JP2013010936A5 - - Google Patents
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- Publication number
- JP2013010936A5 JP2013010936A5 JP2012117271A JP2012117271A JP2013010936A5 JP 2013010936 A5 JP2013010936 A5 JP 2013010936A5 JP 2012117271 A JP2012117271 A JP 2012117271A JP 2012117271 A JP2012117271 A JP 2012117271A JP 2013010936 A5 JP2013010936 A5 JP 2013010936A5
- Authority
- JP
- Japan
- Prior art keywords
- fluoroalkyl
- monomers
- alkyl
- combination
- copolymers according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000178 monomer Substances 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 229920001577 copolymer Polymers 0.000 claims 3
- 125000003709 fluoroalkyl group Chemical group 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000002596 lactones Chemical class 0.000 claims 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 1
- 238000001459 lithography Methods 0.000 description 2
- IBDVWXAVKPRHCU-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCCOC(=O)C(C)=C IBDVWXAVKPRHCU-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161490883P | 2011-05-27 | 2011-05-27 | |
| US61/490,883 | 2011-05-27 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013010936A JP2013010936A (ja) | 2013-01-17 |
| JP2013010936A5 true JP2013010936A5 (enExample) | 2016-03-17 |
| JP5897986B2 JP5897986B2 (ja) | 2016-04-06 |
Family
ID=46298243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012117271A Expired - Fee Related JP5897986B2 (ja) | 2011-05-27 | 2012-05-23 | ポリマー組成物およびこのポリマーを含むフォトレジスト |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8603728B2 (enExample) |
| EP (1) | EP2527379A1 (enExample) |
| JP (1) | JP5897986B2 (enExample) |
| CN (1) | CN102796223A (enExample) |
| TW (1) | TWI507428B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5793489B2 (ja) * | 2011-11-30 | 2015-10-14 | 富士フイルム株式会社 | 感活性光線性又は感放射線性組成物、それを用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
| US9581901B2 (en) | 2013-12-19 | 2017-02-28 | Rohm And Haas Electronic Materials Llc | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device |
| JP6267532B2 (ja) | 2014-02-14 | 2018-01-24 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
| KR102233577B1 (ko) | 2014-02-25 | 2021-03-30 | 삼성전자주식회사 | 반도체 소자의 패턴 형성 방법 |
| EP3238288B1 (en) * | 2014-12-24 | 2020-07-29 | Orthogonal Inc. | Photolithographic patterning of electronic devices |
| CN118702852B (zh) * | 2024-08-29 | 2024-11-08 | 珠海基石科技有限公司 | 含氟树脂及其制备方法、含氟单体、树脂组合物、功能膜和功能件、半导体器件及其制备方法 |
| CN119161524B (zh) * | 2024-11-19 | 2025-04-08 | 中节能万润股份有限公司 | 一种用于电子束光刻胶的聚合物及其制备方法和应用 |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0654382B2 (ja) | 1986-11-18 | 1994-07-20 | 富士写真フイルム株式会社 | 感光性組成物 |
| AU632605B2 (en) * | 1989-08-14 | 1993-01-07 | Mitsubishi Rayon Company Limited | Material for dentistry |
| US5229245A (en) * | 1991-07-26 | 1993-07-20 | Industrial Technology Research Institute | Positively working photosensitive composition |
| US5185403A (en) * | 1991-07-31 | 1993-02-09 | Morton Coatings, Inc. | Thermosetting acrylic polymers and coating compositions containing said acrylic polymers and fluorocarbon resins |
| US6011119A (en) * | 1995-07-28 | 2000-01-04 | Mitsui Chemicals, Inc. | Resin composition for electrophotographic toner, and toner |
| ES2166079T3 (es) * | 1996-05-10 | 2002-04-01 | Du Pont | Compuestos polimeros acrilicos. |
| JP3623058B2 (ja) | 1996-06-13 | 2005-02-23 | 和光純薬工業株式会社 | 新規ポリマー及びこれを用いたレジスト組成物並びにこれを用いたパターン形成方法 |
| TW491860B (en) | 1997-04-30 | 2002-06-21 | Wako Pure Chem Ind Ltd | Acrylic or methacrylic acid derivatives and polymers obtained therefrom |
| JP3788549B2 (ja) | 1997-09-30 | 2006-06-21 | 旭電化工業株式会社 | ポリビニルブチラール樹脂組成物 |
| US6254878B1 (en) * | 1999-07-01 | 2001-07-03 | E. I. Du Pont De Nemours And Company | Nail polish compositions containing acrylic polymers |
| JP3984488B2 (ja) * | 2001-03-27 | 2007-10-03 | 日本ペイント株式会社 | 硬化性塗料組成物および塗膜形成方法 |
| WO2004067592A1 (ja) * | 2003-01-31 | 2004-08-12 | Mitsubishi Rayon Co., Ltd. | レジスト用重合体およびレジスト組成物 |
| JP4301872B2 (ja) * | 2003-06-19 | 2009-07-22 | ダイセル化学工業株式会社 | ラクトン環含有重合性単量体、高分子化合物、フォトレジスト用樹脂組成物、及び半導体の製造方法 |
| US7063931B2 (en) * | 2004-01-08 | 2006-06-20 | International Business Machines Corporation | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| JP4442887B2 (ja) * | 2004-02-27 | 2010-03-31 | 三菱レイヨン株式会社 | レジスト用重合体 |
| TWI368825B (en) * | 2004-07-07 | 2012-07-21 | Fujifilm Corp | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| JP4714488B2 (ja) * | 2004-08-26 | 2011-06-29 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2006171667A (ja) * | 2004-11-22 | 2006-06-29 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US7247419B2 (en) * | 2005-04-11 | 2007-07-24 | Az Electronic Materials Usa Corp. | Nanocomposite photosensitive composition and use thereof |
| EP1720072B1 (en) * | 2005-05-01 | 2019-06-05 | Rohm and Haas Electronic Materials, L.L.C. | Compositons and processes for immersion lithography |
| JP4614092B2 (ja) * | 2006-01-31 | 2011-01-19 | 信越化学工業株式会社 | フッ素アルコール化合物の製造方法 |
| JP2007284368A (ja) * | 2006-04-14 | 2007-11-01 | Daicel Chem Ind Ltd | （メタ）アクリル系単量体及びレジスト樹脂の保護膜用樹脂 |
| JP2007284381A (ja) * | 2006-04-18 | 2007-11-01 | Daicel Chem Ind Ltd | フォトレジスト用（メタ）アクリル系単量体、その高分子化合物及びフォトレジスト用樹脂組成物 |
| JP2008165146A (ja) * | 2007-01-05 | 2008-07-17 | Fujifilm Corp | ポジ型感光性組成物、それを用いたパターン形成方法及び該ポジ型感光性組成物に用いられる樹脂 |
| US10678132B2 (en) * | 2007-03-14 | 2020-06-09 | Fujifilm Corporation | Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin |
| JP4621754B2 (ja) * | 2007-03-28 | 2011-01-26 | 富士フイルム株式会社 | ポジ型レジスト組成物およびパターン形成方法 |
| JP4743450B2 (ja) * | 2008-09-05 | 2011-08-10 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| WO2010071029A1 (ja) * | 2008-12-15 | 2010-06-24 | セントラル硝子株式会社 | 含フッ素重合性単量体、含フッ素重合体、レジスト材料及びパターン形成方法 |
| JP5402809B2 (ja) * | 2009-04-21 | 2014-01-29 | セントラル硝子株式会社 | トップコート組成物 |
| TWI476816B (zh) | 2009-06-26 | 2015-03-11 | 羅門哈斯電子材料有限公司 | 自我對準間隔之多重圖案化方法 |
| JP5741297B2 (ja) * | 2010-08-05 | 2015-07-01 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法及び重合体 |
-
2012
- 2012-05-22 EP EP12168975A patent/EP2527379A1/en not_active Withdrawn
- 2012-05-23 JP JP2012117271A patent/JP5897986B2/ja not_active Expired - Fee Related
- 2012-05-24 TW TW101118475A patent/TWI507428B/zh not_active IP Right Cessation
- 2012-05-28 CN CN2012102429953A patent/CN102796223A/zh active Pending
- 2012-05-29 US US13/482,559 patent/US8603728B2/en not_active Expired - Fee Related
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