JP2013219139A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2013219139A JP2013219139A JP2012087492A JP2012087492A JP2013219139A JP 2013219139 A JP2013219139 A JP 2013219139A JP 2012087492 A JP2012087492 A JP 2012087492A JP 2012087492 A JP2012087492 A JP 2012087492A JP 2013219139 A JP2013219139 A JP 2013219139A
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Abstract
【解決手段】パワー半導体チップ101,102と、前記パワー半導体チップ101,102を搭載する回路配線パターン103Eを有する絶縁基板103と、前記パワー半導体チップ101,102の表面電極101E,102Aと前記絶縁基板103の回路配線パターン103Eとを電気的に接続するリード電極105と、を備え、前記パワー半導体チップ101,102の表面電極101E,102Aと接合されるリード電極105は、前記パワー半導体チップ101,102の面上で複数の薄板部105Bを有し、該複数の薄板部105Bが前記パワー半導体チップ101,102の表面電極101E,102Aに接合される。
【選択図】図1
Description
図1および図10を用いて第1実施形態に係る半導体装置について説明する。図1は、第1実施形態に係る半導体装置の構成を示す図であり、(a)はA−A線断面図であり、(b)は上面図である。図10は、リード電極105を取り付ける前の半導体装置の構成を説明する図であり、(a)はA−A線断面図であり、(b)は上面図である。
第1実施形態に係る半導体装置は、図1(a)に示すように、パワー半導体チップである絶縁ゲートバイポーラトランジスタ(以下「IGBT」(Insulated Gate Bipolar Transistor)と称する。)101と、同じくパワー半導体チップであるSiCショットキーダイオード(以下「SBD」(Schottky Barrier Diode)と称する。)102と、絶縁基板103と、放熱ベース104と、リード電極105と、を備え、パワー半導体チップ(IGBT101,SBD102)と絶縁基板103がパワー半導体チップ下はんだ106a,106bで接続され、絶縁基板103と放熱ベース104が絶縁基板下はんだ107で接続されているとともに、図1(b)に示すように、ゲートワイヤ108G,108Sと、を備えている。
IGBT101は、図10(a)に示すように、IGBT101の裏面側(絶縁基板103の側)にはコレクタ電極101Cが形成され、図10(b)に示すように、IGBT101の表面側(リード電極105の側)にはエミッタ電極101Eおよびゲート電極101Gが形成されている。
パワー半導体チップ(IGBT101,SBD102)を搭載する絶縁基板103は、図10(a)に示すように、絶縁層103Iと、絶縁層103Iの裏面側(放熱ベース104の側)に形成されたベタパターン103Bと、絶縁層103Iの表面側(パワー半導体チップの側)に形成された回路配線パターン(コレクタ配線パターン103C、エミッタ配線パターン103E、ゲート配線パターン103G、ゲート基準電位配線パターン103S)と、を有している。
ゲート基準電位配線パターン103Sは、図10(b)に示すように、ゲートワイヤ108SによりIGBT101のエミッタ電極101Eと電気的に接続されている。
ゲート配線パターン103Gおよびゲート基準電位配線パターン103Sは、外部接続用電極(図示せず)を介して外部のゲート駆動回路(図示せず)と接続されるようになっている。
放熱ベース104は、図10(a)に示すように、絶縁基板下はんだ107により絶縁層103Iのベタパターン103Bと接続されている。放熱ベース104は、パワー半導体チップ(IGBT101,SBD102)から発せられた熱を効率よく外部の冷却器(図示せず)に伝える役目をしている。材料としては、Al(アルミニウム)、Cu(銅)、Al(アルミニウム)とSiC(炭化ケイ素)の合金などが用いられる。
リード電極105は、図1(a)および図1(b)に示すように、IGBT101のエミッタ電極101Eと、SBD102のアノード電極102Aと、絶縁基板103のエミッタ配線パターン103Eとを、電気的に接続する。
また、リード電極105と絶縁基板103のコレクタ配線パターン103Cとの接続においても、リード電極105の薄板部105Bと絶縁基板103のコレクタ配線パターン103Cとが超音波接合されている。
例えば特許文献1のように、平板状の薄板リード電極をパワー半導体チップの表面電極と全面的にはんだで接合すると、パワー半導体チップとリード電極の熱膨張係数に差があるため、温度変化により大きな剪断応力がかかり、温度の上昇/降下を繰り返すことによって、接合部が劣化するおそれがある。特に、パワー半導体チップがスイッチング素子として機能するIGBT101においては、導通/遮断の繰り返しが多くなるため、温度の上昇/降下を繰り返しも多くなり、大電流化することにより温度変化も大きくなるため半導体装置の寿命が短くなるおそれがあった。
また、小面積の薄板部105Bの一辺の長さは、0.5mm以上2.0mm以下とし、パワー半導体チップの表面電極上に均等に配置するのが好ましい。
次に、第1実施形態に係る半導体装置の製造工程について説明する。
図3を用いて第2実施形態に係る半導体装置について説明する。図3は、第2実施形態に係る半導体装置の構成を示す図であり、(a)はA−A線断面図であり、(b)は上面図である。
また、パワー半導体チップの表面電極(IGBT101のエミッタ電極101E、SBD102のアノード電極102A)とリード電極105の厚板部105Aとの空間距離は0.5mm以上3.0mm以下であることが好ましい。
また、小面積の薄板部105Bの一辺の長さは、0.5mm以上2.0mm以下とし、パワー半導体チップの表面電極上に均等に配置するのが好ましい。
図5を用いて第3実施形態に係る半導体装置について説明する。図5は、第3実施形態に係る半導体装置の構成を示す図であり、(a)はA−A線断面図であり、(b)は上面図である。
低硬度な第1の電極材料としては、例えばAl(アルミニウム)やNi(ニッケル)が好適である。また、第2の電極材料としては、例えばCu(銅)が好適である。
低熱膨張係数の第1の電極材料としては、例えばCu(銅)と炭素繊維の複合材料が好適である。また、第2の電極材料としては、例えばCu(銅)が好適である。
図6を用いて第4実施形態に係る半導体装置について説明する。図6は、第4実施形態に係る半導体装置の構成を示す図であり、(a)はA−A線断面図であり、(b)は上面図である。
図7を用いて第5実施形態に係る半導体装置について説明する。図7は、第5実施形態に係る半導体装置の構成を示す図であり、(a)はA−A線断面図であり、(b)は上面図である。
これに対し、第5実施形態に係る半導体装置では、リード電極105とパワー半導体チップの表面電極の塑性流動よりも、ペースト状のリード電極接合材109の焼結を促す摩擦熱を発生させることを主目的とした超音波接合ツールUTの接合条件とできるので、比較的弱い加圧でよく、パワー半導体チップの表面電極に与えるダメージを抑制することができる。
図8を用いて第6実施形態に係る半導体装置について説明する。図8は、第6実施形態に係る半導体装置の構成を示す図であり、(a)はA−A線断面図であり、(b)は上面図である。
図8(a)および図8(b)に示すように、パワー半導体チップの表面電極(IGBT101のエミッタ電極101E、SBD102のアノード電極102A)と平行な広幅面が形成されている。また、外部接続用エミッタ電極110も、図8(a)および図8(b)に示すように、パワー半導体チップの表面電極と平行な広幅面が形成されている。また、外部接続用コレクタ電極111も、図8(a)および図8(b)に示すように、パワー半導体チップの表面電極と平行な広幅面が形成されている。
また、電極や配線に発生する寄生インダクタンスは、電極や配線の幅が広いほど低くすることができ、また互いの磁界を打ち消すため逆向きの電流経路を持つ導体同士を近接させるほど低くすることができる。
リード電極105の厚板部105Aの広幅面と外部接続用エミッタ電極110の広幅面との間隔は、小さくするほどよく、好ましくは3mm以下とするのがよい。なお、リード電極105の厚板部105Aと外部接続用エミッタ電極110とは略同電位であるため、仮に接していてもよい。
このように、外部接続用エミッタ電極110の広幅面と外部接続用コレクタ電極111の広幅面を近接配置すると共に、広幅面での電流の向きが互いに逆方向とすることによって、寄生インダクタンスL110,L111を低減することができる。
なお、本実施形態(第1実施形態〜第6実施形態)に係る半導体装置は、上記実施形態の構成に限定されるものではなく、発明の趣旨を逸脱しない範囲内で種々の変更が可能である。
101C コレクタ電極
101E エミッタ電極(表面電極)
101G ゲート電極
102 SBD(パワー半導体チップ)
102A アノード電極(表面電極)
102K カソード電極
103 絶縁基板
103I 絶縁層
103B ベタパターン
103C コレクタ配線パターン(回路配線パターン)
103E エミッタ配線パターン(回路配線パターン)
103G ゲート配線パターン(回路配線パターン)
103S ゲート基準電位配線パターン(回路配線パターン)
104 放熱ベース
105 リード電極
105A 厚板部
105B 薄板部
109 リード電極接合材(焼結層)
110 外部接続用エミッタ電極(外部接続用電極)
111 外部接続用コレクタ電極
PF 塑性流動接合部
UT 超音波接合ツール
Claims (14)
- パワー半導体チップと、
前記パワー半導体チップを搭載する回路配線パターンを有する絶縁基板と、
前記パワー半導体チップの表面電極と前記絶縁基板の回路配線パターンとを電気的に接続するリード電極と、を備え、
前記パワー半導体チップの表面電極と接合されるリード電極は、前記パワー半導体チップの面上で複数の薄板部を有し、
該複数の薄板部が前記パワー半導体チップの表面電極に接合される
ことを特徴とする半導体装置。 - 前記パワー半導体チップの表面電極と接合される前記リード電極が、前記パワー半導体チップ面上で厚板部を有し、
該厚板部は、前記パワー半導体チップの表面電極と空間を介して対向している
ことを特徴とする請求項1に記載の半導体装置。 - 外部機器と電気的に接続される外部接続用電極を更に備え、
前記リード電極の厚板部と、前記リード電極と前記絶縁基板の回路配線パターンを介して接続される外部接続用電極は、前記パワー半導体チップの表面電極と並行な広幅面をそれぞれ有し、
前記リード電極の厚板部の広幅面と、前記外部接続用電極の広幅面とは、3mm以下の間隔を設けて近接配置されており、
前記リード電極の厚板部の広幅面を流れる電流の向きと、前記外部接続用電極の広幅面を流れる電流の向きとは、互いに逆方向である
ことを特徴とする請求項2に記載の半導体装置。 - 前記パワー半導体チップの表面電極と、前記リード電極の薄板部とは、超音波接合によって接合される
ことを特徴とする請求項1乃至請求項3のいずれか1項に記載の半導体装置。 - 前記リード電極の薄板部は、第1の電極材料により形成され、
前記リード電極の厚板部は、第1の電極材料と第2の電極材料の積層により形成される
ことを特徴とする請求項4に記載の半導体装置。 - 前記パワー半導体チップの表面電極と、前記リード電極の薄板部とは、Agの焼結層またはCuの焼結層を介して接合される
ことを特徴とする請求項4に記載の半導体装置。 - 前記パワー半導体チップの表面電極と、前記リード電極の薄板部とは、はんだを介して接合される
ことを特徴とする請求項2に記載の半導体装置。 - 前記リード電極の薄板部の厚さは、0.1mm以上0.5mm以下であり、
前記リード電極の厚板部の厚さは、0.8mm以上3.0mm以下である
ことを特徴とする請求項1に記載の半導体装置。 - 前記リード電極の薄板部の厚さは、0.1mm以上0.5mm以下であり、
前記リード電極の厚板部の厚さは、0.8mm以上3.0mm以下であり、
前記パワー半導体チップの表面電極と前記リード電極の厚板部との空間距離は0.5mm以上3.0mm以下である
ことを特徴とする請求項2に記載の半導体装置。 - 前記第1の電極材料はAlであり、前記第2の電極材料はCuである
ことを特徴とする請求項5に記載の半導体装置。 - 前記第1の電極材料はNiであり、前記第2の電極材料はCuである
ことを特徴とする請求項5に記載の半導体装置。 - 前記第1の電極材料はCuと炭素繊維の複合材料であり、前記第2の電極材料はCuである
ことを特徴とする請求項5に記載の半導体装置。 - 前記リード電極はAlである
ことを特徴とする請求項1に記載の半導体装置。 - 前記リード電極はCuである
ことを特徴とする請求項1に記載の半導体装置。
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