JP2013539913A - リフトピンを用いた静電デチャックのための極性領域 - Google Patents
リフトピンを用いた静電デチャックのための極性領域 Download PDFInfo
- Publication number
- JP2013539913A JP2013539913A JP2013529342A JP2013529342A JP2013539913A JP 2013539913 A JP2013539913 A JP 2013539913A JP 2013529342 A JP2013529342 A JP 2013529342A JP 2013529342 A JP2013529342 A JP 2013529342A JP 2013539913 A JP2013539913 A JP 2013539913A
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic chuck
- sensor
- controller
- substrate
- polar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 80
- 238000000034 method Methods 0.000 claims description 77
- 235000012431 wafers Nutrition 0.000 claims description 70
- 230000008569 process Effects 0.000 claims description 66
- 238000012545 processing Methods 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 35
- 230000000712 assembly Effects 0.000 description 5
- 238000000429 assembly Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000009530 blood pressure measurement Methods 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 101100520142 Caenorhabditis elegans pin-2 gene Proteins 0.000 description 1
- 208000026487 Triploidy Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000004801 process automation Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
【選択図】図12
Description
Claims (28)
- 静電チャック及びデチャックを行なう装置であって、
複数のゾーンを備える静電チャックであって、各ゾーンは、基板の底面に接触するリフトピンの周囲に1つ又は複数の極性領域を含む、静電チャックと、
前記リフトピンを制御する1つ又は複数のコントローラと、
前記極性領域を制御する1つ又は複数のコントローラと、
を備える装置。 - 請求項1に記載の装置であって、
前記リフトピンが、さらに空気圧シリンダを備える、装置。 - 請求項2に記載の装置であって、
各リフトピンが、別々のセンサに関連付けられる、装置。 - 請求項3に記載の装置であって、
前記センサが、前記リフトピン用のコントローラにフィードバックを提供する、装置。 - 請求項4に記載の装置であって、
1つのコントローラが、すべてのリフトピンに接続される、装置。 - 請求項4に記載の装置であって、
別々のコントローラが、各リフトピンに接続される、装置。 - 請求項6に記載の装置であって、
前記センサが、前記リフトピン用のコントローラにフィードバックを提供する、装置。 - 請求項3に記載の装置であって、
1つのコントローラが、すべての前記極性領域に接続される、装置。 - 請求項8に記載の装置であって、
前記センサが、前記極性領域用のコントローラにフィードバックを提供する、装置。 - 請求項3に記載の装置であって、
別々のコントローラが、各極性領域に接続される、装置。 - 請求項10に記載の装置であって、
前記センサが、各極性領域用の各コントローラにフィードバックを提供する、装置。 - 請求項1に記載の装置であって、
さらに、センサピンを備える、装置。 - 請求項12に記載の装置であって、
前記センサピンが、前記リフトピン用のコントローラにフィードバックを提供する、装置。 - 請求項13に記載の装置であって、
1つのコントローラが、すべての極性領域に接続される、装置。 - 請求項14に記載の装置であって、
前記センサピンが、前記極性領域用のコントローラにフィードバックを提供する、装置。 - 請求項13に記載の装置であって、
別々のコントローラが、各極性領域に接続される、装置。 - 請求項16に記載の装置であって、
前記センサピンが、各極性領域用の各コントローラにフィードバックを提供する、装置。 - 集積回路を製造するための基板を処理する自動化された方法であって、
処理チャンバ内で静電チャック上に前記基板を載置する工程であって、前記静電チャックが複数のゾーンを備え、各ゾーンが、空気圧で動くリフトピンの周囲に1つ又は複数の極性領域を含む、工程と、
前記1つ又は複数の極性領域に電圧を印加することによって、前記静電チャックに前記基板を固定する工程と、
前記基板を処理する工程と、
前記処理の操作を終了する工程と、
前記1つ又は複数のゾーンの前記1つ又は複数の極性領域に別の電圧を印加して、デチャックを開始させる工程と、
1つ又は複数のリフトピンを前記基板の底面に接触させる工程と、
センサを用いて、前記基板と前記静電チャックとの間の静電力を測定する工程と、を備える方法。 - 請求項18に記載の方法であって、さらに、
1つ又は複数のリフトピンの空気圧を調整する工程を備える、方法。 - 請求項18に記載の方法であって、さらに、
1つ又は複数のゾーンの1つ又は複数の極性領域の電圧を調整する工程を備える、方法。 - 請求項18に記載の方法であって、
前記基板を処理する工程が、プラズマを発生させ、前記発生したプラズマを用いて、
前記基板をエッチングする、
前記基板上に材料を蒸着させる、又は、
他の半導体製造作業を行なう、工程を備える、方法。 - 半導体ウエハを処理するチャンバであって、
基板を支持するように構成される静電チャックであって、基板が存在する場合に前記基板に係合するリフトピンを収容する複数の穴を有し、前記複数の穴の各々の少なくとも一部を囲むように構成される複数の極性領域を含む静電チャックを備える、チャンバ。 - 請求項22に記載のチャンバであって、
前記複数の極性領域の各々が、幾何学的パターンと、前記幾何学的パターンに接続される電圧源とを有する、チャンバ。 - 請求項22に記載のチャンバであって、
前記複数の極性領域の各々が、同じ電圧に接続される、チャンバ。 - 請求項22に記載のチャンバであって、
前記複数の極性領域の各々が、異なる電圧に接続される、チャンバ。 - 請求項22に記載のチャンバであって、
前記複数の極性領域の各々が、ゾーンを規定し、各ゾーンが電圧源に接続される、チャンバ。 - 請求項22に記載のチャンバであって、
前記静電チャックが、
金属ベースと、
前記金属ベース上に配置される誘電体層であって、前記基板の支持面を規定する誘電体層と、
前記誘電体層内に配置される、導電金属から形成される幾何学的パターンと、
前記導電材料に電圧を印加する回路であって、前記誘電体層内に配置される回路と、を備えるチャンバ。 - 請求項27に記載のチャンバであって、
前記穴が、前記金属ベースと前記誘電体層とを貫通するように形成される、チャンバ。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38423110P | 2010-09-17 | 2010-09-17 | |
US61/384,231 | 2010-09-17 | ||
US12/970,914 US8840754B2 (en) | 2010-09-17 | 2010-12-16 | Polar regions for electrostatic de-chucking with lift pins |
US12/970,914 | 2010-12-16 | ||
PCT/US2011/051825 WO2012037396A1 (en) | 2010-09-17 | 2011-09-15 | Polar regions for electrostatic de-chucking with lift pins |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013539913A true JP2013539913A (ja) | 2013-10-28 |
JP2013539913A5 JP2013539913A5 (ja) | 2014-10-23 |
JP6046623B2 JP6046623B2 (ja) | 2016-12-21 |
Family
ID=45818132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013529342A Active JP6046623B2 (ja) | 2010-09-17 | 2011-09-15 | 静電デチャックを行う装置及び方法、並びに、半導体ウェハを処理するチャンバ |
Country Status (7)
Country | Link |
---|---|
US (1) | US8840754B2 (ja) |
JP (1) | JP6046623B2 (ja) |
KR (1) | KR20130106365A (ja) |
CN (1) | CN103098195B (ja) |
SG (1) | SG188354A1 (ja) |
TW (1) | TWI598985B (ja) |
WO (1) | WO2012037396A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021533569A (ja) * | 2018-08-10 | 2021-12-02 | 北京北方華創微電子装備有限公司Beijing Naura Microelectronics Equipment Co., Ltd. | リフトシンブルシステム、反応チャンバおよび半導体処理装置 |
JP2022520692A (ja) * | 2018-12-03 | 2022-04-01 | ラム リサーチ コーポレーション | ピンリフター試験基板 |
Families Citing this family (110)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8840754B2 (en) * | 2010-09-17 | 2014-09-23 | Lam Research Corporation | Polar regions for electrostatic de-chucking with lift pins |
US10283321B2 (en) | 2011-01-18 | 2019-05-07 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
CN106884157B (zh) | 2011-03-04 | 2019-06-21 | 诺发系统公司 | 混合型陶瓷喷淋头 |
US9132436B2 (en) | 2012-09-21 | 2015-09-15 | Applied Materials, Inc. | Chemical control features in wafer process equipment |
US10256079B2 (en) | 2013-02-08 | 2019-04-09 | Applied Materials, Inc. | Semiconductor processing systems having multiple plasma configurations |
US9362130B2 (en) | 2013-03-01 | 2016-06-07 | Applied Materials, Inc. | Enhanced etching processes using remote plasma sources |
US9859145B2 (en) | 2013-07-17 | 2018-01-02 | Lam Research Corporation | Cooled pin lifter paddle for semiconductor substrate processing apparatus |
US9558981B2 (en) * | 2013-11-19 | 2017-01-31 | Applied Materials, Inc. | Control systems employing deflection sensors to control clamping forces applied by electrostatic chucks, and related methods |
US9309598B2 (en) | 2014-05-28 | 2016-04-12 | Applied Materials, Inc. | Oxide and metal removal |
KR101632605B1 (ko) * | 2014-10-08 | 2016-06-24 | 세메스 주식회사 | 기판 처리 장치 및 방법 |
US9966240B2 (en) | 2014-10-14 | 2018-05-08 | Applied Materials, Inc. | Systems and methods for internal surface conditioning assessment in plasma processing equipment |
US9355922B2 (en) | 2014-10-14 | 2016-05-31 | Applied Materials, Inc. | Systems and methods for internal surface conditioning in plasma processing equipment |
US11637002B2 (en) | 2014-11-26 | 2023-04-25 | Applied Materials, Inc. | Methods and systems to enhance process uniformity |
US10573496B2 (en) | 2014-12-09 | 2020-02-25 | Applied Materials, Inc. | Direct outlet toroidal plasma source |
US10224210B2 (en) | 2014-12-09 | 2019-03-05 | Applied Materials, Inc. | Plasma processing system with direct outlet toroidal plasma source |
KR101632606B1 (ko) * | 2014-12-30 | 2016-06-23 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
US11257693B2 (en) | 2015-01-09 | 2022-02-22 | Applied Materials, Inc. | Methods and systems to improve pedestal temperature control |
US20160225652A1 (en) | 2015-02-03 | 2016-08-04 | Applied Materials, Inc. | Low temperature chuck for plasma processing systems |
US9728437B2 (en) | 2015-02-03 | 2017-08-08 | Applied Materials, Inc. | High temperature chuck for plasma processing systems |
US9570289B2 (en) | 2015-03-06 | 2017-02-14 | Lam Research Corporation | Method and apparatus to minimize seam effect during TEOS oxide film deposition |
US10177024B2 (en) | 2015-05-12 | 2019-01-08 | Lam Research Corporation | High temperature substrate pedestal module and components thereof |
US9738975B2 (en) | 2015-05-12 | 2017-08-22 | Lam Research Corporation | Substrate pedestal module including backside gas delivery tube and method of making |
US10253412B2 (en) | 2015-05-22 | 2019-04-09 | Lam Research Corporation | Deposition apparatus including edge plenum showerhead assembly |
US10023959B2 (en) | 2015-05-26 | 2018-07-17 | Lam Research Corporation | Anti-transient showerhead |
US9741593B2 (en) | 2015-08-06 | 2017-08-22 | Applied Materials, Inc. | Thermal management systems and methods for wafer processing systems |
US9691645B2 (en) | 2015-08-06 | 2017-06-27 | Applied Materials, Inc. | Bolted wafer chuck thermal management systems and methods for wafer processing systems |
US9349605B1 (en) | 2015-08-07 | 2016-05-24 | Applied Materials, Inc. | Oxide etch selectivity systems and methods |
US10504700B2 (en) * | 2015-08-27 | 2019-12-10 | Applied Materials, Inc. | Plasma etching systems and methods with secondary plasma injection |
US10062599B2 (en) | 2015-10-22 | 2018-08-28 | Lam Research Corporation | Automated replacement of consumable parts using interfacing chambers |
US20170115657A1 (en) * | 2015-10-22 | 2017-04-27 | Lam Research Corporation | Systems for Removing and Replacing Consumable Parts from a Semiconductor Process Module in Situ |
US9881820B2 (en) | 2015-10-22 | 2018-01-30 | Lam Research Corporation | Front opening ring pod |
US10124492B2 (en) | 2015-10-22 | 2018-11-13 | Lam Research Corporation | Automated replacement of consumable parts using end effectors interfacing with plasma processing system |
US10358722B2 (en) | 2015-12-14 | 2019-07-23 | Lam Research Corporation | Showerhead assembly |
US9870917B2 (en) | 2015-12-17 | 2018-01-16 | Lam Research Corporation | Variable temperature hardware and methods for reduction of wafer backside deposition |
JP6505027B2 (ja) | 2016-01-04 | 2019-04-24 | 株式会社日立ハイテクノロジーズ | 試料の離脱方法およびプラズマ処理装置 |
US10256075B2 (en) * | 2016-01-22 | 2019-04-09 | Applied Materials, Inc. | Gas splitting by time average injection into different zones by fast gas valves |
US10504754B2 (en) | 2016-05-19 | 2019-12-10 | Applied Materials, Inc. | Systems and methods for improved semiconductor etching and component protection |
US10522371B2 (en) | 2016-05-19 | 2019-12-31 | Applied Materials, Inc. | Systems and methods for improved semiconductor etching and component protection |
US10629473B2 (en) | 2016-09-09 | 2020-04-21 | Applied Materials, Inc. | Footing removal for nitride spacer |
US10062575B2 (en) | 2016-09-09 | 2018-08-28 | Applied Materials, Inc. | Poly directional etch by oxidation |
US9934942B1 (en) | 2016-10-04 | 2018-04-03 | Applied Materials, Inc. | Chamber with flow-through source |
US10546729B2 (en) | 2016-10-04 | 2020-01-28 | Applied Materials, Inc. | Dual-channel showerhead with improved profile |
US9978618B2 (en) * | 2016-10-07 | 2018-05-22 | Tokyo Electron Limited | Hot plate with programmable array of lift devices for multi-bake process optimization |
US10062579B2 (en) | 2016-10-07 | 2018-08-28 | Applied Materials, Inc. | Selective SiN lateral recess |
US9768034B1 (en) | 2016-11-11 | 2017-09-19 | Applied Materials, Inc. | Removal methods for high aspect ratio structures |
US10163696B2 (en) | 2016-11-11 | 2018-12-25 | Applied Materials, Inc. | Selective cobalt removal for bottom up gapfill |
US10026621B2 (en) | 2016-11-14 | 2018-07-17 | Applied Materials, Inc. | SiN spacer profile patterning |
US10242908B2 (en) | 2016-11-14 | 2019-03-26 | Applied Materials, Inc. | Airgap formation with damage-free copper |
US10566206B2 (en) | 2016-12-27 | 2020-02-18 | Applied Materials, Inc. | Systems and methods for anisotropic material breakthrough |
US10403507B2 (en) | 2017-02-03 | 2019-09-03 | Applied Materials, Inc. | Shaped etch profile with oxidation |
US10431429B2 (en) | 2017-02-03 | 2019-10-01 | Applied Materials, Inc. | Systems and methods for radial and azimuthal control of plasma uniformity |
US10319739B2 (en) | 2017-02-08 | 2019-06-11 | Applied Materials, Inc. | Accommodating imperfectly aligned memory holes |
US10943834B2 (en) | 2017-03-13 | 2021-03-09 | Applied Materials, Inc. | Replacement contact process |
JP6723660B2 (ja) * | 2017-03-24 | 2020-07-15 | 住友重機械イオンテクノロジー株式会社 | ウェハ保持装置及びウェハ着脱方法 |
US10319649B2 (en) | 2017-04-11 | 2019-06-11 | Applied Materials, Inc. | Optical emission spectroscopy (OES) for remote plasma monitoring |
JP6797063B2 (ja) * | 2017-04-14 | 2020-12-09 | 東京エレクトロン株式会社 | ピン制御方法及び基板処理装置 |
US11276559B2 (en) | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Semiconductor processing chamber for multiple precursor flow |
US11276590B2 (en) | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Multi-zone semiconductor substrate supports |
US10147610B1 (en) | 2017-05-30 | 2018-12-04 | Lam Research Corporation | Substrate pedestal module including metallized ceramic tubes for RF and gas delivery |
US10497579B2 (en) | 2017-05-31 | 2019-12-03 | Applied Materials, Inc. | Water-free etching methods |
US11289355B2 (en) | 2017-06-02 | 2022-03-29 | Lam Research Corporation | Electrostatic chuck for use in semiconductor processing |
US10920320B2 (en) | 2017-06-16 | 2021-02-16 | Applied Materials, Inc. | Plasma health determination in semiconductor substrate processing reactors |
US10541246B2 (en) | 2017-06-26 | 2020-01-21 | Applied Materials, Inc. | 3D flash memory cells which discourage cross-cell electrical tunneling |
US10727080B2 (en) | 2017-07-07 | 2020-07-28 | Applied Materials, Inc. | Tantalum-containing material removal |
US10541184B2 (en) | 2017-07-11 | 2020-01-21 | Applied Materials, Inc. | Optical emission spectroscopic techniques for monitoring etching |
US10354889B2 (en) | 2017-07-17 | 2019-07-16 | Applied Materials, Inc. | Non-halogen etching of silicon-containing materials |
US10170336B1 (en) | 2017-08-04 | 2019-01-01 | Applied Materials, Inc. | Methods for anisotropic control of selective silicon removal |
US10043674B1 (en) | 2017-08-04 | 2018-08-07 | Applied Materials, Inc. | Germanium etching systems and methods |
US10297458B2 (en) | 2017-08-07 | 2019-05-21 | Applied Materials, Inc. | Process window widening using coated parts in plasma etch processes |
US11114327B2 (en) | 2017-08-29 | 2021-09-07 | Applied Materials, Inc. | ESC substrate support with chucking force control |
US10522385B2 (en) | 2017-09-26 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wafer table with dynamic support pins |
US10424487B2 (en) | 2017-10-24 | 2019-09-24 | Applied Materials, Inc. | Atomic layer etching processes |
US10283324B1 (en) | 2017-10-24 | 2019-05-07 | Applied Materials, Inc. | Oxygen treatment for nitride etching |
US10128086B1 (en) | 2017-10-24 | 2018-11-13 | Applied Materials, Inc. | Silicon pretreatment for nitride removal |
US10256112B1 (en) | 2017-12-08 | 2019-04-09 | Applied Materials, Inc. | Selective tungsten removal |
US10903054B2 (en) | 2017-12-19 | 2021-01-26 | Applied Materials, Inc. | Multi-zone gas distribution systems and methods |
US11328909B2 (en) | 2017-12-22 | 2022-05-10 | Applied Materials, Inc. | Chamber conditioning and removal processes |
US10854426B2 (en) | 2018-01-08 | 2020-12-01 | Applied Materials, Inc. | Metal recess for semiconductor structures |
US10964512B2 (en) | 2018-02-15 | 2021-03-30 | Applied Materials, Inc. | Semiconductor processing chamber multistage mixing apparatus and methods |
US10679870B2 (en) | 2018-02-15 | 2020-06-09 | Applied Materials, Inc. | Semiconductor processing chamber multistage mixing apparatus |
TWI766433B (zh) | 2018-02-28 | 2022-06-01 | 美商應用材料股份有限公司 | 形成氣隙的系統及方法 |
US10593560B2 (en) | 2018-03-01 | 2020-03-17 | Applied Materials, Inc. | Magnetic induction plasma source for semiconductor processes and equipment |
US10319600B1 (en) | 2018-03-12 | 2019-06-11 | Applied Materials, Inc. | Thermal silicon etch |
US10497573B2 (en) | 2018-03-13 | 2019-12-03 | Applied Materials, Inc. | Selective atomic layer etching of semiconductor materials |
US10573527B2 (en) | 2018-04-06 | 2020-02-25 | Applied Materials, Inc. | Gas-phase selective etching systems and methods |
US10490406B2 (en) | 2018-04-10 | 2019-11-26 | Appled Materials, Inc. | Systems and methods for material breakthrough |
US10699879B2 (en) | 2018-04-17 | 2020-06-30 | Applied Materials, Inc. | Two piece electrode assembly with gap for plasma control |
US10886137B2 (en) | 2018-04-30 | 2021-01-05 | Applied Materials, Inc. | Selective nitride removal |
US10872778B2 (en) | 2018-07-06 | 2020-12-22 | Applied Materials, Inc. | Systems and methods utilizing solid-phase etchants |
US10755941B2 (en) | 2018-07-06 | 2020-08-25 | Applied Materials, Inc. | Self-limiting selective etching systems and methods |
CN108962794B (zh) * | 2018-07-20 | 2020-08-21 | 北京北方华创微电子装备有限公司 | 一种升针方法及应用其的顶针升降装置 |
US10672642B2 (en) | 2018-07-24 | 2020-06-02 | Applied Materials, Inc. | Systems and methods for pedestal configuration |
US11430688B2 (en) * | 2018-09-04 | 2022-08-30 | Lam Research Corporation | Two-stage pin lifter for de-chuck operations |
US11049755B2 (en) | 2018-09-14 | 2021-06-29 | Applied Materials, Inc. | Semiconductor substrate supports with embedded RF shield |
US10892198B2 (en) | 2018-09-14 | 2021-01-12 | Applied Materials, Inc. | Systems and methods for improved performance in semiconductor processing |
US11062887B2 (en) | 2018-09-17 | 2021-07-13 | Applied Materials, Inc. | High temperature RF heater pedestals |
US11417534B2 (en) | 2018-09-21 | 2022-08-16 | Applied Materials, Inc. | Selective material removal |
US11682560B2 (en) | 2018-10-11 | 2023-06-20 | Applied Materials, Inc. | Systems and methods for hafnium-containing film removal |
US11121002B2 (en) | 2018-10-24 | 2021-09-14 | Applied Materials, Inc. | Systems and methods for etching metals and metal derivatives |
US11437242B2 (en) | 2018-11-27 | 2022-09-06 | Applied Materials, Inc. | Selective removal of silicon-containing materials |
EP3899665A1 (en) * | 2018-12-20 | 2021-10-27 | ASML Netherlands B.V. | Object table comprising an electrostatic clamp |
US11721527B2 (en) | 2019-01-07 | 2023-08-08 | Applied Materials, Inc. | Processing chamber mixing systems |
US10920319B2 (en) | 2019-01-11 | 2021-02-16 | Applied Materials, Inc. | Ceramic showerheads with conductive electrodes |
KR102640172B1 (ko) | 2019-07-03 | 2024-02-23 | 삼성전자주식회사 | 기판 처리 장치 및 이의 구동 방법 |
US11798833B2 (en) | 2020-02-26 | 2023-10-24 | Applied Materials, Inc. | Methods of use of a servo control system |
US11415230B2 (en) | 2020-03-31 | 2022-08-16 | Applied Material, Inc. | Slit valve pneumatic control |
CN112071801B (zh) * | 2020-09-16 | 2024-05-17 | 北京北方华创微电子装备有限公司 | 顶针升降装置和半导体工艺腔室 |
KR102251891B1 (ko) * | 2020-12-08 | 2021-05-13 | 주식회사 기가레인 | 기판 지지 장치 및 이를 이용한 기판 반출 방법 |
CN113161279A (zh) * | 2021-03-12 | 2021-07-23 | 拓荆科技股份有限公司 | 预防圆晶破裂的装置和预防方法 |
US11764094B2 (en) * | 2022-02-18 | 2023-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor processing tool and methods of operation |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0794576A (ja) * | 1993-09-20 | 1995-04-07 | Fujitsu Ltd | 静電吸着装置 |
JPH0855903A (ja) * | 1994-02-22 | 1996-02-27 | Applied Materials Inc | 耐腐食性静電チャック |
JPH09120987A (ja) * | 1995-07-10 | 1997-05-06 | Watkins Johnson Co | 静電チャックアセンブリ |
JPH10150100A (ja) * | 1996-09-19 | 1998-06-02 | Hitachi Ltd | 静電チャックとそれを用いた試料処理方法及び装置 |
JPH1187478A (ja) * | 1997-09-01 | 1999-03-30 | Ulvac Japan Ltd | 静電チャック及びこれを用いた真空処理装置 |
JPH11233600A (ja) * | 1997-12-08 | 1999-08-27 | Ulvac Corp | 静電吸着装置、及びその静電吸着装置を用いた真空処理装置 |
JP2002018661A (ja) * | 2000-07-06 | 2002-01-22 | Anelva Corp | 静電吸着機構並びに表面処理方法及び表面処理装置 |
JP2002026113A (ja) * | 2000-07-10 | 2002-01-25 | Toshiba Corp | ホットプレート及び半導体装置の製造方法 |
JP2002511662A (ja) * | 1998-04-10 | 2002-04-16 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | ウエーハのパーティクル汚染が低い静電的ウエーハクランプ |
US20020078891A1 (en) * | 2000-11-09 | 2002-06-27 | Chang-Woong Chu | Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage |
JP2002532877A (ja) * | 1998-12-10 | 2002-10-02 | アプライド マテリアルズ インコーポレイテッド | 静電チャックの表面電位を能動的に制御する装置と方法 |
WO2004061941A1 (ja) * | 2002-12-26 | 2004-07-22 | Mitsubishi Heavy Industries, Ltd. | 静電チャック |
JP2004319840A (ja) * | 2003-04-17 | 2004-11-11 | E-Beam Corp | ウェハのチャキング装置およびチャキング方法 |
WO2006049085A1 (ja) * | 2004-11-04 | 2006-05-11 | Ulvac, Inc. | 静電チャック装置 |
JP2008060285A (ja) * | 2006-08-31 | 2008-03-13 | Tokyo Electron Ltd | 基板載置機構および基板受け渡し方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5684669A (en) * | 1995-06-07 | 1997-11-04 | Applied Materials, Inc. | Method for dechucking a workpiece from an electrostatic chuck |
US5557215A (en) | 1993-05-12 | 1996-09-17 | Tokyo Electron Limited | Self-bias measuring method, apparatus thereof and electrostatic chucking apparatus |
US5459632A (en) | 1994-03-07 | 1995-10-17 | Applied Materials, Inc. | Releasing a workpiece from an electrostatic chuck |
US5646814A (en) * | 1994-07-15 | 1997-07-08 | Applied Materials, Inc. | Multi-electrode electrostatic chuck |
JP2001068539A (ja) * | 1999-08-27 | 2001-03-16 | Taiheiyo Cement Corp | 静電チャック |
US6898064B1 (en) * | 2001-08-29 | 2005-05-24 | Lsi Logic Corporation | System and method for optimizing the electrostatic removal of a workpiece from a chuck |
US7436645B2 (en) | 2004-10-07 | 2008-10-14 | Applied Materials, Inc. | Method and apparatus for controlling temperature of a substrate |
US9147588B2 (en) | 2007-03-09 | 2015-09-29 | Tel Nexx, Inc. | Substrate processing pallet with cooling |
US8840754B2 (en) * | 2010-09-17 | 2014-09-23 | Lam Research Corporation | Polar regions for electrostatic de-chucking with lift pins |
-
2010
- 2010-12-16 US US12/970,914 patent/US8840754B2/en active Active
-
2011
- 2011-09-15 KR KR1020137006771A patent/KR20130106365A/ko not_active Application Discontinuation
- 2011-09-15 WO PCT/US2011/051825 patent/WO2012037396A1/en active Application Filing
- 2011-09-15 JP JP2013529342A patent/JP6046623B2/ja active Active
- 2011-09-15 TW TW100133216A patent/TWI598985B/zh active
- 2011-09-15 CN CN201180043836.4A patent/CN103098195B/zh active Active
- 2011-09-15 SG SG2013015482A patent/SG188354A1/en unknown
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0794576A (ja) * | 1993-09-20 | 1995-04-07 | Fujitsu Ltd | 静電吸着装置 |
JPH0855903A (ja) * | 1994-02-22 | 1996-02-27 | Applied Materials Inc | 耐腐食性静電チャック |
JPH09120987A (ja) * | 1995-07-10 | 1997-05-06 | Watkins Johnson Co | 静電チャックアセンブリ |
JPH10150100A (ja) * | 1996-09-19 | 1998-06-02 | Hitachi Ltd | 静電チャックとそれを用いた試料処理方法及び装置 |
JPH1187478A (ja) * | 1997-09-01 | 1999-03-30 | Ulvac Japan Ltd | 静電チャック及びこれを用いた真空処理装置 |
JPH11233600A (ja) * | 1997-12-08 | 1999-08-27 | Ulvac Corp | 静電吸着装置、及びその静電吸着装置を用いた真空処理装置 |
JP2002511662A (ja) * | 1998-04-10 | 2002-04-16 | バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド | ウエーハのパーティクル汚染が低い静電的ウエーハクランプ |
JP2002532877A (ja) * | 1998-12-10 | 2002-10-02 | アプライド マテリアルズ インコーポレイテッド | 静電チャックの表面電位を能動的に制御する装置と方法 |
JP2002018661A (ja) * | 2000-07-06 | 2002-01-22 | Anelva Corp | 静電吸着機構並びに表面処理方法及び表面処理装置 |
JP2002026113A (ja) * | 2000-07-10 | 2002-01-25 | Toshiba Corp | ホットプレート及び半導体装置の製造方法 |
US20020078891A1 (en) * | 2000-11-09 | 2002-06-27 | Chang-Woong Chu | Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stage |
WO2004061941A1 (ja) * | 2002-12-26 | 2004-07-22 | Mitsubishi Heavy Industries, Ltd. | 静電チャック |
JP2004319840A (ja) * | 2003-04-17 | 2004-11-11 | E-Beam Corp | ウェハのチャキング装置およびチャキング方法 |
WO2006049085A1 (ja) * | 2004-11-04 | 2006-05-11 | Ulvac, Inc. | 静電チャック装置 |
JP2008060285A (ja) * | 2006-08-31 | 2008-03-13 | Tokyo Electron Ltd | 基板載置機構および基板受け渡し方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021533569A (ja) * | 2018-08-10 | 2021-12-02 | 北京北方華創微電子装備有限公司Beijing Naura Microelectronics Equipment Co., Ltd. | リフトシンブルシステム、反応チャンバおよび半導体処理装置 |
JP2022520692A (ja) * | 2018-12-03 | 2022-04-01 | ラム リサーチ コーポレーション | ピンリフター試験基板 |
JP7341237B2 (ja) | 2018-12-03 | 2023-09-08 | ラム リサーチ コーポレーション | ピンリフター試験基板 |
Also Published As
Publication number | Publication date |
---|---|
TW201232694A (en) | 2012-08-01 |
WO2012037396A1 (en) | 2012-03-22 |
KR20130106365A (ko) | 2013-09-27 |
US20120070996A1 (en) | 2012-03-22 |
CN103098195A (zh) | 2013-05-08 |
CN103098195B (zh) | 2015-11-25 |
TWI598985B (zh) | 2017-09-11 |
US8840754B2 (en) | 2014-09-23 |
SG188354A1 (en) | 2013-04-30 |
JP6046623B2 (ja) | 2016-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6046623B2 (ja) | 静電デチャックを行う装置及び方法、並びに、半導体ウェハを処理するチャンバ | |
US9773692B2 (en) | In-situ removable electrostatic chuck | |
JP2013539913A5 (ja) | 静電デチャックを行う装置及び方法、並びに、半導体ウェハを処理するチャンバ | |
US20140213055A1 (en) | Semiconductor manufacturing device and processing method | |
JP7454976B2 (ja) | 基板支持台、プラズマ処理システム及びエッジリングの交換方法 | |
US9530657B2 (en) | Method of processing substrate and substrate processing apparatus | |
JP2023158049A (ja) | 基板処理装置 | |
US20080242086A1 (en) | Plasma processing method and plasma processing apparatus | |
US11804368B2 (en) | Cleaning method and plasma processing apparatus | |
KR20210111700A (ko) | 플라즈마 처리 시스템 및 에지 링의 교환 방법 | |
US20240136158A1 (en) | Plasma processing system and edge ring replacement method | |
JP2024075697A (ja) | 基板支持器及びプラズマ処理装置 | |
JP2019522374A (ja) | 半導体及び機械処理におけるワークピースキャリアの上板としての処理済みウエハ | |
US20210319988A1 (en) | Substrate support stage, plasma processing system, and method of mounting edge ring | |
US20230420286A1 (en) | Substrate processing apparatus and transfer method | |
US20230386798A1 (en) | Substrate processing apparatus and method for aligning ring member | |
US20210398783A1 (en) | Plasma processing system, plasma processing apparatus, and method for replacing edge ring | |
US20230138006A1 (en) | Cleaning method, substrate processing method and plasma processing apparatus | |
CN117751441A (zh) | 用于制造系统机器人的静电终端受动器 | |
KR100682739B1 (ko) | 기판 리프팅 장치 및 이를 이용한 기판 디척킹 방법 | |
JP2023064225A (ja) | 基板支持部、プラズマ処理装置及びプラズマ処理方法 | |
TW202303738A (zh) | 清潔方法及電漿處理裝置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140902 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20140902 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20150702 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150707 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20151006 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160322 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160606 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20161018 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20161117 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6046623 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |