JP6221648B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6221648B2 JP6221648B2 JP2013229972A JP2013229972A JP6221648B2 JP 6221648 B2 JP6221648 B2 JP 6221648B2 JP 2013229972 A JP2013229972 A JP 2013229972A JP 2013229972 A JP2013229972 A JP 2013229972A JP 6221648 B2 JP6221648 B2 JP 6221648B2
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- 239000004065 semiconductor Substances 0.000 title claims description 41
- 238000002955 isolation Methods 0.000 claims description 90
- 239000012535 impurity Substances 0.000 claims description 78
- 230000005684 electric field Effects 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910021332 silicide Inorganic materials 0.000 description 4
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
- H01L29/6609—Diodes
- H01L29/66098—Breakdown diodes
- H01L29/66106—Zener diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/866—Zener diodes
Description
なお、本明細書において「半導体層」は、エピタキシャル層でもよいし、シリコン基板でもよいし、エピタキシャル層またはシリコン基板に形成された不純物拡散層でもよい。
図1及び図2は、本発明の一態様に係る半導体装置の製造方法を示す断面図である。図3は、図2(C)に示す半導体装置の平面図である。
また、本実施の形態による半導体装置は低コストで製造することが可能である。
図4及び図5は、本発明の一態様に係る半導体装置の製造方法を示す断面図であり、図6は、図5(C)に示す半導体装置の平面図である。
また、本実施の形態による半導体装置は低コストで製造することが可能である。
Claims (9)
- 第2導電型の半導体層に形成された、第1の角部を有する素子分離領域と、
前記第2導電型の半導体層に接して形成され、前記素子分離領域の内側に位置する第1導電型の第1の不純物領域と、
前記第1の不純物領域上に接して形成され、前記素子分離領域の内側の前記第1の角部を覆う第2導電型の第2の不純物領域と、
前記半導体層に形成され、且つ前記素子分離領域の外側に形成された第1導電型の第3の不純物領域と、
前記半導体層下に形成され、前記第3の不純物領域及び前記第1の不純物領域に接続された第1導電型の第4の不純物領域と、
を具備し、
前記第1の不純物領域と前記第2の不純物領域の接合部がダイオードのPN接合部であり、
前記PN接合部が前記第1の角部から離れており、
前記半導体層はエピタキシャル層であり、
前記素子分離領域は第2の角部を有し、
前記第3の不純物領域は、前記素子分離領域の外側の前記第2の角部を覆うことを特徴とする半導体装置。 - 請求項1において、
前記PN接合部は前記第2の不純物領域の下部の内側に位置することを特徴とする半導体装置。 - 請求項1または2において、
前記第2の不純物領域は前記素子分離領域の下方に形成されており、
前記第1の不純物領域は前記素子分離領域の下方に形成されていないことを特徴とする半導体装置。 - 請求項1乃至3のいずれか一項において、
前記PN接合部は前記素子分離領域の下方に形成されていないことを特徴とする半導体装置。 - 請求項1乃至4のいずれか一項において、
前記PN接合部は前記素子分離領域によって囲まれていることを特徴とする半導体装置。 - 請求項1乃至5のいずれか一項において、
前記第2の不純物領域は、前記PN接合部を覆う第1の領域と、前記第1の領域上に位置する第2の領域を有し、前記第2の領域は前記第1の領域より不純物濃度が高く、
前記第3の不純物領域は、前記第4の不純物領域に接続された第3の領域と、前記第3の領域上に位置する第4の領域を有し、前記第4の領域は前記第3の領域より不純物濃度が高いことを特徴とする半導体装置。 - 請求項1乃至6のいずれか一項において、
前記素子分離領域の内周の平面形状は、四角形の角を落とした形状であることを特徴とする半導体装置。 - 請求項1乃至7のいずれか一項において、
前記素子分離領域は、LOCOS酸化膜またはトレンチ素子分離膜であることを特徴とする半導体装置。 - 請求項1乃至8のいずれか一項において、
前記第1導電型がN型であり、前記第2導電型がP型であることを特徴とする半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013229972A JP6221648B2 (ja) | 2013-11-06 | 2013-11-06 | 半導体装置 |
US14/533,647 US9190470B2 (en) | 2013-11-06 | 2014-11-05 | Semiconductor device which suppresses fluctuations in breakdown voltage |
CN201410638101.1A CN104638025B (zh) | 2013-11-06 | 2014-11-05 | 半导体装置 |
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JP2013229972A JP6221648B2 (ja) | 2013-11-06 | 2013-11-06 | 半導体装置 |
Publications (2)
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JP2015090913A JP2015090913A (ja) | 2015-05-11 |
JP6221648B2 true JP6221648B2 (ja) | 2017-11-01 |
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JP2013229972A Active JP6221648B2 (ja) | 2013-11-06 | 2013-11-06 | 半導体装置 |
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US (1) | US9190470B2 (ja) |
JP (1) | JP6221648B2 (ja) |
CN (1) | CN104638025B (ja) |
Families Citing this family (1)
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JP6679908B2 (ja) | 2015-12-11 | 2020-04-15 | セイコーエプソン株式会社 | 半導体装置及びその製造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS54112182A (en) * | 1978-02-22 | 1979-09-01 | Nec Corp | Semiconductor device |
JPH06334200A (ja) | 1993-05-24 | 1994-12-02 | Sony Corp | ツェナーダイオードおよびその製造方法 |
JPH0864843A (ja) | 1994-08-26 | 1996-03-08 | Rohm Co Ltd | ツェナーダイオードの製造方法 |
US7719054B2 (en) * | 2006-05-31 | 2010-05-18 | Advanced Analogic Technologies, Inc. | High-voltage lateral DMOS device |
JP2008034503A (ja) * | 2006-07-27 | 2008-02-14 | Seiko Epson Corp | 半導体保護素子及び半導体保護素子の製造方法 |
JP2009004501A (ja) | 2007-06-20 | 2009-01-08 | Rohm Co Ltd | 半導体装置 |
US8217419B2 (en) | 2007-06-15 | 2012-07-10 | Rohm Co., Ltd. | Semiconductor device |
JP4803211B2 (ja) * | 2008-05-27 | 2011-10-26 | トヨタ自動車株式会社 | 半導体装置 |
JP2010239016A (ja) * | 2009-03-31 | 2010-10-21 | Panasonic Corp | 半導体装置およびその製造方法 |
US8415765B2 (en) | 2009-03-31 | 2013-04-09 | Panasonic Corporation | Semiconductor device including a guard ring or an inverted region |
JP5467543B2 (ja) | 2009-03-31 | 2014-04-09 | パナソニック株式会社 | 半導体装置およびその製造方法 |
JP5558901B2 (ja) * | 2010-04-28 | 2014-07-23 | 株式会社東芝 | ダイオード及びその製造方法 |
CN102412307A (zh) * | 2010-09-26 | 2012-04-11 | 上海华虹Nec电子有限公司 | 垂直的齐纳二极管结构及其制备方法 |
JP2012124474A (ja) * | 2010-11-15 | 2012-06-28 | Denso Corp | 横型素子を有する半導体装置 |
JP5711646B2 (ja) * | 2010-11-16 | 2015-05-07 | 株式会社豊田中央研究所 | ダイオード |
JP2012182381A (ja) | 2011-03-02 | 2012-09-20 | Panasonic Corp | 半導体装置 |
US8772901B2 (en) * | 2011-11-11 | 2014-07-08 | Alpha And Omega Semiconductor Incorporated | Termination structure for gallium nitride schottky diode |
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- 2013-11-06 JP JP2013229972A patent/JP6221648B2/ja active Active
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2014
- 2014-11-05 US US14/533,647 patent/US9190470B2/en active Active
- 2014-11-05 CN CN201410638101.1A patent/CN104638025B/zh active Active
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US20150123237A1 (en) | 2015-05-07 |
US9190470B2 (en) | 2015-11-17 |
CN104638025A (zh) | 2015-05-20 |
JP2015090913A (ja) | 2015-05-11 |
CN104638025B (zh) | 2019-02-01 |
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