JP2013084935A5 - - Google Patents

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Publication number
JP2013084935A5
JP2013084935A5 JP2012207606A JP2012207606A JP2013084935A5 JP 2013084935 A5 JP2013084935 A5 JP 2013084935A5 JP 2012207606 A JP2012207606 A JP 2012207606A JP 2012207606 A JP2012207606 A JP 2012207606A JP 2013084935 A5 JP2013084935 A5 JP 2013084935A5
Authority
JP
Japan
Prior art keywords
electrode elements
main surface
protrusions
electrostatic chuck
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012207606A
Other languages
English (en)
Japanese (ja)
Other versions
JP5505667B2 (ja
JP2013084935A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2012207606A external-priority patent/JP5505667B2/ja
Priority to JP2012207606A priority Critical patent/JP5505667B2/ja
Priority to TW101135221A priority patent/TW201316448A/zh
Priority to US14/344,736 priority patent/US9093488B2/en
Priority to KR1020147006021A priority patent/KR101429593B1/ko
Priority to CN201280046775.1A priority patent/CN103890927A/zh
Priority to PCT/JP2012/074866 priority patent/WO2013047647A1/ja
Publication of JP2013084935A publication Critical patent/JP2013084935A/ja
Publication of JP2013084935A5 publication Critical patent/JP2013084935A5/ja
Publication of JP5505667B2 publication Critical patent/JP5505667B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012207606A 2011-09-30 2012-09-20 交流駆動静電チャック Expired - Fee Related JP5505667B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012207606A JP5505667B2 (ja) 2011-09-30 2012-09-20 交流駆動静電チャック
TW101135221A TW201316448A (zh) 2011-09-30 2012-09-26 交流驅動靜電吸盤
CN201280046775.1A CN103890927A (zh) 2011-09-30 2012-09-27 交流驱动静电吸盘
KR1020147006021A KR101429593B1 (ko) 2011-09-30 2012-09-27 교류구동 정전 척
US14/344,736 US9093488B2 (en) 2011-09-30 2012-09-27 AC-driven electrostatic chuck
PCT/JP2012/074866 WO2013047647A1 (ja) 2011-09-30 2012-09-27 交流駆動静電チャック

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011217622 2011-09-30
JP2011217622 2011-09-30
JP2012207606A JP5505667B2 (ja) 2011-09-30 2012-09-20 交流駆動静電チャック

Publications (3)

Publication Number Publication Date
JP2013084935A JP2013084935A (ja) 2013-05-09
JP2013084935A5 true JP2013084935A5 (enExample) 2013-08-22
JP5505667B2 JP5505667B2 (ja) 2014-05-28

Family

ID=47995675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012207606A Expired - Fee Related JP5505667B2 (ja) 2011-09-30 2012-09-20 交流駆動静電チャック

Country Status (6)

Country Link
US (1) US9093488B2 (enExample)
JP (1) JP5505667B2 (enExample)
KR (1) KR101429593B1 (enExample)
CN (1) CN103890927A (enExample)
TW (1) TW201316448A (enExample)
WO (1) WO2013047647A1 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6224428B2 (ja) 2013-11-19 2017-11-01 東京エレクトロン株式会社 載置台にフォーカスリングを吸着する方法
US9633885B2 (en) * 2014-02-12 2017-04-25 Axcelis Technologies, Inc. Variable electrode pattern for versatile electrostatic clamp operation
JP6469985B2 (ja) * 2014-07-28 2019-02-13 株式会社日立ハイテクノロジーズ プラズマ処理装置
JP6168162B2 (ja) * 2014-09-30 2017-07-26 住友大阪セメント株式会社 静電チャック装置
JP6312926B2 (ja) * 2015-04-02 2018-04-18 株式会社アルバック 吸着方法及び真空処理方法
WO2016195945A1 (en) * 2015-06-04 2016-12-08 Applied Materials, Inc. Transparent electrostatic carrier
CN108780773B (zh) * 2016-02-10 2022-10-21 恩特格里斯公司 具有改善粒子性能的晶片接触表面突部轮廓
CN105575872B (zh) * 2016-02-26 2019-05-03 上海华力微电子有限公司 改善静电吸附盘树脂保护环损伤的结构及方法
US11289355B2 (en) 2017-06-02 2022-03-29 Lam Research Corporation Electrostatic chuck for use in semiconductor processing
CN110861113A (zh) * 2018-08-28 2020-03-06 吸力奇迹（北京）科技有限公司 静电吸附装置及其制备方法
KR102048162B1 (ko) * 2018-12-17 2019-12-02 엄홍국 정전척
KR102048161B1 (ko) * 2018-12-17 2019-11-22 엄홍국 정전척용 플레이트 및 이의 제조방법
US11145532B2 (en) * 2018-12-21 2021-10-12 Toto Ltd. Electrostatic chuck
KR102497965B1 (ko) * 2019-03-18 2023-02-08 엔지케이 인슐레이터 엘티디 정전 척
KR102705400B1 (ko) 2019-08-07 2024-09-12 주식회사 엘지에너지솔루션 자동차용 언더 바디
JP7712269B2 (ja) 2019-10-29 2025-07-23 エーエスエムエル ホールディング エヌ．ブイ． リソグラフィ装置および静電クランプの設計
JP7610345B2 (ja) * 2019-10-30 2025-01-08 日本碍子株式会社 複合焼結体および複合焼結体の製造方法
KR20210089375A (ko) * 2020-01-08 2021-07-16 주식회사 미코세라믹스 정전척
JP2022048089A (ja) * 2020-09-14 2022-03-25 東京エレクトロン株式会社 載置台、基板処理装置及び吸着方法
US20220084800A1 (en) * 2020-09-14 2022-03-17 Tokyo Electron Limited Stage, substrate processing apparatus and substrate attraction method
USD1067394S1 (en) * 2020-09-30 2025-03-18 Toto Ltd. Toilet seat
CN112234015B (zh) * 2020-10-12 2022-05-13 烟台睿瓷新材料技术有限公司 一种同心圆结构的静电吸盘电极图形结构
US11417557B2 (en) * 2020-12-15 2022-08-16 Entegris, Inc. Spiraling polyphase electrodes for electrostatic chuck
JP2023130043A (ja) * 2022-03-07 2023-09-20 東京エレクトロン株式会社 載置台及び基板処理装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01313954A (ja) * 1988-06-14 1989-12-19 Fujitsu Ltd 静電チャック
JPH03292753A (ja) * 1990-04-10 1991-12-24 Toto Ltd 静電チャック
EP0871843B1 (en) * 1994-10-17 2003-05-14 Varian Semiconductor Equipment Associates Inc. Mounting member and method for clamping a flat thin conductive workpiece
JPH11233600A (ja) * 1997-12-08 1999-08-27 Ulvac Corp 静電吸着装置、及びその静電吸着装置を用いた真空処理装置
US6538873B1 (en) * 1999-11-02 2003-03-25 Varian Semiconductor Equipment Associates, Inc. Active electrostatic seal and electrostatic vacuum pump
JP4328003B2 (ja) 2000-10-19 2009-09-09 日本碍子株式会社 セラミックヒーター
US6760213B2 (en) 2002-03-04 2004-07-06 Hitachi High-Technologies Corporation Electrostatic chuck and method of treating substrate using electrostatic chuck
JP3974475B2 (ja) * 2002-03-04 2007-09-12 株式会社日立ハイテクノロジーズ 静電チャック装置及びその装置を用いた基板の処理方法
JP4061131B2 (ja) * 2002-06-18 2008-03-12 キヤノンアネルバ株式会社 静電吸着装置
KR100511854B1 (ko) 2002-06-18 2005-09-02 아네르바 가부시키가이샤 정전 흡착 장치
US7357115B2 (en) * 2003-03-31 2008-04-15 Lam Research Corporation Wafer clamping apparatus and method for operating the same
US7151658B2 (en) * 2003-04-22 2006-12-19 Axcelis Technologies, Inc. High-performance electrostatic clamp comprising a resistive layer, micro-grooves, and dielectric layer
JP4409373B2 (ja) 2004-06-29 2010-02-03 日本碍子株式会社 基板載置装置及び基板温度調整方法
US7352554B2 (en) * 2004-06-30 2008-04-01 Axcelis Technologies, Inc. Method for fabricating a Johnsen-Rahbek electrostatic wafer clamp
US7126091B1 (en) * 2005-03-23 2006-10-24 Eclipse Energy Systems, Inc. Workpiece holder for vacuum processing
JP4929150B2 (ja) * 2007-12-27 2012-05-09 新光電気工業株式会社 静電チャック及び基板温調固定装置
EP2306505A4 (en) * 2008-07-08 2011-09-14 Creative Tech Corp BIPOLAR ELECTROSTATIC CHUCK
TWI467691B (zh) 2008-10-15 2015-01-01 Creative Tech Corp Electrostatic chuck and its manufacturing method
US8004817B2 (en) * 2009-06-18 2011-08-23 Varian Semiconductor Equipment Associates, Inc. Method of platen fabrication to allow electrode pattern and gas cooling optimization

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