CN102741925B - 生产全息膜的方法 - Google Patents

生产全息膜的方法 Download PDF

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Publication number
CN102741925B
CN102741925B CN201080061628.2A CN201080061628A CN102741925B CN 102741925 B CN102741925 B CN 102741925B CN 201080061628 A CN201080061628 A CN 201080061628A CN 102741925 B CN102741925 B CN 102741925B
Authority
CN
China
Prior art keywords
photopolymer
component
film
monomer
holographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201080061628.2A
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English (en)
Chinese (zh)
Other versions
CN102741925A (zh
Inventor
F-K·布鲁德
D·赫内尔
M-S·魏泽
T·罗勒
T·费克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Deutschland AG
Bayer Intellectual Property GmbH
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Bayer MaterialScience AG
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Publication date
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Publication of CN102741925A publication Critical patent/CN102741925A/zh
Application granted granted Critical
Publication of CN102741925B publication Critical patent/CN102741925B/zh
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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/30—Details of photosensitive recording material not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Laminated Bodies (AREA)
CN201080061628.2A 2009-11-03 2010-11-02 生产全息膜的方法 Active CN102741925B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09013768 2009-11-03
EP09013768.8 2009-11-03
PCT/EP2010/066587 WO2011054791A1 (de) 2009-11-03 2010-11-02 Verfahren zur herstellung eines holographischen films

Publications (2)

Publication Number Publication Date
CN102741925A CN102741925A (zh) 2012-10-17
CN102741925B true CN102741925B (zh) 2015-12-16

Family

ID=41401821

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080061628.2A Active CN102741925B (zh) 2009-11-03 2010-11-02 生产全息膜的方法

Country Status (9)

Country Link
US (1) US8889321B2 (cg-RX-API-DMAC7.html)
EP (1) EP2497080B1 (cg-RX-API-DMAC7.html)
JP (1) JP5925686B2 (cg-RX-API-DMAC7.html)
KR (1) KR101746883B1 (cg-RX-API-DMAC7.html)
CN (1) CN102741925B (cg-RX-API-DMAC7.html)
ES (1) ES2446344T3 (cg-RX-API-DMAC7.html)
IN (1) IN2012DN03891A (cg-RX-API-DMAC7.html)
TW (1) TWI488908B (cg-RX-API-DMAC7.html)
WO (1) WO2011054791A1 (cg-RX-API-DMAC7.html)

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US8771904B2 (en) * 2009-11-03 2014-07-08 Bayer Materialscience Ag Method for producing holographic media
PL2497082T3 (pl) * 2009-11-03 2013-12-31 Bayer Ip Gmbh Fluorouretany jako dodatek w formulacji fotopolimerowej
CN102574877B (zh) * 2009-11-03 2016-04-20 拜尔材料科学股份公司 具有高折射率和降低的双键密度的氨基甲酸酯丙烯酸酯
IN2012DN03900A (cg-RX-API-DMAC7.html) * 2009-11-03 2015-09-04 Bayer Materialscience Ag
ATE548730T1 (de) * 2009-11-03 2012-03-15 Bayer Materialscience Ag Photopolymerformulierungen mit einstellbarem mechanischem modul guv
US8889322B2 (en) * 2009-11-03 2014-11-18 Bayer Materialscience Ag Photopolymer formulation having different writing comonomers
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
EP2497084B1 (de) * 2009-11-03 2013-12-25 Bayer Intellectual Property GmbH Auswahlverfahren für additive in photopolymeren
KR101804591B1 (ko) * 2010-02-02 2017-12-04 바이엘 인텔렉쳐 프로퍼티 게엠베하 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
US9195215B2 (en) 2011-11-29 2015-11-24 Bayer Intellectual Property Gmbh Holographic medium having a protective layer
PL2613318T3 (pl) * 2012-01-05 2014-12-31 Bayer Ip Gmbh Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową
US20140302425A1 (en) * 2012-04-30 2014-10-09 Bayer Intellectual Property Gmbh Method for producing holographic media
TWI640428B (zh) * 2013-02-27 2018-11-11 拜耳材料科學股份有限公司 以丙烯酸酯為基底之保護塗層與黏著劑
KR102244648B1 (ko) 2017-12-08 2021-04-26 주식회사 엘지화학 포토폴리머 조성물
KR102166846B1 (ko) * 2017-12-11 2020-10-16 주식회사 엘지화학 포토폴리머 조성물
KR102239212B1 (ko) 2018-12-14 2021-04-12 주식회사 엘지화학 포토폴리머 조성물

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Also Published As

Publication number Publication date
TW201132696A (en) 2011-10-01
ES2446344T3 (es) 2014-03-07
US20120219883A1 (en) 2012-08-30
EP2497080B1 (de) 2013-12-25
JP5925686B2 (ja) 2016-05-25
WO2011054791A1 (de) 2011-05-12
EP2497080A1 (de) 2012-09-12
KR20120101643A (ko) 2012-09-14
IN2012DN03891A (cg-RX-API-DMAC7.html) 2015-09-04
JP2013510334A (ja) 2013-03-21
KR101746883B1 (ko) 2017-06-27
US8889321B2 (en) 2014-11-18
TWI488908B (zh) 2015-06-21
CN102741925A (zh) 2012-10-17

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Effective date of registration: 20160617

Address after: German Monheim

Patentee after: BAYER INTELLECTUAL PROPERTY GmbH

Address before: Germany Leverkusen

Patentee before: BAYER MATERIALSCIENCE AG

Effective date of registration: 20160617

Address after: Leverkusen, Germany

Patentee after: COVESTRO DEUTSCHLAND AG

Address before: German Monheim

Patentee before: BAYER INTELLECTUAL PROPERTY GmbH