JP2013510116A5 - - Google Patents
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- Publication number
- JP2013510116A5 JP2013510116A5 JP2012537370A JP2012537370A JP2013510116A5 JP 2013510116 A5 JP2013510116 A5 JP 2013510116A5 JP 2012537370 A JP2012537370 A JP 2012537370A JP 2012537370 A JP2012537370 A JP 2012537370A JP 2013510116 A5 JP2013510116 A5 JP 2013510116A5
- Authority
- JP
- Japan
- Prior art keywords
- holograms
- photosensitive polymer
- polymer composition
- methacrylate
- reacted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 14
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 8
- 239000000178 monomer Substances 0.000 claims description 7
- 125000001624 naphthyl group Chemical group 0.000 claims description 5
- -1 aromatic isocyanate Chemical class 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 2
- 230000005540 biological transmission Effects 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 2
- 239000012948 isocyanate Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000006276 2-bromophenyl group Chemical group [H]C1=C([H])C(Br)=C(*)C([H])=C1[H] 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 125000006269 biphenyl-2-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C(*)C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000006268 biphenyl-3-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C([H])C(*)=C([H])C([H])=C1[H] 0.000 description 1
- 125000000319 biphenyl-4-yl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C1=C([H])C([H])=C([*])C([H])=C1[H] 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09013763 | 2009-11-03 | ||
| EP09013763.9 | 2009-11-03 | ||
| PCT/EP2010/066633 WO2011054818A2 (de) | 2009-11-03 | 2010-11-02 | Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013510116A JP2013510116A (ja) | 2013-03-21 |
| JP2013510116A5 true JP2013510116A5 (enExample) | 2013-12-19 |
| JP5793147B2 JP5793147B2 (ja) | 2015-10-14 |
Family
ID=42072857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537370A Expired - Fee Related JP5793147B2 (ja) | 2009-11-03 | 2010-11-02 | 新規な非結晶化メタクリレート、その製造方法およびその使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20120219885A1 (enExample) |
| EP (1) | EP2496549B1 (enExample) |
| JP (1) | JP5793147B2 (enExample) |
| KR (1) | KR101767280B1 (enExample) |
| CN (2) | CN104892462B (enExample) |
| TW (1) | TWI506018B (enExample) |
| WO (1) | WO2011054818A2 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2497080B1 (de) * | 2009-11-03 | 2013-12-25 | Bayer Intellectual Property GmbH | Verfahren zur herstellung eines holographischen films |
| CN102667936B (zh) * | 2009-11-03 | 2016-03-30 | 拜尔材料科学股份公司 | 生产全息介质的方法 |
| CN102667935B (zh) * | 2009-11-03 | 2016-01-20 | 拜尔材料科学股份公司 | 具有不同书写共聚单体的光聚合物制剂 |
| IN2012DN03900A (enExample) * | 2009-11-03 | 2015-09-04 | Bayer Materialscience Ag | |
| RU2570662C9 (ru) * | 2009-11-03 | 2016-07-20 | Байер Матириальсайенс Аг | Фторуретаны в качестве добавки в фотополимерной композиции |
| PL2317511T3 (pl) | 2009-11-03 | 2012-08-31 | Bayer Materialscience Ag | Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv |
| US8877408B2 (en) * | 2009-11-03 | 2014-11-04 | Bayer Materialscience Ag | Urethanes used as additives in a photopolymer formulation |
| KR101804591B1 (ko) * | 2010-02-02 | 2017-12-04 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 에스테르-기재 기록 단량체를 갖는 광중합체 배합물 |
| EP2531892B1 (de) * | 2010-02-02 | 2016-01-27 | Covestro Deutschland AG | Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren |
| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| TWI557187B (zh) * | 2012-05-03 | 2016-11-11 | 拜耳材料科學股份有限公司 | 用於光聚合物之新穎光起始劑 |
| US20140128508A1 (en) * | 2012-11-06 | 2014-05-08 | Ppg Industries Ohio, Inc. | Non-aqueous dispersions comprising an acrylic polymer stabilizer and an aliphatic polyester stabilized seed polymer |
| US10241402B2 (en) * | 2014-12-12 | 2019-03-26 | Covestro Deutschland Ag | Naphthyl acrylates as writing monomers for photopolymers |
| CN107223121B (zh) * | 2014-12-19 | 2020-10-27 | 科思创德国股份有限公司 | 湿稳定的全息介质 |
| JP7160817B2 (ja) * | 2017-01-20 | 2022-10-25 | エボニック オペレーションズ ゲーエムベーハー | 貯蔵安定なグリセロール（メタ）アクリラートカルボン酸エステル |
| EP3611155A1 (en) | 2018-08-16 | 2020-02-19 | Evonik Operations GmbH | Preparation of (meth)acrylic acid esters |
| US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
| US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
| US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
| US20220153693A1 (en) * | 2020-11-13 | 2022-05-19 | Facebook Technologies, Llc | Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3629187A (en) * | 1969-06-25 | 1971-12-21 | Dentsply Int Inc | Dental compositions containing adduct of 2 2' - propane bis 3-(4-phenoxy)-1 2-hydroxy propane - 1 - methacrylate and isocyanate |
| JPS5738750A (en) * | 1980-08-18 | 1982-03-03 | Kuraray Co Ltd | 2,3-bis 3,4-dicarboxybenzoyloxy propyl methacrylate and its preparation |
| DE3048502A1 (de) * | 1980-12-22 | 1982-07-22 | Hoechst Ag, 6000 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| US4420306A (en) * | 1982-06-24 | 1983-12-13 | Blendax-Werke R. Schneider Gmbh & Co. | Tetraacrylic and tetramethacrylic esters and dental materials containing same |
| DE3368408D1 (en) * | 1982-09-24 | 1987-01-29 | Blendax Werke Schneider Co | Acrylic and methacrylic acid diesters and their use |
| US4579904A (en) * | 1982-09-24 | 1986-04-01 | Blendax Werke R. Schneider Gmbh & Co. | Diacrylic and dimethacrylic esters and their use |
| EP0134861B1 (en) * | 1983-09-22 | 1987-12-09 | Toray Industries, Inc. | Resin material for plastic lens and lens composed thereof |
| EP0176874A3 (en) * | 1984-09-19 | 1988-02-10 | Toray Industries, Inc. | A highly-refractive plastic lens |
| JPS6188201A (ja) * | 1984-10-08 | 1986-05-06 | Toray Ind Inc | 高屈折率プラスチツクレンズ |
| EP0389067B1 (en) | 1985-11-20 | 1994-10-19 | The Mead Corporation | Ionic dye compounds |
| US4917977A (en) * | 1988-12-23 | 1990-04-17 | E. I. Du Pont De Nemours And Company | Visible sensitizers for photopolymerizable compositions |
| JP2873126B2 (ja) * | 1991-04-17 | 1999-03-24 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物 |
| JP3339873B2 (ja) * | 1992-03-23 | 2002-10-28 | 大日本印刷株式会社 | ホログラム形成材料 |
| JPH07199779A (ja) * | 1993-12-28 | 1995-08-04 | Toppan Printing Co Ltd | ホログラム記録材料及びホログラム記録用媒体 |
| JPH07206944A (ja) * | 1994-01-24 | 1995-08-08 | Mitsubishi Rayon Co Ltd | プラスチックレンズ成形用組成物及びそれを用いたプラスチックレンズ |
| GB9410578D0 (en) * | 1994-05-26 | 1994-07-13 | London Hospital Med Coll | Novel (meth)acrylate monomers and denture base compositions prepared therefrom |
| US5679710A (en) * | 1994-11-01 | 1997-10-21 | London Hospital Medical College | High refractive index and/or radio-opaque resins systems |
| US5747629A (en) * | 1996-12-16 | 1998-05-05 | Bayer Corporation | Low surface energy polyisocyanates and their use in one-or two-component coating compositions |
| US6403702B1 (en) * | 1999-12-03 | 2002-06-11 | Bayer Corporation | Diurethane plasticizer containing one-shot polyurethane cast elastomers |
| JP2005527867A (ja) * | 2002-05-29 | 2005-09-15 | インフェイズ テクノロジーズ インコーポレイテッド | アルミニウム塩化合物と不斉アクリレート化合物を含むホログラフィックデータ記録媒体 |
| US7229741B2 (en) * | 2002-05-29 | 2007-06-12 | Inphase Technologies, Inc. | Exceptional high reflective index photoactive compound for optical applications |
| US7736818B2 (en) * | 2004-12-27 | 2010-06-15 | Inphase Technologies, Inc. | Holographic recording medium and method of making it |
| CN1995254B (zh) * | 2006-01-05 | 2010-05-12 | 中国印钞造币总公司 | 粘合剂组合物及其用途 |
| EP2137220B1 (en) * | 2007-04-11 | 2017-10-18 | Covestro Deutschland AG | Aromatic urethane acrylates having a high refractive index |
| ATE493383T1 (de) * | 2008-08-08 | 2011-01-15 | Bayer Materialscience Ag | Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex |
| EP2219073B1 (de) * | 2009-02-17 | 2020-06-03 | Covestro Deutschland AG | Holografische Medien und Photopolymerzusammensetzungen |
| DE102009033831A1 (de) * | 2009-07-18 | 2011-01-20 | Bayer Materialscience Ag | Verfahren zur Herstellung von Hydroxyalkyl(meth)acrylaten |
| US8808946B2 (en) * | 2009-11-03 | 2014-08-19 | Bayer Materialscience Ag | Urethane acrylate having a high refractive index and reduced double bond density |
| EP2531892B1 (de) * | 2010-02-02 | 2016-01-27 | Covestro Deutschland AG | Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
-
2010
- 2010-11-02 EP EP10773312.3A patent/EP2496549B1/de not_active Not-in-force
- 2010-11-02 WO PCT/EP2010/066633 patent/WO2011054818A2/de not_active Ceased
- 2010-11-02 CN CN201510183780.2A patent/CN104892462B/zh not_active Expired - Fee Related
- 2010-11-02 US US13/505,519 patent/US20120219885A1/en not_active Abandoned
- 2010-11-02 KR KR1020127011380A patent/KR101767280B1/ko active Active
- 2010-11-02 TW TW099137562A patent/TWI506018B/zh not_active IP Right Cessation
- 2010-11-02 CN CN201080049781.3A patent/CN102666469B/zh not_active Expired - Fee Related
- 2010-11-02 JP JP2012537370A patent/JP5793147B2/ja not_active Expired - Fee Related
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