JP2013038329A - 半導体装置 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 162
- 239000012535 impurity Substances 0.000 claims abstract description 24
- 238000009792 diffusion process Methods 0.000 claims abstract description 12
- 230000002093 peripheral effect Effects 0.000 abstract description 27
- 230000015556 catabolic process Effects 0.000 abstract description 19
- 230000006378 damage Effects 0.000 abstract description 8
- 230000003247 decreasing effect Effects 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
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- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
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- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
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- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
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Abstract
【解決手段】第1導電型の第1の半導体層と、第1の半導体層の表面に第2導電型の拡散領域を有するセル部と、第1の半導体層の表面に、それぞれセル部を囲むように形成された複数の第2導電型の第2の半導体層と、第1の半導体層の表面に、第2の半導体層の外周に離間して形成され、第1の半導体層より高濃度の第1導電型の第3の半導体層と、第1の半導体層の表面の、第2の半導体層と、第3の半導体層との間に設けられ、第2の半導体層より低濃度の第4の半導体層と、複数の第2の半導体層のそれぞれ内側に、第2の半導体層より低濃度で、第4の半導体層と不純物濃度又は導電型が異なる複数の第5の半導体層と、を備える。
【選択図】図1
Description
図1に本実施形態の半導体装置の終端構造の断面図を示す。図1に示すように、n−ベース層11の表面に、p型拡散領域12aを有するセル部12が形成されている。セル部12において、例えば、トレンチゲート12bとそれを挟むように形成されるn型エミッタ層12cが形成されている。
本実施形態おいては、第1の実施形態と同様の構成であるが、各ガードリング層及びEQPR層の内側の各リサーフ層の濃度を、外周側に順次増大させている。
本実施形態おいては、第1の実施形態と同様の構成であるが、各ガードリング層及びEQPR層の内側の各リサーフ層を、ベース層とは反対のp型としている。
本実施形態おいては、第3の実施形態と同様の構成であるが、各ガードリング層及びEQPR層の内側の各リサーフ層の濃度を、外周側に順次減少させている。
本実施形態おいては、第1の実施形態と同様の構成であるが、各ガードリング層の内側と、ガードリング層とEQPR層間のリサーフ層の導電型が異なっている。
本実施形態おいては、第1の実施形態と同様の構成であるが、各ガードリング層の内側と、ガードリング層とEQPR層間のリサーフ層を、導電型の異なる上層と下層の二層構造としている。
本実施形態おいては、第1の実施形態と同様の構成であるが、ガードリング間、ガードリング層とEQPR層間のリサーフ層が、複数に分離して、部分的に形成されている。
Claims (5)
- 第1導電型の第1の半導体層と、
前記第1の半導体層の表面に第2導電型の拡散領域を有するセル部と、
前記第1の半導体層の表面に、それぞれ前記セル部を囲むように形成された複数の第2導電型の第2の半導体層と、
前記第1の半導体層の表面に、前記第2の半導体層の外周に離間して形成され、前記第1の半導体層より高濃度で、前記第2の半導体層より低濃度の第1導電型の第3の半導体層と、
複数の前記第2の半導体層のそれぞれ内側の、前記第1の半導体層の表面に設けられ、前記第1の半導体層より高濃度の、第1導電型の複数の前記第4の半導体層と、
前記第1の半導体層の表面で、複数の前記第2の半導体層の最外周と、前記第3の半導体層との間に設けられ、前記第4の半導体層とより不純物濃度が高い第1導電型の第5の半導体層と、
を備えることを特徴とする半導体装置。 - 第1導電型の第1の半導体層と、
前記第1の半導体層の表面に第2導電型の拡散領域を有するセル部と、
前記第1の半導体層の表面に、それぞれ前記セル部を囲むように形成された複数の第2導電型の第2の半導体層と、
前記第1の半導体層の表面に、前記第2の半導体層の外周に離間して形成され、前記第1の半導体層より高濃度で、前記第2の半導体層より低濃度の第1導電型の第3の半導体層と、
複数の前記第2の半導体層のそれぞれ内側の、前記第1の半導体層の表面に設けられ、前記第1の半導体層より高濃度の、第2導電型の複数の前記第4の半導体層と、
前記第1の半導体層の表面で、複数の前記第2の半導体層の最外周と、前記第3の半導体層との間に設けられ、前記第4の半導体層とより不純物濃度が低い第2導電型の第5の半導体層と、
を備えることを特徴とする半導体装置。 - 第1導電型の第1の半導体層と、
前記第1の半導体層の表面に第2導電型の拡散領域を有するセル部と、
前記第1の半導体層の表面に、それぞれ前記セル部を囲むように形成された複数の第2導電型の第2の半導体層と、
前記第1の半導体層の表面に、前記第2の半導体層の外周に離間して形成され、前記第1の半導体層より高濃度で、前記第2の半導体層より低濃度の第1導電型の第3の半導体層と、
複数の前記第2の半導体層のそれぞれ内側の、前記第1の半導体層の表面に設けられ、前記第1の半導体層より高濃度の、第2導電型の複数の前記第4の半導体層と、
前記第1の半導体層の表面で、複数の前記第2の半導体層の最外周と、前記第3の半導体層との間に設けられ、第1導電型の第5の半導体層と、
を備えることを特徴とする半導体装置。 - 複数の前記第4の半導体層は、それぞれ不純物濃度が異なることを特徴とする請求項1から請求項3のいずれか1項に記載の半導体装置。
- 前記第4の半導体層又は前記第5の半導体層は、導電型が異なる上層と下層の積層構造を有することを特徴とする請求項1から請求項4のいずれか1項に記載の半導体装置。
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JP2011175074A JP2013038329A (ja) | 2011-08-10 | 2011-08-10 | 半導体装置 |
CN2012100527006A CN102931217A (zh) | 2011-08-10 | 2012-03-02 | 半导体装置 |
US13/420,544 US20130037851A1 (en) | 2011-08-10 | 2012-03-14 | Semiconductor device |
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JP2011175074A JP2013038329A (ja) | 2011-08-10 | 2011-08-10 | 半導体装置 |
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Cited By (10)
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WO2015040675A1 (ja) * | 2013-09-17 | 2015-03-26 | 株式会社日立製作所 | 半導体装置、電力変換装置、鉄道車両、および半導体装置の製造方法 |
JP2015126193A (ja) * | 2013-12-27 | 2015-07-06 | 株式会社豊田中央研究所 | 縦型半導体装置 |
KR101539880B1 (ko) * | 2014-01-02 | 2015-07-27 | 삼성전기주식회사 | 전력 반도체 소자 |
WO2016194216A1 (ja) * | 2015-06-05 | 2016-12-08 | 株式会社日立製作所 | 半導体装置およびその製造方法、並びにパワーモジュール |
WO2018207712A1 (ja) * | 2017-05-08 | 2018-11-15 | ローム株式会社 | 半導体装置 |
US11004932B2 (en) | 2019-06-04 | 2021-05-11 | Mitsubishi Electric Corporation | Semiconductor device |
US11257943B2 (en) | 2019-06-17 | 2022-02-22 | Fuji Electric Co., Ltd. | Semiconductor device |
US11450734B2 (en) | 2019-06-17 | 2022-09-20 | Fuji Electric Co., Ltd. | Semiconductor device and fabrication method for semiconductor device |
WO2024084778A1 (ja) * | 2022-10-19 | 2024-04-25 | 株式会社デンソー | 半導体装置とその製造方法 |
WO2024161753A1 (ja) * | 2023-01-30 | 2024-08-08 | 株式会社デンソー | 半導体装置 |
Families Citing this family (7)
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US9536942B2 (en) * | 2012-03-15 | 2017-01-03 | Mitsubishi Electric Corporation | Semiconductor device having a plurality of electric field relaxation layers and method for manufacturing same |
CN104332488B (zh) * | 2013-07-22 | 2017-07-07 | 无锡华润上华半导体有限公司 | 半导体器件终端、半导体器件及其制造方法 |
JP2016035989A (ja) | 2014-08-04 | 2016-03-17 | 株式会社東芝 | 半導体装置 |
CN105990153B (zh) * | 2015-03-04 | 2019-05-28 | 北大方正集团有限公司 | 功率器件的分压结构的制备方法和功率器件 |
KR101872069B1 (ko) * | 2015-05-22 | 2018-06-28 | 매그나칩 반도체 유한회사 | 플로팅 구조를 갖는 쇼트키 다이오드 |
US10861931B2 (en) * | 2016-12-08 | 2020-12-08 | Cree, Inc. | Power semiconductor devices having gate trenches and buried edge terminations and related methods |
CN109585533A (zh) * | 2018-12-10 | 2019-04-05 | 泉州臻美智能科技有限公司 | 一种功率器件终端结构及其制作方法 |
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2012
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