング方法
CN1030338C (zh) * 1991-05-21 1995-11-22 北京科技大学 一种石墨电极表面形成合金化保护覆层的方法
JPH1045474A (ja) * 1996-08-01 1998-02-17 Toyo Tanso Kk 熱分解炭素被覆黒鉛材の製造方法
JP3608770B2 (ja) * 1998-10-27 2005-01-12 日清紡績株式会社 イオン注入機用カーボン部材及びその製造方法
TW556283B (en) * 2000-05-26 2003-10-01 Nisshin Spinning Silicon/graphite composite ring for supporting silicon wafer, and dry etching apparatus equipped with the same
US6506254B1 (en) * 2000-06-30 2003-01-14 Lam Research Corporation Semiconductor processing equipment having improved particle performance
CN1285873C (zh) * 2001-10-24 2006-11-22 西北工业大学 对石墨坩埚具表面高温复合阻碳涂层进行致密化的方法
JP2004075493A (ja) * 2002-08-22 2004-03-11 Tokai Carbon Co Ltd ＣＶＤ−ＳｉＣ被覆黒鉛材及びその製造方法
JP2004158226A (ja) * 2002-11-05 2004-06-03 Toyo Tanso Kk イオン注入装置用黒鉛材料及びこれを用いたイオン注入装置用黒鉛部材
US20050064247A1 (en) * 2003-06-25 2005-03-24 Ajit Sane Composite refractory metal carbide coating on a substrate and method for making thereof
CN1232988C (zh) * 2003-10-24 2005-12-21 清华大学 一种制备核反应堆用石墨表面抗氧化涂层的方法
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US20100140508A1 (en) * 2008-12-04 2010-06-10 Blake Julian G Coated graphite liners

Also Published As

Publication number Publication date
TW201145344A (en) 2011-12-16
WO2011133417A2 (en) 2011-10-27
US20130108863A1 (en) 2013-05-02
JP2013542153A (ja) 2013-11-21
TWI501285B (zh) 2015-09-21
KR20130064050A (ko) 2013-06-17
CN102918605B (zh) 2015-06-17
CN102918605A (zh) 2013-02-06
WO2011133417A3 (en) 2012-01-05
JP2015134716A (ja) 2015-07-27

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