JP2013509730A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013509730A5 JP2013509730A5 JP2012537174A JP2012537174A JP2013509730A5 JP 2013509730 A5 JP2013509730 A5 JP 2013509730A5 JP 2012537174 A JP2012537174 A JP 2012537174A JP 2012537174 A JP2012537174 A JP 2012537174A JP 2013509730 A5 JP2013509730 A5 JP 2013509730A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- floating protection
- base
- collector
- floating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 6
- 239000004065 semiconductor Substances 0.000 claims 5
- 239000012212 insulator Substances 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 2
- 238000002955 isolation Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/611,074 | 2009-11-02 | ||
| US12/611,074 US8350352B2 (en) | 2009-11-02 | 2009-11-02 | Bipolar transistor |
| PCT/US2010/055000 WO2011053927A1 (en) | 2009-11-02 | 2010-11-01 | Bipolar transistor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013509730A JP2013509730A (ja) | 2013-03-14 |
| JP2013509730A5 true JP2013509730A5 (enExample) | 2013-10-24 |
| JP5746199B2 JP5746199B2 (ja) | 2015-07-08 |
Family
ID=43618000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537174A Expired - Fee Related JP5746199B2 (ja) | 2009-11-02 | 2010-11-01 | バイポーラトランジスタ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8350352B2 (enExample) |
| EP (1) | EP2497113A1 (enExample) |
| JP (1) | JP5746199B2 (enExample) |
| CN (1) | CN102668087B (enExample) |
| WO (1) | WO2011053927A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9653455B1 (en) * | 2015-11-10 | 2017-05-16 | Analog Devices Global | FET—bipolar transistor combination |
| JP7386123B2 (ja) * | 2020-04-28 | 2023-11-24 | 株式会社東海理化電機製作所 | 半導体装置 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1614749U (de) * | 1949-12-05 | 1950-10-19 | Patra Patent Treuhand | Doppelfassung zur aufnahme von zwei parallel nebeneinander angeordneten rohrenden von leuchtroehren. |
| DE1614749A1 (de) | 1967-01-07 | 1970-12-10 | Telefunken Patent | Integrierte Halbleiteranordnung |
| US3772577A (en) | 1972-02-10 | 1973-11-13 | Texas Instruments Inc | Guard ring mesa construction for low and high voltage npn and pnp transistors and diodes and method of making same |
| JPS4991776A (enExample) * | 1973-01-05 | 1974-09-02 | ||
| JPS61278161A (ja) | 1985-06-04 | 1986-12-09 | Tdk Corp | 高耐圧半導体装置 |
| JPS61285764A (ja) * | 1985-06-12 | 1986-12-16 | Tdk Corp | 高耐圧半導体装置 |
| JP2979554B2 (ja) | 1989-09-26 | 1999-11-15 | 株式会社デンソー | 半導体装置の製造方法 |
| DE58908843D1 (de) | 1989-10-30 | 1995-02-09 | Siemens Ag | Eingangsschutzstruktur für integrierte Schaltungen. |
| JPH04506588A (ja) | 1990-01-08 | 1992-11-12 | ハリス コーポレーシヨン | 薄い、絶縁分離したアイランドに納められた、低いコレクタ抵抗を持つ、トランジスタ構造 |
| US5247201A (en) * | 1990-02-15 | 1993-09-21 | Siemens Aktiengesellschaft | Input protection structure for integrated circuits |
| JP3798808B2 (ja) * | 1991-09-27 | 2006-07-19 | ハリス・コーポレーション | 高いアーリー電壓,高周波性能及び高降伏電壓特性を具備した相補型バイポーラトランジスター及びその製造方法 |
| US5274267A (en) | 1992-01-31 | 1993-12-28 | International Business Machines Corporation | Bipolar transistor with low extrinsic base resistance and low noise |
| JP3110852B2 (ja) | 1992-04-08 | 2000-11-20 | 株式会社ブリヂストン | 空気入りタイヤ |
| JPH05291270A (ja) * | 1992-04-13 | 1993-11-05 | Sharp Corp | 半導体装置 |
| JP2812093B2 (ja) * | 1992-09-17 | 1998-10-15 | 株式会社日立製作所 | プレーナ接合を有する半導体装置 |
| SE513512C2 (sv) * | 1994-10-31 | 2000-09-25 | Ericsson Telefon Ab L M | Halvledaranordning med ett flytande kollektorområde |
| US5629552A (en) * | 1995-01-17 | 1997-05-13 | Ixys Corporation | Stable high voltage semiconductor device structure |
| JPH10172980A (ja) * | 1996-12-13 | 1998-06-26 | Sanken Electric Co Ltd | 半導体装置及びその製造方法 |
| JP3906181B2 (ja) * | 2003-05-26 | 2007-04-18 | 株式会社東芝 | 電力用半導体装置 |
| US7737469B2 (en) | 2006-05-16 | 2010-06-15 | Kabushiki Kaisha Toshiba | Semiconductor device having superjunction structure formed of p-type and n-type pillar regions |
| EP1936390A1 (en) * | 2006-12-20 | 2008-06-25 | Ecole Polytechnique Federale De Lausanne Epfl - Sti - Imm - Lmis3 | Semiconductor device for measuring ultra small electrical currents and small voltages |
| US8008734B2 (en) * | 2007-01-11 | 2011-08-30 | Fuji Electric Co., Ltd. | Power semiconductor device |
| JP5205856B2 (ja) * | 2007-01-11 | 2013-06-05 | 富士電機株式会社 | 電力用半導体素子 |
-
2009
- 2009-11-02 US US12/611,074 patent/US8350352B2/en active Active
-
2010
- 2010-11-01 CN CN201080049791.7A patent/CN102668087B/zh active Active
- 2010-11-01 WO PCT/US2010/055000 patent/WO2011053927A1/en not_active Ceased
- 2010-11-01 JP JP2012537174A patent/JP5746199B2/ja not_active Expired - Fee Related
- 2010-11-01 EP EP10779599A patent/EP2497113A1/en not_active Ceased
-
2012
- 2012-01-13 US US13/350,582 patent/US8357985B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105280631B (zh) | 瞬时电压抑制元件及其制造方法 | |
| CN103378087B (zh) | 静电释放保护结构及其制造方法 | |
| TWI377626B (en) | Schottky device and method of forming | |
| JP2014504013A5 (enExample) | ||
| JP2009060117A5 (enExample) | ||
| JP2011514689A5 (enExample) | ||
| JP2005509273A5 (enExample) | ||
| US20110266650A1 (en) | Semiconductor device and method for manufacturing same | |
| JP2015230920A5 (enExample) | ||
| JP5641879B2 (ja) | 半導体装置 | |
| JP2012049466A5 (enExample) | ||
| JP2013509730A5 (enExample) | ||
| JP2013527603A5 (enExample) | ||
| TWI772556B (zh) | 暫態電壓抑制裝置、暫態電壓抑制裝置總成及其形成方法 | |
| JP2013055347A (ja) | 半導体装置 | |
| US20160372554A1 (en) | Fabricating method of lateral-diffused metal oxide semiconductor device | |
| JP2012033657A (ja) | 半導体装置 | |
| JP5569526B2 (ja) | 半導体装置 | |
| KR101657160B1 (ko) | 과도 전압 억제 소자 및 그 제조 방법 | |
| JP2014017487A5 (enExample) | ||
| CN103378172B (zh) | 一种肖特基半导体装置及其制备方法 | |
| JP6221648B2 (ja) | 半導体装置 | |
| TW201234590A (en) | High voltage device and manufacturing method thereof | |
| TW201338130A (zh) | 垂直式半導體元件及其製造方法 | |
| CN103390651B (zh) | 一种沟槽肖特基半导体装置及其制备方法 |