JP2011502276A5 - - Google Patents
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- Publication number
- JP2011502276A5 JP2011502276A5 JP2010530582A JP2010530582A JP2011502276A5 JP 2011502276 A5 JP2011502276 A5 JP 2011502276A5 JP 2010530582 A JP2010530582 A JP 2010530582A JP 2010530582 A JP2010530582 A JP 2010530582A JP 2011502276 A5 JP2011502276 A5 JP 2011502276A5
- Authority
- JP
- Japan
- Prior art keywords
- methacrylate
- methyl
- butyl
- hydroxy
- maleimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- -1 beta-hydroxy-gamma-butyrolactone methacrylate ester Chemical class 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- JYVXNLLUYHCIIH-UHFFFAOYSA-N (+/-)-mevalonolactone Natural products CC1(O)CCOC(=O)C1 JYVXNLLUYHCIIH-UHFFFAOYSA-N 0.000 description 1
- GQRTVVANIGOXRF-UHFFFAOYSA-N (2-methyl-1-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(C)C2(OC(=O)C=C)C3 GQRTVVANIGOXRF-UHFFFAOYSA-N 0.000 description 1
- FDYDISGSYGFRJM-UHFFFAOYSA-N (2-methyl-2-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC1C(OC(=O)C(=C)C)(C)C2C3 FDYDISGSYGFRJM-UHFFFAOYSA-N 0.000 description 1
- RZIYNEXVKNEFEH-UHFFFAOYSA-N (2-tert-butyl-2-methyl-1-adamantyl) 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OC12C(C3CC(CC(C1)C3)C2)(C)C(C)(C)C RZIYNEXVKNEFEH-UHFFFAOYSA-N 0.000 description 1
- OOIBFPKQHULHSQ-UHFFFAOYSA-N (3-hydroxy-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2(O)CC1(OC(=O)C(=C)C)C3 OOIBFPKQHULHSQ-UHFFFAOYSA-N 0.000 description 1
- HTUVMQSHLRSVPT-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethenylbenzene Chemical compound CCOCCOC=CC1=CC=CC=C1 HTUVMQSHLRSVPT-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- JYVXNLLUYHCIIH-ZCFIWIBFSA-N R-mevalonolactone, (-)- Chemical compound C[C@@]1(O)CCOC(=O)C1 JYVXNLLUYHCIIH-ZCFIWIBFSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- WMUQQXZSTBBYPS-UHFFFAOYSA-N benzyl 2-phenylethenyl carbonate Chemical compound C=1C=CC=CC=1C=COC(=O)OCC1=CC=CC=C1 WMUQQXZSTBBYPS-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229940057061 mevalonolactone Drugs 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- XTXNWQHMMMPKKO-UHFFFAOYSA-N tert-butyl 2-phenylethenyl carbonate Chemical compound CC(C)(C)OC(=O)OC=CC1=CC=CC=C1 XTXNWQHMMMPKKO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/876,793 | 2007-10-23 | ||
| US11/876,793 US8088548B2 (en) | 2007-10-23 | 2007-10-23 | Bottom antireflective coating compositions |
| PCT/IB2008/002847 WO2009053832A2 (en) | 2007-10-23 | 2008-10-21 | Bottom antireflective coating compositions |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011502276A JP2011502276A (ja) | 2011-01-20 |
| JP2011502276A5 true JP2011502276A5 (enExample) | 2011-11-24 |
| JP5499386B2 JP5499386B2 (ja) | 2014-05-21 |
Family
ID=40474943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010530582A Active JP5499386B2 (ja) | 2007-10-23 | 2008-10-21 | 底面反射防止膜用コーティング組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8088548B2 (enExample) |
| EP (1) | EP2212273A2 (enExample) |
| JP (1) | JP5499386B2 (enExample) |
| KR (1) | KR101537833B1 (enExample) |
| CN (1) | CN101835735A (enExample) |
| MY (1) | MY148382A (enExample) |
| TW (1) | TWI464537B (enExample) |
| WO (1) | WO2009053832A2 (enExample) |
Families Citing this family (93)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050214674A1 (en) | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
| US9763668B2 (en) | 2004-10-08 | 2017-09-19 | Covidien Lp | Endoscopic surgical clip applier |
| US7717926B2 (en) | 2004-10-08 | 2010-05-18 | Tyco Healthcare Group Lp | Endoscopic surgical clip applier |
| CA2809110A1 (en) | 2004-10-08 | 2006-04-20 | Tyco Healthcare Group Lp | Apparatus for applying surgical clips |
| US7816071B2 (en) * | 2005-02-10 | 2010-10-19 | Az Electronic Materials Usa Corp. | Process of imaging a photoresist with multiple antireflective coatings |
| CA2605135C (en) | 2006-10-17 | 2014-12-30 | Tyco Healthcare Group Lp | Apparatus for applying surgical clips |
| CA2868909A1 (en) | 2007-03-26 | 2008-10-02 | Tyco Healthcare Group Lp | Endoscopic surgical clip applier |
| US8506580B2 (en) | 2007-04-11 | 2013-08-13 | Covidien Lp | Surgical clip applier |
| US20090098490A1 (en) * | 2007-10-16 | 2009-04-16 | Victor Pham | Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing |
| KR101585992B1 (ko) * | 2007-12-20 | 2016-01-19 | 삼성전자주식회사 | 반사방지 코팅용 고분자, 반사방지 코팅용 조성물 및 이를 이용한 반도체 장치의 패턴 형성 방법 |
| US8465502B2 (en) | 2008-08-25 | 2013-06-18 | Covidien Lp | Surgical clip applier and method of assembly |
| US8409223B2 (en) | 2008-08-29 | 2013-04-02 | Covidien Lp | Endoscopic surgical clip applier with clip retention |
| US9358015B2 (en) | 2008-08-29 | 2016-06-07 | Covidien Lp | Endoscopic surgical clip applier with wedge plate |
| US8267944B2 (en) | 2008-08-29 | 2012-09-18 | Tyco Healthcare Group Lp | Endoscopic surgical clip applier with lock out |
| JP4813537B2 (ja) * | 2008-11-07 | 2011-11-09 | 信越化学工業株式会社 | 熱酸発生剤を含有するレジスト下層材料、レジスト下層膜形成基板及びパターン形成方法 |
| US8455176B2 (en) * | 2008-11-12 | 2013-06-04 | Az Electronic Materials Usa Corp. | Coating composition |
| CN102395925B (zh) * | 2009-02-19 | 2015-06-03 | 布鲁尔科技公司 | 可溶于显影剂的酸敏性底部减反射涂料 |
| US8632948B2 (en) | 2009-09-30 | 2014-01-21 | Az Electronic Materials Usa Corp. | Positive-working photoimageable bottom antireflective coating |
| US20110086312A1 (en) * | 2009-10-09 | 2011-04-14 | Dammel Ralph R | Positive-Working Photoimageable Bottom Antireflective Coating |
| JP5504824B2 (ja) * | 2009-10-28 | 2014-05-28 | Ｊｓｒ株式会社 | ポジ型感放射線性樹脂組成物、層間絶縁膜及びその形成方法 |
| US8545486B2 (en) | 2009-12-15 | 2013-10-01 | Covidien Lp | Surgical clip applier |
| JP5691585B2 (ja) * | 2010-02-16 | 2015-04-01 | 住友化学株式会社 | レジスト組成物 |
| US8403945B2 (en) | 2010-02-25 | 2013-03-26 | Covidien Lp | Articulating endoscopic surgical clip applier |
| US8403946B2 (en) | 2010-07-28 | 2013-03-26 | Covidien Lp | Articulating clip applier cartridge |
| US8968337B2 (en) | 2010-07-28 | 2015-03-03 | Covidien Lp | Articulating clip applier |
| JP5737526B2 (ja) * | 2010-08-02 | 2015-06-17 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| CN103180351B (zh) * | 2010-08-25 | 2015-06-10 | 陶氏环球技术有限责任公司 | 共聚物 |
| JP6035017B2 (ja) * | 2010-10-04 | 2016-11-30 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 下層組成物および下層を像形成する方法 |
| JP5820676B2 (ja) * | 2010-10-04 | 2015-11-24 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 下層組成物および下層を像形成する方法 |
| US20120122029A1 (en) | 2010-11-11 | 2012-05-17 | Takanori Kudo | Underlayer Developable Coating Compositions and Processes Thereof |
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| JP2013014743A (ja) | 2011-05-27 | 2013-01-24 | Rohm & Haas Electronic Materials Llc | 表面活性添加剤およびこれを含むフォトレジスト組成物 |
| US8623589B2 (en) * | 2011-06-06 | 2014-01-07 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions and processes thereof |
| CN105153186B (zh) * | 2011-06-14 | 2020-05-01 | 三菱化学株式会社 | 醇化合物、（甲基）丙烯酸酯、聚合物及它们的制造方法、抗蚀剂组合物及基板的制造方法 |
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| US9532787B2 (en) | 2012-05-31 | 2017-01-03 | Covidien Lp | Endoscopic clip applier |
| US8999624B2 (en) * | 2012-06-29 | 2015-04-07 | International Business Machines Corporation | Developable bottom antireflective coating composition and pattern forming method using thereof |
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| US9750500B2 (en) | 2013-01-18 | 2017-09-05 | Covidien Lp | Surgical clip applier |
| US9017934B2 (en) | 2013-03-08 | 2015-04-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist defect reduction system and method |
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2007
- 2007-10-23 US US11/876,793 patent/US8088548B2/en active Active
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2008
- 2008-09-12 TW TW097135282A patent/TWI464537B/zh active
- 2008-10-21 KR KR1020107011146A patent/KR101537833B1/ko active Active
- 2008-10-21 EP EP08843074A patent/EP2212273A2/en not_active Withdrawn
- 2008-10-21 JP JP2010530582A patent/JP5499386B2/ja active Active
- 2008-10-21 WO PCT/IB2008/002847 patent/WO2009053832A2/en not_active Ceased
- 2008-10-21 CN CN200880113002A patent/CN101835735A/zh active Pending
- 2008-10-21 MY MYPI2010001800A patent/MY148382A/en unknown