KR101767280B1 - 신규한 비결정화 메타크릴레이트, 그의 제조 및 용도 - Google Patents

신규한 비결정화 메타크릴레이트, 그의 제조 및 용도 Download PDF

Info

Publication number
KR101767280B1
KR101767280B1 KR1020127011380A KR20127011380A KR101767280B1 KR 101767280 B1 KR101767280 B1 KR 101767280B1 KR 1020127011380 A KR1020127011380 A KR 1020127011380A KR 20127011380 A KR20127011380 A KR 20127011380A KR 101767280 B1 KR101767280 B1 KR 101767280B1
Authority
KR
South Korea
Prior art keywords
hologram
independently
photopolymer
methacrylate
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020127011380A
Other languages
English (en)
Korean (ko)
Other versions
KR20120099426A (ko
Inventor
토마스 팩케
프리드리히-칼 브루더
마크-스테판 바이저
토마스 뢸레
데니스 회넬
Original Assignee
코베스트로 도이칠란드 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코베스트로 도이칠란드 아게 filed Critical 코베스트로 도이칠란드 아게
Publication of KR20120099426A publication Critical patent/KR20120099426A/ko
Application granted granted Critical
Publication of KR101767280B1 publication Critical patent/KR101767280B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/30—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a six-membered aromatic ring being part of a condensed ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/39—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
    • C07C323/43—Y being a hetero atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Holo Graphy (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020127011380A 2009-11-03 2010-11-02 신규한 비결정화 메타크릴레이트, 그의 제조 및 용도 Active KR101767280B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09013763 2009-11-03
EP09013763.9 2009-11-03
PCT/EP2010/066633 WO2011054818A2 (de) 2009-11-03 2010-11-02 Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung

Publications (2)

Publication Number Publication Date
KR20120099426A KR20120099426A (ko) 2012-09-10
KR101767280B1 true KR101767280B1 (ko) 2017-08-23

Family

ID=42072857

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127011380A Active KR101767280B1 (ko) 2009-11-03 2010-11-02 신규한 비결정화 메타크릴레이트, 그의 제조 및 용도

Country Status (7)

Country Link
US (1) US20120219885A1 (enExample)
EP (1) EP2496549B1 (enExample)
JP (1) JP5793147B2 (enExample)
KR (1) KR101767280B1 (enExample)
CN (2) CN104892462B (enExample)
TW (1) TWI506018B (enExample)
WO (1) WO2011054818A2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2453267T3 (es) * 2009-11-03 2014-04-07 Bayer Intellectual Property Gmbh Procedimiento de fabricación de una película holográfica
ES2381808T3 (es) * 2009-11-03 2012-05-31 Bayer Materialscience Ag Formulaciones de fotopolímeros con módulo mecánico ajustable Guv
TWI488908B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 製造全像膜的方法
JP2013510203A (ja) * 2009-11-03 2013-03-21 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト 感光性ポリマー組成物における添加剤としてのフルオロウレタン
WO2011054793A1 (de) * 2009-11-03 2011-05-12 Bayer Materialscience Ag Verfahren zur herstellung von holographischen medien
KR101782182B1 (ko) * 2009-11-03 2017-09-26 코베스트로 도이칠란드 아게 상이한 기록 공단량체를 갖는 광중합체 제제
TWI489209B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 在光聚合物配製物中作為添加劑的胺甲酸乙酯
EP2531889B1 (de) * 2010-02-02 2020-06-03 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit ester-basierten schreibmonomeren zur herstellung holographischer medien
EP2531892B1 (de) * 2010-02-02 2016-01-27 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
TWI557187B (zh) * 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
US20140128508A1 (en) * 2012-11-06 2014-05-08 Ppg Industries Ohio, Inc. Non-aqueous dispersions comprising an acrylic polymer stabilizer and an aliphatic polyester stabilized seed polymer
EP3230261B1 (de) * 2014-12-12 2018-09-05 Covestro Deutschland AG Naphthylacrylate als schreibmonomere für photopolymere
KR102498092B1 (ko) * 2014-12-19 2023-02-09 코베스트로 도이칠란트 아게 수분-안정성 홀로그래픽 매체
WO2018133972A1 (de) * 2017-01-20 2018-07-26 Evonik Röhm Gmbh Lagerstabiles glycerin(meth)acrylatcarbonsäureester
EP3611155A1 (en) 2018-08-16 2020-02-19 Evonik Operations GmbH Preparation of (meth)acrylic acid esters
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3629187A (en) * 1969-06-25 1971-12-21 Dentsply Int Inc Dental compositions containing adduct of 2 2' - propane bis 3-(4-phenoxy)-1 2-hydroxy propane - 1 - methacrylate and isocyanate
JPS5738750A (en) * 1980-08-18 1982-03-03 Kuraray Co Ltd 2,3-bis 3,4-dicarboxybenzoyloxy propyl methacrylate and its preparation
DE3048502A1 (de) * 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US4420306A (en) * 1982-06-24 1983-12-13 Blendax-Werke R. Schneider Gmbh & Co. Tetraacrylic and tetramethacrylic esters and dental materials containing same
DE3368408D1 (en) * 1982-09-24 1987-01-29 Blendax Werke Schneider Co Acrylic and methacrylic acid diesters and their use
US4579904A (en) * 1982-09-24 1986-04-01 Blendax Werke R. Schneider Gmbh & Co. Diacrylic and dimethacrylic esters and their use
DE3374869D1 (en) * 1983-09-22 1988-01-21 Toray Industries Resin material for plastic lens and lens composed thereof
EP0176874A3 (en) * 1984-09-19 1988-02-10 Toray Industries, Inc. A highly-refractive plastic lens
JPS6188201A (ja) * 1984-10-08 1986-05-06 Toray Ind Inc 高屈折率プラスチツクレンズ
EP0389067B1 (en) 1985-11-20 1994-10-19 The Mead Corporation Ionic dye compounds
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
JP2873126B2 (ja) * 1991-04-17 1999-03-24 日本ペイント株式会社 体積ホログラム記録用感光性組成物
JP3339873B2 (ja) * 1992-03-23 2002-10-28 大日本印刷株式会社 ホログラム形成材料
JPH07199779A (ja) * 1993-12-28 1995-08-04 Toppan Printing Co Ltd ホログラム記録材料及びホログラム記録用媒体
JPH07206944A (ja) * 1994-01-24 1995-08-08 Mitsubishi Rayon Co Ltd プラスチックレンズ成形用組成物及びそれを用いたプラスチックレンズ
GB9410578D0 (en) * 1994-05-26 1994-07-13 London Hospital Med Coll Novel (meth)acrylate monomers and denture base compositions prepared therefrom
US5679710A (en) * 1994-11-01 1997-10-21 London Hospital Medical College High refractive index and/or radio-opaque resins systems
US5747629A (en) * 1996-12-16 1998-05-05 Bayer Corporation Low surface energy polyisocyanates and their use in one-or two-component coating compositions
US6403702B1 (en) * 1999-12-03 2002-06-11 Bayer Corporation Diurethane plasticizer containing one-shot polyurethane cast elastomers
AU2003232438A1 (en) * 2002-05-29 2003-12-19 Inphase Technologies, Inc. Holographic data storage media comprising an aluminum salt compound and an asymetric acrylate compound
AU2003232437A1 (en) * 2002-05-29 2003-12-19 Inphase Technologies, Inc. High reflective index photoactive compound for optical applications
US7736818B2 (en) * 2004-12-27 2010-06-15 Inphase Technologies, Inc. Holographic recording medium and method of making it
CN1995254B (zh) * 2006-01-05 2010-05-12 中国印钞造币总公司 粘合剂组合物及其用途
WO2008125199A1 (en) 2007-04-11 2008-10-23 Bayer Materialscience Ag Aromatic urethane acrylates having a high refractive index
ATE493383T1 (de) * 2008-08-08 2011-01-15 Bayer Materialscience Ag Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex
EP2219073B1 (de) * 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
DE102009033831A1 (de) * 2009-07-18 2011-01-20 Bayer Materialscience Ag Verfahren zur Herstellung von Hydroxyalkyl(meth)acrylaten
TWI506049B (zh) * 2009-11-03 2015-11-01 Bayer Materialscience Ag 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯
EP2531892B1 (de) * 2010-02-02 2016-01-27 Covestro Deutschland AG Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme

Also Published As

Publication number Publication date
US20120219885A1 (en) 2012-08-30
KR20120099426A (ko) 2012-09-10
CN102666469B (zh) 2016-03-02
JP5793147B2 (ja) 2015-10-14
CN104892462A (zh) 2015-09-09
JP2013510116A (ja) 2013-03-21
CN102666469A (zh) 2012-09-12
EP2496549A2 (de) 2012-09-12
TWI506018B (zh) 2015-11-01
EP2496549B1 (de) 2014-10-08
WO2011054818A2 (de) 2011-05-12
TW201130796A (en) 2011-09-16
CN104892462B (zh) 2017-08-22
WO2011054818A3 (de) 2011-09-15

Similar Documents

Publication Publication Date Title
KR101767280B1 (ko) 신규한 비결정화 메타크릴레이트, 그의 제조 및 용도
KR101676874B1 (ko) 신규 홀로그래피 매체 및 광중합체
KR101727769B1 (ko) 홀로그래피 필름의 제조 방법
US9505873B2 (en) Photopolymer formulations having a low crosslinking density
TWI494691B (zh) 具有可調節之機械模數Ｇｕｖ的光聚合物配製物
US8771904B2 (en) Method for producing holographic media
JP6088971B2 (ja) 二官能性（メタ）アクリレート書込モノマー
RU2515977C2 (ru) Полиуретановая композиция для изготовления голографических сред, ее применение, способ записи голограмм и ненасыщенные уретаны
JP5524218B2 (ja) ホログラフィック媒体製造用のプレポリマー系ポリウレタン配合物
KR101804591B1 (ko) 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
KR101620652B1 (ko) 자가 현상 중합체 기재의 체적 홀로그래피 기록용 매체
US8685595B2 (en) Prepolymer-based polyurethane formulations for the production of holographic films
KR20150006428A (ko) 광중합체를 위한 신규 광개시제
US20140302425A1 (en) Method for producing holographic media
TW201335211A (zh) 於以聚胺甲酸酯為基底之光聚合物配製物中之含硫鏈轉移劑

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 9