JP2013510334A5 - - Google Patents

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Publication number
JP2013510334A5
JP2013510334A5 JP2012537363A JP2012537363A JP2013510334A5 JP 2013510334 A5 JP2013510334 A5 JP 2013510334A5 JP 2012537363 A JP2012537363 A JP 2012537363A JP 2012537363 A JP2012537363 A JP 2012537363A JP 2013510334 A5 JP2013510334 A5 JP 2013510334A5
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JP
Japan
Prior art keywords
film
photopolymer formulation
writing monomer
mpa
group
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JP2012537363A
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English (en)
Japanese (ja)
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JP5925686B2 (ja
JP2013510334A (ja
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Priority claimed from PCT/EP2010/066587 external-priority patent/WO2011054791A1/de
Publication of JP2013510334A publication Critical patent/JP2013510334A/ja
Publication of JP2013510334A5 publication Critical patent/JP2013510334A5/ja
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JP2012537363A 2009-11-03 2010-11-02 ホログラフィックフィルムの製造方法 Active JP5925686B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09013768 2009-11-03
EP09013768.8 2009-11-03
PCT/EP2010/066587 WO2011054791A1 (de) 2009-11-03 2010-11-02 Verfahren zur herstellung eines holographischen films

Publications (3)

Publication Number Publication Date
JP2013510334A JP2013510334A (ja) 2013-03-21
JP2013510334A5 true JP2013510334A5 (cg-RX-API-DMAC7.html) 2013-12-19
JP5925686B2 JP5925686B2 (ja) 2016-05-25

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Family Applications (1)

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JP2012537363A Active JP5925686B2 (ja) 2009-11-03 2010-11-02 ホログラフィックフィルムの製造方法

Country Status (9)

Country Link
US (1) US8889321B2 (cg-RX-API-DMAC7.html)
EP (1) EP2497080B1 (cg-RX-API-DMAC7.html)
JP (1) JP5925686B2 (cg-RX-API-DMAC7.html)
KR (1) KR101746883B1 (cg-RX-API-DMAC7.html)
CN (1) CN102741925B (cg-RX-API-DMAC7.html)
ES (1) ES2446344T3 (cg-RX-API-DMAC7.html)
IN (1) IN2012DN03891A (cg-RX-API-DMAC7.html)
TW (1) TWI488908B (cg-RX-API-DMAC7.html)
WO (1) WO2011054791A1 (cg-RX-API-DMAC7.html)

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EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
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KR102244648B1 (ko) 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102166846B1 (ko) * 2017-12-11 2020-10-16 주식회사 엘지화학 포토폴리머 조성물
KR102239212B1 (ko) 2018-12-14 2021-04-12 주식회사 엘지화학 포토폴리머 조성물

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US8771904B2 (en) * 2009-11-03 2014-07-08 Bayer Materialscience Ag Method for producing holographic media
US8889322B2 (en) * 2009-11-03 2014-11-18 Bayer Materialscience Ag Photopolymer formulation having different writing comonomers
EP2497084B1 (de) * 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
CN102574877B (zh) * 2009-11-03 2016-04-20 拜尔材料科学股份公司 具有高折射率和降低的双键密度的氨基甲酸酯丙烯酸酯
PL2497082T3 (pl) * 2009-11-03 2013-12-31 Bayer Ip Gmbh Fluorouretany jako dodatek w formulacji fotopolimerowej
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
ATE548730T1 (de) * 2009-11-03 2012-03-15 Bayer Materialscience Ag Photopolymerformulierungen mit einstellbarem mechanischem modul guv
TWI506018B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 新穎的非結晶甲基丙烯酸酯及其製備和用途
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KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
KR101804591B1 (ko) * 2010-02-02 2017-12-04 바이엘 인텔렉쳐 프로퍼티 게엠베하 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
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