JP2013178548A - カラーフィルター用レジスト組成物及びその製造方法、並びにそれを用いたカラーフィルター - Google Patents

カラーフィルター用レジスト組成物及びその製造方法、並びにそれを用いたカラーフィルター Download PDF

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Publication number
JP2013178548A
JP2013178548A JP2013089316A JP2013089316A JP2013178548A JP 2013178548 A JP2013178548 A JP 2013178548A JP 2013089316 A JP2013089316 A JP 2013089316A JP 2013089316 A JP2013089316 A JP 2013089316A JP 2013178548 A JP2013178548 A JP 2013178548A
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JP
Japan
Prior art keywords
component
acid
color filter
resist composition
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013089316A
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English (en)
Japanese (ja)
Inventor
Ichihiro Kobayashi
一大 小林
Yuki Nagoya
友樹 名児耶
Masanori Kono
正範 河野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Steel and Sumikin Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel and Sumikin Chemical Co Ltd filed Critical Nippon Steel and Sumikin Chemical Co Ltd
Priority to JP2013089316A priority Critical patent/JP2013178548A/ja
Publication of JP2013178548A publication Critical patent/JP2013178548A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
JP2013089316A 2006-06-01 2013-04-22 カラーフィルター用レジスト組成物及びその製造方法、並びにそれを用いたカラーフィルター Pending JP2013178548A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013089316A JP2013178548A (ja) 2006-06-01 2013-04-22 カラーフィルター用レジスト組成物及びその製造方法、並びにそれを用いたカラーフィルター

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006153122 2006-06-01
JP2006153122 2006-06-01
JP2013089316A JP2013178548A (ja) 2006-06-01 2013-04-22 カラーフィルター用レジスト組成物及びその製造方法、並びにそれを用いたカラーフィルター

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2007140149A Division JP5255783B2 (ja) 2006-06-01 2007-05-28 カラーフィルター用レジスト組成物及びその製造方法並びにそれを用いたカラーフィルター

Publications (1)

Publication Number Publication Date
JP2013178548A true JP2013178548A (ja) 2013-09-09

Family

ID=39142030

Family Applications (1)

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JP2013089316A Pending JP2013178548A (ja) 2006-06-01 2013-04-22 カラーフィルター用レジスト組成物及びその製造方法、並びにそれを用いたカラーフィルター

Country Status (3)

Country Link
JP (1) JP2013178548A (ko)
KR (1) KR101472429B1 (ko)
TW (1) TWI416174B (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100047648A (ko) 2008-10-29 2010-05-10 제일모직주식회사 안료 분산액 조성물, 이를 포함하는 컬러필터용 레지스트 조성물, 및 이를 이용하여 제조되는 컬러필터
TWI621668B (zh) * 2012-02-29 2018-04-21 大同化成工業股份有限公司 黑色矩陣用碳黑分散體
TWI585527B (zh) * 2012-02-29 2017-06-01 新日鐵住金化學股份有限公司 A photosensitive composition for black matrix and a method for producing the same
JP6139894B2 (ja) * 2013-01-28 2017-05-31 新日鉄住金化学株式会社 タッチパネル用黒色感光性組成物及びタッチパネル
JP6455007B2 (ja) * 2013-08-29 2019-01-23 日鉄ケミカル＆マテリアル株式会社 ゲート絶縁膜、有機薄膜トランジスタ、及び有機薄膜トランジスタの製造方法
JP6357485B2 (ja) * 2013-11-28 2018-07-11 日本化薬株式会社 活性エネルギー線硬化型樹脂組成物、及びそれを用いた表示素子用スペーサー及び／またはカラーフィルター保護膜
JP6708367B2 (ja) * 2014-03-31 2020-06-10 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物、これを硬化した遮光膜及びカラーフィルター
JP6463018B2 (ja) * 2014-07-11 2019-01-30 日鉄ケミカル＆マテリアル株式会社 カラーフィルター用感光性樹脂組成物の製造方法及びカラーフィルター用感光性樹脂組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09133806A (ja) * 1995-11-08 1997-05-20 Dainippon Printing Co Ltd 感光性黒色樹脂組成物及びカラーフイルター
JP2000019728A (ja) * 1998-06-26 2000-01-21 Nippon Steel Chem Co Ltd 優れたパターン形成可能な画像形成用材料
JP2006003860A (ja) * 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002022925A (ja) * 2000-07-11 2002-01-23 Nippon Steel Chem Co Ltd カラーフィルターの製造方法及び着色感光性樹脂組成物
JP4092376B2 (ja) * 2001-11-22 2008-05-28 富士フイルム株式会社 感光性着色樹脂組成物並びにその製造方法及びカラーフィルターの製造方法
WO2003050620A1 (fr) * 2001-12-13 2003-06-19 Fuji Photo Film Co., Ltd. Materiau de formation d'image
JP4437651B2 (ja) * 2003-08-28 2010-03-24 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
TW200530281A (en) * 2003-11-26 2005-09-16 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
TWI349677B (en) * 2004-03-30 2011-10-01 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09133806A (ja) * 1995-11-08 1997-05-20 Dainippon Printing Co Ltd 感光性黒色樹脂組成物及びカラーフイルター
JP2000019728A (ja) * 1998-06-26 2000-01-21 Nippon Steel Chem Co Ltd 優れたパターン形成可能な画像形成用材料
JP2006003860A (ja) * 2003-11-26 2006-01-05 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びそれを用いたカラーフィルター

Also Published As

Publication number Publication date
TWI416174B (zh) 2013-11-21
TW200804875A (en) 2008-01-16
KR20070115762A (ko) 2007-12-06
KR101472429B1 (ko) 2014-12-24

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