CN104114594B - 高‑x两嵌段共聚物的制备、纯化和用途 - Google Patents

高‑x两嵌段共聚物的制备、纯化和用途 Download PDF

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Publication number
CN104114594B
CN104114594B CN201380008774.2A CN201380008774A CN104114594B CN 104114594 B CN104114594 B CN 104114594B CN 201380008774 A CN201380008774 A CN 201380008774A CN 104114594 B CN104114594 B CN 104114594B
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monomer
block
group
homopolymer
phenyl
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Chinese (zh)
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CN104114594A (zh
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W.B.发恩哈姆
M.T.舍汉
H.特兰六世
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DuPont Electronics Inc
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EI Du Pont de Nemours and Co
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C09D133/12—Homopolymers or copolymers of methyl methacrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN201380008774.2A 2012-02-10 2013-02-11 高‑x两嵌段共聚物的制备、纯化和用途 Active CN104114594B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261597530P 2012-02-10 2012-02-10
US61/597530 2012-02-10
PCT/US2013/025508 WO2013120051A1 (en) 2012-02-10 2013-02-11 Preparation, purification and use of high-x diblock copolymers

Publications (2)

Publication Number Publication Date
CN104114594A CN104114594A (zh) 2014-10-22
CN104114594B true CN104114594B (zh) 2017-05-24

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Country Link
US (1) US20150004379A1 (enExample)
EP (1) EP2812369A1 (enExample)
JP (1) JP2015507065A (enExample)
CN (1) CN104114594B (enExample)
WO (1) WO2013120051A1 (enExample)

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US9169383B2 (en) * 2012-02-10 2015-10-27 E I Du Pont De Nemours And Company Preparation, purification and use of high-X diblock copolymers
JP6521974B2 (ja) 2013-12-06 2019-05-29 エルジー・ケム・リミテッド ブロック共重合体
CN105934454B (zh) 2013-12-06 2019-01-18 株式会社Lg化学 嵌段共聚物
CN105899557B (zh) 2013-12-06 2018-10-26 株式会社Lg化学 嵌段共聚物
WO2015084123A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
CN105873968B (zh) 2013-12-06 2018-09-28 株式会社Lg化学 嵌段共聚物
CN105899556B (zh) 2013-12-06 2019-04-19 株式会社Lg化学 嵌段共聚物
EP3078695B1 (en) 2013-12-06 2020-11-04 LG Chem, Ltd. Block copolymer
JP6521975B2 (ja) 2013-12-06 2019-05-29 エルジー・ケム・リミテッド ブロック共重合体
CN105899560B (zh) 2013-12-06 2018-01-12 株式会社Lg化学 嵌段共聚物
JP6483694B2 (ja) 2013-12-06 2019-03-13 エルジー・ケム・リミテッド 単量体およびブロック共重合体
JP6410327B2 (ja) * 2013-12-06 2018-10-24 エルジー・ケム・リミテッド ブロック共重合体
CN105916904B (zh) 2013-12-06 2018-11-09 株式会社Lg化学 嵌段共聚物
CN105934456B (zh) 2013-12-06 2018-09-28 株式会社Lg化学 嵌段共聚物
WO2015084126A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
EP3088425B1 (en) * 2013-12-25 2020-09-30 Unimatec Co., Ltd. Fluorinated macroinitiator and method for producing same
JP5734406B1 (ja) * 2013-12-25 2015-06-17 ユニマテック株式会社 含フッ素２ブロック共重合体
EP3203496B1 (en) 2014-09-30 2021-12-29 LG Chem, Ltd. Method for producing patterned substrate
JP6532941B2 (ja) 2014-09-30 2019-06-19 エルジー・ケム・リミテッド ブロック共重合体
CN107075053B (zh) 2014-09-30 2019-05-21 株式会社Lg化学 嵌段共聚物
CN107075054B (zh) 2014-09-30 2020-05-05 株式会社Lg化学 嵌段共聚物
EP3202798B1 (en) 2014-09-30 2022-01-12 LG Chem, Ltd. Block copolymer
EP3214102B1 (en) 2014-09-30 2022-01-05 LG Chem, Ltd. Block copolymer
US10703897B2 (en) 2014-09-30 2020-07-07 Lg Chem, Ltd. Block copolymer
JP6524220B2 (ja) 2014-09-30 2019-06-05 エルジー・ケム・リミテッド ブロック共重合体
EP3202801B1 (en) 2014-09-30 2021-08-18 LG Chem, Ltd. Block copolymer
WO2016053007A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 패턴화 기판의 제조 방법
US9815947B2 (en) * 2015-10-30 2017-11-14 E I Du Pont De Nemours And Company Substantially symmetrical 3-arm star block copolymers
CN107686542B (zh) * 2016-08-30 2021-06-18 复旦大学 一种高度有序的含氟高分子材料
JP7338852B2 (ja) * 2019-06-19 2023-09-05 学校法人神奈川大学 複合体及びその製造方法、並びに硬化性樹脂組成物

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Publication number Publication date
EP2812369A1 (en) 2014-12-17
CN104114594A (zh) 2014-10-22
JP2015507065A (ja) 2015-03-05
US20150004379A1 (en) 2015-01-01
WO2013120051A1 (en) 2013-08-15

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