JP2015507065A - 高度ｘジブロックコポリマーの製造、精製及び使用 - Google Patents

高度ｘジブロックコポリマーの製造、精製及び使用 Download PDF

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Publication number
JP2015507065A
JP2015507065A JP2014556767A JP2014556767A JP2015507065A JP 2015507065 A JP2015507065 A JP 2015507065A JP 2014556767 A JP2014556767 A JP 2014556767A JP 2014556767 A JP2014556767 A JP 2014556767A JP 2015507065 A JP2015507065 A JP 2015507065A
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Japan
Prior art keywords
monomer
group
block
homopolymer
phenyl
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Pending
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JP2014556767A
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Japanese (ja)
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JP2015507065A5 (enExample
Inventor
ウィリアム・ブラウン・ファーナム
マイケル・トーマス・シーン
ホアン・ヴィ・トラン
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EIDP Inc
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EI Du Pont de Nemours and Co
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Publication of JP2015507065A publication Critical patent/JP2015507065A/ja
Publication of JP2015507065A5 publication Critical patent/JP2015507065A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C09D133/12—Homopolymers or copolymers of methyl methacrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2014556767A 2012-02-10 2013-02-11 高度ｘジブロックコポリマーの製造、精製及び使用 Pending JP2015507065A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261597530P 2012-02-10 2012-02-10
US61/597,530 2012-02-10
PCT/US2013/025508 WO2013120051A1 (en) 2012-02-10 2013-02-11 Preparation, purification and use of high-x diblock copolymers

Publications (2)

Publication Number Publication Date
JP2015507065A true JP2015507065A (ja) 2015-03-05
JP2015507065A5 JP2015507065A5 (enExample) 2016-03-24

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014556767A Pending JP2015507065A (ja) 2012-02-10 2013-02-11 高度ｘジブロックコポリマーの製造、精製及び使用

Country Status (5)

Country Link
US (1) US20150004379A1 (enExample)
EP (1) EP2812369A1 (enExample)
JP (1) JP2015507065A (enExample)
CN (1) CN104114594B (enExample)
WO (1) WO2013120051A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015507066A (ja) * 2012-02-10 2015-03-05 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 高度ｘジブロックコポリマーの製造、精製及び使用
KR20170051350A (ko) * 2015-10-30 2017-05-11 이 아이 듀폰 디 네모아 앤드 캄파니 실질적으로 대칭인 3-아암 성상 블록 공중합체
JP2020204006A (ja) * 2019-06-19 2020-12-24 昭和電工マテリアルズ株式会社 複合体及びその製造方法、並びに硬化性樹脂組成物

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CN106459326B (zh) 2013-12-06 2019-08-13 株式会社Lg化学 嵌段共聚物
US10087276B2 (en) 2013-12-06 2018-10-02 Lg Chem, Ltd. Block copolymer
JP6419820B2 (ja) 2013-12-06 2018-11-07 エルジー・ケム・リミテッド ブロック共重合体
US10227436B2 (en) 2013-12-06 2019-03-12 Lg Chem, Ltd. Block copolymer
EP3078692B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
JP6361893B2 (ja) 2013-12-06 2018-07-25 エルジー・ケム・リミテッド ブロック共重合体
WO2015084126A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
US10239980B2 (en) 2013-12-06 2019-03-26 Lg Chem, Ltd. Block copolymer
CN105934455B (zh) 2013-12-06 2019-01-18 株式会社Lg化学 嵌段共聚物
US10202480B2 (en) 2013-12-06 2019-02-12 Lg Chem, Ltd. Block copolymer
JP6334706B2 (ja) 2013-12-06 2018-05-30 エルジー・ケム・リミテッド ブロック共重合体
EP3078654B1 (en) 2013-12-06 2021-07-07 LG Chem, Ltd. Monomer and block copolymer
JP6432847B2 (ja) 2013-12-06 2018-12-05 エルジー・ケム・リミテッド ブロック共重合体
CN105899560B (zh) 2013-12-06 2018-01-12 株式会社Lg化学 嵌段共聚物
JP5734406B1 (ja) * 2013-12-25 2015-06-17 ユニマテック株式会社 含フッ素２ブロック共重合体
WO2015098847A1 (ja) * 2013-12-25 2015-07-02 ユニマテック株式会社 含フッ素マクロ開始剤およびその製造方法
US10240035B2 (en) 2014-09-30 2019-03-26 Lg Chem, Ltd. Block copolymer
US10287430B2 (en) 2014-09-30 2019-05-14 Lg Chem, Ltd. Method of manufacturing patterned substrate
EP3202801B1 (en) 2014-09-30 2021-08-18 LG Chem, Ltd. Block copolymer
JP6394798B2 (ja) 2014-09-30 2018-09-26 エルジー・ケム・リミテッド ブロック共重合体
JP6633062B2 (ja) 2014-09-30 2020-01-22 エルジー・ケム・リミテッド パターン化基板の製造方法
EP3225641B1 (en) 2014-09-30 2021-11-24 LG Chem, Ltd. Block copolymer
EP3214102B1 (en) 2014-09-30 2022-01-05 LG Chem, Ltd. Block copolymer
WO2016053005A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
JP6538159B2 (ja) 2014-09-30 2019-07-03 エルジー・ケム・リミテッド ブロック共重合体
EP3202799B1 (en) 2014-09-30 2021-08-25 LG Chem, Ltd. Block copolymer
CN107686542B (zh) * 2016-08-30 2021-06-18 复旦大学 一种高度有序的含氟高分子材料

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015507066A (ja) * 2012-02-10 2015-03-05 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 高度ｘジブロックコポリマーの製造、精製及び使用
KR20170051350A (ko) * 2015-10-30 2017-05-11 이 아이 듀폰 디 네모아 앤드 캄파니 실질적으로 대칭인 3-아암 성상 블록 공중합체
JP2017082220A (ja) * 2015-10-30 2017-05-18 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 実質的に対称な３アーム星型ブロックコポリマー
KR102581298B1 (ko) 2015-10-30 2023-09-22 듀폰 일렉트로닉스, 인크. 실질적으로 대칭인 3-아암 성상 블록 공중합체
JP2020204006A (ja) * 2019-06-19 2020-12-24 昭和電工マテリアルズ株式会社 複合体及びその製造方法、並びに硬化性樹脂組成物
JP7338852B2 (ja) 2019-06-19 2023-09-05 学校法人神奈川大学 複合体及びその製造方法、並びに硬化性樹脂組成物

Also Published As

Publication number Publication date
CN104114594B (zh) 2017-05-24
WO2013120051A1 (en) 2013-08-15
EP2812369A1 (en) 2014-12-17
CN104114594A (zh) 2014-10-22
US20150004379A1 (en) 2015-01-01

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