JP2013124413A - 成膜装置及び膜付ガラスフィルムの製造方法 - Google Patents
成膜装置及び膜付ガラスフィルムの製造方法 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
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- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
【解決手段】成膜装置1は、加熱ロール20と、膜形成部30とを備えている。加熱ロール20の表面上には、ガラスフィルム10が供給される。加熱ロール20は、ガラスフィルム10を加熱する。膜形成部30は、ガラスフィルム10の上に膜を形成する。加熱ロール20は、筒状体21と、ヒーター22とを有する。筒状体21は、ガラスまたはセラミックスからなる。筒状体21は、回転可能に設けられている。ヒーター22は、筒状体21の内部に配されている。ヒーター22は、筒状体21を加熱する。
【選択図】図1
Description
10…ガラスフィルム
10a…表面
11…膜
12…膜付ガラスフィルム
20…加熱ロール
21…筒状体
21a…内周面
21b…外周面
22…ヒーター
23…芯体
24…吸収層
25a、25b…回転ロール
30…膜形成部
40…ガラスフィルム供給ロール
41…巻き取りロール
42…シート供給ロール
43…シート巻き取りロール
44…緩衝フィルム
Claims (11)
- 表面上にガラスフィルムが供給され、前記ガラスフィルムを加熱する加熱ロールと、
前記ガラスフィルムの上に膜を形成する膜形成部と、
を備え、
前記加熱ロールは、
ガラスまたはセラミックスからなり、回転可能に設けられた筒状体と、
前記筒状体の内部に配されており、前記筒状体を加熱するヒーターと、
を有する、成膜装置。 - 前記筒状体は、石英ガラス、結晶化ガラス、アルミナ、シリカ、窒化珪素及び炭化ケイ素からなる群から選ばれた少なくとも一種からなる、請求項1に記載の成膜装置。
- 前記筒状体と前記ガラスフィルムとの間に前記ガラスフィルム側の表層の硬度が前記ガラスフィルムの硬度よりも低いシートを供給する供給部をさらに備える、請求項1または2に記載の成膜装置。
- 前記シートは、金属からなる、請求項3に記載の成膜装置。
- 前記シートの熱膨張係数は、前記ガラスフィルムの熱膨張係数の1倍〜10倍である、請求項1〜4のいずれか一項に記載の成膜装置。
- 前記ヒーターは、前記筒状体の前記ガラスフィルムと接する部分を加熱する、請求項1〜5のいずれか一項に記載の成膜装置。
- 前記ヒーターは、前記筒状体に向けて熱線を照射する、請求項1〜6のいずれか一項に記載の成膜装置。
- 前記筒状体の内周面の上に配されており、前記ヒーターから照射される熱線を吸収する吸収層をさらに備える、請求項7に記載の成膜装置。
- 前記膜形成部は、前記ガラスフィルム上において熱反応し、膜を構成する反応ガスを供給する反応ガス供給部、またはスパッタ粒子を前記ガラスフィルム上に堆積させるスパッタ部により構成されている、請求項1〜8のいずれか一項に記載の成膜装置。
- 請求項1〜9のいずれか一項に記載の成膜装置を用いてガラスフィルム上に膜を形成する、膜付ガラスフィルムの製造方法。
- 熱CVD法またはスパッタリング法により前記膜を形成する、請求項10に記載の膜付ガラスフィルムの製造方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
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JP2011275510A JP5987312B2 (ja) | 2011-12-16 | 2011-12-16 | 成膜装置及び膜付ガラスフィルムの製造方法 |
KR1020147010381A KR102022131B1 (ko) | 2011-12-16 | 2012-12-05 | 성막 장치 및 막 형성 유리 필름의 제조 방법 |
PCT/JP2012/081460 WO2013088998A1 (ja) | 2011-12-16 | 2012-12-05 | 成膜装置及び膜付ガラスフィルムの製造方法 |
US14/364,305 US9463998B2 (en) | 2011-12-16 | 2012-12-05 | Manufacturing method for glass with film |
EP12857902.6A EP2792767B1 (en) | 2011-12-16 | 2012-12-05 | Film forming device and manufacturing method for glass with film |
CN201280049855.2A CN103857824B (zh) | 2011-12-16 | 2012-12-05 | 成膜装置和附带膜的玻璃膜的制造方法 |
TW101146724A TWI554482B (zh) | 2011-12-16 | 2012-12-11 | Film forming apparatus and manufacturing method of glass film with film |
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JP2011275510A JP5987312B2 (ja) | 2011-12-16 | 2011-12-16 | 成膜装置及び膜付ガラスフィルムの製造方法 |
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JP2013124413A true JP2013124413A (ja) | 2013-06-24 |
JP5987312B2 JP5987312B2 (ja) | 2016-09-07 |
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US (1) | US9463998B2 (ja) |
EP (1) | EP2792767B1 (ja) |
JP (1) | JP5987312B2 (ja) |
KR (1) | KR102022131B1 (ja) |
CN (1) | CN103857824B (ja) |
TW (1) | TWI554482B (ja) |
WO (1) | WO2013088998A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2016041841A (ja) * | 2014-08-18 | 2016-03-31 | 住友金属鉱山株式会社 | 加熱ロールおよびそれを備えた成膜装置 |
JP2017119613A (ja) * | 2015-12-25 | 2017-07-06 | 日本電気硝子株式会社 | ガラスリボン成膜装置及びガラスリボン成膜方法 |
WO2020250646A1 (ja) * | 2019-06-11 | 2020-12-17 | 日本電気硝子株式会社 | ガラスロールの製造方法 |
Families Citing this family (3)
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JP6546872B2 (ja) * | 2016-04-07 | 2019-07-17 | 株式会社Kokusai Electric | 半導体装置の製造方法、基板処理装置、およびプログラム |
JP6900767B2 (ja) * | 2017-04-28 | 2021-07-07 | 日本電気硝子株式会社 | ガラスロールの製造方法 |
JP7305467B2 (ja) * | 2019-07-04 | 2023-07-10 | 旭化成株式会社 | ロール状長尺ガラスクロス、プリプレグ、及びプリント配線板 |
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CN103857824A (zh) | 2014-06-11 |
TW201341331A (zh) | 2013-10-16 |
KR20140105713A (ko) | 2014-09-02 |
CN103857824B (zh) | 2015-11-25 |
EP2792767A1 (en) | 2014-10-22 |
JP5987312B2 (ja) | 2016-09-07 |
US9463998B2 (en) | 2016-10-11 |
WO2013088998A1 (ja) | 2013-06-20 |
KR102022131B1 (ko) | 2019-09-17 |
EP2792767B1 (en) | 2016-05-18 |
TWI554482B (zh) | 2016-10-21 |
US20140377461A1 (en) | 2014-12-25 |
EP2792767A4 (en) | 2015-05-27 |
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