JP5793147B2 - 新規な非結晶化メタクリレート、その製造方法およびその使用 - Google Patents

新規な非結晶化メタクリレート、その製造方法およびその使用 Download PDF

Info

Publication number
JP5793147B2
JP5793147B2 JP2012537370A JP2012537370A JP5793147B2 JP 5793147 B2 JP5793147 B2 JP 5793147B2 JP 2012537370 A JP2012537370 A JP 2012537370A JP 2012537370 A JP2012537370 A JP 2012537370A JP 5793147 B2 JP5793147 B2 JP 5793147B2
Authority
JP
Japan
Prior art keywords
methacrylate
isocyanate
acid
acrylate
hologram
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012537370A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013510116A (ja
JP2013510116A5 (enExample
Inventor
トーマス・フェッケ
フリードリッヒ−カール・ブルーダー
マルク−シュテファン・ヴァイザー
トーマス・レルレ
デニス・ヘネル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Deutschland AG
Original Assignee
Bayer MaterialScience AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer MaterialScience AG filed Critical Bayer MaterialScience AG
Publication of JP2013510116A publication Critical patent/JP2013510116A/ja
Publication of JP2013510116A5 publication Critical patent/JP2013510116A5/ja
Application granted granted Critical
Publication of JP5793147B2 publication Critical patent/JP5793147B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/30—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a six-membered aromatic ring being part of a condensed ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/39—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
    • C07C323/43—Y being a hetero atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Holo Graphy (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2012537370A 2009-11-03 2010-11-02 新規な非結晶化メタクリレート、その製造方法およびその使用 Expired - Fee Related JP5793147B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09013763 2009-11-03
EP09013763.9 2009-11-03
PCT/EP2010/066633 WO2011054818A2 (de) 2009-11-03 2010-11-02 Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung

Publications (3)

Publication Number Publication Date
JP2013510116A JP2013510116A (ja) 2013-03-21
JP2013510116A5 JP2013510116A5 (enExample) 2013-12-19
JP5793147B2 true JP5793147B2 (ja) 2015-10-14

Family

ID=42072857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012537370A Expired - Fee Related JP5793147B2 (ja) 2009-11-03 2010-11-02 新規な非結晶化メタクリレート、その製造方法およびその使用

Country Status (7)

Country Link
US (1) US20120219885A1 (enExample)
EP (1) EP2496549B1 (enExample)
JP (1) JP5793147B2 (enExample)
KR (1) KR101767280B1 (enExample)
CN (2) CN102666469B (enExample)
TW (1) TWI506018B (enExample)
WO (1) WO2011054818A2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI488908B (zh) * 2009-11-03 2015-06-21 Bayer Materialscience Ag 製造全像膜的方法
US8771904B2 (en) * 2009-11-03 2014-07-08 Bayer Materialscience Ag Method for producing holographic media
PL2497082T3 (pl) * 2009-11-03 2013-12-31 Bayer Ip Gmbh Fluorouretany jako dodatek w formulacji fotopolimerowej
IN2012DN03900A (enExample) * 2009-11-03 2015-09-04 Bayer Materialscience Ag
US8889322B2 (en) * 2009-11-03 2014-11-18 Bayer Materialscience Ag Photopolymer formulation having different writing comonomers
ATE548730T1 (de) * 2009-11-03 2012-03-15 Bayer Materialscience Ag Photopolymerformulierungen mit einstellbarem mechanischem modul guv
US8877408B2 (en) * 2009-11-03 2014-11-04 Bayer Materialscience Ag Urethanes used as additives in a photopolymer formulation
KR101804591B1 (ko) * 2010-02-02 2017-12-04 바이엘 인텔렉쳐 프로퍼티 게엠베하 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
EP2450387A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung für die Herstellung holographischer Medien
TWI557187B (zh) * 2012-05-03 2016-11-11 拜耳材料科學股份有限公司 用於光聚合物之新穎光起始劑
US20140128508A1 (en) * 2012-11-06 2014-05-08 Ppg Industries Ohio, Inc. Non-aqueous dispersions comprising an acrylic polymer stabilizer and an aliphatic polyester stabilized seed polymer
CN107001246B (zh) * 2014-12-12 2021-02-02 科思创德国股份有限公司 作为光聚合物用书写单体的萘基丙烯酸酯
WO2016096641A1 (de) * 2014-12-19 2016-06-23 Covestro Deutschland Ag Feuchtigkeitsstabile holographische medien
US11414373B2 (en) 2017-01-20 2022-08-16 Evonik Operations Gmbh Glycerol (meth)acrylate carboxylic ester having a long shelf life
EP3611155A1 (en) 2018-08-16 2020-02-19 Evonik Operations GmbH Preparation of (meth)acrylic acid esters
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3629187A (en) * 1969-06-25 1971-12-21 Dentsply Int Inc Dental compositions containing adduct of 2 2' - propane bis 3-(4-phenoxy)-1 2-hydroxy propane - 1 - methacrylate and isocyanate
JPS5738750A (en) * 1980-08-18 1982-03-03 Kuraray Co Ltd 2,3-bis 3,4-dicarboxybenzoyloxy propyl methacrylate and its preparation
DE3048502A1 (de) * 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US4420306A (en) * 1982-06-24 1983-12-13 Blendax-Werke R. Schneider Gmbh & Co. Tetraacrylic and tetramethacrylic esters and dental materials containing same
US4579904A (en) * 1982-09-24 1986-04-01 Blendax Werke R. Schneider Gmbh & Co. Diacrylic and dimethacrylic esters and their use
ATE24311T1 (de) * 1982-09-24 1987-01-15 Blendax Werke Schneider Co Neue diacryl- und dimethacrylester und ihre verwendung.
EP0134861B1 (en) * 1983-09-22 1987-12-09 Toray Industries, Inc. Resin material for plastic lens and lens composed thereof
EP0176874A3 (en) * 1984-09-19 1988-02-10 Toray Industries, Inc. A highly-refractive plastic lens
JPS6188201A (ja) * 1984-10-08 1986-05-06 Toray Ind Inc 高屈折率プラスチツクレンズ
DE3650107T2 (de) 1985-11-20 1995-05-24 Mead Corp Ionische Farbstoffe.
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
JP2873126B2 (ja) * 1991-04-17 1999-03-24 日本ペイント株式会社 体積ホログラム記録用感光性組成物
JP3339873B2 (ja) * 1992-03-23 2002-10-28 大日本印刷株式会社 ホログラム形成材料
JPH07199779A (ja) * 1993-12-28 1995-08-04 Toppan Printing Co Ltd ホログラム記録材料及びホログラム記録用媒体
JPH07206944A (ja) * 1994-01-24 1995-08-08 Mitsubishi Rayon Co Ltd プラスチックレンズ成形用組成物及びそれを用いたプラスチックレンズ
GB9410578D0 (en) * 1994-05-26 1994-07-13 London Hospital Med Coll Novel (meth)acrylate monomers and denture base compositions prepared therefrom
US5679710A (en) * 1994-11-01 1997-10-21 London Hospital Medical College High refractive index and/or radio-opaque resins systems
US5747629A (en) * 1996-12-16 1998-05-05 Bayer Corporation Low surface energy polyisocyanates and their use in one-or two-component coating compositions
US6403702B1 (en) * 1999-12-03 2002-06-11 Bayer Corporation Diurethane plasticizer containing one-shot polyurethane cast elastomers
WO2003102693A1 (en) * 2002-05-29 2003-12-11 Inphase Technologies, Inc. High reflective index photoactive compound for optical applications
ATE331288T1 (de) * 2002-05-29 2006-07-15 Inphase Tech Inc Holographische datenspeichermedien mit einer aluminiumsalzverbindung und einer asymmetrischen acrylatverbindung
US7736818B2 (en) * 2004-12-27 2010-06-15 Inphase Technologies, Inc. Holographic recording medium and method of making it
CN1995254B (zh) * 2006-01-05 2010-05-12 中国印钞造币总公司 粘合剂组合物及其用途
BRPI0810831A2 (pt) * 2007-04-11 2014-10-29 Bayer Materialscience Ag Acrilatos de uretano aromáticos tendo um alto índice de refração.
DE502008002161D1 (de) * 2008-08-08 2011-02-10 Bayer Materialscience Ag Phenylisocyanat-basierte Urethanacrylate mit hohem Brechungsindex
EP2219073B1 (de) * 2009-02-17 2020-06-03 Covestro Deutschland AG Holografische Medien und Photopolymerzusammensetzungen
DE102009033831A1 (de) * 2009-07-18 2011-01-20 Bayer Materialscience Ag Verfahren zur Herstellung von Hydroxyalkyl(meth)acrylaten
CN102574877B (zh) * 2009-11-03 2016-04-20 拜尔材料科学股份公司 具有高折射率和降低的双键密度的氨基甲酸酯丙烯酸酯
KR20120125270A (ko) * 2010-02-02 2012-11-14 바이엘 인텔렉쳐 프로퍼티 게엠베하 트리아진-기재 기록 단량체를 갖는 광중합체 배합물
EP2372454A1 (de) * 2010-03-29 2011-10-05 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme

Also Published As

Publication number Publication date
CN104892462B (zh) 2017-08-22
JP2013510116A (ja) 2013-03-21
WO2011054818A3 (de) 2011-09-15
TW201130796A (en) 2011-09-16
CN104892462A (zh) 2015-09-09
KR20120099426A (ko) 2012-09-10
WO2011054818A2 (de) 2011-05-12
CN102666469A (zh) 2012-09-12
TWI506018B (zh) 2015-11-01
KR101767280B1 (ko) 2017-08-23
EP2496549B1 (de) 2014-10-08
EP2496549A2 (de) 2012-09-12
US20120219885A1 (en) 2012-08-30
CN102666469B (zh) 2016-03-02

Similar Documents

Publication Publication Date Title
JP5793147B2 (ja) 新規な非結晶化メタクリレート、その製造方法およびその使用
RU2515977C2 (ru) Полиуретановая композиция для изготовления голографических сред, ее применение, способ записи голограмм и ненасыщенные уретаны
JP5909038B2 (ja) 新規なホログラフィック媒体およびフォトポリマー
JP6023592B2 (ja) トリアジン系書込モノマー含有感光性ポリマー組成物
JP5524218B2 (ja) ホログラフィック媒体製造用のプレポリマー系ポリウレタン配合物
JP5886751B2 (ja) 調節可能な力学的弾性率ｇｕｖを有する感光性ポリマー組成物
JP6088971B2 (ja) 二官能性（メタ）アクリレート書込モノマー
US9505873B2 (en) Photopolymer formulations having a low crosslinking density
JP5792746B2 (ja) エステル系書込モノマー含有感光性ポリマー組成物
KR101727769B1 (ko) 홀로그래피 필름의 제조 방법
US20120231377A1 (en) Photopolymer formulation having different writing comonomers

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20131101

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20131101

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20141215

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150106

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150403

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20150501

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20150602

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150728

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150807

R150 Certificate of patent or registration of utility model

Ref document number: 5793147

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees