JP2015507065A5 - - Google Patents
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- Publication number
- JP2015507065A5 JP2015507065A5 JP2014556767A JP2014556767A JP2015507065A5 JP 2015507065 A5 JP2015507065 A5 JP 2015507065A5 JP 2014556767 A JP2014556767 A JP 2014556767A JP 2014556767 A JP2014556767 A JP 2014556767A JP 2015507065 A5 JP2015507065 A5 JP 2015507065A5
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- JP
- Japan
- Prior art keywords
- monomer
- group
- block
- homopolymer
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000178 monomer Substances 0.000 claims 8
- 229920001400 block copolymer Polymers 0.000 claims 4
- 229920001519 homopolymer Polymers 0.000 claims 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 238000006116 polymerization reaction Methods 0.000 claims 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 125000004076 pyridyl group Chemical group 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261597530P | 2012-02-10 | 2012-02-10 | |
| US61/597,530 | 2012-02-10 | ||
| PCT/US2013/025508 WO2013120051A1 (en) | 2012-02-10 | 2013-02-11 | Preparation, purification and use of high-x diblock copolymers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015507065A JP2015507065A (ja) | 2015-03-05 |
| JP2015507065A5 true JP2015507065A5 (enExample) | 2016-03-24 |
Family
ID=47747845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014556767A Pending JP2015507065A (ja) | 2012-02-10 | 2013-02-11 | 高度ｘジブロックコポリマーの製造、精製及び使用 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20150004379A1 (enExample) |
| EP (1) | EP2812369A1 (enExample) |
| JP (1) | JP2015507065A (enExample) |
| CN (1) | CN104114594B (enExample) |
| WO (1) | WO2013120051A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104105729B (zh) * | 2012-02-10 | 2016-10-26 | 纳幕尔杜邦公司 | 高-x两嵌段共聚物的制备、纯化和使用 |
| US10081698B2 (en) | 2013-12-06 | 2018-09-25 | Lg Chem, Ltd. | Block copolymer |
| EP3078689B1 (en) | 2013-12-06 | 2020-12-02 | LG Chem, Ltd. | Block copolymer |
| WO2015084133A1 (ko) * | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
| JP6347356B2 (ja) | 2013-12-06 | 2018-06-27 | エルジー・ケム・リミテッド | ブロック共重合体 |
| JP6361893B2 (ja) | 2013-12-06 | 2018-07-25 | エルジー・ケム・リミテッド | ブロック共重合体 |
| EP3078654B1 (en) | 2013-12-06 | 2021-07-07 | LG Chem, Ltd. | Monomer and block copolymer |
| US10227437B2 (en) | 2013-12-06 | 2019-03-12 | Lg Chem, Ltd. | Block copolymer |
| EP3078693B1 (en) | 2013-12-06 | 2021-01-27 | LG Chem, Ltd. | Block copolymer |
| EP3078684B1 (en) | 2013-12-06 | 2019-07-31 | LG Chem, Ltd. | Block copolymer |
| US10202480B2 (en) | 2013-12-06 | 2019-02-12 | Lg Chem, Ltd. | Block copolymer |
| JP6334706B2 (ja) | 2013-12-06 | 2018-05-30 | エルジー・ケム・リミテッド | ブロック共重合体 |
| EP3078688B1 (en) | 2013-12-06 | 2020-03-04 | LG Chem, Ltd. | Block copolymer |
| WO2015084129A1 (ko) | 2013-12-06 | 2015-06-11 | 주식회사 엘지화학 | 블록 공중합체 |
| EP3078687B1 (en) | 2013-12-06 | 2020-06-03 | LG Chem, Ltd. | Block copolymer |
| US9587039B2 (en) * | 2013-12-25 | 2017-03-07 | Unimatec Co., Ltd. | Fluorinated-containing macroinitiator and production process for the same |
| JP5734406B1 (ja) * | 2013-12-25 | 2015-06-17 | ユニマテック株式会社 | 含フッ素２ブロック共重合体 |
| WO2016052994A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| CN107077066B9 (zh) | 2014-09-30 | 2021-05-14 | 株式会社Lg化学 | 制造图案化基底的方法 |
| EP3202798B1 (en) | 2014-09-30 | 2022-01-12 | LG Chem, Ltd. | Block copolymer |
| EP3203496B1 (en) | 2014-09-30 | 2021-12-29 | LG Chem, Ltd. | Method for producing patterned substrate |
| WO2016053009A1 (ko) | 2014-09-30 | 2016-04-07 | 주식회사 엘지화학 | 블록 공중합체 |
| US10633533B2 (en) | 2014-09-30 | 2020-04-28 | Lg Chem, Ltd. | Block copolymer |
| EP3202801B1 (en) | 2014-09-30 | 2021-08-18 | LG Chem, Ltd. | Block copolymer |
| US10281820B2 (en) | 2014-09-30 | 2019-05-07 | Lg Chem, Ltd. | Block copolymer |
| JP6532941B2 (ja) | 2014-09-30 | 2019-06-19 | エルジー・ケム・リミテッド | ブロック共重合体 |
| CN107075054B (zh) | 2014-09-30 | 2020-05-05 | 株式会社Lg化学 | 嵌段共聚物 |
| US9815947B2 (en) * | 2015-10-30 | 2017-11-14 | E I Du Pont De Nemours And Company | Substantially symmetrical 3-arm star block copolymers |
| CN107686542B (zh) * | 2016-08-30 | 2021-06-18 | 复旦大学 | 一种高度有序的含氟高分子材料 |
| JP7338852B2 (ja) * | 2019-06-19 | 2023-09-05 | 学校法人神奈川大学 | 複合体及びその製造方法、並びに硬化性樹脂組成物 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5712356A (en) * | 1993-11-26 | 1998-01-27 | Ciba Vision Corporation | Cross-linkable copolymers and hydrogels |
| AU2001239773A1 (en) * | 2000-02-17 | 2001-08-27 | Massachusetts Institute Of Technology | Baroplastic materials |
| US8133534B2 (en) | 2004-11-22 | 2012-03-13 | Wisconsin Alumni Research Foundation | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials |
| US20070183035A1 (en) * | 2005-10-31 | 2007-08-09 | Koji Asakawa | Short-wavelength polarizing elements and the manufacture and use thereof |
| JP2007246600A (ja) * | 2006-03-14 | 2007-09-27 | Shin Etsu Chem Co Ltd | 自己組織化高分子膜材料、自己組織化パターン、及びパターン形成方法 |
| US7553760B2 (en) * | 2006-10-19 | 2009-06-30 | International Business Machines Corporation | Sub-lithographic nano interconnect structures, and method for forming same |
| US7521094B1 (en) | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
| WO2010096363A2 (en) * | 2009-02-19 | 2010-08-26 | Arkema Inc. | Nanofabrication method |
| US8398868B2 (en) | 2009-05-19 | 2013-03-19 | International Business Machines Corporation | Directed self-assembly of block copolymers using segmented prepatterns |
| US8202436B2 (en) * | 2009-12-18 | 2012-06-19 | Korea University Research And Business Foundation | Use of block copolymers for preparing conductive nanostructures |
| GB201003970D0 (en) * | 2010-03-10 | 2010-04-21 | Univ Sheffield | Polymer synthesis |
| JP2013534542A (ja) | 2010-06-04 | 2013-09-05 | エーエスエムエル ネザーランズ ビー．ブイ． | 自己組織化可能な重合体及びリソグラフィにおける使用方法 |
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2013
- 2013-02-11 CN CN201380008774.2A patent/CN104114594B/zh active Active
- 2013-02-11 EP EP13705696.6A patent/EP2812369A1/en not_active Withdrawn
- 2013-02-11 US US14/377,312 patent/US20150004379A1/en not_active Abandoned
- 2013-02-11 JP JP2014556767A patent/JP2015507065A/ja active Pending
- 2013-02-11 WO PCT/US2013/025508 patent/WO2013120051A1/en not_active Ceased