JP2013157547A5 - - Google Patents

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Publication number
JP2013157547A5
JP2013157547A5 JP2012018634A JP2012018634A JP2013157547A5 JP 2013157547 A5 JP2013157547 A5 JP 2013157547A5 JP 2012018634 A JP2012018634 A JP 2012018634A JP 2012018634 A JP2012018634 A JP 2012018634A JP 2013157547 A5 JP2013157547 A5 JP 2013157547A5
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JP
Japan
Prior art keywords
cut
interval
drawing method
patterns
sets
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JP2012018634A
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English (en)
Japanese (ja)
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JP6087506B2 (ja
JP2013157547A (ja
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Priority claimed from JP2012018634A external-priority patent/JP6087506B2/ja
Priority to JP2012018634A priority Critical patent/JP6087506B2/ja
Priority to TW101150553A priority patent/TWI483290B/zh
Priority to KR1020130007497A priority patent/KR101597869B1/ko
Priority to US13/749,853 priority patent/US9690201B2/en
Priority to CN201310031183.9A priority patent/CN103226292B/zh
Publication of JP2013157547A publication Critical patent/JP2013157547A/ja
Publication of JP2013157547A5 publication Critical patent/JP2013157547A5/ja
Publication of JP6087506B2 publication Critical patent/JP6087506B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2012018634A 2012-01-31 2012-01-31 描画方法及び物品の製造方法 Expired - Fee Related JP6087506B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012018634A JP6087506B2 (ja) 2012-01-31 2012-01-31 描画方法及び物品の製造方法
TW101150553A TWI483290B (zh) 2012-01-31 2012-12-27 描畫方法和製造物品的方法
KR1020130007497A KR101597869B1 (ko) 2012-01-31 2013-01-23 묘화 방법 및 물품의 제조 방법
US13/749,853 US9690201B2 (en) 2012-01-31 2013-01-25 Drawing method and method of manufacturing article
CN201310031183.9A CN103226292B (zh) 2012-01-31 2013-01-28 描画方法和制造物品的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012018634A JP6087506B2 (ja) 2012-01-31 2012-01-31 描画方法及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2013157547A JP2013157547A (ja) 2013-08-15
JP2013157547A5 true JP2013157547A5 (enExample) 2015-03-12
JP6087506B2 JP6087506B2 (ja) 2017-03-01

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Family Applications (1)

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JP2012018634A Expired - Fee Related JP6087506B2 (ja) 2012-01-31 2012-01-31 描画方法及び物品の製造方法

Country Status (5)

Country Link
US (1) US9690201B2 (enExample)
JP (1) JP6087506B2 (enExample)
KR (1) KR101597869B1 (enExample)
CN (1) CN103226292B (enExample)
TW (1) TWI483290B (enExample)

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US11246951B2 (en) 2005-01-31 2022-02-15 S. Edward Neister Method and apparatus for sterilizing and disinfecting air and surfaces and protecting a zone from external microbial contamination
US9501601B2 (en) * 2013-03-14 2016-11-22 Taiwan Semiconductor Manufacturing Company, Ltd. Layout optimization of a main pattern and a cut pattern
JP6215061B2 (ja) * 2014-01-14 2017-10-18 株式会社アドバンテスト 電子ビーム露光装置
JP6211435B2 (ja) * 2014-02-26 2017-10-11 株式会社アドバンテスト 半導体装置の製造方法
US9318564B2 (en) 2014-05-19 2016-04-19 Qualcomm Incorporated High density static random access memory array having advanced metal patterning
CN106415775B (zh) 2014-06-13 2019-06-04 英特尔公司 电子束交错的束孔阵列
JP6462720B2 (ja) * 2014-06-13 2019-01-30 インテル・コーポレーション 電子ビームの３ビームアパーチャアレイ
JP6677368B2 (ja) * 2014-06-13 2020-04-08 インテル・コーポレーション 電子ビームのユニバーサルカッタ
CN106463354B (zh) * 2014-06-25 2019-12-20 英特尔公司 用于形成功能单元的紧凑阵列的技术
WO2016028334A1 (en) 2014-08-19 2016-02-25 Intel Corporation Cross scan proximity correction with ebeam universal cutter
JP2016122676A (ja) 2014-12-24 2016-07-07 株式会社アドバンテスト 露光装置および露光方法
JP2016207925A (ja) 2015-04-27 2016-12-08 株式会社アドバンテスト 素子、製造方法、および露光装置
JP2016207926A (ja) 2015-04-27 2016-12-08 株式会社アドバンテスト 露光装置および露光方法
JP2017063101A (ja) 2015-09-24 2017-03-30 株式会社アドバンテスト 露光装置および露光方法
US9818623B2 (en) 2016-03-22 2017-11-14 Globalfoundries Inc. Method of forming a pattern for interconnection lines and associated continuity blocks in an integrated circuit
JP2018041790A (ja) 2016-09-06 2018-03-15 株式会社アドバンテスト 露光装置および露光データ構造
US9786545B1 (en) 2016-09-21 2017-10-10 Globalfoundries Inc. Method of forming ANA regions in an integrated circuit
US9818641B1 (en) 2016-09-21 2017-11-14 Globalfoundries Inc. Apparatus and method of forming self-aligned cuts in mandrel and a non-mandrel lines of an array of metal lines
US9818640B1 (en) 2016-09-21 2017-11-14 Globalfoundries Inc. Apparatus and method of forming self-aligned cuts in a non-mandrel line of an array of metal lines
US9852986B1 (en) 2016-11-28 2017-12-26 Globalfoundries Inc. Method of patterning pillars to form variable continuity cuts in interconnection lines of an integrated circuit
US10002786B1 (en) 2016-12-15 2018-06-19 Globalfoundries Inc. Interconnection cells having variable width metal lines and fully-self aligned variable length continuity cuts
US10043703B2 (en) 2016-12-15 2018-08-07 Globalfoundries Inc. Apparatus and method for forming interconnection lines having variable pitch and variable widths
US9812351B1 (en) 2016-12-15 2017-11-07 Globalfoundries Inc. Interconnection cells having variable width metal lines and fully-self aligned continuity cuts
US9887127B1 (en) 2016-12-15 2018-02-06 Globalfoundries Inc. Interconnection lines having variable widths and partially self-aligned continuity cuts
JP7474151B2 (ja) * 2020-08-21 2024-04-24 株式会社ニューフレアテクノロジー マルチ電子ビーム描画装置及びマルチ電子ビーム描画方法
JP7455720B2 (ja) * 2020-09-29 2024-03-26 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム照射装置およびマルチ荷電粒子ビーム照射方法
JP7492929B2 (ja) * 2021-02-19 2024-05-30 株式会社東芝 半導体装置、荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム照射装置

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JP5988537B2 (ja) * 2010-06-10 2016-09-07 株式会社ニコン 荷電粒子線露光装置及びデバイス製造方法
JP2012023316A (ja) * 2010-07-16 2012-02-02 Canon Inc 荷電粒子線描画装置および物品の製造方法
JP2012033923A (ja) * 2010-07-29 2012-02-16 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP5744564B2 (ja) * 2011-02-25 2015-07-08 キヤノン株式会社 描画装置、描画方法、および、物品の製造方法
JP6215061B2 (ja) * 2014-01-14 2017-10-18 株式会社アドバンテスト 電子ビーム露光装置
JP6211435B2 (ja) * 2014-02-26 2017-10-11 株式会社アドバンテスト 半導体装置の製造方法

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