JP2013123052A5 - - Google Patents
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- Publication number
- JP2013123052A5 JP2013123052A5 JP2012266296A JP2012266296A JP2013123052A5 JP 2013123052 A5 JP2013123052 A5 JP 2013123052A5 JP 2012266296 A JP2012266296 A JP 2012266296A JP 2012266296 A JP2012266296 A JP 2012266296A JP 2013123052 A5 JP2013123052 A5 JP 2013123052A5
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- JP
- Japan
- Prior art keywords
- film
- gan
- stacked
- layer
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 15
- 229910052710 silicon Inorganic materials 0.000 claims 15
- 239000010703 silicon Substances 0.000 claims 15
- 238000000034 method Methods 0.000 claims 14
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 12
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims 11
- 239000000758 substrate Substances 0.000 claims 8
- 239000011800 void material Substances 0.000 claims 8
- 239000013078 crystal Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 229910017121 AlSiO Inorganic materials 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/316,305 | 2011-12-09 | ||
| US13/316,305 US8507947B2 (en) | 2011-12-09 | 2011-12-09 | High quality GaN high-voltage HFETS on silicon |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013123052A JP2013123052A (ja) | 2013-06-20 |
| JP2013123052A5 true JP2013123052A5 (https=) | 2016-01-28 |
| JP6141627B2 JP6141627B2 (ja) | 2017-06-07 |
Family
ID=47263114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012266296A Active JP6141627B2 (ja) | 2011-12-09 | 2012-12-05 | シリコン基板上にＧａＮ層を形成する方法およびＧａＮ基板 |
Country Status (5)
| Country | Link |
|---|---|
| US (4) | US8507947B2 (https=) |
| EP (1) | EP2602812B1 (https=) |
| JP (1) | JP6141627B2 (https=) |
| CN (2) | CN103165444B (https=) |
| TW (2) | TWI569444B (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8507947B2 (en) * | 2011-12-09 | 2013-08-13 | Power Integrations, Inc. | High quality GaN high-voltage HFETS on silicon |
| US9478708B2 (en) | 2015-03-11 | 2016-10-25 | International Business Machines Corporation | Embedded gallium—nitride in silicon |
| US10818611B2 (en) | 2015-07-01 | 2020-10-27 | Ii-Vi Delaware, Inc. | Stress relief in semiconductor wafers |
| US20170148747A1 (en) * | 2015-07-01 | 2017-05-25 | Ii-Vi Optoelectronic Devices, Inc. | Stress relief in semiconductor wafers |
| CN105591004B (zh) | 2016-03-29 | 2020-07-10 | 苏州晶湛半导体有限公司 | 基于图形化Si衬底的LED外延片及其制备方法 |
| US9917156B1 (en) | 2016-09-02 | 2018-03-13 | IQE, plc | Nucleation layer for growth of III-nitride structures |
| KR102680861B1 (ko) * | 2016-12-15 | 2024-07-03 | 삼성전자주식회사 | 질화 갈륨 기판의 제조 방법 |
| US20220139709A1 (en) * | 2020-11-05 | 2022-05-05 | International Business Machines Corporation | Confined gallium nitride epitaxial layers |
| DE102022003646A1 (de) * | 2022-09-30 | 2024-04-04 | Azur Space Solar Power Gmbh | Halbleiterscheibe zur Ausbildung von GaN-Halbleiterbauelementen |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000164510A (ja) * | 1998-11-26 | 2000-06-16 | Sony Corp | 窒化物系ｉｉｉ−ｖ族化合物半導体基板およびその製造方法ならびに半導体装置およびその製造方法 |
| WO2001069663A1 (fr) * | 2000-03-14 | 2001-09-20 | Toyoda Gosei Co., Ltd. | Procede de production de semiconducteur a base de compose de nitrure iii et element en semiconducteur a base de compose de nitrure iii |
| US20030012984A1 (en) * | 2001-07-11 | 2003-01-16 | Tetsuzo Ueda | Buffer layer and growth method for subsequent epitaxial growth of III-V nitride semiconductors |
| JP3785970B2 (ja) * | 2001-09-03 | 2006-06-14 | 日本電気株式会社 | Ｉｉｉ族窒化物半導体素子の製造方法 |
| JP2003224071A (ja) * | 2002-01-29 | 2003-08-08 | Matsushita Electric Ind Co Ltd | 窒化物系半導体の製造方法及びそれを用いた窒化物半導体素子 |
| JP2004051446A (ja) * | 2002-07-22 | 2004-02-19 | Asahi Kasei Corp | 酸化物単結晶薄膜形成方法および半導体薄膜形成方法 |
| US6818061B2 (en) | 2003-04-10 | 2004-11-16 | Honeywell International, Inc. | Method for growing single crystal GaN on silicon |
| US7547925B2 (en) | 2005-11-14 | 2009-06-16 | Palo Alto Research Center Incorporated | Superlattice strain relief layer for semiconductor devices |
| US7413982B2 (en) * | 2006-03-29 | 2008-08-19 | Eastman Kodak Company | Process for atomic layer deposition |
| RU2326993C2 (ru) * | 2006-07-25 | 2008-06-20 | Самсунг Электро-Меканикс Ко., Лтд. | Способ выращивания монокристалла нитрида на кремниевой пластине, нитридный полупроводниковый светоизлучающий диод, изготовленный с его использованием, и способ такого изготовления |
| JP2008053554A (ja) * | 2006-08-25 | 2008-03-06 | Osaka Univ | 電子デバイスとその製造方法 |
| JP5401758B2 (ja) * | 2006-12-12 | 2014-01-29 | サンケン電気株式会社 | 半導体装置及びその製造方法 |
| KR20090107882A (ko) * | 2008-04-10 | 2009-10-14 | 삼성전자주식회사 | 고정층을 포함하는 경사 조성 봉지 박막 및 그의 제조방법 |
| WO2010061617A1 (ja) * | 2008-11-28 | 2010-06-03 | 国立大学法人山口大学 | 半導体発光素子及びその製造方法 |
| EP2498293B1 (en) * | 2009-11-06 | 2018-08-01 | NGK Insulators, Ltd. | Epitaxial substrate for semiconductor element and method for producing epitaxial substrate for semiconductor element |
| JP2011198837A (ja) * | 2010-03-17 | 2011-10-06 | Renesas Electronics Corp | 半導体装置およびその製造方法 |
| US8507947B2 (en) * | 2011-12-09 | 2013-08-13 | Power Integrations, Inc. | High quality GaN high-voltage HFETS on silicon |
-
2011
- 2011-12-09 US US13/316,305 patent/US8507947B2/en active Active
-
2012
- 2012-11-20 EP EP12193443.4A patent/EP2602812B1/en active Active
- 2012-12-05 JP JP2012266296A patent/JP6141627B2/ja active Active
- 2012-12-06 CN CN201210520205.3A patent/CN103165444B/zh active Active
- 2012-12-06 CN CN201610751506.5A patent/CN106206258B/zh active Active
- 2012-12-07 TW TW104106155A patent/TWI569444B/zh active
- 2012-12-07 TW TW101145982A patent/TWI481027B/zh active
-
2013
- 2013-07-17 US US13/944,620 patent/US8703561B2/en active Active
-
2014
- 2014-04-18 US US14/256,790 patent/US9147734B2/en active Active
-
2015
- 2015-08-24 US US14/834,192 patent/US9437688B2/en active Active
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