JP2012529133A5 - - Google Patents
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- Publication number
- JP2012529133A5 JP2012529133A5 JP2012514107A JP2012514107A JP2012529133A5 JP 2012529133 A5 JP2012529133 A5 JP 2012529133A5 JP 2012514107 A JP2012514107 A JP 2012514107A JP 2012514107 A JP2012514107 A JP 2012514107A JP 2012529133 A5 JP2012529133 A5 JP 2012529133A5
- Authority
- JP
- Japan
- Prior art keywords
- polishing composition
- substrate
- alumina particles
- polishing
- chemical mechanical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims description 31
- 239000002245 particle Substances 0.000 claims description 21
- 238000005498 polishing Methods 0.000 claims 42
- 238000000034 method Methods 0.000 claims 17
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 16
- 239000000758 substrate Substances 0.000 claims 14
- 239000000126 substance Substances 0.000 claims 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 8
- 239000008139 complexing agent Substances 0.000 claims 8
- 239000002736 nonionic surfactant Substances 0.000 claims 8
- -1 siloxane units Chemical group 0.000 claims 6
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 claims 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 4
- 229920001577 copolymer Polymers 0.000 claims 4
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 claims 4
- 239000004094 surface-active agent Substances 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Natural products NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims 2
- 239000004471 Glycine Substances 0.000 claims 2
- 125000003275 alpha amino acid group Chemical group 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 125000003630 glycyl group Chemical group [H]N([H])C([H])([H])C(*)=O 0.000 claims 2
- 239000007800 oxidant agent Substances 0.000 claims 2
- NGWOVIOEEGSBCX-UHFFFAOYSA-J tetrasodium;2-[1,2-dicarboxylatoethyl(hydroxy)amino]butanedioate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CC(C([O-])=O)N(O)C(CC([O-])=O)C([O-])=O NGWOVIOEEGSBCX-UHFFFAOYSA-J 0.000 claims 2
- 239000000725 suspension Substances 0.000 description 2
- 238000013019 agitation Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/455,631 US9330703B2 (en) | 2009-06-04 | 2009-06-04 | Polishing composition for nickel-phosphorous memory disks |
| US12/455,631 | 2009-06-04 | ||
| PCT/US2010/037158 WO2010141652A2 (en) | 2009-06-04 | 2010-06-03 | Polishing composition for nickel-phosphorous memory disks |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014167757A Division JP5856256B2 (ja) | 2009-06-04 | 2014-08-20 | ニッケル−リン記憶ディスク用の研磨組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012529133A JP2012529133A (ja) | 2012-11-15 |
| JP2012529133A5 true JP2012529133A5 (enExample) | 2013-04-04 |
| JP5684801B2 JP5684801B2 (ja) | 2015-03-18 |
Family
ID=43298492
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012514107A Active JP5684801B2 (ja) | 2009-06-04 | 2010-06-03 | ニッケル−リン記憶ディスク用の研磨組成物 |
| JP2014167757A Expired - Fee Related JP5856256B2 (ja) | 2009-06-04 | 2014-08-20 | ニッケル−リン記憶ディスク用の研磨組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014167757A Expired - Fee Related JP5856256B2 (ja) | 2009-06-04 | 2014-08-20 | ニッケル−リン記憶ディスク用の研磨組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9330703B2 (enExample) |
| JP (2) | JP5684801B2 (enExample) |
| CN (1) | CN102804345B (enExample) |
| MY (1) | MY158719A (enExample) |
| SG (1) | SG176661A1 (enExample) |
| TW (2) | TWI596202B (enExample) |
| WO (1) | WO2010141652A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8623766B2 (en) * | 2011-09-20 | 2014-01-07 | Cabot Microelectronics Corporation | Composition and method for polishing aluminum semiconductor substrates |
| US9039914B2 (en) * | 2012-05-23 | 2015-05-26 | Cabot Microelectronics Corporation | Polishing composition for nickel-phosphorous-coated memory disks |
| US8518135B1 (en) * | 2012-08-27 | 2013-08-27 | Cabot Microelectronics Corporation | Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks |
| SG11201602877RA (en) | 2013-10-18 | 2016-05-30 | Cabot Microelectronics Corp | Polishing composition and method for nickel-phosphorous coated memory disks |
| US10358579B2 (en) * | 2013-12-03 | 2019-07-23 | Cabot Microelectronics Corporation | CMP compositions and methods for polishing nickel phosphorous surfaces |
| US9401104B2 (en) | 2014-05-05 | 2016-07-26 | Cabot Microelectronics Corporation | Polishing composition for edge roll-off improvement |
| JP6495095B2 (ja) | 2014-05-20 | 2019-04-03 | 花王株式会社 | 磁気ディスク基板用研磨液組成物 |
| SG11201702051VA (en) * | 2014-10-14 | 2017-04-27 | Cabot Microelectronics Corp | Nickel phosphorous cmp compositions and methods |
| US9481811B2 (en) * | 2015-02-20 | 2016-11-01 | Cabot Microelectronics Corporation | Composition and method for polishing memory hard disks exhibiting reduced edge roll-off |
| US11384253B2 (en) | 2019-01-11 | 2022-07-12 | Cmc Materials, Inc. | Dual additive composition for polishing memory hard disks exhibiting edge roll off |
| JP7666904B2 (ja) * | 2020-09-30 | 2025-04-22 | 株式会社フジミインコーポレーテッド | 研磨用組成物 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100429440B1 (ko) * | 1995-07-27 | 2004-07-15 | 미쓰비시 가가꾸 가부시키가이샤 | 기체의표면처리방법및그에사용되는표면처리조성물 |
| US5958288A (en) * | 1996-11-26 | 1999-09-28 | Cabot Corporation | Composition and slurry useful for metal CMP |
| JP2000340532A (ja) * | 1999-05-31 | 2000-12-08 | Mitsubishi Materials Corp | 研磨用スラリー及びこれを用いた研磨方法 |
| JP4188598B2 (ja) * | 1999-08-13 | 2008-11-26 | キャボット マイクロエレクトロニクス コーポレイション | 停止化合物を伴う研磨系及びその使用方法 |
| US6471884B1 (en) * | 2000-04-04 | 2002-10-29 | Cabot Microelectronics Corporation | Method for polishing a memory or rigid disk with an amino acid-containing composition |
| US6623355B2 (en) * | 2000-11-07 | 2003-09-23 | Micell Technologies, Inc. | Methods, apparatus and slurries for chemical mechanical planarization |
| US20040232379A1 (en) * | 2003-05-20 | 2004-11-25 | Ameen Joseph G. | Multi-oxidizer-based slurry for nickel hard disk planarization |
| US20050045852A1 (en) * | 2003-08-29 | 2005-03-03 | Ameen Joseph G. | Particle-free polishing fluid for nickel-based coating planarization |
| US7524347B2 (en) * | 2004-10-28 | 2009-04-28 | Cabot Microelectronics Corporation | CMP composition comprising surfactant |
| JP2006282755A (ja) * | 2005-03-31 | 2006-10-19 | Dainippon Ink & Chem Inc | 有機無機ハイブリッド粒子水性分散体及びそれから得られる研磨スラリー |
| JP2007031594A (ja) * | 2005-07-27 | 2007-02-08 | Nippon Shokubai Co Ltd | ３−ヒドロキシ−２，２′−イミノジコハク酸塩類含有固体組成物及びその製造方法 |
| JP5142594B2 (ja) * | 2007-06-11 | 2013-02-13 | 花王株式会社 | ハードディスク基板の製造方法 |
| JP2008307676A (ja) * | 2007-06-18 | 2008-12-25 | Kao Corp | ハードディスク基板用研磨液組成物 |
| JP5192953B2 (ja) * | 2007-09-14 | 2013-05-08 | 三洋化成工業株式会社 | 磁気ディスク用ガラス基板洗浄剤 |
-
2009
- 2009-06-04 US US12/455,631 patent/US9330703B2/en active Active
-
2010
- 2010-05-20 TW TW103135280A patent/TWI596202B/zh active
- 2010-05-20 TW TW099116166A patent/TWI481680B/zh active
- 2010-06-03 MY MYPI2011005864A patent/MY158719A/en unknown
- 2010-06-03 JP JP2012514107A patent/JP5684801B2/ja active Active
- 2010-06-03 SG SG2011089638A patent/SG176661A1/en unknown
- 2010-06-03 WO PCT/US2010/037158 patent/WO2010141652A2/en not_active Ceased
- 2010-06-03 CN CN201080034414.6A patent/CN102804345B/zh not_active Expired - Fee Related
-
2014
- 2014-08-20 JP JP2014167757A patent/JP5856256B2/ja not_active Expired - Fee Related
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